Patents by Inventor Dae Yun Kim

Dae Yun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130171564
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Application
    Filed: September 5, 2012
    Publication date: July 4, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Eun-Kyung YOON, Eun-Ha HWANG, Jong-Hwa LEE, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Kyun KIM, Sang-Soo KIM, Kun-Bae NOH, Jun-Ho LEE, Jin-Young LEE, Hyun-Yong CHO, Chung-Beom HONG
  • Publication number: 20130171568
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
    Type: Application
    Filed: September 5, 2012
    Publication date: July 4, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Kyun KIM, Sang-Soo KIM, Kun-Bae NOH, Eun-Kyung YOON, Jong-Hwa LEE, Jun-Ho LEE, Jin-Young LEE, Hwan-Sung CHEON, Hyun-Yong CHO, Chung-Beom HONG, Eun-Ha HWANG
  • Patent number: 7947795
    Abstract: A polymer for filling gaps in a semiconductor substrate and a composition using the polymer are provided. According to the composition, holes having a diameter of 100 nm or less and an aspect ratio (i.e. a ratio between the diameter and height of the holes) of 1 or higher in semiconductor substrates can be substantially completely filled by common spin coating without formation of defects, e.g., air voids, the film can be dissolved by an aqueous alkaline solution (i.e. a developing solution) until a desired thickness is reached, the film is highly resistant to isopropyl alcohol (IPA) and plasma etching after curing by baking, and residue can be rapidly removed from the inside of the holes by ashing.
    Type: Grant
    Filed: June 23, 2006
    Date of Patent: May 24, 2011
    Assignee: Cheil Industries Inc.
    Inventors: Hyun Hoo Sung, Jong Seob Kim, Sun Yul Lee, Seung Bae Oh, Dae Yun Kim