Patents by Inventor Christopher LAURENT
Christopher LAURENT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11920234Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.Type: GrantFiled: December 28, 2022Date of Patent: March 5, 2024Assignee: Applied Materials, Inc.Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
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Patent number: 11841140Abstract: A pre-vaporisation tube for a turbine engine combustion chamber includes a main body ROOM defining a first inner duct configured to have an injector mounted therein. The tube includes a first end attached to a wall of the chamber, and at least two end pieces are arranged at a second end of the body and define second inner ducts. The end pieces include first portions and second portions, respectively. The second portions each include two coaxial cylindrical walls which are inner and outer coaxial cylindrical walls, respectively, and which define an annular cavity therebetween. The inner wall defines an inner passage and has first openings for fluid communication between the passage and the annular cavity.Type: GrantFiled: October 5, 2020Date of Patent: December 12, 2023Assignee: SAFRAN HELICOPTER ENGINESInventors: Thomas Jean Olivier Lederlin, Christophe Laurent, Guillaume Gerard Joel Mauries
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Publication number: 20230348290Abstract: Described herein is a plasma resistant protective coating composition and bulk composition that provides enhanced erosion and corrosion resistance upon the coating composition's or the bulk composition's exposure to harsh chemical environment (such as hydrogen based and/or halogen based chemistries) and/or upon the coating composition's or the bulk composition's exposure to high energy plasma. Also described herein is a method of coating an article with a plasma resistant protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits a reduced number of yttrium based particles.Type: ApplicationFiled: June 30, 2023Publication date: November 2, 2023Inventors: Christopher Laurent Beaudry, Vahid Firouzdor, Joseph Frederick Sommers, Trevor Edward Wilantewicz, Hyun-Ho Doh, Joseph Frederick Behnke
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Publication number: 20230323531Abstract: A method includes affixing a supply apparatus to inlets for one or more channels of a chamber component. The channels provide one or more gas flow paths between a first side of the chamber component that comprises the inlets and a second side of the chamber component comprising outlets of the one or more channels. The method further includes affixing an exhaust apparatus to the outlets of the one or more channels. The method further includes performing a plurality of atomic layer deposition cycles to deposit a corrosion resistant coating on interior surfaces of the one or more channels of the chamber component.Type: ApplicationFiled: December 27, 2022Publication date: October 12, 2023Inventors: Joseph Frederick Behnke, Carlaton Wong, Albert Barrett Hicks, III, Steven Darrell Marcus, Joseph Frederick Sommers, Christopher Laurent Beaudry, Timothy Joseph Franklin
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Publication number: 20230317131Abstract: The present disclosure includes apparatuses, methods, and systems for unbalanced programmed data states in memory. An embodiment includes a memory having a group of memory cells, and circuitry configured to determine a quantity of the memory cells of the group to program to a first data state, wherein the determined quantity of memory cells is less than or greater than half of the memory cells of the group, program the determined quantity of the memory cells of the group to the first data state, and program a remaining quantity of the memory cells of the group to a second data state.Type: ApplicationFiled: April 4, 2022Publication date: October 5, 2023Inventors: Christophe Laurent, Riccardo Muzzetto
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Patent number: 11761978Abstract: A vibration monitoring apparatus is disclosed that includes a vibration sensor, a controller electrically coupled to the vibration sensor, a power unit electrically coupled to the controller and the vibration sensor, and an environment-resistant material encapsulating the vibration sensor, the controller, and the power unit. The vibration monitoring apparatus includes processing capability to process vibration data and transmission hardware to transmit processed or unprocessed vibration data.Type: GrantFiled: February 26, 2021Date of Patent: September 19, 2023Assignee: Schlumberger Technology CorporationInventors: Christophe Laurent, Hugues Trifol
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Publication number: 20230260227Abstract: A system configured to determine poses of a tracked device in a physical environment and to utilize the poses as an input to control or manipulate a virtual environment or mixed reality environment. In some cases, the system may include a fall back tracking system for when the main tracking system loses visual tracking of the tracked device.Type: ApplicationFiled: January 25, 2023Publication date: August 17, 2023Inventors: Jeffrey Roger Powers, Anatoly Stanislavovich Baksheev, Martin Christophe Laurent Brossard
