Patents by Inventor Christian Wagner

Christian Wagner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7663741
    Abstract: To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: February 16, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Van Der Laan, Christian Wagner
  • Publication number: 20100007048
    Abstract: A melt feed device for an injection molding apparatus having at least one nozzle element connected both to a first hot runner and a second hot runner for feeding both the first melt and the second melt into an injection molding mold. The nozzle has three substantially concentrically arranged feed passages, wherein the innermost and the outermost feed passage are in communication with the first hot runner and the central feed passage is in communication with the second hot runner. A closure element is provided that can be reciprocated between a first position in which the closure element closes all feed passages, a second position in which the closure element opens the outermost feed passage but closes the other two feed passages and a third position in which the closure element opens all feed passages. The invention also includes process and molds using the device.
    Type: Application
    Filed: July 30, 2007
    Publication date: January 14, 2010
    Applicant: MHT Mold & Hotrunner Technology AG
    Inventors: Stefan Schweininger, Christian Wagner, Rainer Petry, Erich Winkler
  • Publication number: 20090275079
    Abstract: The invention relates to newly identified gene sequences that encode novel proteases obtainable from Aspergillus niger. The invention features the full length gene sequence of the novel genes, their cDNA sequences as well as the full-length functional protein and fragments thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with DNA according to the invention and cells wherein a protease according to the invention is genetically modified to enhance or reduce its activity and/or level of expression.
    Type: Application
    Filed: October 25, 2007
    Publication date: November 5, 2009
    Applicant: DSM IP ASSETS B.V.
    Inventors: Luppo Edens, Alard Van Albertus Dijk, Phillip Krubasik, Kaj Albermann, Alexander Stock, Erik Kimpel, Sabrine Klaubauer, Christian Wagner, Andreas Fritz, Wilk Von Gustedt, Oliver Henrich, Dieter Maier, Fabio Spreafico, Ulrike Folkers, Sylvia Hopper, Wolfram Kemmner, Pamela Tan, Josephine Stiebler, Ricahrd Albang
  • Patent number: 7605914
    Abstract: An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.
    Type: Grant
    Filed: January 2, 2009
    Date of Patent: October 20, 2009
    Assignee: Carl Zeiss SMT AG
    Inventors: Thomas Stammler, Christian Wagner, Gerd Reisinger
  • Publication number: 20090232936
    Abstract: The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel lipolytic enzyme from Aspergillus niger The invention features the full length nucleotide sequence of the novel gene, the cDNA sequence comprising the full length coding sequence of the novel lipolytic enzyme as well as the amino acid sequence of the full-length functional protein and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein a lipolytic enzyme according to the invention is genetically modified to enhance its activity and/or level of expression.
    Type: Application
    Filed: May 6, 2009
    Publication date: September 17, 2009
    Applicant: DSM IP ASSETS B.V.
    Inventors: Richard Albang, Andreas Fritz, Oliver Heinrich, Hilmar Ilgenfritz, Dieter Maier, Christian Wagner, Ulrike Folkers, Beatrix Gerhard, Fabio Spreafico, Lex De Boer, Roelf Bernhard Meima
  • Patent number: 7588925
    Abstract: The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel phospholipase isolated from Aspergillus niger. The invention features the full length nucleotide sequence of the novel gene, the cDNA sequence comprising the full length coding sequence of the novel phospholipase as well as the amino acid sequence of the full-length functional protein and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein a phospholipase according to the invention is genetically modified to enhance or reduce its activity and/or level of expression.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: September 15, 2009
    Assignee: DSM IP Assets B.V.
    Inventors: Kaj Albermann, Wolfram Kemmner, Dieter Maier, Fabio Spreafico, Alexander Stock, Christian Wagner, Lex De Boer, Roelf Bernhard Meima
  • Publication number: 20090225308
    Abstract: An optical system has at least two optical elements whose spatial relation with respect to each other can be changed. At least one of the optical elements comprises a plurality of optical components. The optical system comprises first measuring means for individually measuring an image defect of each optical component, and first computing means for computing first target positions for the plurality of optical components such that an overall image defect of the at least one of the optical elements is below a predetermined threshold value. Second measuring means are provided for measuring an overall image defect of the optical system, and second computing means represent the measured overall image defect as a linear combination of base functions of an orthogonal function set. The second computing means calculate second target position for the at least two optical elements so as to reduce the overall image defect.
