Abstract: A method for manufacturing a semiconductor structures is provided. The method includes forming a first hybrid bonding layer over a first wafer having a logic structure, forming a second hybrid bonding layer over a second wafer having a first capacitor structure, bonding the first wafer and the second wafer through a hybrid bonding operation to connect the first hybrid bonding layer and the second hybrid bonding layer, thereby obtaining a first bonded wafer, and the first capacitor structure is electrically connected to the logic structure through the first hybrid bonding layer and the second hybrid bonding layer, and singulating the first bonded wafer to obtain a plurality of semiconductor structures.

Abstract: A circuit assembly includes an integrated circuit (IC) die and a first capacitor die. The IC die provides an IC and includes a plurality of first conductive pads. The first capacitor die provides a plurality of capacitors, and includes a plurality of second conductive pads at the first side and a plurality of conductive vias at the second side. At least one of the second conductive pads electrically connects to the capacitors. The conductive vias is adapted to form a plurality of external signal connections of the IC die and the first capacitor die. The IC die is stacked with the first capacitor die in such a way that the first conductive pads electrically connect to the second conductive pads, and surfaces of the IC die and the first capacitor die attaching to each other are substantially of the same size.

Abstract: An interface of a memory circuit includes a chip enable terminal, at least one data terminal, and a data strobe terminal. The chip enable terminal receives a chip enable signal that varies between a first high voltage and a low voltage for enabling the memory circuit. The at least one data terminal receives at least one first data signal that varies between a second high voltage and the low voltage. The data strobe terminal receives a first data strobe signal that periodically varies between the second high voltage and the low voltage. The first data strobe signal is synchronized with the at least one first data signal, and is arranged to latch and sample the at least one first data signal. The first high voltage is higher than the second high voltage, and the second high voltage is higher than the low voltage.

Abstract: A display controller includes a first chip and a second chip. The first chip is configured to control a display device. The second chip is externally coupled to the first chip, and configured to be a random access memory and. The first chip is further configured to provide a first supply power to the second chip and to access the second chip during the controlling of the display device.

Abstract: A method for enhancing an accuracy of a benign tumor development trend assessment system includes: a first processing procedure, an image captured before the treatment is inputted to and be processed by a server computing device of the benign tumor development trend assessment system to obtain a first processing result; a second processing procedure, the images captured before and in at least one period after the treatment are inputted to and processed by the server computing device to obtain a second processing result; a trend analyzing procedure, the trend analyzing module of the server computing device analyzes the first processing result, the second processing result and the trend pathways to obtain a tumor development trend result; and a storing procedure, the first processing result, the second processing result and the tumor development trend result are transformed to an individual trend pathway which is stored in the trend analyzing module.

Abstract: A target image of a target circuit board and a gold image of a gold circuit board are taken by an image acquisition system. Fiducial points are located on the target image and on the gold image. Perspective transformation is performed on the target image using the fiducial points on the target image for reference and on the gold image using the fiducial points on the gold image for reference. After perspective transformation, an anomalous section of the target image is identified by identifying pixels that have different intensities between the target image and the gold image, the anomalous section being indicative of an unauthorized modification to the target circuit board.

Abstract: A method for manufacturing a semiconductor structures is provided. The method includes forming a first hybrid bonding layer over a first wafer having a logic structure, forming a second hybrid bonding layer over a second wafer having a first capacitor structure, bonding the first wafer and the second wafer through a hybrid bonding operation to connect the first hybrid bonding layer and the second hybrid bonding layer, thereby obtaining a first bonded wafer, and the first capacitor structure is electrically connected to the logic structure through the first hybrid bonding layer and the second hybrid bonding layer, and singulating the first bonded wafer to obtain a plurality of semiconductor structures.

Abstract: A method to manufacture a semiconductor device includes: bonding a first wafer and a second wafer to be stacked vertically with one another, in which the first wafer provides a plurality of memory components and the second wafer provides a control circuit; forming a plurality of input/output channels on a surface of one of the first and second wafers; and cutting the bonded first and second wafers into a plurality of dices; wherein a plurality of first conductive contacts in the first wafer are electrically connected to the control circuit and the first conductive contacts in combinations with a plurality of first conductive vias in the first wafer form a plurality of transmission channels through which the control circuit is capable to access the memory components.

Abstract: A semiconductor device includes a first semiconductor portion and a second semiconductor portion. The first semiconductor portion provides a plurality of memory components, including a first substrate layer, a plurality of first interconnect conductive layers, a plurality of first conductive vias, and a plurality of first conductive contacts. The first conductive contacts electrically connect to the first conductive vias, and the first conductive contacts in combination with the first conductive vias are formed on a top first interconnect conductive layer of the first interconnect conductive layers. The second semiconductor portion provides a control circuit, including a second substrate layer and a plurality of second interconnect conductive layers.

Abstract: A benign tumor development trend assessment system includes an image outputting device and a server computing device. The image outputting device outputs first/second images captured from the same position in a benign tumor. The server computing device includes an image receiving module, an image pre-processing module, a target extracting module, a feature extracting module and a trend analyzing module. The image receiving module receives the first/second images. The image pre-processing module pre-processes the first/second images to obtain first/second local images. The target extracting module automatically detects and delineates tumor regions from the first/second local images to obtain first/second region of interest (ROI) images. The feature extracting module automatically identifies the first/second ROI images to obtain at least one first/second features. The trend analyzing module analyzes the first/second features to obtain a tumor development trend result.

