Patents by Inventor Dai Nakamura
Dai Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230297239Abstract: A memory system includes a memory chip and a memory controller. The memory chip includes a storage region that stores setup data used for setup of the memory chip during power on thereof. The memory controller is configured to determine whether or not the memory controller has the setup data, when determining that the memory controller does not have the setup data, instruct the memory chip to read the setup data from the storage region and perform a first setup operation based on the read setup data, and when determining that the memory controller has the setup data, transmit the setup data to the memory chip and instruct the memory chip to perform a second setup operation based on the setup data received from the memory controller.Type: ApplicationFiled: August 29, 2022Publication date: September 21, 2023Inventors: Kenta SHIBASAKI, Yoshihiko SHINDO, Yasuhiro HIRASHIMA, Akio SUGAHARA, Shigeki NAGASAKA, Dai NAKAMURA, Yousuke HAGIWARA
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Publication number: 20230207012Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: ApplicationFiled: February 20, 2023Publication date: June 29, 2023Applicant: KIOXIA CORPORATIONInventors: Takatoshi MINAMOTO, Toshiki HISADA, Dai NAKAMURA
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Patent number: 11610630Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: GrantFiled: March 17, 2021Date of Patent: March 21, 2023Assignee: Kioxia CorporationInventors: Takatoshi Minamoto, Toshiki Hisada, Dai Nakamura
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Patent number: 11209846Abstract: In one embodiment, a semiconductor device includes a reference voltage supply circuit configured to supply a first reference voltage and a second reference voltage. The device further includes a power source voltage supply circuit including a first power source voltage generator supplied with the first reference voltage and configured to generate a first power source voltage, and a second power source voltage generator supplied with the second reference voltage and configured to generate a second power source voltage, the power source voltage supply circuit being configured to supply the first power source voltage and the second power source voltage to a power source voltage line. The device further includes a voltage control circuit connected to the power source voltage line, and configured to control a value of the first reference voltage and a value the second reference voltage.Type: GrantFiled: July 29, 2020Date of Patent: December 28, 2021Assignee: KIOXIA CORPORATIONInventors: Kazuhiko Satou, Tomonori Kurosawa, Dai Nakamura
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Patent number: 11139039Abstract: According to one embodiment, a memory device includes a memory cell, a word line connected to the memory cell, a word line driver which generates a selection signal for the word line, a first transistor including a gate to which the selection signal generated by the word line driver is input, and a drain which supplies a signal based on the selection signal to the word line, and a detection circuit which detects a value based on a current flowing through the first transistor during a verification period after writing data to the memory cell.Type: GrantFiled: March 12, 2020Date of Patent: October 5, 2021Assignee: Kioxia CorporationInventors: Tomonori Kurosawa, Dai Nakamura
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Publication number: 20210202002Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: ApplicationFiled: March 17, 2021Publication date: July 1, 2021Applicant: TOSHIBA MEMORY CORPORATIONInventors: Takatoshi MINAMOTO, Toshiki HISADA, Dai NAKAMURA
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Patent number: 10978151Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffuse layers.Type: GrantFiled: August 15, 2019Date of Patent: April 13, 2021Assignee: TOSHIBA MEMORY CORPORATIONInventors: Takatoshi Minamoto, Toshiki Hisada, Dai Nakamura
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Publication number: 20210080984Abstract: In one embodiment, a semiconductor device includes a reference voltage supply circuit configured to supply a first reference voltage and a second reference voltage. The device further includes a power source voltage supply circuit including a first power source voltage generator supplied with the first reference voltage and configured to generate a first power source voltage, and a second power source voltage generator supplied with the second reference voltage and configured to generate a second power source voltage, the power source voltage supply circuit being configured to supply the first power source voltage and the second power source voltage to a power source voltage line. The device further includes a voltage control circuit connected to the power source voltage line, and configured to control a value of the first reference voltage and a value the second reference voltage.Type: ApplicationFiled: July 29, 2020Publication date: March 18, 2021Applicant: Kioxia CorporationInventors: Kazuhiko SATOU, Tomonori KUROSAWA, Dai NAKAMURA
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Publication number: 20210057032Abstract: According to one embodiment, a memory device includes a memory cell, a word line connected to the memory cell, a word line driver which generates a selection signal for the word line, a first transistor including a gate to which the selection signal generated by the word line driver is input, and a drain which supplies a signal based on the selection signal to the word line, and a detection circuit which detects a value based on a current flowing through the first transistor during a verification period after writing data to the memory cell.Type: ApplicationFiled: March 12, 2020Publication date: February 25, 2021Applicant: Kioxia CorporationInventors: Tomonori KUROSAWA, Dai NAKAMURA
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Publication number: 20190371404Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffuse layers.Type: ApplicationFiled: August 15, 2019Publication date: December 5, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Takatoshi Minamoto, Toshiki Hisada, Dai Nakamura
