Patents by Inventor Chung-Kai Lin

Chung-Kai Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140215419
    Abstract: A system and method for designing integrated circuits and predicting current mismatch in a metal oxide semiconductor (MOS) array. A first subset of cells in the MOS array is selected and current measured for each of these cells. Standard deviation of current for each cell in the first subset of cells is determined with respect to current of a reference cell. Standard deviation of local variation can be determined using the determined standard deviation of current for one or more cells in the first subset. Standard deviations of variation induced by, for example, poly density gradient effects, in the x and/or y direction of the array can then be determined and current mismatch for any cell in the array determined therefrom.
    Type: Application
    Filed: January 28, 2013
    Publication date: July 31, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Amit KUNDU, Jaw-Juinn HORNG, Yung-Chow PENG, Shih-Cheng YANG, Chung-Kai LIN
  • Publication number: 20130194213
    Abstract: A touch-sensing panel including a substrate, a plurality of first electrode series, a plurality of second electrode series, and a plurality of first floating patterns is provided. Each of the first electrode series includes a plurality of first touch-sensing pads and a plurality of first bridge patterns. The second electrode series are disposed on the substrate and electrically insulated from each other. The second sensing series are intersected with and electrically insulated from the first sensing series. Each of the second electrode series includes a plurality of second touch-sensing pads and a plurality of second bridge patterns. The first floating patterns are disposed between the first sensing series and the second sensing series. Each of the first touch-sensing pads includes at least one extending portion. In addition, there is no first floating pattern located between the extending portion and the second electrode series adjacent thereto.
    Type: Application
    Filed: January 22, 2013
    Publication date: August 1, 2013
    Applicants: WINTEK CORPORATION, Dongguan Masstop Liquid Crystal Display Co., Ltd.
    Inventors: Jen-Yen Chou, Cheng-Yen Yeh, Jiann-Liang Chou, Chung-Kai Lin, Chih-Jung Teng, Chen-Hao Su
  • Publication number: 20120278050
    Abstract: A method includes providing an integrated circuit device comprising a plurality of input parameters and an electrical parameter. A simulation is performed using a simulation model to simulate a plurality of data of the electrical parameter, wherein the plurality of data are generated through simulation from a first plurality of input parameter sets reflecting values of the plurality of input parameters, and wherein the plurality of data is distributed in a range. A first sub-range among the range is selected. All of the plurality of data falling into the first sub-range are selected, and are fitted with corresponding ones of the first input parameter sets to generate a first function, wherein the electrical parameter is expressed as the first function of the plurality of input parameters. The first function is different from functions in the simulation model.
    Type: Application
    Filed: April 29, 2011
    Publication date: November 1, 2012
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng Hsiao, Ke-Wei Su, Chung-Kai Lin, Min-Chie Jeng
  • Patent number: 8275584
    Abstract: A method of developing a statistical model for integrated circuits includes providing a set of test patterns; collecting a set of intra-die data from the set of test patterns; collecting a set of inter-die data from the set of test patterns; generating a total variation sigma (sigma_total) from the set of intra-die data and the set of inter-die data; appointing one of a global variation sigma (sigma_global) and a local variation sigma (sigma_local) as a first sigma, and a remaining one as a second sigma; generating the first sigma from one of the set of intra-data and the set of inter-data; generating the second sigma by removing the first sigma from the sigma_total; generating a corner model for global variations based on sigma_global and the set of inter-die data; and generating a corner model for local variations based on sigma_local and the set of intra-die data.
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: September 25, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chung-Kai Lin, Cheng Hsiao, Sally Liu
  • Patent number: 8201111
    Abstract: Disclosed is a system and method for integrated circuit designs and post layout analysis. The integrated circuit design method includes providing a plurality of IC devices with various design dimensions; collecting electrical performance data of the IC devices; extracting equivalent dimensions of the IC devices; generating a shape related model to relate the equivalent dimensions to the electrical performance data of the IC devices; and creating a data refinement table using the equivalent dimensions and the electrical performance data.
