Abstract: A photonics device is described. The photonics device includes a plurality of unit cells. Each of the unit cells includes a first portion of a waveguide, an electrode section proximate to the first portion of the waveguide, and an integrated circuit (IC) driver coupled to and configured to drive the electrode section. The unit cells are adjacent and distributed along a second portion of the waveguide. The waveguide includes at least one electro-optic material possessing a Pockels Effect. The waveguide is also configured to carry an optical signal. The IC driver, the electrode section, and the first portion of the waveguide for each of the unit cells are integrated into the photonics device. The unit cells are configured such that the photonics device has a 3 dB bandwidth of at least 70 GHz and the first portion of the waveguide has a length not exceeding five hundred micrometers.

Abstract: Methods and systems for data distribution are described herein. In one aspect, a method can include receiving, by at least one worker node (WN) 110 of a plurality of WNs of a data distribution system, a job definition from a job manager, wherein the job definition comprises a set of processes to be performed on a set of data request; sending, by the WN 110 and to an extended binary access manager (BAMEx) 140, a request for the data; receiving, by the WN 110 and from the BAMEx 140, the data based on the request for the data; performing, by the WN 110, one or more processes according to the job definition; generating, by the WN 110, a set of results files comprising results of at least one of the performed one or more processes; and sending, by the WN 110, the set of results files to the BAMEx 140.

Abstract: A method of forming a line cut structure in a space separating lines of a line pattern formed in or on a substrate includes conformally depositing a conformal layer on at least one sidewall of a cut window in a resist layer and through the cut window on a portion of the space, etching the conformal layer from horizontal surfaces of the substrate leaving a cut sidewall spacer on the at least one sidewall, and removing the resist layer to form the line cut structure from the cut sidewall spacer. The method may further include forming a metal cut in a metal line by etching a dielectric layer to transfer the line pattern and the line cut structure into the dielectric layer forming a dielectric line cut structure and then forming a metal layer including the metal line in the dielectric layer.

Abstract: A method of processing a substrate that includes: forming recesses in a first mask layer over a mask stack including a lower hardmask, a middle mask, and an upper hardmask, the recesses defining an initial pattern including a plurality of spacer structures, each of the spacer structures having a first sidewall and an opposite second sidewall, the first sidewall having a different height from the second sidewall; etching the upper hardmask, selectively to the middle mask, to transfer the initial pattern to the upper hardmask; etching the middle mask, selectively to the lower hardmask and the patterned upper hardmask, to transfer a pattern of the patterned upper hardmask to the middle mask; and etching the lower hardmask, selectively to the patterned middle mask, to transfer a pattern of the patterned middle mask to the lower hardmask.

Abstract: Methods of manufacturing a semiconductor device are disclosed. The method includes providing a structure comprising an organic mandrel formed in a pattern and an underlying layer. The method includes hardening the organic mandrel including forming a silicon-based layer along an outer portion of the organic mandrel. The method includes depositing a spacer layer over the hardened organic mandrel.

Abstract: Disclosed herein are machine learning-based particle classification systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a particle classification system may include: an electronic processing device configured to: receive, from an imaging flow cytometer instrument, a test set comprising unlabeled data to classify; pool the test set and a training set into a concatenated dataset comprising a plurality of parameters, wherein the training set comprises labeled data; normalize the concatenated dataset by bringing the variance to one for each of the plurality of parameters; non-linearly reduce a dimensionality of the normalized concatenated dataset to a reduced dimension space; compute classification parameters by classifying the unlabeled data from the reduced dimension space using the labeled data from the reduced dimension space; and provide the classification parameters for further processing.

Abstract: An optical modulator including a driving module, waveguide(s), and differential electrodes is described. The driving module has a first number of differential inputs and a second number of differential outputs. The second number is equal to the first number multiplied by an even integer. The waveguide(s) include a thin film lithium-containing (TFLC) electro-optic material. Each of the waveguide(s) has multiple arms. The differential electrodes are coupled to the second number of differential outputs, each of the plurality of differential electrodes including a positive electrode and a negative electrode, at least a portion of an arm of the plurality of arms between a portion of the positive electrode and a portion of the negative electrode.

Abstract: A pulley block that includes a first side plate, a second side plate and an axle received in the first side plate and the second side plate. The axle is fixed with the first side plate and in a floating relationship with the second side plate such that the second side plate is retained on the axle and capable of rotating around the axle. The axle defines a central opening configured for receiving a soft shackle and a pulley supported on the axle between the first side plate and the second side plate in a longitudinal direction of the axle. The pulley is configured for receiving a winch line around an outer perimeter thereof. Also a method of installing a winch line on such a pulley block.

Abstract: A method for processing a substrate includes forming a first hardmask layer over a target layer and a second hardmask layer over the first hardmask layer, and patterning the second hardmask layer. The method further includes forming a tone inversion mask between portions of the patterned second hardmask layer, removing the patterned second hardmask layer, patterning the first hardmask layer using the tone inversion mask as an etching mask, and etching the target layer using the patterned first hardmask layer as another etching mask.

Abstract: Embodiments herein are directed to an energy device. The energy device includes a housing, an insert sleeve, a magnet, and a control circuit. The insert sleeve has a through bore, and is positioned within a bore of the housing. The insert sleeve has an exterior surface and at least one coil solenoid positioned on the exterior surface. The magnet is configured to traverse the through bore to generate an energy through induction with the at least one coil solenoid. The control circuit includes a battery and an electrical connection interface and is communicatively coupled to the at least one coil solenoid. When the magnet is manually forced to traverse the through bore in a repetitive manner, an oscillation of the magnet generates the energy through induction with the at least one coil solenoid such that the battery is energized to provide a charging energy to an external personal electronic device.

