Patents by Inventor Chung-Chieh Lee

Chung-Chieh Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11037792
    Abstract: The present disclosure provides a semiconductor structure etching solution, including an etchant, an ionic strength enhancer having an ionic strength greater than 10?3 M in the semiconductor structure etching solution, and a solvent having a dielectric constant lower than a dielectric constant of water.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: June 15, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventor: Chung-Chieh Lee
  • Patent number: 11004746
    Abstract: The present disclosure provides a dehydrating chemical for dehydrating a semiconductor substrate under an ambient temperature, including a first chemical having a melting point below the ambient temperature, and a second chemical having a melting point greater than the melting point of the first chemical, wherein the dehydrating chemical has a melting point less than the ambient temperature by predetermined ?T0 degrees, and at least one of the first chemical and the second chemical has a saturated vapor pressure greater than a predetermined pressure PSV under 1 atm.
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: May 11, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chung-Chieh Lee, Chi-Ming Yang, Chyi Shyuan Chern
  • Patent number: 10971353
    Abstract: The present disclosure provides a method for dehydrating a semiconductor structure, including providing a semiconductive substrate, forming a trench on the semiconductive substrate, dispensing an agent in liquid form into the trench, solidifying the agent, and dehydrating a surface in the trench by transforming the agent from solid form to vapor form.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: April 6, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventor: Chung-Chieh Lee
  • Patent number: 10957529
    Abstract: A method for drying a wafer is provided. The method includes providing or receiving the wafer and applying a rinsing liquid in a liquid state to the wafer. The rinsing liquid has a boiling point. The method also includes drying the wafer by applying a drying fluid in a gaseous state to the wafer. The drying fluid has a higher temperature than the boiling point of the rinsing liquid, and the rinsing liquid is evaporated and removed by the drying fluid. After the removal of the rinsing liquid, the drying fluid remains in a gaseous state.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: March 23, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventor: Chung-Chieh Lee
  • Patent number: 10824561
    Abstract: A computer device and a data protection method therefor are provided. The computer device includes an embedded controller, a data storage, and a power module. The embedded controller includes a general-purpose input-output port. The data storage is coupled to the embedded controller through the general-purpose input-output port. The power module is coupled to the embedded controller. The embedded controller detects whether an abnormal shutdown event occurs. When the abnormal shutdown event occurs, the embedded controller informs the data storage to perform a buffered data storage operation through the general-purpose input-output port, so as to transfer buffered data in the data storage to a non-volatile storage area in the data storage, and the embedded controller controls the power module to maintain power supply to the data storage in a predetermined time period.
    Type: Grant
    Filed: April 13, 2018
    Date of Patent: November 3, 2020
    Assignee: COMPAL ELECTRONICS, INC.
    Inventors: Hsiu-En Hsu, Chung-Chieh Lee, Jeng-Nan Lin, Chan-Ju Lin, Pa-I Chuang, Yu-Ting Chou
  • Publication number: 20200168508
    Abstract: The present disclosure provides a dehydrating chemical for dehydrating a semiconductor substrate under an ambient temperature, including a first chemical having a melting point below the ambient temperature, and a second chemical having a melting point greater than the melting point of the first chemical, wherein the dehydrating chemical has a melting point less than the ambient temperature by predetermined ?T0 degrees, and at least one of the first chemical and the second chemical has a saturated vapor pressure greater than a predetermined pressure PSV under 1 atm.
    Type: Application
    Filed: November 8, 2019
    Publication date: May 28, 2020
    Inventors: CHUNG-CHIEH LEE, CHI-MING YANG, CHYI SHYUAN CHERN
  • Publication number: 20200135479
    Abstract: The present disclosure provides a semiconductor structure etching solution, including an etchant, an ionic strength enhancer having an ionic strength greater than 10?3 M in the semiconductor structure etching solution, and a solvent having a dielectric constant lower than a dielectric constant of water.