    Type: Grant
    Filed: August 2, 2011
    Date of Patent: June 12, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Chin Hou, Ying-Chou Cheng, Ru-Gun Liu, Chih-Ming Lai, Yi-Kan Cheng, Chung-Kai Lin, Hsiao-Shu Chao, Ping-Heng Yeh, Min-Hong Wu, Yao-Ching Ku, Tsong-Hua Ou
  • Publication number: 20110289466
    Abstract: Disclosed is a system and method for integrated circuit designs and post layout analysis. The integrated circuit design method includes providing a plurality of IC devices with various design dimensions; collecting electrical performance data of the IC devices; extracting equivalent dimensions of the IC devices; generating a shape related model to relate the equivalent dimensions to the electrical performance data of the IC devices; and creating a data refinement table using the equivalent dimensions and the electrical performance data.
    Type: Application
    Filed: August 2, 2011
    Publication date: November 24, 2011
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yung-Chin Hou, Ying-Chou Cheng, Ru-Gun Liu, Chih-Ming Lai, Yi-Kan Cheng, Chung-Kai Lin, Hsiao-Shu Chao, Ping-Heng Yeh, Min-Hong Wu, Yao-Ching Ku, Tsong-Hua Ou
  • Patent number: 8001494
    Abstract: Disclosed is a system and method for integrated circuit designs and post layout analysis. The integrated circuit design method includes providing a plurality of IC devices with various design dimensions; collecting electrical performance data of the IC devices; extracting equivalent dimensions of the IC devices; generating a shape related model to relate the equivalent dimensions to the electrical performance data of the IC devices; and creating a data refinement table using the equivalent dimensions and the electrical performance data.
    Type: Grant
    Filed: October 13, 2008
    Date of Patent: August 16, 2011
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Chin Hou, Ying-Chou Cheng, Ru-Gun Liu, Chih-Ming Lai, Yi-Kan Cheng, Chung-Kai Lin, Hsiao-Shu Chao, Ping-Heng Yeh, Min-Hong Wu, Yao-Ching Ku, Tsong-Hua Ou
  • Publication number: 20100095253
    Abstract: Disclosed is a system and method for integrated circuit designs and post layout analysis. The integrated circuit design method includes providing a plurality of IC devices with various design dimensions; collecting electrical performance data of the IC devices; extracting equivalent dimensions of the IC devices; generating a shape related model to relate the equivalent dimensions to the electrical performance data of the IC devices; and creating a data refinement table using the equivalent dimensions and the electrical performance data.
    Type: Application
    Filed: October 13, 2008
    Publication date: April 15, 2010
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yung-Chin HOU, Ying-Chou CHENG, Ru-Gun LIU, Chih-Ming LAI, Yi-Kan CHENG, Chung-Kai LIN, Hsiao-Shu CHAO, Ping-Heng YEH, Min-Hong WU, Yao-Ching KU, Tsong-Hua OU
  • Publication number: 20080140363
    Abstract: A method of developing a statistical model for integrated circuits includes providing a set of test patterns; collecting a set of intra-die data from the set of test patterns; collecting a set of inter-die data from the set of test patterns; generating a total variation sigma (sigma_total) from the set of intra-die data and the set of inter-die data; appointing one of a global variation sigma (sigma_global) and a local variation sigma (sigma_local) as a first sigma, and a remaining one as a second sigma; generating the first sigma from one of the set of intra-data and the set of inter-data; generating the second sigma by removing the first sigma from the sigma_total; generating a corner model for global variations based on sigma_global and the set of inter-die data; and generating a corner model for local variations based on sigma_local and the set of intra-die data.
    Type: Application
    Filed: December 12, 2006
    Publication date: June 12, 2008
    Inventors: Chung-Kai Lin, Cheng Hsiao, Sally Liu
  • Patent number: 6800496
    Abstract: A method of characterizing gate leakage current in the fabrication of integrated circuits is described. A MOSFET model is provided including a gate electrode deposed over a gate oxide layer on a substrate and source and drain regions associated with the gate electrode. Device current is measured at four terminals simultaneously wherein one of the terminals is a drain terminal. The other terminals are the source, gate, and substrate. The portion of the device current measured at the drain terminal that is contributed by gate current is evaluated. The evaluated gate current contribution is subtracted from the drain terminal current measurement to obtain pure drain current. Fitting procedures are performed to obtain curves for the device currents. The pure drain current is used to extract mobility model parameters.
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: October 5, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chung-Shi Chiang, Ke-Wei Su, Chung-Kai Lin, Jaw-Kang Her, Yu-Tai Chia