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Publication number: 20230184438Abstract: A pre-vaporisation tube for a turbine engine combustion chamber includes a main body defining a first inner duct configured to have an injector mounted therein. The tube includes a first end attached to a wall of the chamber, and at least two end pieces are arranged at a second end of the body and define second inner ducts. The end pieces include first portions and second portions, respectively. The second portions each include two coaxial cylindrical walls which are inner and outer coaxial cylindrical walls, respectively, and which define an annular cavity therebetween. The inner wall defines an inner passage and has first openings for fluid communication between the passage and the annular cavity.Type: ApplicationFiled: October 5, 2020Publication date: June 15, 2023Applicant: SAFRAN HELICOPTER ENGINESInventors: Thomas Jean Olivier LEDERLIN, Christophe LAURENT, Guillaume Gerard Joel MAURIES
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Patent number: 11661650Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.Type: GrantFiled: April 10, 2020Date of Patent: May 30, 2023Assignee: Applied Materials, Inc.Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
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Publication number: 20230160055Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.Type: ApplicationFiled: December 28, 2022Publication date: May 25, 2023Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
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Patent number: 11565550Abstract: A tire for a two-wheeled motorized vehicle includes a tread joined by two sidewalls to two beads, the tread having first and second elastomer compositions, crown reinforcement, radially inside tread having a crown layer having mutually parallel circumferential reinforcers forming an angle at most equal to 5° to the circumferential direction, a carcass reinforcement, radially inside crown reinforcement, having turnup. Carcass reinforcement includes mutually parallel reinforcers, and wrapped, in each bead, from the inside to the outside of the tire, about bead wire in order to form turnup having free end E2. Carcass reinforcement includes crown portion and lateral portion, crown portion extending axially between first and second ends E2, E?2, E2 and E?2 being symmetric to equatorial plane P of the tire, lateral portion extending symmetrically to equatorial plane P radially towards the inside, from radially outermost end E2 to fourth end E4 disposed at the bead wire.Type: GrantFiled: March 31, 2017Date of Patent: January 31, 2023Assignee: COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELINInventors: Charles Guicherd, Mickaël Precigout, Romain Bouchet, Christophe Laurent
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Patent number: 11531547Abstract: Data processing circuitry comprises out-of-order instruction execution circuitry; register mapping circuitry to map zero or more architectural processor registers relating to execution of that program instruction to respective ones of a set of physical processor registers; commit circuitry to commit, in a program code order, the results of executed program instructions, the commit circuitry being configured to access a data store which stores register tag data to indicate which physical registers mapped by the register mapping circuitry relate to a given program instruction; fault detection circuitry to detect a memory access fault in respect of a vector memory access operation and to generate fault indication data indicative of an element earliest in the element order for which a memory access fault was detected; a fault indication register to store the fault indication data, in which the register mapping circuitry is configured to generate a register mapping for a program instruction for any architectural pType: GrantFiled: May 21, 2021Date of Patent: December 20, 2022Assignee: Arm LimitedInventors: Damian Maiorano, Luca Nassi, Cédric Denis Robert Airaud, Christophe Laurent Carbonne, Jocelyn François Orion Jaubert, Pasquale Ranone
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Publication number: 20220374240Abstract: Data processing circuitry comprises out-of-order instruction execution circuitry; register mapping circuitry to map zero or more architectural processor registers relating to execution of that program instruction to respective ones of a set of physical processor registers; commit circuitry to commit, in a program code order, the results of executed program instructions, the commit circuitry being configured to access a data store which stores register tag data to indicate which physical registers mapped by the register mapping circuitry relate to a given program instruction; fault detection circuitry to detect a memory access fault in respect of a vector memory access operation and to generate fault indication data indicative of an element earliest in the element order for which a memory access fault was detected; a fault indication register to store the fault indication data, in which the register mapping circuitry is configured to generate a register mapping for a program instruction for any architectural pType: ApplicationFiled: May 21, 2021Publication date: November 24, 2022Inventors: Damian MAIORANO, Luca NASSI, Cédric Denis Robert AIRAUD, Christophe Laurent CARBONNE, Jocelyn François Orion JAUBERT, Pasquale RANONE
