Patents by Inventor Christian Marinus Leewis

Christian Marinus Leewis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of Measuring a Characteristic
    Publication number: 20100227280
    Abstract: During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.
    Type: Application
    Filed: February 23, 2010
    Publication date: September 9, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Anna Quaedackers, Paul Christiaan Hinnen, Antoine Gaston Marie Kiers, Christian Marinus Leewis
  • Method of Determining a Characteristic
    Publication number: 20100165312
    Abstract: A plurality of targets including a second population superimposed on a first population are formed. In the first target the second population has an asymmetry with respect to the first population. In the second target the second population has a different asymmetry with respect to the first population. Reflected radiation is detected from both the targets and used to determine different characteristics of the underlying populations.
    Type: Application
    Filed: December 18, 2009
    Publication date: July 1, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Henricus Johannes Lambertus Megens, Johannes Anna Quaedackers, Christian Marinus Leewis, Peter Clement Paul Vanoppen