Patents by Inventor Czang-Ho Lee
Czang-Ho Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20110183463Abstract: A method of manufacturing a thin film transistor (“TFT”) substrate includes forming a first conductive pattern group including a gate electrode on a substrate, forming a gate insulating layer on the first conductive pattern group, forming a semiconductor layer and an ohmic contact layer on the gate insulating layer by patterning an amorphous silicon layer and an oxide semiconductor layer, forming a second conductive pattern group including a source electrode and a drain electrode on the ohmic contact layer by patterning a data metal layer, forming a protection layer including a contact hole on the second conductive pattern group, and forming a pixel electrode on the contact hole of the protection layer. The TFT substrate including the ohmic contact layer formed of an oxide semiconductor is further provided.Type: ApplicationFiled: December 6, 2010Publication date: July 28, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Sung-Ryul KIM, Sung-Hoon YANG, Byoung-June KIM, Czang-Ho LEE, Jae-Ho CHOI, Hwa-Yeul OH, Yong-Mo CHOI
-
Patent number: 7972883Abstract: In a method of manufacturing a photoelectric device, a transparent conductive layer is formed on a substrate, and the transparent conductive layer is partially etched using an etching solution including hydrofluoric acid. Thus, a transparent electrode having a concavo-convex pattern on its surface is formed. When the transparent conductive layer is partially etched, a haze of the transparent electrode may be controlled by adjusting an etching time of the transparent conductive layer. Also, since the etching solution is sprayed to the transparent conductive layer to etch the transparent conductive layer, the concavo-convex pattern on the surface of the transparent electrode may be easily formed even though the size of the substrate increases.Type: GrantFiled: March 9, 2009Date of Patent: July 5, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Seung-Jae Jung, Byoung-June Kim, Jin-Seock Kim, Czang-Ho Lee, Myung-Hun Shin, Joon-Young Seo, Dong-Uk Choi, Byoung-Kyu Lee
-
Publication number: 20110143483Abstract: A transparent conductive layer includes a substrate, a first conductive layer disposed on the substrate, and a second conductive layer disposed on the first conductive layer, wherein the second conductive layer comprises a textured surface and an opening which exposes the first conductive layer, wherein the opening comprises a diameter of about 1 micrometer to about 3 micrometers. Also disclosed is a method of manufacturing the transparent conductive layer and a photoelectric device.Type: ApplicationFiled: February 24, 2011Publication date: June 16, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Seung-Jae JUNG, Yuk-Hyun NAM, Czang-Ho LEE, Myung-Hun SHIN, Min-Seok OH, Byoung-Kyu LEE, Mi-Hwa LIM, Joon-Young SEO
-
Patent number: 7932576Abstract: A transparent conductive layer includes a substrate, a first conductive layer disposed on the substrate, and a second conductive layer disposed on the first conductive layer, wherein the second conductive layer comprises a textured surface and an opening which exposes the first conductive layer, wherein the opening comprises a diameter of about 1 micrometer to about 3 micrometers. Also disclosed is a method of manufacturing the transparent conductive layer and a photoelectric device.Type: GrantFiled: March 30, 2009Date of Patent: April 26, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Seung-Jae Jung, Yuk-Hyun Nam, Czang-Ho Lee, Myung-Hun Shin, Min-Seok Oh, Byoung-Kyu Lee, Mi-Hwa Lim, Joon-Young Seo
-
Publication number: 20110030769Abstract: A solar cell including an insulation substrate, a buffer layer disposed on the insulation substrate, a first electrode disposed on the buffer layer, a first polycrystalline semiconductor layer disposed on the first electrode and including first impurities, a photo-absorptive layer disposed on the first polycrystalline semiconductor layer, a second semiconductor layer disposed on the photo-absorptive layer and including second impurities, and a second electrode disposed on the second semiconductor layer.Type: ApplicationFiled: July 1, 2010Publication date: February 10, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventor: Czang-Ho LEE
-
