Abstract: An insert for a source chamber of an EUV radiation source has a pressure stage and, spaced apart from it, a stop.

Abstract: An inner insert for a passage opening in an outer insert for an EUV radiation source is embodied in multiple parts and/or has a plurality of sections that extend in the longitudinal direction and have different internal diameters (di, da).

Abstract: An inner insert for a passage opening in an outer insert for an EUV radiation source is embodied in multiple parts and/or has a plurality of sections that extend in the longitudinal direction and have different internal diameters (di, da).

Abstract: The present invention relates to an optical device and a method of in situ treating an optical component (2, 6, 13) reflecting EUV and/or soft X-ray radiation in said optical device, said optical component (2, 6, 13) being arranged in a vacuum chamber (14) of said optical device and comprising one or several reflecting surfaces (3) having a top layer of one or several surface materials. In the method, a source (1, 5) of said one or several surface materials is provided in said chamber (14) of said optical device and surface material from said source (1, 5) is deposited on said one or several reflecting surfaces (3) during operation and/or during operation-pauses of said optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.

Abstract: Disclosed herein a rotational type foil trap that is capable of avoiding the transmission rate of the EUV light to be lowered even when the EUV light source operates with the high input power and also suppressing the temperature increase of the foil to attain a sufficient life duration. In the rotational type foil trap, one end of each of foils is inserted into each of a plurality of grooves provided on a side face of a center support, and the center support and the each of the foils are fixed together by brazing.

Abstract: The present invention relates to a method of manufacturing mirror shells of a nested shells grazing incidence mirror, in particular for EUV radiation and/or X-rays. In the method a blank of a bulk material is provided and machined to form a mirror body of the shell. Mechanical structures are integrated and/or attached to the mirror body during and/or after the machining step. The mechanical structures are required for mounting and/or operating the mirror shells. After these steps the optical surface is formed on the mirror body by diamond turning. The proposed method allows the manufacturing of mirror shells of a nested shells grazing incidence mirror at low costs with high optical quality which may also be refurbished one or several times.

Abstract: Disclosed herein a rotational type foil trap that is capable of avoiding the transmission rate of the EUV light to be lowered even when the EUV light source operates with the high input power and also suppressing the temperature increase of the foil to attain a sufficient life duration. In the rotational type foil trap, one end of each of foils is inserted into each of a plurality of grooves provided on a side face of a center support, and the center support and the each of the foils are fixed together by brazing.

Abstract: The present invention relates to an optical device and a method of in situ treating an optical component (2, 6, 13) reflecting EUV and/or soft X-ray radiation in said optical device, said optical component (2, 6, 13) being arranged in a vacuum chamber (14) of said optical device and comprising one or several reflecting surfaces (3) having a top layer of one or several surface materials. In the method, a source (1, 5) of said one or several surface materials is provided in said chamber (14) of said optical device and surface material from said source (1, 5) is deposited on said one or several reflecting surfaces (3) during operation and/or during operation-pauses of said optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.

Abstract: A method of in situ treating an optical component reflecting EUV and/or soft X-ray radiation in an optical device includes providing at least one source of one or several surface materials in a vacuum chamber of the optical device where the optical component is arranged. The optical component includes one or several reflecting surfaces having a top layer of one or several surface materials. The method includes providing a source of the one or several surface materials in the chamber, and depositing surface material from the source on the one or several reflecting surfaces during operation and/or during operation-pauses of the optical device in order to cover or substitute deposited contaminant material and/or to compensate for ablated surface material.

Abstract: The invention relates to an improved EUV generating device having a contamination captor for “catching” contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.

Abstract: The present invention relates to a method of manufacturing mirror shells of a nested shells grazing incidence mirror, in particular for EUV radiation and/or X-rays. In the method a blank of a bulk material is provided and machined to form a mirror body of the shell. Mechanical structures are integrated and/or attached to the mirror body during and/or after the machining step. The mechanical structures are required for mounting and/or operating the mirror shells. After these steps the optical surface is formed on the mirror body by diamond turning. The proposed method allows the manufacturing of mirror shells of a nested shells grazing incidence mirror at low costs with high optical quality which may also be refurbished one or several times.

