Patents by Inventor Christopher F. Robinson
Christopher F. Robinson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11402361Abstract: A method of controlling a gas mixture for a laser includes receiving as an input one or more of a plurality of concentration values. Each of the concentration values respectively corresponds to a constituent of a plurality of constituents of air. In the method, a blend of the plurality of constituents of air is generated based on the received one or more of the concentration values. The method also includes determining whether the blend of the plurality of constituents of air is within a threshold range for a ratio of the concentration values for the plurality of constituents of air. A flow of the blend of the plurality of constituents of air is controlled to be routed through an output circuit for use as the gas mixture for the laser following a determination that the blend of the plurality of constituents of air is within the threshold range.Type: GrantFiled: June 10, 2019Date of Patent: August 2, 2022Assignee: International Business Machines CorporationInventors: Shane D. Bryant, Robert Young, Christopher F. Robinson, Kelly Bronson
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Publication number: 20200386729Abstract: A method of controlling a gas mixture for a laser includes receiving as an input one or more of a plurality of concentration values. Each of the concentration values respectively corresponds to a constituent of a plurality of constituents of air. In the method, a blend of the plurality of constituents of air is generated based on the received one or more of the concentration values. The method also includes determining whether the blend of the plurality of constituents of air is within a threshold range for a ratio of the concentration values for the plurality of constituents of air. A flow of the blend of the plurality of constituents of air is controlled to be routed through an output circuit for use as the gas mixture for the laser following a determination that the blend of the plurality of constituents of air is within the threshold range.Type: ApplicationFiled: June 10, 2019Publication date: December 10, 2020Inventors: Shane D. Bryant, Robert Young, Christopher F. Robinson, Kelly Bronson
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Patent number: 10642161Abstract: Systems, methods and computer program products generally include a vector by vector subtraction method per wafer. A first layer is exposed to form a pattern image on a wafer and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a baseline reference are measured. The first layer is then reworked and exposed to form the same pattern image and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a first layer are measured. The overlay data of the reworked first layer is subtracted from the overlay data of the first layer to provide an overlay difference at each of the multiple locations. The overlay difference is converted to a pre-correction factor of a magnitude opposite that of the overlay difference and is applied to exposure of a second layer provided on the first layer.Type: GrantFiled: October 10, 2018Date of Patent: May 5, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Daniel A. Corliss, Scott D. Halle, Richard C. Johnson, Christopher F. Robinson, Chumeng Zheng
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Publication number: 20200117100Abstract: Systems, methods and computer program products generally include a vector by vector subtraction method per wafer. A first layer is exposed to form a pattern image on a wafer and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a baseline reference are measured. The first layer is then reworked and exposed to form the same pattern image and the overlay data of alignment registration marks at multiple locations relative to alignment registration marks of a first layer are measured. The overlay data of the reworked first layer is subtracted from the overlay data of the first layer to provide an overlay difference at each of the multiple locations. The overlay difference is converted to a pre-correction factor of a magnitude opposite that of the overlay difference and is applied to exposure of a second layer provided on the first layer.Type: ApplicationFiled: October 10, 2018Publication date: April 16, 2020Inventors: Daniel A. Corliss, Scott D. Halle, Richard C. Johnson, Christopher F. Robinson, Chumeng Zheng
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Patent number: 10281826Abstract: Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame exposures with the lithography tool on a substrate to produce a set of controlled exposure dose blocks in resist, and then baking and developing the exposed substrate. The method further includes scanning the resultant open frame images with oblique light and capturing the light scattered from the substrate surface. The method further includes creating a haze map from the background signal of the scattered light data, converting the haze map to a graphical image file, and analyzing the graphical image file to determine effective dose of the lithography tool, wherein a brightness of the graphical image file is related to effective dose of the lithography tool.Type: GrantFiled: November 27, 2017Date of Patent: May 7, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Daniel A. Corliss, Luciana Meli Thompson, Christopher F. Robinson