    Type: Application
    Filed: April 1, 2019
    Publication date: April 30, 2020
    Inventor: CHUNG-CHIEH LEE
  • Publication number: 20200117076
    Abstract: A method for generating an electromagnetic radiation includes the following operations. A target material is introduced in a chamber. A light beam is irradiated on the target material in the chamber to generate plasma and an electromagnetic radiation. The electromagnetic radiation is collected with an optical device. A gas mixture is introduced in the chamber. The gas mixture includes a first buffer gas reactive to the target material, and a second buffer gas to slow down debris of the target material and/or plasma by-product, so as to increase an reaction efficiency of the target material and the first buffer gas, and to reduce deposition of the debris of the target material and/or the plasma by-product on the optical device.
    Type: Application
    Filed: December 13, 2019
    Publication date: April 16, 2020
    Inventors: CHUNG-CHIEH LEE, FENG YUAN HSU, CHYI SHYUAN CHERN, CHI-MING YANG, TSIAO-CHEN WU, CHUN-LIN CHANG
  • Publication number: 20200090925
    Abstract: The present disclosure provides a method for dehydrating a semiconductor structure, including providing a semiconductive substrate, forming a trench on the semiconductive substrate, dispensing an agent in liquid form into the trench, solidifying the agent, and dehydrating a surface in the trench by transforming the agent from solid form to vapor form.
    Type: Application
    Filed: November 6, 2019
    Publication date: March 19, 2020
    Inventor: CHUNG-CHIEH LEE
  • Publication number: 20200020522
    Abstract: In a method of cleaning a substrate, a solution including a size-modification material is applied on a substrate, on which particles to be removed are disposed. Size-modified particles having larger size than the particles are generated, from the particles and the size-modification material. The size-modified particles are removed from the substrate.
    Type: Application
    Filed: September 24, 2019
    Publication date: January 16, 2020
    Inventor: Chung-Chieh LEE
  • Patent number: 10509311
    Abstract: A method for generating an electromagnetic radiation includes the following operations. A target material is introduced in a chamber. A light beam is irradiated on the target material in the chamber to generate plasma and an electromagnetic radiation. The electromagnetic radiation is collected with an optical device. A gas mixture is introduced in the chamber. The gas mixture includes a first buffer gas reactive to the target material, and a second buffer gas to slow down debris of the target material and/or plasma by-product, so as to increase an reaction efficiency of the target material and the first buffer gas, and to reduce deposition of the debris of the target material and/or the plasma by-product on the optical device.
    Type: Grant
    Filed: May 29, 2018
    Date of Patent: December 17, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Chung-Chieh Lee, Feng Yuan Hsu, Chyi Shyuan Chern, Chi-Ming Yang, Tsiao-Chen Wu, Chun-Lin Chang
  • Publication number: 20190369481
    Abstract: A method for generating an electromagnetic radiation includes the following operations. A target material is introduced in a chamber. A light beam is irradiated on the target material in the chamber to generate plasma and an electromagnetic radiation. The electromagnetic radiation is collected with an optical device. A gas mixture is introduced in the chamber. The gas mixture includes a first buffer gas reactive to the target material, and a second buffer gas to slow down debris of the target material and/or plasma by-product, so as to increase an reaction efficiency of the target material and the first buffer gas, and to reduce deposition of the debris of the target material and/or the plasma by-product on the optical device.
    Type: Application
    Filed: May 29, 2018
    Publication date: December 5, 2019
    Inventors: CHUNG-CHIEH LEE, FENG YUAN HSU, CHYI SHYUAN CHERN, CHI-MING YANG, TSIAO-CHEN WU, CHUN-LIN CHANG
  • Patent number: 10497559
    Abstract: The present disclosure provides a method for dehydrating a semiconductor structure, including providing a semiconductive substrate, forming a trench on the semiconductive substrate, dispensing an agent in liquid form into the trench, solidifying the agent, and dehydrating a surface in the trench by transforming the agent from solid form to vapor form.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: December 3, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventor: Chung-Chieh Lee
  • Patent number: 10468243
    Abstract: In a method of cleaning a substrate, a solution including a size-modification material is applied on a substrate, on which particles to be removed are disposed. Size-modified particles having larger size than the particles are generated, from the particles and the size-modification material. The size-modified particles are removed from the substrate.
