Patents by Inventor Christopher Newsome

Christopher Newsome has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7582509
    Abstract: A method of forming an electronic device on a substrate 10, comprising: embossing the substrate 10, surface treating the substrate so that unindented portions 11 repel a solution of a first material 60, and depositing a solution of the first material 60 in indentations 12 on the substrate 10 formed by the embossing. The substrate is then annealed so that level of the first material is the same as the surface of the substrate. The first material 60 in the indentations can then, for example, be used as the source and drain in the subsequent formation of a TFT.
    Type: Grant
    Filed: June 16, 2006
    Date of Patent: September 1, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Shunpu Li, Christopher Newsome, David Russell, Thomas Kugler
  • Patent number: 7579620
    Abstract: Provided is a field-effect transistor (10) which comprises a metal or carbon source electrode (14) and a layer of a functional organic semiconductor (28). A column of an injection material (48) extends through the layer of the functional organic semiconductor (28), the column being in contact with both the source electrode (14) and the layer of the functional organic semiconductor (28). This column (48) facilitates the transfer charge carriers between the source electrode (14) and semiconductor layer (28). The injection material is preferably an organic compound such as 3-hexylthiophene, polyarylamine, poly(3,4-ethylenedioxythiophene)-polystyrenesulphonic acid or polyaniline.
    Type: Grant
    Filed: September 2, 2005
    Date of Patent: August 25, 2009
    Assignee: Seiko Epson Corporation
    Inventors: David Russel, Christopher Newsome, Thomas Kugler, Shunpu Li
  • Patent number: 7560049
    Abstract: A method of manufacturing a device, comprising printing an aqueous solution or dispersion comprising an electronically functional substance, for example a conducting polymer such as PEDOT-PSS, and a surface tension reducing agent onto predetermined portions of a hydrophobic surface, for example formed by a ferroelectric polymer layer. The conducting polymer can form conductive tracks on either side of the ferroelectric layer to form a memory device.
    Type: Grant
    Filed: December 11, 2006
    Date of Patent: July 14, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Christopher Newsome, Daping Chu
  • Patent number: 7517719
    Abstract: Provided is a method for forming a semiconductor element such as film. The method comprises the steps of: (i) depositing a suspension of particles of a first semiconductor and a solution of a second semiconductor or a precursor thereof on a surface of a substrate such that a mixture comprising the particles of the first semiconductor suspended in a liquid phase comprising the second semiconductor or precursor thereof results thereon; and (ii) solidifying the mixture to form the semiconductor element comprising particles of the first semiconductor in a matrix of the second semiconductor which electrically connects adjacent particles of the first semiconductor, the first and second semiconductors being of the same conductivity type and being formed from either the same or different materials. The method does not require any step of vacuum deposition or sintering. Also provided is a semiconductor element itself.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: April 14, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Thomas Kugler, Christopher Newsome, David Russel, Shunpu Li
  • Patent number: 7501308
    Abstract: Provided is a method of depositing a polythiophene semiconductor on a substrate. First, the semiconductor is dissolved in a solvent comprising a halogen-containing aromatic compound. Then, the resulting solution is ink-jet printed onto the substrate. The method is useful in the production of microelectronic components such as thin film transistor devices.
    Type: Grant
    Filed: January 23, 2006
    Date of Patent: March 10, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Christopher Newsome, Shunpu Li, Thomas Kugler, David Russell
  • Patent number: 7468329
    Abstract: The present invention relates to a method of dedoping an organic semiconductor comprising the step of contacting a doped organic semiconductor with a compound of formula (1): wherein R1-R8 each independently represents a hydrogen atom or a C1-C6 alkyl group which may be linear or branched and which may be optionally substituted with one or more hydroxyl groups and/or one or more halogen atoms and/or a C1-C3 alkoxy group; one or more pairs of R groups which are not hydrogen may join to form a cyclic group according to the following pairings: R1 and R2; R2 and R3; R3 and R4; R4 and R5; R5 and R6; R6 and R7; R7 and R8; and R8 and R1.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: December 23, 2008
    Assignee: Seiko Epson Corproation
    Inventors: David Russell, Thomas Kugler, Christopher Newsome, Shunpu Li
  • Patent number: 7468287
    Abstract: Provided is a method of forming a heterojunction of contiguous layers of organic semiconducting polymers. The method comprises firstly forming a layer of a first organic semiconducting polymer on a substrate. A solution of a film-forming material is then deposited on the layer of the first organic semiconducting polymer. The first organic semiconducting polymer is insoluble in this solution and so is not disturbed by its deposition. The deposited solution is then dried to form a temporary film having a thickness of less then 20 nm formed from the film-forming material. Next a solution of a second organic semiconducting polymer dissolved in an organic solvent is deposited on the temporary film and this solution dried. The solubility of the material forming the temporary film in the organic solvent and the thickness of the temporary film are such that the organic solvent permeates through the thickness of the temporary film during drying of the solution of the second organic semiconducting polymer.
