Patents by Inventor Christopher Dennis

Christopher Dennis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10599044
    Abstract: The present disclosure generally relates to lithography devices comprising an image projection system. The image projection system comprises a fiber bundle coupled to a first homogenizer and a second homogenizer. The first homogenizer is offset from the second homogenizer along a scan direction. The first homogenizer is optically aligned with a first digital micromirror device, and the second homogenizer is optically aligned with a second digital micromirror device. The first digital micromirror device is offset from the second digital micromirror device along the scan direction within an optical field of view of a projection lens. A scan field of the first digital micromirror device overlaps or aligns with a scan field of the second digital micromirror device to eliminate a gap between the scan field of the first digital micromirror device and the scan field of the second digital micromirror device.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: March 24, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Guoheng Zhao, Jeremy Rolfe Nesbitt, Christopher Dennis Bencher, Mehdi Vaez-Iravani
  • Publication number: 20200089128
    Abstract: The embodiments described herein relate to a software application platform, which enhances image patterns resolution on a substrate. The application platform method includes running an algorithm to provide different target polygons for forming a pattern on a target. A minimum feature size which may be formed by a DMD is determined. For each target polygons smaller than the minimum feature size determining to line bias or shot bias the one or more target polygons to achieve an acceptable exposure contrast at the target polygon boundary. The one or more target polygons smaller than the minimum feature size are biased to form a digitized pattern on the substrate. Electromagnetic radiation is delivered to reflect off of a first mirror of the DMD when the centroid for the first mirror is within the one or more target polygons.
    Type: Application
    Filed: July 16, 2019
    Publication date: March 19, 2020
    Inventors: Christopher Dennis BENCHER, Joseph R. JOHNSON
  • Patent number: 10591815
    Abstract: Embodiments described herein provide a method shifting mask pattern data during a digital lithography process to reduce line waviness of an exposed pattern. The method includes providing a mask pattern data having a plurality of exposure polygons to a processing unit of a digital lithography system. The processing unit has a plurality of image projection systems that receive the mask pattern data. Each image projection system corresponds to a portion of a plurality of portions of a substrate and receives an exposure polygon corresponding to the portion. The substrate is scanned under the plurality of image projection systems and pluralities of shots are projected to the plurality of portions while shifting the mask pattern data. Each shot of the pluralities of shots is inside the exposure polygon corresponding to the portion.
    Type: Grant
    Filed: June 28, 2018
    Date of Patent: March 17, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Christopher Dennis Bencher, Thomas L. Laidig
  • Publication number: 20200073253
    Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
    Type: Application
    Filed: October 9, 2019
    Publication date: March 5, 2020
    Inventors: Joseph R. JOHNSON, Thomas L. LAIDIG, Christopher Dennis BENCHER
  • Publication number: 20200069976
    Abstract: Embodiments of the present disclosure relate to techniques for facilitating personalized neuromodulation treatment protocols. In one embodiment, a predetermined treatment position of an energy application device is used to guide future treatments for the patient. In one embodiment, a position of the energy application device relative to the predetermined treatment position is determined. In one embodiment, a total dose of ultrasound energy applied to the region of interest is determined.
    Type: Application
    Filed: September 4, 2018
    Publication date: March 5, 2020
    Inventors: Christopher Michael Puleo, Yang Zhao, Kirk Dennis Wallace, Ying Fan, Jeffrey Michael Ashe, David Andrew Shoudy
  • Patent number: 10571809
    Abstract: Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment of the system includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels temporally by grey tone shots and full tone shots of a multiplicity of shots, and the controller is configured to vary a second intensity of a light beam generated by a light source and vary a first intensity of the light beam generated by the light source of each image projection system at the full tone shots.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: February 25, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher Dennis Bencher, Joseph R. Johnson, Thomas L. Laidig
  • Publication number: 20200054228
    Abstract: The subject matter of the present disclosure generally relates to techniques for neuromodulation of a tissue that include applying energy (e.g., ultrasound energy) into the tissue to cause altered activity at a synapse between a neuron and a non-neuronal cell.