Publication number: 20100193006Abstract: A solar cell module includes a substrate, a lower electrode layer, a semiconductor layer and an upper electrode layer for an embodiment. The lower electrode layer may include a plurality of area-separating grooves separating the substrate into an active area and a peripheral area surrounding the active area, and a plurality of first cell-separating grooves formed in the active area. The semiconductor layer is formed on the lower electrode layer. The semiconductor layer includes a plurality of second cell-separating grooves that are spaced apart from the first cell-separating grooves. The upper electrode layer is formed on the semiconductor layer. The upper electrode layer includes a plurality of third cell-separating grooves that are spaced apart from the second separating grooves.Type: ApplicationFiled: December 2, 2009Publication date: August 5, 2010Inventors: Ku-Hyun KANG, Dong-Jin Kim, Yeon-Il Kang, Czang-Ho Lee, Myung-Hun Shin, Dae-Ha Woo, Byoung-Kyu Lee, Yuk-Hyun Nam, Seung-Jae Jung, Joong-Hyun Park
-
Publication number: 20100159633Abstract: Provided is a method of manufacturing a photovoltaic device using a Joule heating-induced crystallization method. The method includes: forming a first conductive pattern on a substrate; forming a photoelectric conversion layer on the substrate having the first conductive pattern; and crystallizing at least part of the photoelectric conversion layer by applying an electric field to the photoelectric conversion layer, wherein the photoelectric conversion layer includes a first amorphous semiconductor layer containing first impurities, a second intrinsic, amorphous semiconductor layer, and a third amorphous semiconductor layer containing second impurities.Type: ApplicationFiled: December 18, 2009Publication date: June 24, 2010Inventors: Byoung-Kyu LEE, Se-Jin Chung, Byoung-June Kim, Czang-Ho Lee, Myung-Hun Shin, Min-Seok Oh, Ku-Hyun Kang, Yuk-Hyun Nam, Seung-Jae Jung, Min Park, Mi-Hwa Lim, Joon-Young Seo
-
Publication number: 20100154869Abstract: Disclosed herein is a photoelectric conversion device having a semiconductor substrate including a front side and back side, a protective layer formed on the front side of the semiconductor substrate, a first non-single crystalline semiconductor layer formed on the back side of the semiconductor substrate, a first conductive layer including a first impurity formed on a first portion of a back side of the first non-single crystalline semiconductor layer, and a second conductive layer including the first impurity and a second impurity formed on a second portion of the back side of the first non-single crystalline semiconductor layer.Type: ApplicationFiled: June 2, 2009Publication date: June 24, 2010Inventors: Min-Seok Oh, Jung-Tae Kim, Nam-Kyu Song, Min Park, Yun-Seok Lee, Czang-Ho Lee, Myung-Hun Shin, Byoung-Kyu Lee, Yuk-Hyun Nam, Seung-Jae Jung, Mi-Hwa Lim, Joon-Young Seo, Dong-Uk Choi, Dong-Seop Kim, Byoung-June Kim
-
Publication number: 20100126569Abstract: A solar cell includes: a semiconductor substrate having a first surface and a second surface opposite the first surface; uneven patterns disposed on at least one of the first surface and the second surface of the semiconductor substrate; a first impurity layer disposed on the uneven patterns and which includes a first part having a first doping concentration and a second part having a second doping concentration greater than the first doping concentration; and a first electrode which contacts the second part of the first impurity layer and does not contact the first part of the first impurity layer.Type: ApplicationFiled: October 20, 2009Publication date: May 27, 2010Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Min-Seok Oh, Byoung-Kyu Lee, Min Park, Czang-Ho Lee, Myung-Hun Shin, Yuk-Hyun Nam, Seung-Jae Jung, Mi-Hwa Lim, Joon-Young Seo
-
Publication number: 20100101633Abstract: A photovoltaic device and a manufacturing method thereof are provided. The photovoltaic device includes: a substrate; a first conductive layer formed on the substrate; P layers and N layers alternately formed along a first direction on the first conductive layer; and I layers covering the P layers and the N layers on the first conductive layer, wherein the P layers and the N layers are separated from each other by a first interval, the I layers are formed between the P layers and the N layers that are separated by the first interval, and the P layers, the I layers, and the N layers formed along the first direction form unit cells.Type: ApplicationFiled: June 17, 2009Publication date: April 29, 2010Inventors: Min PARK, Min-Seok Oh, Jung-Tae Kim, Czang-Ho Lee, Myung-Hun Shin, Byoung-Kyu Lee, Ku-Hyun Kang, Yuk-Hyun Nam, Seung-Jae Jung, Mi-Hwa Lim, Joon-Young Seo
