Patents by Inventor Christine H. Tsau

Christine H. Tsau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100276185
    Abstract: A structure that may be used in substrate solder bumping comprises a substrate (110), a solder resist layer (120) disposed over the substrate, a plurality of solder resist openings (121) in a surface (122) of the solder resist layer, a conformal barrier layer (130) having a first portion (131) over the surface of the solder resist layer and a second portion (132) in the solder resist openings, a mask layer (140) over the first portion of the conformal barrier layer, and a solder material (150) in the solder resist openings over the metal layer. The conformal barrier layer acts as a barrier against interaction between the solder resist layer and the mask layer during solder reflow.
    Type: Application
    Filed: July 14, 2010
    Publication date: November 4, 2010
    Inventors: Ravi K. Nalla, Christine H. Tsau, Mark S. Hlad
  • Patent number: 7776734
    Abstract: A structure that may be used in substrate solder bumping comprises a substrate (110), a solder resist layer (120) disposed over the substrate, a plurality of solder resist openings (121) in a surface (122) of the solder resist layer, a conformal barrier layer (130) having a first portion (131) over the surface of the solder resist layer and a second portion (132) in the solder resist openings, a mask layer (140) over the first portion of the conformal barrier layer, and a solder material (150) in the solder resist openings over the metal layer. The conformal barrier layer acts as a barrier against interaction between the solder resist layer and the mask layer during solder reflow.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: August 17, 2010
    Assignee: Intel Corporation
    Inventors: Ravi K. Nalla, Christine H. Tsau, Mark S. Hlad
  • Publication number: 20100062565
    Abstract: A microchip has a bonding material that bonds a first substrate to a second substrate. The bonding material has, among other things, a rare earth metal and other material.
    Type: Application
    Filed: May 4, 2009
    Publication date: March 11, 2010
    Applicant: ANALOG DEVICES, INC.
    Inventors: John R. Martin, Christine H. Tsau, Timothy J. Frey
  • Publication number: 20100059835
    Abstract: A method of forming an inertial sensor provides 1) a device wafer with a two-dimensional array of inertial sensors and 2) a second wafer, and deposits an alloy of aluminum/germanium onto one or both of the wafers. The alloy is deposited and patterned to form a plurality of closed loops. The method then aligns the device wafer and the second wafer, and then positions the alloy between the wafers. Next, the method melts the alloy, and then solidifies the alloy to form a plurality of conductive hermetic seal rings about the plurality of the inertial sensors. The seal rings bond the device wafer to the second wafer. Finally, the method dices the wafers to form a plurality of individual, hermetically sealed inertial sensors.
    Type: Application
    Filed: May 4, 2009
    Publication date: March 11, 2010
    Applicant: ANALOG DEVICES, INC.
    Inventors: John R. Martin, Timothy J. Frey, Christine H. Tsau
  • Publication number: 20070275550
    Abstract: A structure that may be used in substrate solder bumping comprises a substrate (110), a solder resist layer (120) disposed over the substrate, a plurality of solder resist openings (121) in a surface (122) of the solder resist layer, a conformal barrier layer (130) having a first portion (131) over the surface of the solder resist layer and a second portion (132) in the solder resist openings, a mask layer (140) over the first portion of the conformal barrier layer, and a solder material (150) in the solder resist openings over the metal layer. The conformal barrier layer acts as a barrier against interaction between the solder resist layer and the mask layer during solder reflow.
    Type: Application
    Filed: May 26, 2006
    Publication date: November 29, 2007
    Inventors: Ravi K. Nalla, Christine H. Tsau, Mark S. Hlad