    Type: Grant
    Filed: February 28, 2018
    Date of Patent: November 5, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: Chung-Chieh Lee
  • Patent number: 10452311
    Abstract: A hard disk monitoring method and a hard disk monitoring system are provided. The hard disk monitoring method includes: determining whether a speaker outputs a sound source by using a host system; if the speaker outputs the sound source, determining whether a performance of the hard disk is lower than a threshold by using the host system; if the performance of the hard disk is lower than the threshold, adjusting the sound source signal of the sound source by using the host system. Therefore, the hard disk monitoring method and the hard disk monitoring system inspect the performance of the hard disk when the speaker outputs the sound source. If the performance of the hard disk drops, the volume outputted by the speaker is dynamically turned down to stop the performance drop of the hard disk caused by the vibration generated by the speaker outputting the sound source.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: October 22, 2019
    Assignee: COMPAL ELECTRONICS, INC.
    Inventors: Pa-I Chuang, Chung-Chieh Lee
  • Publication number: 20190304773
    Abstract: The present disclosure provides a method for dehydrating a semiconductor structure, including providing a semiconductive substrate, forming a trench on the semiconductive substrate, dispensing an agent in liquid form into the trench, solidifying the agent, and dehydrating a surface in the trench by transforming the agent from solid form to vapor form.
    Type: Application
    Filed: March 28, 2018
    Publication date: October 3, 2019
    Inventor: CHUNG-CHIEH LEE
  • Publication number: 20190157070
    Abstract: In a method of cleaning a substrate, a solution including a size-modification material is applied on a substrate, on which particles to be removed are disposed. Size-modified particles having larger size than the particles are generated, from the particles and the size-modification material. The size-modified particles are removed from the substrate.
    Type: Application
    Filed: February 28, 2018
    Publication date: May 23, 2019
    Inventor: Chung-Chieh LEE
  • Publication number: 20180300239
    Abstract: A computer device and a data protection method therefore are provided. The computer device includes an embedded controller, a data storage, and a power module. The embedded controller includes a general-purpose input-output port. The data storage is coupled to the embedded controller through the general-purpose input-output port. The power module is coupled to the embedded controller. The embedded controller detects whether an abnormal shutdown event occurs. When the abnormal shutdown event occurs, the embedded controller informs the data storage to perform a buffered data storage operation through the general-purpose input-output port, so as to transfer buffered data in the data storage to a non-volatile storage area in the data storage, and the embedded controller controls the power module to maintain power supply to the data storage in a predetermined time period.
    Type: Application
    Filed: April 13, 2018
    Publication date: October 18, 2018
    Applicant: COMPAL ELECTRONICS, INC.
    Inventors: Hsiu-En Hsu, Chung-Chieh Lee, Jeng-Nan Lin, Chan-Ju Lin, Pa-I Chuang, Yu-Ting Chou
  • Publication number: 20180151348
    Abstract: A method for drying a wafer is provided. The method includes providing or receiving the wafer and applying a rinsing liquid in a liquid state to the wafer. The rinsing liquid has a boiling point. The method also includes drying the wafer by applying a drying fluid in a gaseous state to the wafer. The drying fluid has a higher temperature than the boiling point of the rinsing liquid, and the rinsing liquid is evaporated and removed by the drying fluid. After the removal of the rinsing liquid, the drying fluid remains in a gaseous state.
    Type: Application
    Filed: January 19, 2017
    Publication date: May 31, 2018
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventor: Chung-Chieh LEE
  • Patent number: 9869018
    Abstract: A method of solid precursor delivery for a vapor deposition process is provided. In some embodiments, a precursor ampoule is provided including a solid precursor arranged in the precursor ampoule. A solvent is added to the precursor ampoule including one or more ionic liquids to dissolve chemical species of the solid precursor and to form a liquid precursor. A carrier gas is applied into the liquid precursor through an inlet of the precursor ampoule. A gas precursor is generated at an upper region of the precursor ampoule by vaporization of the liquid precursor. The chemical species of the solid precursor are delivered into a vapor deposition chamber by the carrier gas. The chemical species of the solid precursor is deposited onto a substrate within the vapor deposition chamber.
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: January 16, 2018
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chung-Chieh Lee, Chi-Ming Yang, Lin-Jung Wu