Abstract: The present invention relates to an electrode system, in particular of a gas discharge device for generating EUV radiation and/or soft X-rays. The electrode system comprises at least two electrodes (1, 2) formed of an electrode material which contains Mo or W or an alloy of Mo or W as a main component. The electrode material has a fine grained structure with fine grains having a mean size of <500 nm. With the proposed electrode system, a high thermo-mechanical and thermo-chemical resistance of the electrodes is achieved. The electrode system can therefore be used in known EUV light sources using liquid Sn and being operated at high temperatures.

Abstract: The present invention relates to a foil trap device for debris mitigation, in particular in an EUV system. The foil trap comprises a plurality of spaced apart foils (4) extending from an entrance side towards an exit side of the foil trap, said foils (4) being arranged to allow a straight pass of radiation between the entrance side and the exit side. The foils (4) are coated at least at entrance side edges with a layer (8, 11) of a carbon material containing a fraction of at least 60% of sp3-hybridized carbon atoms, or with a layer (8, 11) of carbon nanotubes. As an alternative, the foils (4) are made of a bulk carbon material of the above composition. The proposed foil trap offers the combination of a high thermal conductivity, a high thermo-chemical resistance against Sn and other liquid metals and a high mechanical stiffness.

Abstract: A bulk acoustic wave resonator comprising a substrate, a Bragg reflector, a top and a bottom electrode and a piezoelectric layer with means for suppression of the pass-band ripples in a bulk acoustic wave filter. The means for absorbing or scattering the spurious modes are a roughened rear side of the substrate, an absorbing layer disposed on the rear side of the substrate and/or an absorbing layer disposed on the front side of the substrate.

Abstract: The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of ?5 nm and essentially made out of a material with a sputter resistance of ?10 nm per 108 shots and whereby the second layer is provided in the path of the incident and/or reflected EUV light.

Abstract: The invention relates to an improved EUV generating device having coated supply pipes for the liquid tin, in order to provide an extreme UV radiation generating device which is capable of providing a less contaminated flow of tin to and from a plasma generating part.

Abstract: The present invention relates to a foil trap device for debris mitigation, in particular in an EUV system. The foil trap comprises a plurality of spaced apart foils (4) extending from an entrance side towards an exit side of the foil trap, said foils (4) being arranged to allow a straight pass of radiation between the entrance side and the exit side. The foils (4) are coated at least at entrance side edges with a layer (8, 11) of a carbon material containing a fraction of at least 60% of sp3-hybridized carbon atoms, or with a layer (8, 11) of carbon nanotubes. As an alternative, the foils (4) are made of a bulk carbon material of the above composition. The proposed foil trap offers the combination of a high thermal conductivity, a high thermo-chemical resistance against Sn and other liquid metals and a high mechanical stiffness.

Abstract: The present invention relates to an electrode system, in particular of a gas discharge device for generating EUV radiation and/or soft X-rays. The electrode system comprises at least two electrodes (1, 2) formed of an electrode material which contains Mo or W or an alloy of Mo or W as a main component. The electrode material has a fine grained structure with fine grains having a mean size of <500 nm. With the proposed electrode system, a high thermo-mechanical and thermo-chemical resistance of the electrodes is achieved. The electrode system can therefore be used in known EUV light sources using liquid Sn and being operated at high temperatures.

Abstract: The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting EUV-radiation and/or soft X-rays, a first volume (40) following said radiation source (1, 31) and containing first optical components (3, 33) with said optical surfaces, and a second volume (41) following said first volume (40) and containing second optical components (38). The method comprises at least one cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces, thereby forming volatile compounds with contaminations deposited on said optical surfaces, wherein said compounds are pumped out of the first volume (40) together with the first gas or gas mixture.

Abstract: The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture.