Patents by Inventor Craig R. Metzner

Craig R. Metzner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6454860
    Abstract: An integrated deposition system is provided which is capable of vaporizing low vapor pressure liquid precursors and delivering this vapor into a processing region for use in the fabrication of advanced integrated circuits. The integrated deposition system is made up of a heated exhaust system, a remote plasma generator, a processing chamber and a liquid delivery system which together provide a commercially viable and production worthy system for depositing high capacity dielectric materials from low vapor pressure precursors, anneal those films while also providing commercially viable in-situ cleaning capability.
    Type: Grant
    Filed: October 27, 1998
    Date of Patent: September 24, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Craig R. Metzner, Turgut Sahin, Gregory F. Redinbo, Pravin K. Narwankar, Patricia M. Liu
  • Publication number: 20010035127
    Abstract: An integrated deposition system is provided which is capable of vaporizing low vapor pressure liquid precursors and delivering this vapor into a processing region for use in the fabrication of advanced integrated circuits. The integrated deposition system is made up of a heated exhaust system, a remote plasma generator, a processing chamber and a liquid delivery system which together provide a commercially viable and production worthy system for depositing high capacity dielectric materials from low vapor pressure precursors, anneal those films while also providing commercially viable in-situ cleaning capability.
    Type: Application
    Filed: October 27, 1998
    Publication date: November 1, 2001
    Inventors: CRAIG R. METZNER, TURGUT SAHIN, GREGORY F. REDINBO, PRAVIN K. NARWANKAR, PATRICIA M. LIU