-
Publication number: 20100071745Abstract: In one or more embodiments of a photovoltaic device and a method of manufacturing the photovoltaic device, a first conductive layer, a first light-absorbing layer and a second conductive layer may be formed on a substrate, in sequence. A temperature for forming the second conductive layer may be lower than a temperature for forming the first conductive layer and a temperature for forming the first light-absorbing layer.Type: ApplicationFiled: April 9, 2009Publication date: March 25, 2010Inventors: Czang-Ho LEE, Byoung-Kyu Lee, Mi-Hwa Lim, Joon-Young Seo, Myung-Hun Shin, Min-Seok Oh, Ku-Hyun Kang, Yuk-Hyun Nam, Seung-Jae Jung, Min Park
-
Publication number: 20100059111Abstract: A solar cell module includes a bottom module layer formed on a first substrate and absorbing a greater fraction of light energy in a first wavelength band than in a second wavelength band. The first wavelength band includes a shorter wavelength than any wavelength in the second wavelength band. A top module layer is formed on the bottom module layer to absorb a greater fraction of light energy in the second wavelength band than in the first wavelength band. A second substrate is formed on the top module layer. A reflecting filter is provided between the bottom module layer and the top module layer. The reflecting filter reflects a greater fraction of light energy in the first wavelength band than in the second wavelength band and transmits a greater fraction of light energy in the second wavelength band than in the first wavelength band.Type: ApplicationFiled: March 27, 2009Publication date: March 11, 2010Inventors: Myung-Hun Shin, Czang-Ho Lee, Min-Seok Oh, Ku-Hyun Kang, Yuk-Hyun Nam, Seung-Jae Jung, Min Park, Mi-Hwa Lim, Joon-Young Seo
-
Publication number: 20100051082Abstract: A thin film solar cell module includes a front substrate; a plurality of thin film solar cells disposed on the front substrate; a rear substrate disposed on the thin film solar cells; a plurality of inter-connection terminals electrically connected to the thin film solar cells, respectively, and exposed to an exterior surface of at least one of the front and rear substrates; and a connector electrically connecting the inter-connection terminals in a series or parallel configuration.Type: ApplicationFiled: April 9, 2009Publication date: March 4, 2010Applicant: Samsung Electronics Co., Ltd.Inventors: Yeon-Il KANG, Jin-Seock KIM, Czang-Ho LEE, Hee-Chan LEE, Ku-Hyun KANG
-
Publication number: 20100037940Abstract: A solar cell including a first semiconductor layer formed by sequentially stacking a positive (P) layer, an intrinsic (I) layer and a negative (N) layer, wherein the P layer comprises amorphous silicon carbide and at least one of the I and N layers comprises micro-crystalline silicon.Type: ApplicationFiled: May 19, 2009Publication date: February 18, 2010Inventors: Mi-Hwa Lim, Czang-Ho Lee, Joon-Young Seo, Myung-Hun Shin, Min-Seok Oh, Byoung-Kyu Lee, Yuk-Hyun Nam, Seung-Jae Jung
-
Publication number: 20100024871Abstract: A method of manufacturing a photovoltaic device includes preparing a semiconductor substrate having a light incidence surface receiving light and including single crystalline silicon, wet-etching the light incidence surface to form a plurality of first protrusions on the light incidence surface, dry etching a plurality of surfaces of the first protrusions to form a plurality of second protrusions on the plurality of surfaces of the first protrusions, and forming a semiconductor layer on the light incidence surface. The method further includes forming a first electrode on the semiconductor layer and forming a second electrode on a rear surface of the semiconductor substrate facing the light incidence surface.Type: ApplicationFiled: March 6, 2009Publication date: February 4, 2010Inventors: Min-Seok Oh, Min Park, Czang-Ho Lee, Myung-Hun Shin, Byoung-Kyu Lee, Yuk-Hyun Nam, Seung-Jae Jung, Mi-Hwa Lim, Joon-Young Seo
-