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Publication number: 20220199455Abstract: Embodiments of packaged chamber components and methods of packaging chamber components are provided herein. In some embodiments, a packaged chamber component for use in a process chamber includes: an insert having an annular trench disposed about a raised inner portion, wherein the annular trench is disposed between the raised inner portion and an outer lip, wherein a ledge couples the raised inner portion to the outer lip, wherein the ledge includes a first portion and a second portion disposed radially outward of the first portion, and wherein the second portion includes a resting surface that extends upward and radially outward of an upper surface of the first portion; and a chamber component disposed in the annular trench of the insert and supported by the resting surface such that one or more critical surfaces of the chamber component are spaced apart from the insert.Type: ApplicationFiled: December 22, 2020Publication date: June 23, 2022Inventors: Joseph Frederick BEHNKE, Trevor WILANTEWICZ, Christopher Laurent BEAUDRY, Timothy Douglas TOTH, Scott OSTERMAN
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Publication number: 20220181124Abstract: Embodiments of the disclosure relate to articles, coated chamber components, methods of coating chamber components and systems with a metal fluoride coating that includes at least one metal fluoride having a formula of M1xFw, M1xM2yFw or M1xM2yM3zFw, where at least one of M1, M2, or M3 is nickel. The metal fluoride coating can be formed directly on a substrate or on a coating of a substrate.Type: ApplicationFiled: December 3, 2020Publication date: June 9, 2022Inventors: Ren-Guan Duan, Christopher Laurent Beaudry, Glen T. Mori
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Publication number: 20210403337Abstract: Described herein is a plasma resistant protective coating composition and bulk composition that provides enhanced erosion and corrosion resistance upon the coating composition's or the bulk composition's exposure to harsh chemical environment (such as hydrogen based and/or halogen based chemistries) and/or upon the coating composition's or the bulk composition's exposure to high energy plasma. Also described herein is a method of coating an article with a plasma resistant protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits a reduced number of yttrium based particles.Type: ApplicationFiled: June 25, 2021Publication date: December 30, 2021Inventors: Christopher Laurent Beaudry, Vahid Firouzdor, Joseph Frederick Sommers, Trevor Edward Wilantewicz, Hyun-Ho Doh, Joseph Frederick Behnke
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Publication number: 20210323060Abstract: The invention relates to a solid composite material comprising copper and an amount by volume of silver of less than about 5% by volume, relative to the total volume of said material, a process for manufacturing said material, and the uses of said material in various applications.Type: ApplicationFiled: July 25, 2019Publication date: October 21, 2021Inventors: Florence LECOUTURIER, Christophe LAURENT, David MESGUICH, Antoine LONJON, Simon TARDIEU, Nelson FERREIRA, Geoffroy CHEVALLIER, Claude ESTOURNES
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Publication number: 20210317564Abstract: Described herein is a protective coating composition that provides erosion and corrosion resistance to a coated article (such as a chamber component) upon the article's exposure to harsh chemical environment (such as hydrogen based and/or halogen based environment) and/or upon the article's exposure to high energy plasma. Also described herein is a method of coating an article with the protective coating using electronic beam ion assisted deposition, physical vapor deposition, or plasma spray. Also described herein is a method of processing wafer, which method exhibits, on average, less than about 5 yttrium based particle defects per wafer.Type: ApplicationFiled: April 10, 2020Publication date: October 14, 2021Inventors: Vahid Firouzdor, Christopher Laurent Beaudry, Hyun-Ho Doh, Joseph Frederick Behnke, Joseph Frederick Sommers
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Publication number: 20210270866Abstract: A vibration monitoring apparatus is disclosed that includes a vibration sensor, a controller electrically coupled to the vibration sensor, a power unit electrically coupled to the controller and the vibration sensor, and an environment-resistant material encapsulating the vibration sensor, the controller, and the power unit. The vibration monitoring apparatus includes processing capability to process vibration data and transmission hardware to transmit processed or unprocessed vibration data.Type: ApplicationFiled: February 26, 2021Publication date: September 2, 2021Inventors: Christophe Laurent, Hugues Trifol
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Patent number: D984895Type: GrantFiled: December 22, 2020Date of Patent: May 2, 2023Assignee: APPLIED MATERIALS, INC.Inventors: Joseph Frederick Behnke, Trevor Wilantewicz, Christopher Laurent Beaudry, Timothy Douglas Toth, Scott Osterman