Patents by Inventor Clint L. Kemerling

Clint L. Kemerling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240388285
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Application
    Filed: April 19, 2024
    Publication date: November 21, 2024
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Publication number: 20240266441
    Abstract: A method and apparatus are disclosed for use in improving gate oxide reliability of semiconductor-on-insulator (SOI) metal-oxide-silicon field effect transistor (MOSFET) devices using accumulated charge control (ACC) techniques. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one embodiment, a circuit includes a MOSFET, operating in an accumulated charge regime, and means for controlling the accumulated charge. Determinations are made of effects of an uncontrolled accumulated charge and a controlled accumulated charge on time dependent dielectric breakdown (TDDB) of the gate oxide. The SOI MOSFET is adapted to have a selected average time-to-breakdown, responsive to the determinations, and the circuit is operated using techniques for ACC operatively coupled to the SOI MOSFET.
    Type: Application
    Filed: February 12, 2024
    Publication date: August 8, 2024
    Inventors: Michael A. Stuber, Christopher N. Brindle, Dylan J. Kelly, Clint L. Kemerling, George P. Imthurn, Robert B. Welstand, Mark L. Burgener, Alexander Dribinsky, Tae-Youn Kim
  • Patent number: 11967948
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Grant
    Filed: June 13, 2022
    Date of Patent: April 23, 2024
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Michael A Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: 11901459
    Abstract: A method and apparatus are disclosed for use in improving gate oxide reliability of semiconductor-on-insulator (SOI) metal-oxide-silicon field effect transistor (MOSFET) devices using accumulated charge control (ACC) techniques. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one embodiment, a circuit includes a MOSFET, operating in an accumulated charge regime, and means for controlling the accumulated charge, operatively coupled to the SOI MOSFET. A first determination is made of the effects of an uncontrolled accumulated charge on time dependent dielectric breakdown (TDDB) of the gate oxide of the SOI MOSFET. A second determination is made of the effects of a controlled accumulated charge on TDDB of the gate oxide of the SOI MOSFET.
    Type: Grant
    Filed: December 13, 2021
    Date of Patent: February 13, 2024
    Assignee: pSemi Corporation
    Inventors: Michael A. Stuber, Christopher N. Brindle, Dylan J. Kelly, Clint L. Kemerling, George P. Imthurn, Robert B. Welstand, Mark L. Burgener, Alexander Dribinsky, Tae-Youn Kim
  • Publication number: 20220311432
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FIT performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Application
    Filed: June 13, 2022
    Publication date: September 29, 2022
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: 11362652
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Grant
    Filed: August 6, 2020
    Date of Patent: June 14, 2022
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Publication number: 20220181497
    Abstract: A method and apparatus are disclosed for use in improving gate oxide reliability of semiconductor-on-insulator (SOI) metal-oxide-silicon field effect transistor (MOSFET) devices using accumulated charge control (ACC) techniques. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one embodiment, a circuit includes a MOSFET, operating in an accumulated charge regime, and means for controlling the accumulated charge, operatively coupled to the SOI MOSFET. A first determination is made of the effects of an uncontrolled accumulated charge on time dependent dielectric breakdown (TDDB) of the gate oxide of the SOI MOSFET. A second determination is made of the effects of a controlled accumulated charge on TDDB of the gate oxide of the SOI MOSFET.
    Type: Application
    Filed: December 13, 2021
    Publication date: June 9, 2022
    Inventors: Michael A. Stuber, Christopher N. Brindle, Dylan J. Kelly, Clint L. Kemerling, George P. Imthurn, Robert B. Welstand, Mark L. Burgener, Alexander Dribinsky, Tae-Youn Kim
  • Patent number: 11201245
    Abstract: A method and apparatus are disclosed for use in improving the gate oxide reliability of semiconductor-on-insulator (SOD metal-oxide-silicon field effect transistor (MOSFET) devices using accumulated charge control (ACC) techniques. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one embodiment, a circuit comprises a MOSFET, operating in an accumulated charge regime, and means for controlling the accumulated charge, operatively coupled to the SOI MOSFET. A first determination is made of the effects of an uncontrolled accumulated charge on time dependent dielectric breakdown (TDDB) of the gate oxide of the SOI MOSFET. A second determination is made of the effects of a controlled accumulated charge on TDDB of the gate oxide of the SOI MOSFET.