    Type: Application
    Filed: October 31, 2017
    Publication date: February 20, 2020
    Inventors: Christopher Michael Puleo, Victoria Cotero, Ying Fan, Tzu-Jen Kao, David Mills, Jeffrey Ashe, Sireesha KAANUMALLE, Kirk Dennis WALLACE, Kenneth Wayne RIGBY, Ileana HANCU, James ROTHMAN
  • Patent number: 10559730
    Abstract: The present disclosure generally relates to light field displays and methods of displaying images with light field arrays. In one example, the present disclosure relates to pixel arrangements for use in light field displays. Each pixel includes a plurality of LEDs, such as micro LEDs, positioned adjacent respective micro-lenses of each pixel.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: February 11, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Manivannan Thothadri, Christopher Dennis Bencher, Robert Jan Visser, John M. White
  • Publication number: 20200041248
    Abstract: The methods disclosed herein include recording at near-vertical first and second measurement positions respective first and second interferograms of the photomask surface and defining a difference map as the difference between the first and second interferograms. Respective first and second normal forces on the photomask are also measured at the first and second measurement positions. The change in the normal force is used define a scaling factor, which is applied to the difference map to define a scaled difference map. A compensated flatness measurement with a reduced shape contribution due to gravity is obtained by subtracting the scaled difference map from the first interferogram. An interferometer-based flatness measurement system is also disclosed.
    Type: Application
    Filed: July 31, 2019
    Publication date: February 6, 2020
    Inventors: Thomas James Dunn, John Weston Frankovich, Robert Dennis Grejda, Christopher Alan Lee, Matthew Ronald Millecchia, Yoshihiro Nakamura
  • Publication number: 20200028901
    Abstract: Certain example embodiments relate to a distributed computing system including servers organized in a cluster and clients. One server is elected leader and is responsible for maintaining consensus information among the other servers. Each server is configured to determine whether a new leader election is to take place. If so, the respective server requests votes for a new leader from the other server(s) and determines whether it has won by a clear majority. Depending on the implementation, votes from eligible client devices are counted, either in a main election together with server votes, or in a tie-break election (if needed) after server votes. Once a server has won, the other servers are informed accordingly. It therefore is possible to maintain a highly-available, consistent, partition-tolerant cluster in the distributed computing systems, using client voters.
    Type: Application
    Filed: July 18, 2018
    Publication date: January 23, 2020
    Inventors: Albin SURESH, Ramesh Kavanappillil, Christopher DENNIS, Myron SCOTT, Christopher SCHANCK
  • Publication number: 20200028750
    Abstract: Certain example embodiments relate to a distributed computing system including servers organized in a cluster and clients. One server is elected leader and is responsible for maintaining consensus information among the other servers. Each server is configured to determine whether a new leader election is to take place. If so, the respective server requests votes for a new leader from the other server(s) and determines whether it has won by a clear majority. Depending on the implementation, votes from eligible client devices are counted, either in a main election together with server votes, or in a tie-break election (if needed) after server votes. Once a server has won, the other servers are informed accordingly. It therefore is possible to maintain a highly-available, consistent, partition-tolerant cluster in the distributed computing systems, using client voters.
    Type: Application
    Filed: July 17, 2018
    Publication date: January 23, 2020
    Inventors: Albin SURESH, Ramesh Kavanappillil, Christopher DENNIS, Myron SCOTT, Christopher SCHANCK
  • Patent number: 10533693
    Abstract: Apparatus and methods for filling a pressure compensated fluid container with a liquid. An example method includes restraining movement of a piston slidably disposed within the fluid container in a first piston position, wherein the piston divides the fluid container into first and second portions. The method further includes pumping the liquid into the first portion to compress gas located within the first portion, stopping the pumping of the liquid into the first portion, and stopping the restraining of movement of the piston to permit the piston to move to a second piston position due to expansion of the gas compressed within the first portion.
    Type: Grant
    Filed: July 11, 2017
    Date of Patent: January 14, 2020
    Assignee: SCHLUMBERGER TECHNOLOGY CORPORATION
    Inventors: Hugues Dupont, Adam Zygmunt Cygan, Stephen Dennis Parks, Christopher Del Campo, Alien Ugalde, Christopher Irvine, Thomas Murray
  • Publication number: 20200012188
    Abstract: Photoresist compositions, methods of manufacturing the photoresist compositions, and methods of using the photoresist compositions are provided. In one implementation, the photoresist composition comprises a novolac (novolac) resin, a diazonaphthoquinone (DNQ) dissolution inhibitor, a bis(azide) crosslinker, and a casting solvent. In one implementation, the bis(azide) crosslinker absorbs at wavelengths in a range between 325 nanometers and 400 nanometers. In one implementation, the bis(azide) crosslinker is an aromatic bi(azide) crosslinker.
    Type: Application
    Filed: July 3, 2019
    Publication date: January 9, 2020
    Inventors: Ankit VORA, Christopher Dennis BENCHER
  • Publication number: 20200000774
    Abstract: The invention relates to heterocyclic compounds consisting of a core nitrogen atom surrounded by three pendant groups, wherein two of the three pendant groups are preferably benzimidazolyl methyl and tetrahydroquinolyl, and the third pendant group contains N and optionally contains additional rings. The compounds bind to chemokine receptors, including CXCR4 and CCR5, and demonstrate protective effects against infection of target cells by a human immunodeficiency virus (HIV).
