Abstract: An integrated circuit device that includes a semiconductor substrate, a well region formed inside the semiconductor substrate, a first isolation structure formed inside the well region, a second isolation structure formed inside the well region and spaced apart from the first isolation structure, a dielectric layer formed over the well region, and a layer of silicon, formed over the dielectric layer, including a p-type portion, an n-type portion and a center portion disposed between the p-type and n-type portions.

Abstract: A tape with a chip-bonding area is provided. The tape is suitable for a chip on film configuration, wherein a chip is suitable for being disposed on the tape and in the chip-bonding area. The tape includes a dielectric base film, a first wiring pattern, and at least a second wiring pattern. The first wiring pattern is disposed on the dielectric base film and has multiple inner leads disposed in the chip-bonding area. The second wiring pattern is disposed on the dielectric base film and in the chip-bonding area. The chip is suitable for being electrically connected to at least a part of the inner leads and being disposed above the second wiring pattern.

Abstract: An integrated circuit device is disclosed that includes a semiconductor substrate, a well region formed inside the semiconductor substrate, and a first isolation structure formed inside the well region. Further, a second isolation structure is formed inside the well region and spaced apart from the first isolation structure, a dielectric layer is formed over the well region, and a layer of silicon, formed over the dielectric layer, including a p-type portion, an n-type portion, and a center portion is disposed between the p-type and n-type portions.

Abstract: A display panel structure for improving electrostatic discharge (ESD) immunity is provided. The structure includes a first substrate, a pixel-array area, and an ESD protection path. The pixel-array area is disposed on the first substrate. At least one pixel unit and at least one data channel are disposed in the pixel-array area. The ESD protection path surrounds the pixel-array area to conduct an electrostatic current.

Abstract: An integrated circuit device for converting an incident optical signal into an electrical signal comprises a semiconductor substrate, a well region formed inside the semiconductor substrate, a dielectric layer formed over the well region, and a layer of polysilicon for receiving the incident optical signal, formed over the dielectric layer, including a p-type portion, an n-type portion and an undoped portion disposed between the p-type and n-type portions, wherein the well region is biased to control the layer of polysilicon for providing the electrical signal.

Abstract: A level shifter ESD protection circuit with power-on-sequence consideration used for receiving a first signal and outputting a second signal is provided. The level shifter circuit includes an inverter, a first switch, a second switch, a voltage level shifting circuit, a first ESD clamp and a second ESD clamp circuits. When the first power supply has been powered on and the second power supply is off, the first and second switches will remain off resulting from the power-off of the second power supply. Therefore, the second power source would not be affected by the first power supply because of passing through the ESD protection circuit.

Abstract: An electrostatic discharge (ESD) protection apparatus for high-voltage products is provided. The ESD protection apparatus includes a resistor, a capacitor, a first transistor, n diodes, and a main transistor, wherein n is an integer greater than 0. The holding voltage of the provided ESD protection apparatus is adjusted by determining the n value. The adjusted holding voltage is higher than the system voltage under normal operation, so that latch-up issues are avoided.

Abstract: An integrated circuit device for converting an incident optical signal into an electrical signal comprises a semiconductor substrate, a well region formed inside the semiconductor substrate, a dielectric layer formed over the well region, and a layer of polysilicon for receiving the incident optical signal, formed over the dielectric layer, including a p-type portion, an n-type portion and an undoped portion disposed between the p-type and n-type portions, wherein the well region is biased to control the layer of polysilicon for providing the electrical signal.

Abstract: A differential input/output device including an electro static discharge protection circuit is provided. The differential input/output device includes a P-type differential pair. The P-type differential pair includes two P-type transistors. The gate of each P-type transistor is coupled to an N-type transistor to protect the P-type transistor when CDM ESD occurs. Compared with the conventional technology, the protection device of the present invention provides a lower impedance current path when CDM ESD occurs in the input device.

Abstract: An integrated circuit device for converting an incident optical signal into an electrical signal comprises a semiconductor substrate, a well region formed inside the semiconductor substrate, a dielectric layer formed over the well region, and a layer of polysilicon for receiving the incident optical signal, formed over the dielectric layer, including a p-type portion, an n-type portion and an undoped portion disposed between the p-type and n-type portions, wherein the well region is biased to control the layer of polysilicon for providing the electrical signal.

Abstract: An integrated circuit device for converting an incident optical signal into an electrical signal comprises a semiconductor substrate, a well region formed inside the semiconductor substrate, a dielectric layer formed over the well region, and a layer of polysilicon for receiving the incident optical signal, formed over the dielectric layer, including a p-type portion, an n-type portion and an undoped portion disposed between the p-type and n-type portions, wherein the well region is biased to control the layer of polysilicon for providing the electrical signal.