    Type: Grant
    Filed: February 28, 2006
    Date of Patent: December 23, 2008
    Assignee: Seiko Epson Corporation
    Inventors: Christopher Newsome, Thomas Kugler, Shunpu Li, David Russell
  • Patent number: 7439193
    Abstract: Provided is a patterning method capable of fabricating high resolution structures without using a high resolution patterning step. The method comprises the steps of: (i) pre-patterning a layer of material (12) on a substrate (10), (ii) spin-coating a solution of a film-forming substance over the pre-patterned substrate, (iii) drying the spin-coated solution to form a film (14) of the film-forming substance on the unpatterned areas of the substrate and on the surface and sides of the pre-patterned material, (iv) etching the dried film in such a way that it remains only around the sides of the pre-patterned material, and (v) removing the pre-patterned material to leave ridges (20) of the film-forming substance on the substrate, the pattern of the ridges corresponding to the outline of the pre-patterned material.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: October 21, 2008
    Assignee: Seiko Epson Corporation
    Inventors: Shunpu Li, Christopher Newsome, David Russell, Thomas Kugler
  • Publication number: 20080160761
    Abstract: A method of modulating a surface includes: (a) forming a BCB layer on a surface of a target object; and (b) conducting a CF4 plasma exposure against a top surface of the BCB layer.
    Type: Application
    Filed: November 19, 2007
    Publication date: July 3, 2008
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Christopher NEWSOME, Shunpu LI, Daping CHU
  • Patent number: 7390752
    Abstract: The present invention relates to a self-aligning patterning method which can be used to manufacture a plurality of multi-layer thin film transistors on a substrate. The method comprises firstly forming a patterned mask 20 on the surface of a sacrificial layer 18 which is part of a multi-layer structure 10 which comprises the substrate 12, a conductive layer 14, an insulating layer 16 and the sacrificial layer 18. Unpatterned areas are then etched to remove the corresponding areas of the sacrificial layer, the insulating layer 16 and the conductive layer 14 thereby leaving voids. A layer of dielectric 22 is then deposited over the etched multi-layer structure to at least substantially fill the voids. The deposited dielectric is then etched in order to at least partially expose the sides of the remaining areas 28 of the sacrificial layer. Conductive material 30 is then deposited on the surface of the etched dielectric.
    Type: Grant
    Filed: October 20, 2005
    Date of Patent: June 24, 2008
    Assignee: Seiko Epson Corporation
    Inventors: Shunpu Li, Thomas Kugler, Christopher Newsome, David Russell
  • Publication number: 20080035915
    Abstract: According to a first aspect, the present invention provides a method for forming a semiconductor film comprising a first step of providing a solution comprising a first organic semiconductor and a second organic semiconductor on a surface of a substrate. The solution is then dried to form the semiconductor film so that it comprises discrete domains of the first organic semiconductor in a matrix of the second organic semiconductor which electrically connects adjacent domains of the first organic semiconductor. The first and second semiconductors are of the same conductivity type. The mobility of charge carriers in the domains of the first organic semiconductor is higher than the mobility of charge carriers in the matrix of the second organic semiconductor.
    Type: Application
    Filed: September 8, 2006
    Publication date: February 14, 2008
    Applicant: Seiko Epson Corporation
    Inventors: David Russell, Thomas Kugler, Christopher Newsome, Shunpu Ll
  • Publication number: 20080017606
    Abstract: A method for forming a surface energy difference bank includes: providing a material for forming a self-assembled molecular film onto a contact region of a stamps the contact region being formed of a plurality of apical faces of a plurality of elastic elements protruding out from a base part of the stamp; and transferring the material from the contact region to an object face by contacting the contact region with the object face so as to obtain the surface energy difference bank that is composed of a plurality of dots on the object face, the plurality of the dots being made of the self assembled molecular film and corresponding to the plurality of elastic elements.
    Type: Application
    Filed: July 17, 2007
    Publication date: January 24, 2008
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Shunpu LI, Christopher NEWSOME, Daping CHU
  • Publication number: 20080006161
    Abstract: A method of fabricating a bank structure, includes: (a) forming a multi-layer structure on an underlying surface thereof, the multi-layer structure having at least a first layer and a second layer, (b) embossing the second layer so as to define a bank pattern in the second layer, (c) transferring the bank pattern to the first layer so as to form a bank structure defining an indented region; and (d) removing the second layer after the step (c) so as to expose a surface of the first layer as a top surface of the bank structure.
