Abstract: The invention relates to a process for controlling the structure of a block copolymer by selective copolymerization, by ring opening, of cyclic carbonate and lactone monomers in the presence of a catalyst based on methanesulfonic acid, the said process comprising a sequence of stages carried out strictly in the following order: a) dissolving the cyclic carbonate monomer in a nonchlorinated aromatic solvent, b) adding, to the monomer solution, a bifunctional initiator chosen from diols or water, c) adding methanesulfonic acid (MSA) as catalyst of the polymerization reaction, d) when all the cyclic carbonate has been consumed, a telechelic polycarbonate capable of acting as macroinitiator of polymerization of the lactone is obtained, e) adding the lactone to the reaction medium in order to selectively obtain a block copolymer.

Abstract: The present invention relates to a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.

Abstract: A method for controlling the synthesis of a block copolymer containing at least two blocks, with at least one nonpolar block and at least one polar block, said method making it possible in particular to control the ratio between the blocks and the molecular weight of each of the blocks, said copolymer being a block copolymer intended to be used as a mask in a method of nanolithography by direct self-assembly (DSA), said control being achieved by semicontinuous anionic polymerization in an aprotic nonpolar medium.

Abstract: The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.

Abstract: The present invention relates to thermoplastic compositions comprising as impact modifier a rubber containing graft polymer prepared by the process of emulsion polymerization and recovered by a special process controlling and adjusting the pH value, the use of the thermoplastic compositions in the production of molded bodies, and to the molded, bodies themselves. The present invention relates also to thermoplastic compositions comprising a polymeric impact modifier with a core-shell structure made by a multistage process and recovered by a special process controlling and adjusting the pH value comprising at least one gradient polymer the use of the thermoplastic compositions in the production of molded bodies, and to the molded, bodies themselves.

Abstract: The invention relates to a process for reducing the defectivity of a block copolymer (BCP1) film, the lower surface of which is in contact with a preneutralized surface (N) of a substrate (S) and the upper surface of which is covered by an upper surface neutralization layer (TC) in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, where the upper surface neutralization layer (TC) employed to cover the upper surface of the block copolymer (BCP1) film comprises a second block copolymer (BCP2).

Abstract: The invention relates to a process for controlling the surface energy at the upper interface of a block copolymer (BCP1), the lower interface of which is in contact with a preneutralized surface of a substrate, in order to make it possible to obtain an orientation of the nanodomains of the block copolymer (BCP1) perpendicularly to the two lower and upper interfaces, the said process consisting in covering the upper surface of the block copolymer (BCP1) with an upper surface neutralization layer (TC) and being characterized in that the said upper surface neutralization layer (TC) comprises a second block copolymer (BCP2).

Abstract: The present invention relates to a process for obtaining high-period (typically >10 nm), thick (typically >20 nm) ordered films on a nanometric scale comprising a block copolymer (BCP). The invention also relates to the compositions used to obtain these thick ordered films and to the resulting ordered films that can be used in particular as masks in the lithography field.

Abstract: The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).

Abstract: The invention relates to a process for synthesizing poly(3,4-ethylenedioxythiophene)-electrolytic (co)polymer composite in a single step.

Abstract: The present invention relates to a process for reducing the assembly time comprising a block copolymer (BCP). The invention also relates to the compositions used to obtain these ordered films and to the resulting ordered films that can be used in particular as masks in the lithography field.

Abstract: The present invention relates to a process for reducing the number of defects in an ordered film comprising a block copolymer (BCP). The invention also relates to the compositions used to obtain these ordered films and to the resulting ordered films that can be used in particular as masks in the lithography field.

Abstract: The present invention relates to a multistage polymer, its composition, its process of preparation, and its use as impact modifier in thermoplastic compositions. More particularly the present invention relates to a process for manufacturing a polymer composition comprising a multistage polymer and its use as impact modifier in thermoplastic compositions.

Abstract: The present invention relates to a method for controlling the level of defects in films obtained using a composition comprising a blend of block copolymers and polymers deposited on a surface. The polymers comprise at least one monomer identical to those present in one or other block of the block copolymers.

Abstract: The present invention relates to a method for preparing a copolymer from at least one cyclic monomer selected from: a lactone, a lactam, a carbonate, a lactide and a glycolide, an oxazoline, an epoxide, a cyclosiloxane, comprising the step consisting of reacting said cyclic monomer in the presence of a substituted phosphorus-containing compound. It also relates to the polymer composition obtained according to this method, as well as the uses thereof, notably as antistatic additives, biocompatible materials, as membranes for treatment of effluents or in electrochemical systems for energy storage.

Abstract: The present invention relates to new impact modifiers and a process for making these new impact modifiers and their use in polymeric compositions. More particularly the present invention relates to a new polymeric impact modifier with a core-shell structure made by a multistage polymerization process comprising at least one gradient polymer. The present invention relates as well to a process preparing such an impact modifier, especially its recovery process after the end of the polymerization. The present invention also relates to a thermoplastic composition comprising the new impact modifier.

Abstract: The invention relates to a method for eliminating metal ions from a viscous organic solution, the viscosity of which at 20° C. is between 1 and 1000 cP. This method comprises the steps consisting in placing a macroporous ion-exchange resin in a column, said resin comprising at least one acid resin of carboxylic type, based on a copolymer having active groups in carboxylic form (CO2H), then in continuously passing said viscous organic solution over said ion-exchange resin.

Abstract: The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).

Abstract: The invention concerns a manufacturing method for nanolithography masks from a PS-b-PMMA block copolymer film deposited on a surface to be etched, said copolymer film comprising PMMA nanodomains orientated perpendicularly to the surface to be etched, said method being characterized in that it comprises the following steps: partially irradiating said copolymer film to form a first irradiated area and a second non-irradiated area in said copolymer film, then treating said copolymer film in a developer solvent to selectively remove at least said PMMA nanodomains of said first irradiated area of said copolymer film.

Abstract: The invention relates to novel block copolymers that enable a good dispersion of nanofillers in water and also to a dispersion of nanofillers obtained owing to these block copolymers. This dispersion may be used as a transparent electrode in organic solar cells or other photoemitter or photoreceptor devices.