Abstract: An electrostatic discharge (ESD) protection apparatus for programmable device is provided. This ESD protection device provides a high impedance along the electrical path from the pad to the power system for preventing the programmable device from damages induced by ESD event; and the impedance can be intentionally decreased during the normal reading and writing operations.

Abstract: An electronic static discharge (ESD) protection apparatus for a programmable device is provided. The apparatus can improve the turn-on efficiency and reduce the surface area of the chip efficiently by providing a low impedance current path which can sufficiently lower the voltage of the programmable device when ESD occurs. The ESD protection apparatus includes an ESD protection device, a programmable device, a first circuit, a second circuit, and a third circuit.

Abstract: A level shifter ESD protection circuit with power-on-sequence consideration used for receiving a first signal and outputting a second signal is provided. The level shifter circuit includes an inverter, a first switch, a second switch, a voltage level shifting circuit, a first ESD clamp and a second ESD clamp circuits. When the first power supply has been powered on and the second power supply is off, the first and second switches will remain off resulting from the power-off of the second power supply. Therefore, the second power source would not be affected by the first power supply because of passing through the ESD protection circuit.

Abstract: A system for measuring electrostatic discharge (ESD) characteristics of a semiconductor device that comprises at least one pulse generator generating ESD-scale pulses, a first point of the semiconductor device receiving a first ESD-scale pulse from the at least one pulse generator, a second point of the semiconductor device receiving the first ESD-scale pulse from the at least one pulse generator, at least a third point of the semiconductor device receiving a second ESD-scale pulse from the at least one pulse generator, and a data collector to collect data on the ESD characteristics of the semiconductor device.

Abstract: A separated power ESD protection circuit is disclosed. The separated power ESD protection circuit is coupled between a first and a second power lines. The separated power ESD protection circuit has a first diode, a second diode and a MOS transistor. The first diode has an anode and a cathode, wherein the anode is coupled to the first power line. The source of the MOS transistor is coupled to the second power line. The anode of the second diode is coupled to the second power line and cathode is coupled to the first power line. The first diode and the MOS transistor form a parasitic silicon-controlled rectifier (SCR) so as to provide a discharge route for ESD.

Abstract: An electrostatic discharge protection circuit includes a first terminal, a second terminal, an electrostatic discharge device coupled between the first and second terminals, and an active device coupled to the electrostatic discharge device and controlling an electrostatic current through the electrostatic discharge device. The electrostatic discharge device includes at least one of an SCR, an FOD, an active device, a BJT, and an MOS device.

Abstract: A high voltage device for an electrostatic discharge protection circuit is provided. A silicon layer is disposed in a substrate. A first type well and a second type well are disposed in the silicon layer. A lightly doped region of a second type well is located next to the first type well. A heavily doped region of the second type well is located underneath a portion of the first type well and the lightly doped region. A gate structure is disposed over a portion of the first type well and the lightly doped region. A second type first doped region and a second type second doped region are disposed in the lightly doped region and the first type well on each side of the gate structure. An isolation structure is disposed in the lightly doped region. A first type doped region is disposed in the first type well.

Abstract: A high voltage device for an electrostatic discharge protection circuit is provided. A silicon layer is disposed in a substrate. A first type well and a second type well are disposed in the silicon layer. A lightly doped region of a second type well is located next to the first type well. A heavily doped region of the second type well is located underneath a portion of the first type well and the lightly doped region. A gate structure is disposed over a portion of the first type well and the lightly doped region. A second type first doped region and a second type second doped region are disposed in the lightly doped region and the first type well on each side of the gate structure. An isolation structure is disposed in the lightly doped region. A first type doped region is disposed in the first type well.

Abstract: ESD preventing-able level shifter, for receiving a first signal and outputting a second signal is provided. The level shifter comprises an inverter, a voltage converter, a first ESD clamp circuit and a second ESD clamp circuit. The inverter receives the first signal and outputs a first reverse signal. The voltage converter having a first input terminal for receiving the first reverse signal, a second input terminal for receiving the first signal and an output terminal for outputting the second signal. A first and second terminal of the first ESD clamp circuit is coupled to the first input terminal of the voltage converter and a second ground voltage, respectively. A first and a second terminal of the second ESD clamp circuit is coupled to the second input terminal of the voltage converter and the second ground voltage, respectively.