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Patent number: 10274836Abstract: Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame exposures with the lithography tool on a substrate to produce a set of controlled exposure dose blocks in resist, and then baking and developing the exposed substrate. The method further includes scanning the resultant open frame images with oblique light and capturing the light scattered from the substrate surface. The method further includes creating a haze map from the background signal of the scattered light data, converting the haze map to a graphical image file, and analyzing the graphical image file to determine effective dose of the lithography tool, wherein a brightness of the graphical image file is related to effective dose of the lithography tool.Type: GrantFiled: June 23, 2017Date of Patent: April 30, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Daniel A. Corliss, Luciana Meli Thompson, Christopher F. Robinson
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Publication number: 20180373165Abstract: Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame exposures with the lithography tool on a substrate to produce a set of controlled exposure dose blocks in resist, and then baking and developing the exposed substrate. The method further includes scanning the resultant open frame images with oblique light and capturing the light scattered from the substrate surface. The method further includes creating a haze map from the background signal of the scattered light data, converting the haze map to a graphical image file, and analyzing the graphical image file to determine effective dose of the lithography tool, wherein a brightness of the graphical image file is related to effective dose of the lithography tool.Type: ApplicationFiled: November 27, 2017Publication date: December 27, 2018Inventors: DANIEL A. CORLISS, LUCIANA MELI THOMPSON, CHRISTOPHER F. ROBINSON
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Publication number: 20180373164Abstract: Embodiments are directed to a method and system for determining effective dose of a lithography tool. The method includes performing a series of open frame exposures with the lithography tool on a substrate to produce a set of controlled exposure dose blocks in resist, and then baking and developing the exposed substrate. The method further includes scanning the resultant open frame images with oblique light and capturing the light scattered from the substrate surface. The method further includes creating a haze map from the background signal of the scattered light data, converting the haze map to a graphical image file, and analyzing the graphical image file to determine effective dose of the lithography tool, wherein a brightness of the graphical image file is related to effective dose of the lithography tool.Type: ApplicationFiled: June 23, 2017Publication date: December 27, 2018Inventors: DANIEL A. CORLISS, LUCIANA MELI THOMPSON, CHRISTOPHER F. ROBINSON
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Patent number: 8946866Abstract: An article including a microelectronic substrate is provided as an article usable during the processing of the microelectronic substrate. Such article includes a microelectronic substrate having a front surface, a rear surface opposite the front surface and a peripheral edge at boundaries of the front and rear surfaces. The front surface is a major surface of the article. A removable annular edge extension element having a front surface, a rear surface and an inner edge extending between the front and rear surfaces has the inner edge joined to the peripheral edge of the microelectronic substrate. In such way, a continuous surface is formed which includes the front surface of the edge extension element extending laterally from the peripheral edge of the microelectronic substrate and the front surface of the microelectronic substrate, the continuous surface being substantially co-planar and flat where the peripheral edge is joined to the inner edge.Type: GrantFiled: June 6, 2012Date of Patent: February 3, 2015Assignee: International Business Machines CorporationInventors: Charles W. Koburger, III, Steven J. Holmes, David V. Horak, Kurt R. Kimmel, Karen E. Petrillo, Christopher F. Robinson
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Publication number: 20120241913Abstract: An article including a microelectronic substrate is provided as an article usable during the processing of the microelectronic substrate. Such article includes a microelectronic substrate having a front surface, a rear surface opposite the front surface and a peripheral edge at boundaries of the front and rear surfaces. The front surface is a major surface of the article. A removable annular edge extension element having a front surface, a rear surface and an inner edge extending between the front and rear surfaces has the inner edge joined to the peripheral edge of the microelectronic substrate. In such way, a continuous surface is formed which includes the front surface of the edge extension element extending laterally from the peripheral edge of the microelectronic substrate and the front surface of the microelectronic substrate, the continuous surface being substantially co-planar and flat where the peripheral edge is joined to the inner edge.Type: ApplicationFiled: June 6, 2012Publication date: September 27, 2012Applicant: International Business Machines CorporationInventors: Charles W. Koburger, III, Steven J. Holmes, David V. Horak, Kurt R. Kimmel, Karen E. Petrillo, Christopher F. Robinson
