Patents by Inventor Cornelius Maria Rops
Cornelius Maria Rops has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11860546Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: September 23, 2022Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Publication number: 20230418165Abstract: Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.Type: ApplicationFiled: October 22, 2021Publication date: December 28, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Cornelius Maria ROPS, Erik, Henricus Egidius, Catharina EUMMELEN, Giovanni, Luca GATTOBIGIO, Christianus, Wilhelmus Johannes BERENDSEN
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Publication number: 20230259037Abstract: A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.Type: ApplicationFiled: June 14, 2021Publication date: August 17, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Cornelius Maria ROPS, Christianus Wilhelmus Johannes BERENDSEN, Erik Henricus Egidius Catharina EUMMELEN, Dagmar Antoinette WISMEIJER
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Patent number: 11614689Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.Type: GrantFiled: January 21, 2022Date of Patent: March 28, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Johannes Cornelis Paulus Melman, Han Henricus Aldegonda Lempens, Miao Yu, Cornelius Maria Rops, Ruud Olieslagers, Artunç Ulucan, Theodorus Wilhelmus Polet, Patrick Johannes Wilhelmus Spruytenburg
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Publication number: 20230053840Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: September 23, 2022Publication date: February 23, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalena CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscus TEUNISSEN
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Patent number: 11454892Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: May 10, 2021Date of Patent: September 27, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Publication number: 20220137519Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.Type: ApplicationFiled: January 21, 2022Publication date: May 5, 2022Applicant: ASML Netherlands B.V.Inventors: Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Johannes Cornelis Paulus Melman, Han Henricus Aldegonda Lempens, Miao Yu, Cornelius Maria Rops, Ruud Olieslagers, Artunç Ulucan, Theodorus Wilhelmus Polet, Patrick Johannes Wilhelmus Spruytenburg
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Publication number: 20220028754Abstract: The invention pertains to a method of cooling a microchip, using vaporization of a cooling liquid in a vaporization chamber of a cooling element wherein the vaporization chamber comprises channels and a plurality of flow-modifying structures.Type: ApplicationFiled: December 23, 2019Publication date: January 27, 2022Inventors: Jan Eite BULLEMA, Cornelius Maria ROPS
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Patent number: 11231653Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.Type: GrantFiled: February 26, 2021Date of Patent: January 25, 2022Assignee: ASML Netherlands B.V.Inventors: Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Johannes Cornelis Paulus Melman, Han Henricus Aldegonda Lempens, Miao Yu, Cornelius Maria Rops, Ruud Olieslagers, Artunç Ulucan, Theodorus Wilhelmus Polet, Patrick Johannes Wilhelmus Spruytenburg
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Patent number: 11199112Abstract: A method for recovering heat from a flue gas from an engine and a heat recovery system are described. The method involves contacting coolant in a vaporization chamber with a plurality of flow-modifying structures. The structures are arranged in series in the direction of the flow of coolant liquid and are each configured for modifying the flow of the coolant liquid and the vapour in said vaporization chamber.Type: GrantFiled: August 17, 2018Date of Patent: December 14, 2021Assignee: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNOInventor: Cornelius Maria Rops
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Patent number: 11143969Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.Type: GrantFiled: March 9, 2018Date of Patent: October 12, 2021Assignee: ASML Netherlands B.V.Inventors: Giovanni Luca Gattobigio, Nirupam Banerjee, Johan Franciscus Maria Beckers, Erik Henricus Egidius Catharina Eummelen, Ronald Frank Kox, Theodorus Wilhelmus Polet, Cornelius Maria Rops, Mike Paulus Johannes Van Gils, Wouterus Jozephus Johannes Van Sluisveld, Rik Vangheluwe
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Publication number: 20210263424Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: May 10, 2021Publication date: August 26, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalena CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscus TEUNISSEN
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Publication number: 20210181641Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.Type: ApplicationFiled: February 26, 2021Publication date: June 17, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Johannes Cornelis Paulus MELMAN, Han Henricus Aldegonda LEMPENS, Miao YU, Cornelius Maria ROPS, Ruud OLIESLAGERS, Artunç ULUCAN, Theodorus Wilhelmus POLET, Patrick Johannes Wilhelmus SPRUYTENBURG
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Patent number: 11029607Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: August 28, 2017Date of Patent: June 8, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Publication number: 20210159560Abstract: The present document relates to an electrode for use in a layered device structure, the electrode comprising at least one layer of conductive material, wherein the electrode comprises at least one micro evaporator having an evaporator inlet for receiving a cooling fluid and an evaporator outlet for removing the cooling fluid after evaporation, wherein the micro evaporator includes a plurality of micro channels forming an evaporation volume, the micro channels being embedded in the layer of conductive material. The present document further relates to a battery design including such an electrode.Type: ApplicationFiled: July 12, 2019Publication date: May 27, 2021Inventors: Jan Eite BULLEMA, Cornelius Maria ROPS, Maurice Pierre Marie Arthur LIMPENS
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Patent number: 10969695Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.Type: GrantFiled: September 13, 2019Date of Patent: April 6, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Johannes Cornelis Paulus Melman, Han Henricus Aldegonda Lempens, Miao Yu, Cornelius Maria Rops, Ruud Olieslagers, Artunç Ulucan, Theodorus Wilhelmus Polet, Patrick Johannes Wilhelmus Spruytenburg
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Publication number: 20210088912Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.Type: ApplicationFiled: December 4, 2020Publication date: March 25, 2021Applicant: ASML Netherlands B.V.Inventors: Cornelius Maria ROPS, Walter Theodorus Matheus STALS, David BESSEMS, Giovanni Luca GATTOBIGIO, Victor Manuel BLANCO CARBALLO, Erik Henricus Egidius Catharina EUMMELEN, Ronald VAN DER HAM, Frederik Antonius VAN DER ZANDEN, Wilhelmus Antonius WERNAART
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Patent number: 10916453Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: GrantFiled: September 9, 2019Date of Patent: February 9, 2021Assignee: ASML Netherlands B.V.Inventors: Aart Adrianus Van Beuzekom, Jozef Augustinus Maria Alberti, Hubert Marie Segers, Ronald Van Der Ham, Francis Fahrni, Ruud Olieslagers, Gerben Pieterse, Cornelius Maria Rops, Pepijn Van Den Eijnden, Paul Van Dongen, Bas Willems
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Publication number: 20200409270Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: ApplicationFiled: August 28, 2017Publication date: December 31, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Pepijn VAN DEN EIJNDEN, Cornelius Maria ROPS, Theodorus Wilhelmus POLET, Floor Lodewijk KEUKENS, Gheorghe TANASA, Rogier Hendrikus Magdalen CORTIE, Koen CUYPERS, Harold Sebastiaan BUDDENBERG, Giovanni Luca GATTOBIGIO, Evert VAN VLIET, Nicolaas TEN KATE, Mark Johannes Hermanus FRENCKEN, Jantien Laura VAN ERVE, Marcel Maria Cornelius Franciscu TEUNISSEN
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Patent number: 10859919Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.Type: GrantFiled: January 31, 2020Date of Patent: December 8, 2020Assignee: ASML NETHERLANDS B.V.Inventors: Cornelius Maria Rops, Walter Theodorus Matheus Stals, David Bessems, Giovanni Luca Gattobigio, Victor Manuel Blanco Carballo, Erik Henricus Egidius Catharina Eummelen, Ronald Van Der Ham, Frederik Antonius Van Der Zanden, Wilhelmus Antonius Wernaart