Patents by Inventor Daishi Yokoyama

Daishi Yokoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210317323
    Abstract: The present invention relates to a composition and to a method of manufacturing a composition.
    Type: Application
    Filed: July 31, 2019
    Publication date: October 14, 2021
    Applicant: Merck Patent GmbH
    Inventors: Tadashi KISHIMOTO, Yuko ARAI, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI
  • Publication number: 20210208503
    Abstract: To provide a negative type photosensitive composition curable at a low temperature and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability, and also to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: an alkali-soluble resin, a compound having two or more (meth)acryloyloxy groups, a polysiloxane, a polymerization initiator, and a solvent. The alkali-soluble resin is a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit.
    Type: Application
    Filed: January 20, 2017
    Publication date: July 8, 2021
    Inventors: Motoki MISUMI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Masahiro KUZAWA
  • Publication number: 20200319557
    Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
    Type: Application
    Filed: March 27, 2020
    Publication date: October 8, 2020
    Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Publication number: 20200301277
    Abstract: [Object] To provide a negative type photosensitive composition developable with a low concentration alkali developer and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability; and further to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: (I) an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit, (II) a polysiloxane, (III) a compound having two or more (meth)acryloyloxy groups, (IV) (i) a silicone derivative having a particular structure and/or (ii) a compound having two or more epoxy groups, (V) a polymerization initiator, and (VI) a solvent.
    Type: Application
    Filed: March 27, 2017
    Publication date: September 24, 2020
    Inventors: MOTOKI MISUMI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Masahiro KUZAWA
  • Publication number: 20200201179
    Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative a compound generating acid or base when exposed to heat or light; and a solvent.
    Type: Application
    Filed: March 2, 2020
    Publication date: June 25, 2020
    Inventors: MEGUMI TAKAHASHI, Daishi Yokoyama, Naofumi Yoshida, Katsuto Taniguchi, Masahiro Kuzawa
  • Patent number: 10678134
    Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: June 9, 2020
    Assignees: MERCK PATENT GMBH, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Yuki Hirayama, Tadashi Kishimoto, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi, Toshiaki Nonaka
  • Patent number: 10620538
    Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: April 14, 2020
    Assignees: Sakai Display Products Corporation, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi
  • Patent number: 10606173
    Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: March 31, 2020
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Megumi Takahashi, Daishi Yokoyama, Naofumi Yoshida, Katsuto Taniguchi, Masahiro Kuzawa
  • Patent number: 10509319
    Abstract: The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: December 17, 2019
    Assignees: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Masayoshi Suzuki, Tadashi Kishimoto, Yuki Hirayama, Stephan Dertinger, Toshiaki Nonaka, Daishi Yokoyama
  • Patent number: 10435513
    Abstract: An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively. Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: October 8, 2019
    Assignee: Ridgefield Acquisition
    Inventors: Naofumi Yoshida, Yuji Tashiro, Daishi Yokoyama, Toshiaki Nonaka
  • Patent number: 10409161
    Abstract: To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability. The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-generator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: September 10, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Motoki Misumi, Daishi Yokoyama, Megumi Takahashi, Toshiaki Nonaka
  • Publication number: 20190211266
    Abstract: The present invention relates to a photosensitive composition, and a color conversion medium. The present invention further relates to a use of the photosensitive composition in a color conversion medium fabrication process, and to a use of the color conversion medium in an optical device. The invention furthermore relates to an optical device and method for preparing the color conversion medium and the optical device.
    Type: Application
    Filed: July 27, 2017
    Publication date: July 11, 2019
    Applicant: Merck Patent GmbH
    Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Teruaki SUZUKI
  • Publication number: 20190077961
    Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.
    Type: Application
    Filed: March 23, 2017
    Publication date: March 14, 2019
    Inventors: MEGUMI TAKAHASHI, Daishi YOKOYAMA, Naofumi YOSHIDA, Katsuto TANIGUCHI, Masahiro KUZAWA
  • Publication number: 20190064660
    Abstract: To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability. The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-generator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.
    Type: Application
    Filed: January 20, 2017
    Publication date: February 28, 2019
    Applicant: AZ Electronic Materials (Luxembourg) S.à r.l.
    Inventors: Motoki MISUMI, Daishi YOKOYAMA, Megumi TAKAHASHI, Toshiaki NONAKA
  • Publication number: 20180284613
    Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
    Type: Application
    Filed: August 30, 2016
    Publication date: October 4, 2018
    Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Publication number: 20180179337
    Abstract: [Problem] An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively. [Means for Solution] Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.
    Type: Application
    Filed: February 21, 2018
    Publication date: June 28, 2018
    Inventors: Naofumi YOSHIDA, Yuji TASHIRO, Daishi YOKOYAMA, Toshiaki NONAKA
  • Publication number: 20180046080
    Abstract: The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.
    Type: Application
    Filed: February 5, 2016
    Publication date: February 15, 2018
    Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Masayoshi SUZUKI, Tadashi KISHIMOTO, Yuki HIRAYAMA, Stephan DERTINGER, Toshiaki NONAKA, Daishi YOKOYAMA
  • Publication number: 20180017869
    Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.
    Type: Application
    Filed: February 3, 2016
    Publication date: January 18, 2018
    Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi
  • Patent number: 9684240
    Abstract: To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: June 20, 2017
    Assignee: AZ Electronic Materials (Luxembourg) S.à.r.l.
    Inventors: Daishi Yokoyama, Atsuko Noya, Yuji Tashiro, Naofumi Yoshida, Yasuaki Tanaka, Takashi Fuke, Megumi Takahashi, Katsuto Taniguchi, Toshiaki Nonaka
  • Patent number: 9505888
    Abstract: [Problem] An object of the present invention is to provide a composite of metal oxide nanoparticles and a silsesquioxane polymer, which can form a high-quality cured film wherein aggregation and the like of metal oxide do not occur during a curing process and the metal oxide is uniformly dispersed. [Means for Solution] Provided are: a method of producing a composite of metal oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal, or a silane monomer with metal oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in an aqueous solvent in the presence of a phase transfer catalyst; and a composite produced by the method.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: November 29, 2016
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Naofumi Yoshida, Yuji Tashiro, Daishi Yokoyama, Yasuaki Tanaka, Takashi Fuke, Megumi Takahashi, Toshiaki Nonaka