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Patent number: 8202460Abstract: An article including a microelectronic substrate is provided as an article usable during the processing of the microelectronic substrate. Such article includes a microelectronic substrate having a front surface, a rear surface opposite the front surface and a peripheral edge at boundaries of the front and rear surfaces. The front surface is a major surface of the article. A removable annular edge extension element having a front surface, a rear surface and an inner edge extending between the front and rear surfaces has the inner edge joined to the peripheral edge of the microelectronic substrate. In such way, a continuous surface is formed which includes the front surface of the edge extension element and the front surface of the microelectronic substrate, the continuous surface being substantially co-planar and flat where the peripheral edge is joined to the inner edge.Type: GrantFiled: September 22, 2005Date of Patent: June 19, 2012Assignee: International Business Machines CorporationInventors: Charles W. Koburger, III, Steven J. Holmes, David V. Horak, Kurt R. Kimmel, Karen E. Petrillo, Christopher F. Robinson
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Patent number: 7391023Abstract: Electron beam lithography tool image quality evaluating and correcting including a test pattern with a repeated test pattern cell, an evaluation method and correction program product are disclosed. The test pattern cell includes a set of at least three elongated spaces with each elongated space having a different width than other elongated spaces in the set such that evaluation of a number of space widths in terms of tool image quality and calibration can be completed. The evaluation method implements the test pattern cell in a test pattern in at least thirteen sub-field test positions across an exposure field, which provides improved focus and astigmatism corrections for the lithography tool. The program product implements the use of corrections from the at least thirteen sub-field test positions to provide improved corrections for any selected sub-field position.Type: GrantFiled: June 13, 2005Date of Patent: June 24, 2008Assignee: International Business Machines CorporationInventors: William A. Enichen, Christopher F. Robinson
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Patent number: 7057715Abstract: Test patterns and a method for evaluating and adjusting the resolution of an electron beam lithography tool. The test patterns include multiple feature patterns that are repeated throughout the test pattern. Each feature pattern can be interleaved with horizontal and/or vertical line patterns that facilitate cleaving of a test substrate for three dimensional analysis of the developed image. Further, each feature pattern can comprise multiple sub-patterns. Each sub-pattern includes at least one feature having a size that varies from less than a nominal resolution limit of the lithography tool to greater than the nominal resolution limit. The lithography tool resolution can be evaluated by exposing a test pattern on a resist coated substrate, and analyzing the developed image.Type: GrantFiled: June 27, 2003Date of Patent: June 6, 2006Assignee: International Business Machines CorporationInventor: Christopher F. Robinson
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Patent number: 6931337Abstract: Electron beam lithography tool image quality evaluating and correcting including a test pattern with a repeated test pattern cell, an evaluation method and correction program product are disclosed. The test pattern cell includes a set of at least three elongated spaces with each elongated space having a different width than other elongated spaces in the set such that evaluation of a number of space widths in terms of tool image quality and calibration can be completed. The evaluation method implements the test pattern cell in a test pattern in at least thirteen sub-field test positions across an exposure field, which provides improved focus and astigmatism corrections for the lithography tool. The program product implements the use of corrections from the at least thirteen sub-field test positions to provide improved corrections for any selected sub-field position.Type: GrantFiled: June 24, 2003Date of Patent: August 16, 2005Assignee: International Business Machines CorporationInventors: William A. Enichen, Christopher F. Robinson