    Type: Application
    Filed: January 2, 2009
    Publication date: September 10, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Thomas Stammler, Christian Wagner, Gerd Reisinger
  • Publication number: 20090212459
    Abstract: The invention concerns a system for the post-treatment of preforms (7) produced in an injection molding mold, comprising at least two post-treatment tools which each have a receiving plate (4) which has a group of receiving cavities (2) and a pin plate (6) which has a group of post-treatment pins (3), and a device for transferring the preforms (7) from the injection molding mold alternately into the at least two post-treatment tools. In order to provide a method of and a system for the post-treatment of preforms produced in an injection molding mold, which on the one hand allows early removal of the preform from the injection molding tool and which on the other hand allows reliable post-treatment in particular of the interior of the preform after removal from the injection molding mold, it is proposed in accordance with the invention that the post-treatment pins (3) remain in the preforms for a period of time which is longer than the mold stand time.
    Type: Application
    Filed: November 10, 2006
    Publication date: August 27, 2009
    Applicant: MHT Mold & Hotrunner Technology AG
    Inventors: Witold Neter, Helmut Thoemmes, Rainer Petry, Christian Wagner
  • Publication number: 20090167459
    Abstract: A duplexer is described herein. The duplexer includes a transmission branch configured to allow passage of signals in a transmission band. The duplexer also includes a reception branch configured to allow passage of signals in a reception band. The duplexer also includes a band rejection filter in the transmission branch configured to produce a short circuit to an electrical ground in a stopband. The stopband at least partially overlaps the reception band.
    Type: Application
    Filed: January 31, 2007
    Publication date: July 2, 2009
    Inventors: Michael Jakob, Gholamreza Dadgar Javid, Maximilian Pitschi, Karl-Christian Wagner, Juergen Kiwitt
  • Publication number: 20090161089
    Abstract: A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid.
    Type: Application
    Filed: December 5, 2008
    Publication date: June 25, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Antonius LEENDERS, Sjoerd Nicolaas Lambertus Donders, Christian Wagner, Rogier Hendrikus Magdalena Cortie
  • Publication number: 20090162473
    Abstract: A neck block of a moulding tool for the production of a hollow body preform by means of injection moulding, wherein the neck block has a main body with a shaping surface which is adapted to the external contour of a neck portion of the hollow body preform to be produced and is provided to come into contact in the injection moulding operation with the neck portion of the hollow body preform, wherein furthermore there is provided at least one cooling passage for a cooling fluid which at least portion-wise extends substantially parallel to the shaping surface. The neck block is further provided with an inlet and an outlet and an inlet passage and an outlet passage which connect the inlet and the outlet respectively to the cooling passage. The cooling passage is arranged closer to the shaping surface than the inlet and the outlet.
    Type: Application
    Filed: November 28, 2006
    Publication date: June 25, 2009
    Applicant: MHT Mold & Hortrunner Technology AG
    Inventors: Witold Neter, Marek Hoenisch, Klaus Wegmann, Stefan Schweininger, Christian Wagner
  • Patent number: 7550280
    Abstract: The invention relates to a newly identified polynucleotide sequence comprising a gene that encodes a novel lipolytic enzyme from Aspergillus niger. The invention features the full length nucleotide sequence of the novel gene, the cDNA sequence comprising the full length coding sequence of the novel lipolytic enzyme as well as the amino acid sequence of the full-length functional protein and functional equivalents thereof. The invention also relates to methods of using these enzymes in industrial processes and methods of diagnosing fungal infections. Also included in the invention are cells transformed with a polynucleotide according to the invention and cells wherein a lipolytic enzyme according to the invention is genetically modified to enhance its activity and/or level of expression.