    Type: Application
    Filed: June 14, 2007
    Publication date: January 10, 2008
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Shunpu LI, Christopher NEWSOME, Daping CHU
  • Publication number: 20070287270
    Abstract: The invention disclosed relates to the fabrication of electronic devices. A method for fabricating an electronic device is disclosed, comprising embossing a surface of a work-piece 200, 202 using an embossing tool 204, so as to form a microstructure having at least two levels of thickness contrast on the work-piece surface, and depositing fluid 208 containing a functional material onto the microstructure. In a preferred embodiment, the step of depositing fluid 208 comprises ink-jet printing. An embossing tool 204 for creating a microstructure on a work-piece 200, 202 is also disclosed, the embossing tool 204 comprising a first surface and steps of at least two different heights relative to the first surface.
    Type: Application
    Filed: March 6, 2007
    Publication date: December 13, 2007
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Shunpu Li, Christopher Newsome, David Russell, Thomas Kugler
  • Patent number: 7293852
    Abstract: A method and apparatus for depositing a soluble material, such as an organic polymer, onto a substrate uses an inkjet print head. The substrate is viewed from the underside by a CCD microscope during the deposition of an organic polymer droplet onto a well provided in a bank structure. As the organic polymer droplets are viewed when in wet condition they are more clearly visible and any offset or deviation detected between the deposited droplet and the well can be used to reposition a platen supporting the substrate. The substrate is viewed with light having a wavelength to which the substrate is transparent and, preferably, which does not include a wavelength component within the absorption region of the polymer.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: November 13, 2007
    Assignee: Seiko Epson Corporation
    Inventors: Christopher Newsome, Takeo Kawase
  • Publication number: 20070243678
    Abstract: A method of manufacturing a cross-point device, comprises: providing at least one first electrode on a substrate; providing first regions of an electrically functional material over the at least one first electrode; and providing at least one second electrode over the at least one first electrode and the plurality of regions of electrically functional material, whereby the first and second electrodes form a plurality of intersections with the electrically functional material between them. At least two intersections have separate regions of electrically functional material between the first and second electrodes.
    Type: Application
    Filed: March 26, 2007
    Publication date: October 18, 2007
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Christopher Newsome, Daping Chu
  • Patent number: 7271098
    Abstract: Provided is a method forming a desired pattern of electronically functional material 3 on a substrate 1. The method comprises the steps of: creating a first layer of patterning material 2 on the substrate whilst leaving areas of the substrate exposed to define said desired pattern; printing a suspension comprising particles of the electronically functional material 3 in a liquid dispersant, to which the patterning material is impervious, on the patterning material and the exposed substrate; removing at least some of the liquid dispersant from the suspension to consolidate the particles; and applying a first solvent to said consolidated particles which is capable of solubilizing the patterning material 2 and to which the consolidated particles are pervious so that the patterning material is removed from the substrate 1 together with any overlying electronically functional material 3.
    Type: Grant
    Filed: April 11, 2005
    Date of Patent: September 18, 2007
    Assignee: Seiko Epson Corporation
    Inventors: Shunpu Li, Christopher Newsome, Thomas Kugler, David Russell
  • Patent number: 7247339
    Abstract: The invention provides a method and apparatus for depositing a soluble material, such as an organic polymer, onto a substrate using an inkjet print head. The substrate is provided with an array of alignment marks and the material in solution is deposited when substantially aligned with one of the alignment marks to provide an alignment dot of the material in solution. The alignment dot is viewed before the deposited material in solution has dried. Cross-shaped alignment marks are used to facilitate viewing of the positions of the alignment dot.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: July 24, 2007
    Assignee: Seiko Epson Corporation
    Inventors: Christopher Newsome, Takeo Kawase
  • Publication number: 20070148797
    Abstract: A method of manufacturing a device, comprising printing an aqueous solution or dispersion comprising an electronically functional substance, for example a conducting polymer such as PEDOT-PSS, and a surface tension reducing agent onto predetermined portions of a hydrophobic surface, for example formed by a ferroelectric polymer layer. The conducting polymer can form conductive tracks on either side of the ferroelectric layer to form a memory device.
    Type: Application
    Filed: December 11, 2006
    Publication date: June 28, 2007
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Christopher Newsome, Daping Chu
  • Patent number: 7217438
    Abstract: In an inkjet deposition apparatus, a print head is translated in a transverse direction relative to a substrate and the deviation of the print head relative to a first alignment mark is measured. The inkjet head is then translated in a longitudinal direction relative to the substrate and the deviation of the print head to a further alignment mark is measured. A correction factor for a control unit for translation stage of the apparatus is then generated from the measured deviations.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: May 15, 2007
    Assignee: Seiko Epson Corporation
    Inventors: Christopher Newsome, Takeo Kawase