    Type: Application
    Filed: April 10, 2019
    Publication date: January 2, 2020
    Inventors: Gary J. Bridger, Renato T. Skerlj, Al Kaller, Curtis Harwig, David Bogucki, Trevor R. Wilson, Jason B. Crawford, Ernest J. McEachern, Bem Atsma, Siqiao Nan, Yuanxi Zhou, Dominique Schols, Christopher Dennis Smith, Maria Rosaria Di Fluri
  • Publication number: 20200004132
    Abstract: Embodiments described herein provide a method shifting mask pattern data during a digital lithography process to reduce line waviness of an exposed pattern. The method includes providing a mask pattern data having a plurality of exposure polygons to a processing unit of a digital lithography system. The processing unit has a plurality of image projection systems that receive the mask pattern data. Each image projection system corresponds to a portion of a plurality of portions of a substrate and receives an exposure polygon corresponding to the portion. The substrate is scanned under the plurality of image projection systems and pluralities of shots are projected to the plurality of portions while shifting the mask pattern data. Each shot of the pluralities of shots is inside the exposure polygon corresponding to the portion.
    Type: Application
    Filed: June 28, 2018
    Publication date: January 2, 2020
    Inventors: Joseph R. JOHNSON, Christopher Dennis BENCHER, Thomas L. LAIDIG
  • Publication number: 20190380701
    Abstract: An endoscopic handle attachment is adapted to be secured to an endoscope having a working channel and used in combination with a suture device adapted to extend through the working channel. The attachment includes a backbone adapted to conform to an outer surface of the endoscope and that includes one or more attachment features adapted to enable releasable securement to the endoscope. A primary arm extends radially outwardly from the backbone and includes one or attachment points, at least one of the one or more attachment points adapted to releasably secure a proximal handle of the suture device such that a translation handle may be moved relative to the proximal handle without an operator needing to separately hold the proximal handle.
    Type: Application
    Filed: June 19, 2019
    Publication date: December 19, 2019
    Applicant: BOSTON SCIENTIFIC SCIMED, INC.
    Inventors: CHRISTOPHER R. DEUEL, SHAUN DENNIS COMEE, EVAN HUNTER WILLIAMS, ANDREW JONES, RICHARD L. MILLER
  • Patent number: 10507903
    Abstract: A motor assembly that includes a motor having a motor casing, a rotatable shaft extending from said motor casing to a shaft length and a hub coupled to said rotatable shaft, the hub having a circumferential skid surface disposed immediately proximal to the motor casing and having a channel configured to seat a propeller, when a propeller is present, wherein a bending moment applied to the shaft through the hub results in the circumferential skid surface contacting said motor casing.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: December 17, 2019
    Assignee: AEROVIRONMENT, INC.
    Inventors: Emil Ghapgharan, Lane Dennis Dalan, Pavel Belik, Christopher Eugene Fisher, Austin Craig Gunder
  • Patent number: 10509328
    Abstract: Systems and methods discussed herein relate to patterning substrates during lithography and microlithography to form features to a set or sets of critical dimensions using dose. The dose maps are generated based upon images captured during manufacturing to account for process variation in a plurality of operations employed to pattern the substrates. The dose maps are used along with imaging programs to tune the voltages applied to various regions of a substrate in order to produce features to a set or sets of critical dimensions and compensate for upstream or downstream operations that may otherwise result in incorrect critical dimension formation.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: December 17, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Christopher Dennis Bencher, Joseph R. Johnson
  • Patent number: 10510464
    Abstract: A continuously transposed conductor (CTC) cable may include a plurality of electrically insulated strands arranged in first and second stacks with the plurality of strands successively transposed between the first and second stacks. The plurality of strands may include at least one strand having a plurality of component strands that are arranged in third and fourth stacks with the plurality of component strands successively transposed between the third and fourth stacks. Each of the components strands may include a conductor and insulation formed at least partially around the conductor.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: December 17, 2019
    Assignee: Essex Group, Inc.
    Inventors: Bogdan Gronowski, David Marshall Cain, Matthew Leach, Christopher Richardson, Jason Dennis Stephens
  • Patent number: 10503076
    Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
    Type: Grant
    Filed: August 29, 2018
    Date of Patent: December 10, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Joseph R. Johnson, Thomas L. Laidig, Christopher Dennis Bencher