Abstract: A method of processing a substrate that includes: forming recesses in a first mask layer over a mask stack including a lower hardmask, a middle mask, and an upper hardmask, the recesses defining an initial pattern including a plurality of spacer structures, each of the spacer structures having a first sidewall and an opposite second sidewall, the first sidewall having a different height from the second sidewall; etching the upper hardmask, selectively to the middle mask, to transfer the initial pattern to the upper hardmask; etching the middle mask, selectively to the lower hardmask and the patterned upper hardmask, to transfer a pattern of the patterned upper hardmask to the middle mask; and etching the lower hardmask, selectively to the patterned middle mask, to transfer a pattern of the patterned middle mask to the lower hardmask.

Abstract: A substrate processing method is described for etching silicon carbide films for resist underlayer applications. The method includes providing a substrate containing a silicon carbide film thereon, and a photoresist layer defining a pattern over the silicon carbide film, plasma-exciting an etching gas containing a fluorocarbon-containing gas and an oxygen-containing gas, and exposing the substrate to the plasma-excited etching gas to transfer the pattern to the silicon carbide film, where at least a portion of a thickness of the photoresist layer survives the exposing. For example, the photoresist layer includes an EUV resist layer and the etching gas includes C4F8 gas, O2 gas, and Ar gas. In another example, the exposing includes exposing the substrate to a) a plasma-excited etching gas containing C4F8 gas, O2 gas, and Ar gas, and b) exposing the substrate to a plasma-excited Ar gas, where steps a) and b) are sequentially performed at least once.

Abstract: The present disclosure provides a building unit comprising first and second light transmissive panels. The first panel defines a light receiving surface. The building unit also comprises a structure supporting the panels in a spaced apart relationship to form 5 a cavity therebetween. In addition, the building unit comprises one or more photovoltaic cells disposed within the cavity adjacent the structure. The building unit also comprises an arrangement supported by the structure for re-directing non-visible wavelengths of sunlight incident on or passing through the light receiving surface in a direction generally transverse to a plane of the unit toward structure for collection by 10 the one or more photovoltaic elements. Further, the building unit comprises one or more electrically powered devices within the cavity and arranged to receive electrical power generated by the one or photovoltaic cells.

Abstract: A pulley block that includes a first side plate, a second side plate and an axle received in the first side plate and the second side plate. The axle is fixed with the first side plate and in a floating relationship with the second side plate such that the second side plate is retained on the axle and capable of rotating around the axle. The axle defines a central opening configured for receiving a soft shackle and a pulley supported on the axle between the first side plate and the second side plate in a longitudinal direction of the axle. The pulley is configured for receiving a winch line around an outer perimeter thereof. Also a method of installing a winch line on such a pulley block.

Abstract: A substrate processing method is described for etching silicon carbide films for resist underlayer applications. The method includes providing a substrate containing a silicon carbide film thereon, and a photoresist layer defining a pattern over the silicon carbide film, plasma-exciting an etching gas containing a fluorocarbon-containing gas and an oxygen-containing gas, and exposing the substrate to the plasma-excited etching gas to transfer the pattern to the silicon carbide film, where at least a portion of a thickness of the photoresist layer survives the exposing. For example, the photoresist layer includes an EUV resist layer and the etching gas includes C4F8 gas, O2 gas, and Ar gas. In another example, the exposing includes exposing the substrate to a) a plasma-excited etching gas containing C4F8 gas, O2 gas, and Ar gas, and b) exposing the substrate to a plasma-excited Ar gas, where steps a) and b) are sequentially performed at least once.

Abstract: A device for use with one or more lines that includes a unitary rigid body having an annular portion surrounding a central opening and at least four finger sections that extend from the annular portion of the rigid body. A first finger section and a second finger section curve toward each other on one end of the rigid body and terminate in blunt tips that are spaced apart from each other by a gap. Similarly, a third finger section and a fourth finger section curve toward each other on an opposite end of the rigid body and terminate in blunt tips that are spaced apart from each other by a gap. The device maximizes the pulling strength of lines while reducing the possibility of line failure. Also disclosed are methods of using the device for shortening a line, belaying an object, joining two lines together and for forming a V-bridle.

Abstract: Examples of job allocation are described hereon. In an example, a job for allocation may be received. The job may be analyzed to obtain information pertaining to the job. The information may comprise at least one of a domain of the job and a priority level of the job. Further, performance of resources may be determined to provide resource information. The resource information may be determined using a supervised learning model comprising a job vector for each job type and a resource vector corresponding to each resource. The resource information may include a list of resources with at least one of a corresponding probability of each resource completing the job and a performance score of each resource. Based on the job information and the resource information, the resource may be recommended for the job using an expertise-estimation modeling technique and the job may be assigned to the recommended resource, accordingly.

Abstract: A device for use with one or more lines that includes a unitary rigid body having an annular portion surrounding a central opening and at least four finger sections that extend from the annular portion of the rigid body. A first finger section and a second finger section curve toward each other on one end of the rigid body and terminate in blunt tips that are spaced apart from each other by a gap. Similarly, a third finger section and a fourth finger section curve toward each other on an opposite end of the rigid body and terminate in blunt tips that are spaced apart from each other by a gap. The device maximizes the pulling strength of lines while reducing the possibility of line failure. Also disclosed are methods of using the device for shortening a line, belaying an object, joining two lines together and for forming a V-bridle.