Abstract: In one general aspect, a device can include a leadframe including at least one of an external input terminal or an external output terminal, an interposer made of an insulating material, and a redistribution layer coupled to the interposer and made of a conductive material. The redistribution layer can include a plurality of traces. The device can also include a semiconductor die disposed between the redistribution layer and the leadframe.

Abstract: A first embodiment is a common drain+clip 20. It has a conventional drain contact on its bottom surface and is flip chip mounted on a half-etched leadframe 40 which has external source, gate and drain contacts connected to the sources, gate and common drain of the die 20. Common drain clip 50 connects the drain 30 to external contacts between opposite gate contacts. A second embodiment is a direct drain embodiment+heatslug. The device 80 has a top drain contact 36 that extends to the common drain 30 across the bottom of the die which is flip chip mounted to a half-etched leadframe having external source, gate and drain contacts connected to the sources, gates and common drain of the die 80.

Abstract: A data writing method for a rewritable non-volatile memory module, and a memory controller and a memory storage apparatus using the same are provided. The method includes partitioning physical blocks of the rewritable non-volatile memory module into a data area and a spare area and configuring logical blocks. The method also includes selecting physical blocks from the spare area as spare physical blocks corresponding to a logical block and using only lower physical pages of the spare physical blocks to store updated data that is to be written into the logical block. The method further includes moving valid data of all logical pages of the logical block into a physical block of the data area, wherein each lower physical page and an upper physical page corresponding thereto in the physical block are programmed together. Accordingly, the method can effectively improve the speed and reliability of writing data.

Abstract: A capacitive shear force sensor and a method for fabricating thereof are provided. The capacitive shear force sensor includes a first electric field shielding layer, a second electric field shielding layer, a driving electrode, a first sensing electrode, a second sensing electrode and a dielectric layer. The second electric field shielding layer is disposed under the first electric field shielding layer. The driving electrode is disposed between the first electric field shielding layer and the second electric field shielding layer. The first and the second sensing electrodes are disposed between the driving electrode and the second electric field shielding layer. The dielectric layer is disposed between the driving electrode and the first sensing electrode, and between the driving electrode and the second sensing electrode. The first sensing electrode and the driving electrode form a first capacitor. The second sensing electrode and the driving electrode form a second capacitor.

Abstract: In one general aspect, a method can include forming a redistribution layer on a substrate using a first electroplating process, and forming a conductive pillar on the redistribution layer using a second electroplating process. The method can include coupling a semiconductor die to the redistribution layer, and can include forming a molding layer encapsulating at least a portion of the redistribution layer and at least a portion of the conductive pillar.

Abstract: In one general aspect, a method can include forming a redistribution layer on a substrate using a first electroplating process, and forming a conductive pillar on the redistribution layer using a second electroplating process. The method can include coupling a semiconductor die to the redistribution layer, and can include forming a molding layer encapsulating at least a portion of the redistribution layer and at least a portion of the conductive pillar.

Abstract: Semiconductor die packages are disclosed. An exemplary semiconductor die package includes a premolded substrate. The premolded substrate can have a semiconductor die attached to it, and an encapsulating material may be disposed over the semiconductor die.

Abstract: In some general aspects, an apparatus may include a first semiconductor die, a second semiconductor die, and a capacitive isolation circuit being coupled to the first semiconductor die and the second semiconductor die. The capacitive isolation circuit may be disposed outside of the first semiconductor die and the second semiconductor die. The first semiconductor die, the second semiconductor die, and the capacitive circuit may be included in a molding of a semiconductor package.

Abstract: In one general aspect, a package can include a semiconductor die having a first terminal on a first side of the semiconductor die and a second terminal on a second side of the semiconductor die, a leadframe portion electrically coupled to the second terminal of the semiconductor die, and a molding compound. The first terminal on the first side of the semiconductor die, a first surface of the leadframe portion, and a first surface of the molding compound can define at least a portion of a first surface of the package. A second surface of the molding compound and a second surface of the leadframe portion can define at least a portion of a second surface of the package parallel to the first surface of the package, and the second surface can be on an opposite side of the package from the first surface of the package.

Abstract: In one general aspect, a method can include forming a redistribution layer on a substrate using a first electroplating process, and forming a conductive pillar on the redistribution layer using a second electroplating process. The method can include coupling a semiconductor die to the redistribution layer, and can include forming a molding layer encapsulating at least a portion of the redistribution layer and at least a portion of the conductive pillar.