    Type: Grant
    Filed: August 15, 2003
    Date of Patent: June 23, 2009
    Assignee: DSM IP Assets B.V.
    Inventors: Richard Albang, Andreas Fritz, Oliver Heinrich, Hilmar Ilgenfritz, Dieter Maier, Christian Wagner, Ulrike Folkers, Beatrix Gerhard, Fabio Spreafico, Lex De Boer, Roelf Bernhard Meima
  • Patent number: 7517213
    Abstract: A cooling system for cooling tool parts. The system includes at least one base system including a fluid guided from a fluid inlet through connector lines to a fluid outlet. The tool parts are connected in the direction of through-flow between at least one connector line connected to the fluid inlet and at least one connected to the fluid outlet, wherein, between the at least one connector line connected to the fluid inlet and the at least one connector line connected to the fluid outlet, at least one additional connector line and tool parts which are in flow communication therewith are placed in between such that, on its flow path, the fluid flows through at least two tool parts one after the other.
    Type: Grant
    Filed: February 10, 2004
    Date of Patent: April 14, 2009
    Assignee: MHT Mold & Hotrunner Technology AG
    Inventors: Manfred Lausenhammer, Christian Wagner
  • Publication number: 20090022780
    Abstract: The invention is related to gel preparations capable of absorbing as well as releasing liquid, and the use of such gel preparations in the treatment of wounds.
    Type: Application
    Filed: January 31, 2007
    Publication date: January 22, 2009
    Applicant: EURO-CELTIQUE S.A.
    Inventors: Sabine Scherer, Christian Wagner, Christian Leuner, Wolfgang Fleischer
  • Publication number: 20080315972
    Abstract: A transducer includes an acoustic track in which an acoustic wave can be propagated, the acoustic track having a transversal fundamental mode, the acoustic track being subdivided in a transversal direction into an excitation area and two peripheral areas. The transducer also includes a first outside area and a second outside area bordering the acoustic track such that the acoustic track is arranged in the transversal direction between the first and second outside area. The transducer also includes peripheral areas configured such that the longitudinal phase velocity vRB of the acoustic wave in the respective peripheral area is greater than the longitudinal phase velocity vMB of the wave in the excitation area.
    Type: Application
    Filed: December 18, 2006
    Publication date: December 25, 2008
    Inventors: Markus Mayer, Karl Christian Wagner, Andreas Bergmann
  • Publication number: 20080212052
    Abstract: An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat that results lacks symmetry corresponding to the shape of the optical element. A connecting structure is provided between the optical element and the mount and has a symmetry that does not correspond to the shape of the optical element and effects an at least partial homogenization of the temperature distribution in the optical element.
    Type: Application
    Filed: May 13, 2008
    Publication date: September 4, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: Christian Wagner, Michael Trunz, Ralf Hilgers
  • Publication number: 20080143992
    Abstract: A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus.
    Type: Application
    Filed: January 30, 2008
    Publication date: June 19, 2008
    Applicants: ASML NETHERLANDS B.V., Carl Zeiss SMT AG
    Inventors: Christian Wagner, Wilhelmus Petrus De Boeij, Roel De Jonge, Tilmann Heil, Damian Fiolka
  • Publication number: 20080137053
    Abstract: A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
    Type: Application
    Filed: January 28, 2008
    Publication date: June 12, 2008
    Applicants: ASML Netherlands B.V, ASML Holding N.V.
    Inventors: Arno Jan BLEEKER, Johannes Jacobus Matheus Baselmans, Marce Mathijs Theodore Marie Dierichs, Stanislav Smirnov, Christian Wagner, Lev Ryzhikov, Kars Zeger Troost
  • Patent number: 7382536
    Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: June 3, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
  • Patent number: RE40743
    Abstract: A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate.
    Type: Grant
    Filed: August 11, 2004
    Date of Patent: June 16, 2009
    Assignee: Carl Zeiss SMT AG
    Inventors: Gerhard Fuerter, Christian Wagner, Uwe Goedecke, Henriette Mueller