Patents by Inventor Chung-Cheng Lin

Chung-Cheng Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240188857
    Abstract: The invention provides a biomedical detection photoelectric module, which includes a circuit substrate, a plurality of isolating barriers, a light-emitting unit, a photosensitive unit, and a light-guiding assembly. The light-guiding assembly provides a first optical element and a second optical element, respectively, corresponding to a light-emitting unit and a light-sensing unit. The first optical element has a first pattern layer to alter the emitting angle of the first light generated by the light-emitting unit. The second optical element has a second pattern layer to alter the incident angle of a second optical element entering the light-sensing unit. The first light is guided by the first optical element so that the energy of the first light is concentrated and incident on a predetermined area of a human's skin layer. The second light in the predetermined area is guided by the second optical element to enter the light-sensing unit.
    Type: Application
    Filed: December 7, 2023
    Publication date: June 13, 2024
    Inventors: Sheng-Wei CHEN, Chung-Cheng LIN, Chuan-Fa LIN, Chuan-Yu HUNG
  • Patent number: 11573454
    Abstract: A display apparatus including a circuit board, a plurality of light-emitting devices and a display panel is provided. The light-emitting devices are disposed on the circuit board and electrically connected to the circuit board. The display panel is disposed on the light-emitting devices. The display panel includes a peripheral light-shielding pattern. An opening portion of the peripheral light-shielding pattern defines an active area of the display panel. A physical portion of the peripheral light-shielding pattern defines a non-active area of the display panel. An optical axis of a light-emitting surface of at least one of the light-emitting devices is located at a junction of the active area and the non-active area, at the non-active area, or at the active area and a side wall of the at least one of the light-emitting devices is located at the junction of the active area and the non-active area.
    Type: Grant
    Filed: June 21, 2022
    Date of Patent: February 7, 2023
    Assignee: Coretronic Corporation
    Inventors: Yu-Yu Liu, Tao-Lin Wang, Wen-Pin Yang, Chen-Hung Lin, Chung-Cheng Lin, Guan-Jr Huang
  • Publication number: 20220413340
    Abstract: A display apparatus including a circuit board, a plurality of light-emitting devices and a display panel is provided. The light-emitting devices are disposed on the circuit board and electrically connected to the circuit board. The display panel is disposed on the light-emitting devices. The display panel includes a peripheral light-shielding pattern. An opening portion of the peripheral light-shielding pattern defines an active area of the display panel. A physical portion of the peripheral light-shielding pattern defines a non-active area of the display panel. An optical axis of a light-emitting surface of at least one of the light-emitting devices is located at a junction of the active area and the non-active area, at the non-active area, or at the active area and a side wall of the at least one of the light-emitting devices is located at the junction of the active area and the non-active area.
    Type: Application
    Filed: June 21, 2022
    Publication date: December 29, 2022
    Applicant: Coretronic Corporation
    Inventors: Yu-Yu Liu, Tao-Lin Wang, Wen-Pin Yang, Chen-Hung Lin, Chung-Cheng Lin, Guan-Jr Huang
  • Patent number: 11004997
    Abstract: An infrared thermal emitter includes a substrate, a light-emitting unit and an infrared-emitting unit. The light-emitting unit is disposed on the substrate in a laminating direction and has a light-exiting surface away from the substrate. The infrared-emitting unit is disposed on the substrate in the laminating direction to cover the light-emitting unit and includes a layered structure having a light-absorbing layer that is aligned with the light-emitting unit in the laminating direction. The light-absorbing layer absorbs light emitted from the light-emitting unit so as to be heated up and to generate infrared radiation.
    Type: Grant
    Filed: August 13, 2019
    Date of Patent: May 11, 2021
    Assignees: GODSMITH SENSOR INC., OPTO TECH CORPORATION
    Inventors: Jin-Shown Shie, Yi-Chun Liao, Chieh-Yi Chen, Chung-Cheng Lin, Cheng-Wei Yang, Chi-Tseng Chang
  • Patent number: 10784221
    Abstract: A method includes vacuum annealing on a substrate having at least one solder bump to reduce voids at an interface of the at least one solder bump. A die is mounted over the substrate.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: September 22, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsiu-Jen Lin, Chung-Shi Liu, Ming-Da Cheng, Chung-Cheng Lin, Yu-Peng Tsai, Cheng-Ting Chen
  • Publication number: 20200083394
    Abstract: An infrared thermal emitter includes a substrate, a light-emitting unit and an infrared-emitting unit. The light-emitting unit is disposed on the substrate in a laminating direction and has a light-exiting surface away from the substrate. The infrared-emitting unit is disposed on the substrate in the laminating direction to cover the light-emitting unit and includes a layered structure having a light-absorbing layer that is aligned with the light-emitting unit in the laminating direction. The light-absorbing layer absorbs light emitted from the light-emitting unit so as to be heated up and to generate infrared radiation.