Abstract: In one general aspect, a system can include a through-silicon-via (TSV) coupling a drain region associated with a vertical transistor to a back metal disposed on a second side of the substrate opposite the first side. The system can include a first metal layer, and a second metal layer aligned orthogonal to the first metal layer. The system can define a conduction path extending substantially vertically through the TSV to the substrate and laterally through the substrate.

Abstract: A data writing method for writing data from a host system into a flash memory chip is provided, and the flash memory chip has a plurality of physical blocks. The method includes receiving a host writing command and write data thereof, and executing the host writing command. The method also includes giving a data program command for writing the write data into one of the physical blocks of the flash memory chip, and giving a command for determining whether data stored in the physical block has any error bit. Accordingly, the method can effectively ensure the correctness of data to be written into the flash memory chip.

Abstract: A capacitive shear force sensor and a method for fabricating thereof are provided. The capacitive shear force sensor includes a first electric field shielding layer, a second electric field shielding layer, a driving electrode, a first sensing electrode, a second sensing electrode and a dielectric layer. The second electric field shielding layer is disposed under the first electric field shielding layer. The driving electrode is disposed between the first electric field shielding layer and the second electric field shielding layer. The first and the second sensing electrodes are disposed between the driving electrode and the second electric field shielding layer. The dielectric layer is disposed between the driving electrode and the first sensing electrode, and between the driving electrode and the second sensing electrode. The first sensing electrode and the driving electrode form a first capacitor. The second sensing electrode and the driving electrode form a second capacitor.

Abstract: Semiconductor die packages are disclosed. An exemplary semiconductor die package includes a premolded substrate. The premolded substrate can have a semiconductor die attached to it, and an encapsulating material may be disposed over the semiconductor die.

Abstract: The multi-chip leadless module 200 has integrated circuit (IC) 150, dual n-channel mosfet 110, IC leads 210, 211, 212, gate leads 213, 213, and source leads 217-220 encapsulated in resin 250. The IC 150 and the dual n-channel mosfet 110 are mounted face down on the leads. IC leads 210, 211, 212 are made of planar metal and connect, respectively, to the electrodes TEST, VDD and VM on the IC 150 using a flip chip technique to assemble the leads on copper pillars or copper studs.

Abstract: A flash memory storage device, a controller thereof, and a data programming method are provided. The flash memory storage device has a flash memory comprising a plurality of physical blocks, each physical block includes a plurality of physical addresses, and the physical addresses comprises at least one fast physical address and at least one slow physical address. The method comprises at least grouping the physical blocks into a data area and a spare area; setting a predetermined block number; obtaining m physical blocks from the spare area, receiving a write command comprising a write data and a logical address, determining a logical address range of a buffer according to the logical address and the predetermined block number. When all logical addresses to be programmed with the write data are within the logical address range of the buffer, using a fast mode to program the data into the m physical blocks.

Abstract: A first embodiment is a common drain+clip 20. It has a conventional drain contact on its bottom surface and is flip chip mounted on a half-etched leadframe 40 which has external source, gate and drain contacts connected to the sources, gate and common drain of the die 20. Common drain clip 50 connects the drain 30 to external contacts between opposite gate contacts. A second embodiment is a direct drain embodiment+heatslug. The device 80 has a top drain contact 36 that extends to the common drain 30 across the bottom of the die which is flip chip mounted to a half-etched leadframe having external source, gate and drain contacts connected to the sources, gates and common drain of the die 80.

Abstract: Semiconductor die packages are disclosed. An exemplary semiconductor die package includes a premolded substrate. The premolded substrate can have a semiconductor die attached to it, and an encapsulating material may be disposed over the semiconductor die.

Abstract: The multi-chip leadless module 200 has integrated circuit (IC) 150, dual re-channel mosfet 110, IC leads 210, 211, 212, gate leads 213, 213, and source leads 217-220 encapsulated in resin 250. The IC 150 and the dual n-channel mosfet 110 are mounted face down on the leads. IC leads 210, 211, 212 are made of planar metal and connect, respectively, to the electrodes TEST, VDD and VM on the IC 150 using a flip chip technique to assemble the leads on copper pillars or copper studs.

Abstract: Disclosed are semiconductor dice with backside trenches filled with elastic conductive material. The trenches reduce the on-state resistances of the devices incorporated on the dice. The elastic conductive material provides a conductive path to the backsides of the die with little induced stress on the semiconductor die caused by thermal cycling. Also disclosed are packages using the dice, and methods of making the dice.