    Type: Grant
    Filed: January 9, 2020
    Date of Patent: December 14, 2021
    Assignee: pSemi Corporation
    Inventors: Michael A. Stuber, Christopher N. Brindle, Dylan J. Kelly, Clint L. Kemerling, George P. Imthurn, Robert B. Welstand, Mark L. Burgener, Alexander Dribinsky, Tae-Youn Kim
  • Publication number: 20210194478
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Application
    Filed: August 6, 2020
    Publication date: June 24, 2021
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: 10818796
    Abstract: A method and apparatus are disclosed for use in improving the gate oxide reliability of semiconductor-on-insulator (SOI) metal-oxide-silicon field effect transistor (MOSFET) devices using accumulated charge control (ACC) techniques. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one embodiment, a circuit comprises a MOSFET, operating in an accumulated charge regime, and means for controlling the accumulated charge, operatively coupled to the SOI MOSFET. A first determination is made of the effects of an uncontrolled accumulated charge on time dependent dielectric breakdown (TDDB) of the gate oxide of the SOI MOSFET. A second determination is made of the effects of a controlled accumulated charge on TDDB of the gate oxide of the SOI MOSFET.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: October 27, 2020
    Assignee: pSemi Corporation
    Inventors: Michael A. Stuber, Christopher N. Brindle, Dylan J. Kelly, Clint L. Kemerling, George P. Imthurn, Robert B. Welstand, Mark L. Burgener, Alexander Dribinsky, Tae Youn Kim
  • Publication number: 20200335633
    Abstract: A method and apparatus are disclosed for use in improving the gate oxide reliability of semiconductor-on-insulator (SOD metal-oxide-silicon field effect transistor (MOSFET) devices using accumulated charge control (ACC) techniques. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one embodiment, a circuit comprises a MOSFET, operating in an accumulated charge regime, and means for controlling the accumulated charge, operatively coupled to the SOI MOSFET. A first determination is made of the effects of an uncontrolled accumulated charge on time dependent dielectric breakdown (TDDB) of the gate oxide of the SOI MOSFET. A second determination is made of the effects of a controlled accumulated charge on TDDB of the gate oxide of the SOI MOSFET.
    Type: Application
    Filed: January 9, 2020
    Publication date: October 22, 2020
    Inventors: Michael A. Stuber, Christopher N. Brindle, Dylan J. Kelly, Clint L. Kemerling, George P. Imthurn, Robert B. Welstand, Mark L. Burgener, Alexander Dribinsky, Tae-Youn Kim
  • Patent number: 10797691
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Grant
    Filed: April 20, 2020
    Date of Patent: October 6, 2020
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: 10797690
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Grant
    Filed: October 1, 2019
    Date of Patent: October 6, 2020
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: 10797172
    Abstract: A method and apparatus for use in improving linearity sensitivity of MOSFET devices having an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to address degradation in second- and third-order intermodulation harmonic distortion at a desired range of operating voltage in devices employing an accumulated charge sink.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: October 6, 2020
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Jie Deng, Alper Genc, Chieh-Kai Yang, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Mark L. Burgener, Robert B. Welstand
  • Patent number: 10790814
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Grant
    Filed: November 1, 2019
    Date of Patent: September 29, 2020
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: 10790815
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Grant
    Filed: November 4, 2019
    Date of Patent: September 29, 2020
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: 10784855
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Grant
    Filed: October 1, 2019
    Date of Patent: September 22, 2020
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Publication number: 20200295751
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Application
    Filed: April 20, 2020
    Publication date: September 17, 2020
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: RE48944
    Abstract: A method and apparatus for use in improving the linearity characteristics of MOSFET devices using an accumulated charge sink (ACS) are disclosed. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one exemplary embodiment, a circuit having at least one SOI MOSFET is configured to operate in an accumulated charge regime. An accumulated charge sink, operatively coupled to the body of the SOI MOSFET, eliminates, removes or otherwise controls accumulated charge when the FET is operated in the accumulated charge regime, thereby reducing the nonlinearity of the parasitic off-state source-to-drain capacitance of the SOI MOSFET. In RF switch circuits implemented with the improved SOI MOSFET devices, harmonic and intermodulation distortion is reduced by removing or otherwise controlling the accumulated charge when the SOI MOSFET operates in an accumulated charge regime.
    Type: Grant
    Filed: January 9, 2020
    Date of Patent: February 22, 2022
    Assignee: pSemi Corporation
    Inventors: Christopher N. Brindle, Michael A. Stuber, Dylan J. Kelly, Clint L. Kemerling, George P. Imthurn, Robert B. Welstand, Mark L. Burgener
  • Patent number: RE48965
    Abstract: A method and apparatus are disclosed for use in improving the gate oxide reliability of semiconductor-on-insulator (SOI) metal-oxide-silicon field effect transistor (MOSFET) devices using accumulated charge control (ACC) techniques. The method and apparatus are adapted to remove, reduce, or otherwise control accumulated charge in SOI MOSFETs, thereby yielding improvements in FET performance characteristics. In one embodiment, a circuit comprises a MOSFET, operating in an accumulated charge regime, and means for controlling the accumulated charge, operatively coupled to the SOI MOSFET. A first determination is made of the effects of an uncontrolled accumulated charge on time dependent dielectric breakdown (TDDB) of the gate oxide of the SOI MOSFET. A second determination is made of the effects of a controlled accumulated charge on TDDB of the gate oxide of the SOI MOSFET.
    Type: Grant
    Filed: December 11, 2019
    Date of Patent: March 8, 2022
    Assignee: pSemi Corporation
    Inventors: Michael A. Stuber, Christopher N. Brindle, Dylan J. Kelly, Clint L. Kemerling, George P. Imthurn, Robert B. Welstand, Mark L. Burgener, Alexander Dribinsky, Tae Youn Kim