    Type: Application
    Filed: August 13, 2019
    Publication date: March 12, 2020
    Applicants: Godsmith Sensor Inc., Opto Tech Corporation
    Inventors: Jin-Shown SHIE, Yi-Chun LIAO, Chieh-Yi CHEN, Chung-Cheng LIN, Cheng-Wei YANG, Chi-Tseng CHANG
  • Patent number: 10053572
    Abstract: The disclosure provides a masterbatch, a method for fabricating the same and a film formed from the masterbatch. The masterbatch includes a product prepared from a composition via polymerization and granulation. The composition includes: terephthalic acid; and a silicon dioxide dispersion, wherein the silicon dioxide dispersion includes surface-modified silicon dioxide particles disposed within ethylene glycol, and the surface-modified silicon dioxide particle has first functional groups and second functional groups bonded on the surface of the silicon dioxide particles, wherein the first functional groups have a structure represented by and the second functional groups include a C1-8 haloalkyl functional group, C1-8 alkoxy functional group, C1-8 aminoalkyl functional group, C2-8 alkenyl group, or epoxy group, R1 is hydrogen or a C1-3 alkyl functional group, and n is 1-4.
    Type: Grant
    Filed: May 1, 2013
    Date of Patent: August 21, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wen-Jiunn Chen, Ming-Tzung Wu, Te-Yi Chang, Chih-Hsiang Lin, Chung-Cheng Lin, Meng-Hsin Chen
  • Patent number: 9688813
    Abstract: Disclosed is a thermoplastic polyester elastomer, which is formed by reacting 100 parts by weight of polyester and 0.01 to 2 parts by weight of an epoxy resin with two epoxy groups, wherein the polyester is formed by reacting a parts by mole of a hard-segment diol, b parts by mole of a soft-segment diol, and 1 part by mole of a diacid, wherein 1?a?3 and 0.005?b?1.5.
    Type: Grant
    Filed: December 24, 2014
    Date of Patent: June 27, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chun-Hsiung Liao, Jen-Chun Chiu, Cing-Jiuh Kang, Chung-Cheng Lin, Chin-Lang Wu, Yu-Chuan Hsu
  • Patent number: 9642249
    Abstract: A disclosure provides a resin composition, a prepreg, and a substrate employing the same. According to an embodiment of the disclosure, the resin composition includes a polyphenylene ether compound, and a bismaleimide. The prepreg includes a cured product of the resin composition. The substrate includes a product fabricated by the resin composition or the prepreg.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: May 2, 2017
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wei-Ta Yang, Li-Chun Liang, I-Hong Lin, Chung-Cheng Lin
  • Patent number: 9521851
    Abstract: A method of fabricating an antimicrobial metal complex surface, and the method includes providing an article, and the article has a first metal complex surface treated by anodization. The first metal complex surface is formed with a first pore. Secondly a silver suspension is provided. The silver suspension also has pore sealing agent. The article is soaked in the suspension to form a pore sealing layer having silver particles on the first metal complex surface such that the silver particles are distributed in the pore sealing layer. The antimicrobial metal complex surface fabricated by the method inhibits microorganism growth on the anodized metal surface.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: December 20, 2016
    Assignee: CATCHER TECHNOLOGY CO., LTD.
    Inventors: Chung-Cheng Lin, Feng-Ju Lai
  • Publication number: 20160159980
    Abstract: An aqueous-phase catalyst composition including a metal ion including copper, nickel, manganese or iron and a water-soluble linear polymer having a molecular weight ranging from 1,000 to 20,000 is provided. The metal ion and the water-soluble linear polymer have a weight ratio of 1:1 to 1:5. A method for preparing polyphenylene ether including providing the disclosed aqueous-phase catalyst composition and adding phenolic monomers to the aqueous-phase catalyst composition to proceed to a polymerization reaction to prepare polyphenylene ether is also provided.
    Type: Application
    Filed: December 30, 2014
    Publication date: June 9, 2016
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chung-Cheng LIN, Hsuan-Wei LEE, Wei-Ta YANG, I-Hong LIN, Chi-Wei CHEN, Hou Yuan CHEN
  • Patent number: 9359475
    Abstract: An aqueous-phase catalyst composition including a metal ion including copper, nickel, manganese or iron and a water-soluble linear polymer having a molecular weight ranging from 1,000 to 20,000 is provided. The metal ion and the water-soluble linear polymer have a weight ratio of 1:1 to 1:5. A method for preparing polyphenylene ether including providing the disclosed aqueous-phase catalyst composition and adding phenolic monomers to the aqueous-phase catalyst composition to proceed to a polymerization reaction to prepare polyphenylene ether is also provided.
    Type: Grant
    Filed: December 30, 2014
    Date of Patent: June 7, 2016
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chung-Cheng Lin, Hsuan-Wei Lee, Wei-Ta Yang, I-Hong Lin, Chi-Wei Chen, Hou Yuan Chen
  • Publication number: 20160152839
    Abstract: Method for forming antimicrobial complex surface, being performed during processes of an anodic treatment including the following steps being worked on a workpiece: pretreatment, anodization, acid pickling, staining and pole sealing, at least comprising the following steps: providing an silver containing solution; introducing the silver solution during the processes of the anodic treatment; and providing silver particles based on the silver solution as an silver particle source, so as to form an antimicrobial complex surface on the workpiece.
