Patents by Inventor Cornelius Maria Rops
Cornelius Maria Rops has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170219939Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.Type: ApplicationFiled: June 26, 2015Publication date: August 3, 2017Applicant: ASML Netherlands B.V.Inventors: Theodorus Wilhelmus POLET, Johannes Jacobus BASELMANS, Willem Jan BOUMAN, Han Henricus Aldegonda LEMPENS, Theodorus Marinus MODDERMAN, Cornelius Maria ROPS, Bart SMEETS, Koen STEFFENS, Ronald VAN DER HAM
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Publication number: 20170176875Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.Type: ApplicationFiled: March 6, 2017Publication date: June 22, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Rogier Hendrikus Magdalena CORTIE, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
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Publication number: 20170131644Abstract: A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of the projection system and/or a component of the lithographic apparatus at least partially surrounding the final element of the projection system, and on the other side by a surface of the fluid confinement structure. The apparatus is configured to increase the humidity of the gas within the space.Type: ApplicationFiled: June 1, 2015Publication date: May 11, 2017Applicant: ASML Netherlands B.V.Inventors: Giovanni Luca GATTOBIGIO, Erik Henricus Egidius Catharina EUMMELEN, Ruud OLIESLAGERS, Gerben PIETERSE, Cornelius Maria Rops, Laurentius Johannes Adrianus VAN BOKHOVEN
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Publication number: 20170108781Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.Type: ApplicationFiled: May 12, 2015Publication date: April 20, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Aart Adrianus VAN BEUZEKOM, Jozef Augustinus Maria ALBERTI, Hubert Marie SEGERS, Ronald VAN DER HAM, Francis FAHRNI, Ruud OLIESLAGERS, Gerben PIETERSE, Cornelius Maria ROPS, Pepijn VAN DEN EIJNDEN, Paul VAN DONGEN, Bas WILLEMS
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Patent number: 9625829Abstract: A fluid handling structure for a lithographic apparatus has, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure, a gas supply opening radially outward of the space, a fluid recovery opening radially outward of the gas supply opening, and a damper surface extending at least 0.5 mm radially outwards from the fluid recovery opening along the undersurface of the fluid handling structure.Type: GrantFiled: September 11, 2012Date of Patent: April 18, 2017Assignee: ASML NETHERLANDS B.V.Inventors: David Bessems, Cornelius Maria Rops
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Patent number: 9625828Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.Type: GrantFiled: February 7, 2011Date of Patent: April 18, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Erik Henricus Egidius Catharina Eummelen, Sandra Van Der Graaf, Rogier Hendrikus Magdalena Cortie, Takeshi Kaneko, Nina Vladimirovna Dziomkina, Laurentius Johannes Adrianus Van Bokhoven, Fabrizio Evangelista, David Bessems, Cornelius Maria Rops, Adrianus Marinus Verdonck, Nicolaas Ten Kate
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Patent number: 9588437Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.Type: GrantFiled: December 18, 2015Date of Patent: March 7, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
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Patent number: 9563132Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.Type: GrantFiled: August 1, 2012Date of Patent: February 7, 2017Assignee: ASML NETHERLANDS B.V.Inventors: David Bessems, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Adrianes Johannes Baeten, Cornelius Maria Rops
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Publication number: 20160377989Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.Type: ApplicationFiled: September 9, 2016Publication date: December 29, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Rogier Hendrikus Magdalena CORTIE, Michel Riepen, Cornelius Maria Rops
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Patent number: 9442390Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.Type: GrantFiled: May 14, 2015Date of Patent: September 13, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Rogier Hendrikus Magdalena Cortie, Michel Riepen, Cornelius Maria Rops
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Publication number: 20160116850Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10?3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.Type: ApplicationFiled: December 18, 2015Publication date: April 28, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Cornelius Maria ROPS, Nicolaas Rudolf KEMPER, Michel RIEPEN
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Publication number: 20160103398Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.Type: ApplicationFiled: December 18, 2015Publication date: April 14, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Rogier Hendrikus Magdalena CORTIE, Nicolaas TEN KATE, Niek Jacobus Johannes ROSET, Michel RIEPEN, Henricus Jozef CASTELIJNS, Cornelius Maria ROPS, Jim Vincent OVERKAMP
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Patent number: 9291914Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.Type: GrantFiled: August 29, 2014Date of Patent: March 22, 2016Assignee: ASML NETHERLANDS B.V.Inventors: David Bessems, Rogier Hendrikus Magdalena Cortie, Marcus Johannes Van Der Zanden, Cornelius Maria Rops, Paul Willems, Jimmy Matheus Wilhelmus Van De Winkel, Erik Henricus Egidius Catharina Eummelen
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Patent number: 9235138Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.Type: GrantFiled: July 5, 2012Date of Patent: January 12, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
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Patent number: 9229334Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10?3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.Type: GrantFiled: December 7, 2010Date of Patent: January 5, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Cornelius Maria Rops, Nicolaas Rudolf Kemper, Michel Riepen
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Patent number: 9213246Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.Type: GrantFiled: February 12, 2014Date of Patent: December 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops
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Publication number: 20150309421Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.Type: ApplicationFiled: May 14, 2015Publication date: October 29, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Rogier Hendrikus Magdalena CORTIE, Michel RIEPEN, Cornelius Maria ROPS
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Patent number: 9069262Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.Type: GrantFiled: July 5, 2012Date of Patent: June 30, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Rogier Hendrikus Magdalena Cortie, Michel Riepen, Cornelius Maria Rops
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Publication number: 20150055103Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.Type: ApplicationFiled: August 29, 2014Publication date: February 26, 2015Applicant: ASML NETHERLANDS B.V.Inventors: David BESSEMS, Rogier Hendrikus Magdalena Cortie, Marcus Johannes Van der Zanden, Cornelius Maria Rops, Paul Willems, Jimmy Matheus Wilhelmus Van de Winkel, Erik Henricus Egidius Catharina Eummelen
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Publication number: 20140300879Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.Type: ApplicationFiled: February 12, 2014Publication date: October 9, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf KEMPER, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops