Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Abstract: Fast 3D printing with high resolution is made possible by projecting light and an image from optical light engine comprises a micro display chip and a light source, through a projection lens of a multi-projection lens system onto printing material, e.g., a curable resin, wherein the multi-projection lens system comprises two or more projection lenses each with different imaging ratios wherein the image and light are projected through only one projection lens of the multi-projection lens system at a time.

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Abstract: A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.

Abstract: The present application relates to a method for preparing trifluridine, comprising reacting a compound of formula III with a compound of formula IV in a first solvent in the presence of an acid to obtain a compound of formula II, and performing further reaction to obtain trifluridine.

Abstract: A method for multi-material high resolution projection micro stereolithography for 3-D printing of a sample, comprising: A) generating a 3D digital model of the sample to be printed in a computer, B) arranging a lens having an optical axis, a charge coupled device (CCD), and a printing head relative to a surface of a substrate, C) positioning the printing head, D) moving the printing head relative to the substrate by moving the substrate, the printing head, or both the substrate and the printing head, E) sending an image from the control computer to an LCD micro display chip, projecting the image from the LCD or DLP chip through the lens onto a surface of the flat tip of the printing head, and F) and changing the printing material to be used for printing a following layer or layer section.

Abstract: A method for high resolution projection micro stereolithography for 3-D printing comprising: generating a 3D digital model of the sample to be printed in a computer, slicing the digital model into a sequence of images, wherein each of the images of the sequence represents a layer of the 3D digital model, positioning a transparent printing head relative to a resin vat containing a photo-sensitive resin, moving the transparent printing head into position for selectively exposing the photosensitive resin, sending an image from the sequence of images to a LCD or DLP chip, and together with a light source projecting the image through a lens onto the flat tip of the transparent printing head to initiate cure of the photosensitive resin in areas where the projected image allows light from the light source to reach the photosensitive resin.

Abstract: A multi-material 3-D printing system and method including at least two printing heads each with a transparent window circumscribed by an ejection nozzle. Each ejection nozzle is coupled to a respective pump that pumps resin from a respective vat onto a respective window. The resin is cured from below the window by exposure to a digital image displayed by a micro display chip. To switch resins, the sample is moved across a plurality of suction nozzles towards a second printing head. A respective one of the suction heads is coupled to a vacuum that effectuates the intake of residual resin from the underside of the sample.

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

Abstract: Parallel surfaces on two substrates are established with specific distances of separation, typically within a 10-micron tolerance. In general, one surface is a surface of a transparent membrane or hard window. On one embodiment, the gap defined by the distance of the transparent membrane or hard window and the other surface used to precisely control the dimensions of layers in projection micro stereolithography, however the methods for establishing the relative positions of two surfaces can be adapted to other applications.

Abstract: A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.

Abstract: The speed and control over layer thickness in multi-layer 3-D printing is enhanced when producing a sample layer by projecting an image of the layer from light engine onto an optically clear membrane in contact with a printing material to prepare a sample layer in contact with the membrane, followed by moving the sample away from the membrane to separate the two, then moving the sample back toward the membrane to a point where the distance between the membrane and sample, as measured by a laser displacement sensor, is equal to the thickness of the next layer. While the sample moves back toward the membrane a dual-roller spreader or rotary roller spreader oscillates on the membrane to simultaneously to drive away printing material and flatten the membrane. A bubble scrapper is employed to remove bubbles from the printing material as they form.

Abstract: The present application relates to a method for preparing trifluridine, comprising reacting a compound of formula III with a compound of formula IV in a first solvent in the presence of an acid to obtain a compound of formula II, and performing further reaction to obtain trifluridine.

Abstract: A method for multi-material high resolution projection micro stereolithography for 3-D printing of a sample, comprising: A) generating a 3D digital model of the sample to be printed in a computer, B) arranging a lens having an optical axis, a charge coupled device (CCD), and a printing head relative to a surface of a substrate, C) positioning the printing head, D) moving the printing head relative to the substrate by moving the substrate, the printing head, or both the substrate and the printing head, E) sending an image from the control computer to an LCD micro display chip, projecting the image from the LCD or DLP chip through the lens onto a surface of the flat tip of the printing head, and F) and changing the printing material to be used for printing a following layer or layer section.

Abstract: The present application relates to a method for preparing a cholic acid compound. Specifically, the method prepares a compound as shown in formula I, including subjecting a compound of formula 2 to an oxidization reaction to obtain a compound of formula 3; attaching a trimethylsilyl group to the compound of formula 3 to obtain a compound of formula 4; reacting the compound of formula 4 with acetaldehyde to obtain a compound of formula 5; subjecting the compound of formula 5 to a catalytic hydrogenation reaction to obtain a compound of formula 6; and converting a cyano group of the compound of formula 6 to a carboxyl group to give the compound of formula I.

Abstract: A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.

Abstract: A method for high resolution projection micro stereolithography for 3-D printing comprising: generating a 3D digital model of the sample to be printed in a computer, slicing the digital model into a sequence of images, wherein each of the images of the sequence represents a layer of the 3D digital model, positioning a transparent printing head relative to a resin vat containing a photo-sensitive resin, moving the transparent printing head into position for selectively exposing the photosensitive resin, sending an image from the sequence of images to a LCD or DLP chip, and together with a light source projecting the image through a lens onto the flat tip of the transparent printing head to initiate cure of the photosensitive resin in areas where the projected image allows light from the light source to reach the photosensitive resin.

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.