Abstract: An acoustic wave element includes: a substrate; a bonding structure on the substrate; a support layer on the bonding structure; a first electrode including a lower surface on the support layer; a cavity positioned between the support layer and the first electrode and exposing a lower surface of the first electrode; a piezoelectric layer on the first electrode; and a second electrode on the piezoelectric layer, wherein at least one of the first electrode and the second electrode includes a first layer and a second layer that the first layer has a first acoustic impedance and a first electrical impedance, the second layer has a second acoustic impedance and a second electrical impedance, wherein the first acoustic impedance is higher than the second acoustic impedance, and the second electrical impedance is lower than the first electrical impedance.

Abstract: A method for manufacturing a semiconductor structures is provided. The method includes forming a first hybrid bonding layer over a first wafer having a logic structure, forming a second hybrid bonding layer over a second wafer having a first capacitor structure, bonding the first wafer and the second wafer through a hybrid bonding operation to connect the first hybrid bonding layer and the second hybrid bonding layer, thereby obtaining a first bonded wafer, and the first capacitor structure is electrically connected to the logic structure through the first hybrid bonding layer and the second hybrid bonding layer, and singulating the first bonded wafer to obtain a plurality of semiconductor structures.

Abstract: A circuit assembly includes an integrated circuit (IC) die and a first capacitor die. The IC die provides an IC and includes a plurality of first conductive pads. The first capacitor die provides a plurality of capacitors, and includes a plurality of second conductive pads at the first side and a plurality of conductive vias at the second side. At least one of the second conductive pads electrically connects to the capacitors. The conductive vias is adapted to form a plurality of external signal connections of the IC die and the first capacitor die. The IC die is stacked with the first capacitor die in such a way that the first conductive pads electrically connect to the second conductive pads, and surfaces of the IC die and the first capacitor die attaching to each other are substantially of the same size.

Abstract: A semiconductor device includes a first semiconductor portion and a second semiconductor portion. The first semiconductor portion provides a plurality of memory components, including a first substrate layer, a plurality of first interconnect conductive layers, a plurality of first conductive vias, and a plurality of first conductive contacts. The first conductive contacts electrically connect to the first conductive vias, and the first conductive contacts in combination with the first conductive vias are formed on a top first interconnect conductive layer of the first interconnect conductive layers. The second semiconductor portion provides a control circuit, including a second substrate layer and a plurality of second interconnect conductive layers.

Abstract: A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a substrate, a first doped region, a second doped region, a first dielectric layer, a third doped region, a fourth doped region, a second dielectric layer and a conductive layer. The substrate has a first trench in a first area and a second trench in a second area. The first and second doped regions are disposed in the substrate respectively at two side of the first trench. The first dielectric layer is disposed on the sidewall of the first trench. The third doped region is disposed around the second trench. The fourth doped region is disposed in the third doped region at one side of the second trench. The second dielectric layer is disposed on the sidewall and bottom of the second trench. The conductive layer is disposed in the first and second trenches.

Abstract: A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a substrate, a first doped region, a second doped region, a first dielectric layer, a third doped region, a fourth doped region, a second dielectric layer and a conductive layer. The substrate has a first trench in a first area and a second trench in a second area. The first and second doped regions are disposed in the substrate respectively at two side of the first trench. The first dielectric layer is disposed on the sidewall of the first trench. The third doped region is disposed around the second trench. The fourth doped region is disposed in the third doped region at one side of the second trench. The second dielectric layer is disposed on the sidewall and bottom of the second trench. The conductive layer is disposed in the first and second trenches.

Abstract: An electronic apparatus having a coplanar waveguide transmission line configured to reduce impedance discontinuity in the coplanar waveguide transmission line is introduced. The electronic apparatus includes a coplanar waveguide transmission line including a substrate, at least one signal line and a plurality of reference planes, and the electronic apparatus includes at least one passive component. Each of the reference planes is coupled to a DC voltage. The at least one passive component is electrically connected between the reference planes and acts as a short circuit at relatively high frequencies.

Abstract: A method for performing display stabilization control in an electronic device and an associated apparatus are provided, where the method may include the steps of: receiving a detection signal from at least one sensing component of the electronic device, such as at least one micro-electro-mechanical system (MEMS) sensor, to determine a movement of the electronic device according to the detection signal; determining a reverse-movement that is opposite to the movement of the electronic device; and adjusting at least one location of at least one portion of display contents on a display module (e.g. a touch-sensitive display module) of the electronic device according to the reverse-movement, to emulate a stabilized version of the at least one portion of the display contents for a user of the electronic device.

Abstract: The present invention provides a method for improving gate coupling ratio of a flash memory device and a protruding floating gate is formed. First, a substrate having a plurality of isolation structures is formed. Then, a first conductive layer is formed overlaying the substrate. A chemical-mechanical polishing process is performed to planarize the first conductive layer. After that, a portion of the isolation structures is removed, and a second conductive layer is formed overlaying the first conductive layer and the isolation structures. Finally, a lithography process with a photomask can be used to define a mask that covers the first conductive layer and the second conductive layer, and then an insulating layer is deposited overlaying the substrate, so that a third conductive layer is formed overlaying the insulating layer.

Abstract: A grille attachment for a loudspeaker is disclosed. A grille retainer is defined by a retention lip portion, a radial rim interface portion, and a hinge portion. The radial rim interface portion is in an abutting relationship with a flange radial mounting surface of the loudspeaker basket. The hinge portion connects the retention lip portion and the radial rim interface portion. The retention lip portion extends toward a flanged rim of the speaker basket, and defines an inner retention surface that is opposed to a flange circumferential surface. A grille extends across the griller retainer and is defined by a grille body and a grille rim that is circumferentially disposed and extending from the grille body. The grille rim is interposed between the flange circumferential surface and the inner retention surface, with the retention lip portion exerting a radial compressive force against the grille rim.