    Type: Application
    Filed: February 3, 2015
    Publication date: June 2, 2016
    Inventors: FENG-JU LAI, CHUNG-CHENG LIN
  • Publication number: 20160130393
    Abstract: Disclosed is a thermoplastic polyester elastomer, which is formed by reacting 100 parts by weight of ester and 0.01 to 2 parts by weight of an epoxy resin with two epoxy groups, wherein the ester is formed by reacting a parts by mole of a hard-segment diol, b parts by mole of a soft-segment diol, and 1 part by mole of a diacid, wherein 1?a?3 and 0.005?b?1.5.
    Type: Application
    Filed: December 24, 2014
    Publication date: May 12, 2016
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chun-Hsiung LIAO, Jen-Chun CHIU, Cing-Jiuh KANG, Chung-Cheng LIN, Chin-Lang WU, Yu-Chuan HSU
  • Patent number: 9332765
    Abstract: An antimicrobial metal complex surface and a method of fabricating the same, and the method includes providing an article, and the article has a first metal complex surface treated by anodization. The first metal complex surface is formed with a first pore. Secondly a silver suspension is provided. The silver suspension also has pore sealing agent. The article is soaked in the suspension to form a pore sealing layer having silver particles on the first metal complex surface such that the silver particles are distributed in the pore sealing layer. The antimicrobial metal complex surface fabricated by the method inhibits microorganism growth on the anodized metal surface.
    Type: Grant
    Filed: March 31, 2014
    Date of Patent: May 10, 2016
    Assignee: CATCHER TECHNOLOGY CO., LTD.
    Inventors: Chung-Cheng Lin, Feng-Ju Lai
  • Publication number: 20150373988
    Abstract: A method of fabricating an antimicrobial metal complex surface, and the method includes providing an article, and the article has a first metal complex surface treated by anodization. The first metal complex surface is formed with a first pore. Secondly a silver suspension is provided. The silver suspension also has pore sealing agent. The article is soaked in the suspension to form a pore sealing layer having silver particles on the first metal complex surface such that the silver particles are distributed in the pore sealing layer. The antimicrobial metal complex surface fabricated by the method inhibits microorganism growth on the anodized metal surface.
    Type: Application
    Filed: September 9, 2015
    Publication date: December 31, 2015
    Inventors: CHUNG-CHENG LIN, FENG-JU LAI
  • Publication number: 20150225524
    Abstract: A polyester film is provided. The polyester film is produced from a composition that includes the following monomers: terephthalic acid, ethylene glycol, and a branched monomer having a structure represented by formula (I), formula (II) or formula (III): , wherein X is independently hydroxyl, carboxyl or —COOR, and R is C1-6 alkyl. The molar ratio between terephthalic acid and ethylene glycol ranges is between about 50:50 and 30:70. The molar percentage of the branched monomer is from about 1 mol % to 3 mol %, based on the total mole of terephthalic acid and ethylene glycol.
    Type: Application
    Filed: December 30, 2014
    Publication date: August 13, 2015
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Meng-Hsin CHEN, Chih-Hsiang LIN, Chung-Cheng LIN
  • Publication number: 20150208662
    Abstract: An antimicrobial metal complex surface and a method of fabricating the same, and the method includes providing an article, and the article has a first metal complex surface treated by anodization. The first metal complex surface is formed with a first pore. Secondly a silver suspension is provided. The silver suspension also has pore sealing agent. The article is soaked in the suspension to form a pore sealing layer having silver particles on the first metal complex surface such that the silver particles are distributed in the pore sealing layer. The antimicrobial metal complex surface fabricated by the method inhibits microorganism growth on the anodized metal surface.
    Type: Application
    Filed: March 31, 2014
    Publication date: July 30, 2015
    Applicant: CATCHER TECHNOLOGY CO., LTD.
    Inventors: CHUNG-CHENG LIN, FENG-JU LAI
  • Patent number: 9045604
    Abstract: The disclosure provides a polyester composition and a polyester article. According to an embodiment, the polyester composition includes a polyester and a branched monomer. The branched monomer has a structure represented by formula (I) or formula (II): wherein R is independently hydrogen, fluorine, chlorine, bromine, or C1-6 alkyl.
    Type: Grant
    Filed: March 25, 2014
    Date of Patent: June 2, 2015
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Meng-Hsin Chen, Chih-Hsiang Lin, Chung-Cheng Lin
  • Patent number: 9012572
    Abstract: A polyphenylene ether oligomer is provided. The polyphenylene ether oligomer has the following formula (I): X is ?R is H or C1-6 alkyl group; Y independently is a moiety polymerized by at least two different phenol-based compounds; and Z independently is H, acryloyl group, allyl group, vinylbenzyl group, epoxypropyl group, methylacryloyl group, propargyl group, or cyanoallyl group.
    Type: Grant
    Filed: December 26, 2013
    Date of Patent: April 21, 2015
    Assignee: Industrial Technology Research Institute
    Inventors: I-Hong Lin, Chung-Cheng Lin, Wei-Ta Yang, Chih-Hsiang Lin