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Publication number: 20040265711Abstract: Test patterns and a method for evaluating and adjusting the resolution of an electron beam lithography tool. The test patterns include multiple feature patterns that are repeated throughout the test pattern. Each feature pattern can be interleaved with horizontal and/or vertical line patterns that facilitate cleaving of a test substrate for three dimensional analysis of the developed image. Further, each feature pattern can comprise multiple sub-patterns. Each sub-pattern includes at least one feature having a size that varies from less than a nominal resolution limit of the lithography tool to greater than the nominal resolution limit. The lithography tool resolution can be evaluated by exposing a test pattern on a resist coated substrate, and analyzing the developed image.Type: ApplicationFiled: June 27, 2003Publication date: December 30, 2004Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventor: Christopher F. Robinson
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Publication number: 20040267471Abstract: Electron beam lithography tool image quality evaluating and correcting including a test pattern with a repeated test pattern cell, an evaluation method and correction program product are disclosed. The test pattern cell includes a set of at least three elongated spaces with each elongated space having a different width than other elongated spaces in the set such that evaluation of a number of space widths in terms of tool image quality and calibration can be completed. The evaluation method implements the test pattern cell in a test pattern in at least thirteen sub-field test positions across an exposure field, which provides improved focus and astigmatism corrections for the lithography tool. The program product implements the use of corrections from the at least thirteen sub-field test positions to provide improved corrections for any selected sub-field position.Type: ApplicationFiled: June 24, 2003Publication date: December 30, 2004Applicant: International Business Machines Corporation, Armonk, NYInventors: William A. Enichen, Christopher F. Robinson
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Patent number: 6639219Abstract: An electron beam system employs a non-saturating detector for measuring total beam current that comprises a thin membrane of only a few microns thickness placed before a detector and separated from the detector by a drift space of about 10 mm, so that electrons in the beam are not absorbed to any significant extent, but are scattered transversely to spread the beam and avoid local saturation of the detector.Type: GrantFiled: November 9, 2001Date of Patent: October 28, 2003Assignee: International Business Machines CorporationInventors: Rodney A. Kendall, Christopher F. Robinson
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Patent number: 6573514Abstract: A method of aligning elements of an electron beam beam tool such as an electron beam projection lithography tool utilizes a detector such as a pinhole and scintillator over which an image is rastered to provide a real-time display of a projected image at a target plane. A shaping aperture is projected and the detector centered thereon. A reticle sub-field image is then centered on and aligned with the image of the shaping aperture and the compound image thus formed is rotated using deflectors. The compound image is then aligned with movement of a translation device at the target plane using lenses and compound image orientation is corrected by electrical or mechanical rotation of the deflectors. Sub-field size can then be adjusted and any observed further rotation of the compound image may be corrected by reiteration of rotation adjustment with lenses and deflectors, in sequence.Type: GrantFiled: May 25, 2001Date of Patent: June 3, 2003Assignee: Nikon CorporationInventors: Michael S. Gordon, Jon E. Lieberman, Christopher F. Robinson
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Publication number: 20030089853Abstract: An electron beam system employs a non-saturating detector for measuring total beam current that comprises a thin membrane of only a few microns thickness placed before a detector and separated from the detector by a drift space of about 10 mm, so that electrons in the beam are not absorbed to any significant extent, but are scattered transversely to spread the beam and avoid local saturation of the detector.Type: ApplicationFiled: November 9, 2001Publication date: May 15, 2003Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Rodney A. Kendall, Christopher F. Robinson
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Patent number: 6541783Abstract: Proximity (exposure dose) effects and/or local Coulomb (space charge defocussing) effects, both dependent on local pattern density of exposed areas, are simultaneously compensated in a charged particle beam projection device or tool by a projection reticle having an apertured weakly scattering membrane with selective strongly scattering regions between the apertures in the membrane. A reticle so constructed provides at least three independent exposure dosage levels that can be mixed to provide a wide range of exposure levels with high contrast. The more weakly the electrons are scattered (in the extreme, the electrons are not scattered at all through apertures), the greater the number that pass through a given beam contrast aperture, the higher the corresponding dose received at the target plane and the more space charge is contained in the beam bundle. Therefore, to compensate for the proximity effect (i.e. provide dose boost) and the local Coulomb effect (i.e.Type: GrantFiled: May 28, 1999Date of Patent: April 1, 2003Assignee: Nikon CorporationInventors: Christopher F. Robinson, Werner Stickel