Publication number: 20100013037Abstract: A method for manufacturing a solar cell is provided. The manufacturing method includes: depositing a transparent conductive layer on a substrate; patterning the transparent conductive layer; forming a semiconductor layer including deposited on the patterned transparent conductive layer; patterning the semiconductor layer; coating a metal powder on the patterned semiconductor layer; forming a rear electrode layer on the semiconductor layer coated with the metal powder; and patterning the rear electrode layer and the semiconductor layer. This method is useful for producing a solar cell with improved light absorption efficiency.Type: ApplicationFiled: March 3, 2009Publication date: January 21, 2010Inventors: Min Park, Min-Seok Oh, Myung-Hun Shin, Czang-Ho Lee, Byoung-Kyu Lee, Yuk-Hyun Nam, Seung-Jae Jung, Mi-Hwa Lim, Joon-Young Seo
-
Publication number: 20100001359Abstract: A transparent conductive layer includes a substrate, a first conductive layer disposed on the substrate, and a second conductive layer disposed on the first conductive layer, wherein the second conductive layer comprises a textured surface and an opening which exposes the first conductive layer, wherein the opening comprises a diameter of about 1 micrometer to about 3 micrometers. Also disclosed is a method of manufacturing the transparent conductive layer and a photoelectric device.Type: ApplicationFiled: March 30, 2009Publication date: January 7, 2010Applicant: Samsung Electronics Co., Ltd.Inventors: Seung-Jae JUNG, Yuk-Hyun NAM, Czang-Ho LEE, Myung-Hun SHIN, Min-Seok OH, Byoung-Kyu LEE, Mi-Hwa LIM, Joon-Young SEO
-
Publication number: 20090314337Abstract: Photovoltaic devices and methods of manufacturing the same are provided. In one example, a photovoltaic device includes: a substrate; a transparent conductive layer deposited on the substrate; a semiconductor layer provided with a P layer, an I layer, and a N layer sequentially deposited on the transparent conductive layer; and a rear electrode deposited on the N layer of the semiconductor layer, wherein the P layer is a P-type oxide semiconductor.Type: ApplicationFiled: June 15, 2009Publication date: December 24, 2009Inventors: Czang-Ho Lee, Myung-Hun Shin, Seung-Jae Jung, Joon-Young Seo, Min-Seok Oh, Byoung-Kyu Lee, Ku-Hyun Kang, Mi-Hwa Lim
-
Publication number: 20090242881Abstract: A thin film transistor substrate includes an insulating plate; a gate electrode disposed on the insulating plate; a semiconductor layer comprising a metal oxide, wherein the metal oxide has oxygen defects of less than or equal to 3%, and wherein the metal oxide comprises about 0.01 mole/cm3 to about 0.3 mole/cm3 of a 3d transition metal; a gate insulating layer disposed between the gate electrode and the semiconductor layer; and a source electrode and a drain electrode disposed on the semiconductor layer. Also described is a display substrate. The metal oxide has oxygen defects of less than or equal to 3%, and is doped with about 0.01 mole/cm3 to about 0.3 mole/cm3 of 3d transition metal. The metal oxide comprises indium oxide or titanium oxide. The 3d transition metal includes at least one 3d transition metal selected from the group consisting of chromium, cobalt, nickel, iron, manganese, and mixtures thereof.Type: ApplicationFiled: August 25, 2008Publication date: October 1, 2009Applicant: SAMSUNG ELECTRONICS CO., LTDInventors: Kap-Soo YOON, Sung-Hoon YANG, Byoung-June KIM, Czang-Ho LEE, Sung-Ryul KIM, Hwa-Yeul OH, Jae-Ho CHOI, Yong-Mo CHOI
-
Publication number: 20090233399Abstract: In a method of manufacturing a photoelectric device, a transparent conductive layer is formed on a substrate, and the transparent conductive layer is partially etched using an etching solution including hydrofluoric acid. Thus, a transparent electrode having a concavo-convex pattern on its surface is formed. When the transparent conductive layer is partially etched, a haze of the transparent electrode may be controlled by adjusting an etching time of the transparent conductive layer. Also, since the etching solution is sprayed to the transparent conductive layer to etch the transparent conductive layer, the concavo-convex pattern on the surface of the transparent electrode may be easily formed even though the size of the substrate increases.Type: ApplicationFiled: March 9, 2009Publication date: September 17, 2009Inventors: Seung-Jae Jung, Byoung-June Kim, Jin-Seock Kim, Czang-Ho Lee, Myung-Hun Shin, Joon-Young Seo, Dong-Uk Choi, Byoung-Kyu Lee