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Patent number: 10431309Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: GrantFiled: April 9, 2019Date of Patent: October 1, 2019Assignee: TOSHIBA MEMORY CORPORATIONInventors: Takatoshi Minamoto, Toshiki Hisada, Dai Nakamura
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Publication number: 20190237143Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: ApplicationFiled: April 9, 2019Publication date: August 1, 2019Applicant: TOSHIBA MEMORY CORPORATIONInventors: Takatoshi Minamoto, Toshiki Hisada, Dai Nakamura
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Patent number: 10304538Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: GrantFiled: July 17, 2018Date of Patent: May 28, 2019Assignee: TOSHIBA MEMORY CORPORATIONInventors: Takatoshi Minamoto, Toshiki Hisada, Dai Nakamura
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Publication number: 20180322924Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: ApplicationFiled: July 17, 2018Publication date: November 8, 2018Applicant: TOSHIBA MEMORY CORPORATIONInventors: Takatoshi MINAMOTO, Toshiki HISADA, Dai NAKAMURA
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Patent number: 10049745Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: GrantFiled: May 19, 2017Date of Patent: August 14, 2018Assignee: TOSHIBA MEMORY CORPORATIONInventors: Takatoshi Minamoto, Toshiki Hisada, Dai Nakamura
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Patent number: 9906086Abstract: A rotating electric machine having downsized coil ends is provided. In a rotating electric machine having a stator 130 including a stator core 132 formed with a plurality of slots 420 rowed in a circumferential direction and a stator coil 138 inserted into the slots of the stator core, and a rotor 150 disposed rotatably with respect to the stator core with a clearance interposed therebetween. The stator coil is formed by a plurality of segment coils 28 being connected, the segment coils 28 being made of a conductor shaped into a rough U-shape and having a rectangular cross-section. The segment coil has at an end a connection portion 800 connected to another segment coil, the connection portion having a corner portion 810.Type: GrantFiled: July 29, 2013Date of Patent: February 27, 2018Assignee: Hitachi Automotive Systems, Ltd.Inventors: Kenichi Nakayama, Tomohiro Fukuda, Masamichi Kase, Hiroshi Matahira, Kazuo Ojima, Dai Nakamura, Shin Onose, Mitsuaki Mirumachi, Hisaya Shimizu
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Publication number: 20170256318Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M<N) of the word lines close to the i-th word line pass through a region above the gate electrode by a first level interconnection without passing over the impurity diffused layers.Type: ApplicationFiled: May 19, 2017Publication date: September 7, 2017Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Takatoshi MINAMOTO, Toshiki HISADA, Dai NAKAMURA
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Patent number: RE46526Abstract: A non-volatile semiconductor storage device includes: a memory cell array having memory cells arranged therein, the memory cells storing data in a non-volatile manner; and a plurality of transfer transistors transferring a voltage to the memory cells, the voltage to be supplied for data read, write and erase operations with respect to the memory cells. Each of the transfer transistors includes: a gate electrode formed on a semiconductor substrate via a gate insulation film; and diffusion layers formed to sandwich the gate electrode therebetween and functioning as drain/source layers. Upper layer wirings are provided above the diffusion layers and provided with a predetermined voltage to prevent depletion of the diffusion layers at least when the transfer transistors become conductive.Type: GrantFiled: October 22, 2014Date of Patent: August 29, 2017Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Dai Nakamura, Hiroyuki Kutsukake, Kenji Gomikawa, Takeshi Shimane, Mitsuhiro Noguchi, Koji Hosono, Masaru Koyanagi, Takashi Aoi
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Patent number: RE47355Abstract: A non-volatile semiconductor storage device includes: a memory cell array having memory cells arranged therein, the memory cells storing data in a non-volatile manner; and a plurality of transfer transistors transferring a voltage to the memory cells, the voltage to be supplied for data read, write and erase operations with respect to the memory cells. Each of the transfer transistors includes: a gate electrode formed on a semiconductor substrate via a gate insulation film; and diffusion layers formed to sandwich the gate electrode therebetween and functioning as drain/source layers. Upper layer wirings are provided above the diffusion layers and provided with a predetermined voltage to prevent depletion of the diffusion layers at least when the transfer transistors become conductive.Type: GrantFiled: July 13, 2017Date of Patent: April 16, 2019Assignee: TOSHIBA MEMORY CORPORATIONInventors: Dai Nakamura, Hiroyuki Kutsukake, Kenji Gomikawa, Takeshi Shimane, Mitsuhiro Noguchi, Koji Hosono, Masaru Koyanagi, Takashi Aoi
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Patent number: RE49274Abstract: A non-volatile semiconductor storage device includes: a memory cell array having memory cells arranged therein, the memory cells storing data in a non-volatile manner; and a plurality of transfer transistors transferring a voltage to the memory cells, the voltage to be supplied for data read, write and erase operations with respect to the memory cells. Each of the transfer transistors includes: a gate electrode formed on a semiconductor substrate via a gate insulation film; and diffusion layers formed to sandwich the gate electrode therebetween and functioning as drain/source layers. Upper layer wirings are provided above the diffusion layers and provided with a predetermined voltage to prevent depletion of the diffusion layers at least when the transfer transistors become conductive.Type: GrantFiled: February 25, 2019Date of Patent: November 1, 2022Assignee: KIOXIA CORPORATIONInventors: Dai Nakamura, Hiroyuki Kutsukake, Kenji Gomikawa, Takeshi Shimane, Mitsuhiro Noguchi, Koji Hosono, Masaru Koyanagi, Takashi Aoi