Patents by Inventor Daishi Yokoyama
Daishi Yokoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11965049Abstract: Photosensitive compositions containing nanosized light emitting materials and (meth)acrylic polymer are suitable for use in a variety of optical applications, for example the preparation of quantum material doped photoresist films, especially for optical devices. Optical films can be prepared be by: a) providing the photosensitive composition onto a substrate, and b) polymerizing the photosensitive composition by exposing the photosensitive composition to radiation.Type: GrantFiled: July 31, 2019Date of Patent: April 23, 2024Assignee: MERCK PATENT GMBHInventors: Tadashi Kishimoto, Yuko Arai, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi
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Publication number: 20230320140Abstract: The present invention relates to a color conversion device (100).Type: ApplicationFiled: September 1, 2021Publication date: October 5, 2023Applicant: MERCK PATENT GMBHInventors: Tadashi KISHIMOTO, Atsuko NOYA, Julian BURSCHKA, Teruaki SUZUKI, Daishi YOKOYAMA, Seishi SHIBAYAMA
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Patent number: 11630390Abstract: To provide a negative type photosensitive composition curable at a low temperature and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability, and also to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: an alkali-soluble resin, a compound having two or more (meth)acryloyloxy groups, a polysiloxane, a polymerization initiator, and a solvent. The alkali-soluble resin is a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit.Type: GrantFiled: January 20, 2017Date of Patent: April 18, 2023Assignee: MERCK PATENT GMBHInventors: Motoki Misumi, Daishi Yokoyama, Katsuto Taniguchi, Masahiro Kuzawa
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Publication number: 20230107892Abstract: To provide a negative type photosensitive composition which is capable of forming a cured film having good light shielding properties and high reflectance. [Means for Solution] A negative type photosensitive composition comprising an alkali-soluble resin having a particular structure, a reflectance modifier, a polymerization initiator, and a solvent.Type: ApplicationFiled: March 5, 2021Publication date: April 6, 2023Inventors: Suryani LIN, Yi-Meng YEN, Yung-Cheng CHANG, Daishi YOKOYAMA, Atsuko NOYA
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Patent number: 11579530Abstract: [Problem] To provide a negative type photosensitive composition which can be developed with a low-concentration developer. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin having a carboxyl group, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent, wherein the content of the compound containing two or more (meth)acryloyloxy groups is 40 to 300 mass % based on the total mass of the alkali-soluble resin.Type: GrantFiled: July 29, 2020Date of Patent: February 14, 2023Assignee: MERCK PATENT GMBHInventors: Daishi Yokoyama, Seishi Shibayama, Atsuko Noya
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Patent number: 11506978Abstract: [Object] To provide a negative type photosensitive composition developable with a low concentration alkali developer and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability; and further to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: (I) an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit, (II) a polysiloxane, (III) a compound having two or more (meth)acryloyloxy groups, (IV) (i) a silicone derivative having a particular structure and/or (ii) a compound having two or more epoxy groups, (V) a polymerization initiator, and (VI) a solvent.Type: GrantFiled: March 27, 2017Date of Patent: November 22, 2022Assignee: MERCK PATENT GMBHInventors: Motoki Misumi, Daishi Yokoyama, Katsuto Taniguchi, Masahiro Kuzawa
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Publication number: 20220267641Abstract: To provide a negative type photosensitive composition having excellent chemical resistance and capable of being cured at a low temperature. A negative type photosensitive composition comprising (I) a polysiloxane having a specific structure, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent.Type: ApplicationFiled: July 22, 2020Publication date: August 25, 2022Inventors: Daishi YOKOYAMA, Atsuko NOYA, Cho-Ying LIN, Yung-Cheng CHANG
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Publication number: 20220260912Abstract: [Problem] To provide a negative type photosensitive composition which can be developed with a low-concentration developer. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin having a carboxyl group, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent, wherein the content of the compound containing two or more (meth)acryloyloxy groups is 40 to 300 mass % based on the total mass of the alkali-soluble resin.Type: ApplicationFiled: July 29, 2020Publication date: August 18, 2022Inventors: Daishi YOKOYAMA, Seishi SHIBAYAMA, Atsuko NOYA
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Patent number: 11269255Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.Type: GrantFiled: March 27, 2020Date of Patent: March 8, 2022Assignees: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Yuki Hirayama, Tadashi Kishimoto, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi, Toshiaki Nonaka
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Publication number: 20210317323Abstract: The present invention relates to a composition and to a method of manufacturing a composition.Type: ApplicationFiled: July 31, 2019Publication date: October 14, 2021Applicant: Merck Patent GmbHInventors: Tadashi KISHIMOTO, Yuko ARAI, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI
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Publication number: 20210208503Abstract: To provide a negative type photosensitive composition curable at a low temperature and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability, and also to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: an alkali-soluble resin, a compound having two or more (meth)acryloyloxy groups, a polysiloxane, a polymerization initiator, and a solvent. The alkali-soluble resin is a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit.Type: ApplicationFiled: January 20, 2017Publication date: July 8, 2021Inventors: Motoki MISUMI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Masahiro KUZAWA
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Publication number: 20200319557Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.Type: ApplicationFiled: March 27, 2020Publication date: October 8, 2020Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
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Publication number: 20200301277Abstract: [Object] To provide a negative type photosensitive composition developable with a low concentration alkali developer and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability; and further to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: (I) an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit, (II) a polysiloxane, (III) a compound having two or more (meth)acryloyloxy groups, (IV) (i) a silicone derivative having a particular structure and/or (ii) a compound having two or more epoxy groups, (V) a polymerization initiator, and (VI) a solvent.Type: ApplicationFiled: March 27, 2017Publication date: September 24, 2020Inventors: MOTOKI MISUMI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Masahiro KUZAWA
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Publication number: 20200201179Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative a compound generating acid or base when exposed to heat or light; and a solvent.Type: ApplicationFiled: March 2, 2020Publication date: June 25, 2020Inventors: MEGUMI TAKAHASHI, Daishi Yokoyama, Naofumi Yoshida, Katsuto Taniguchi, Masahiro Kuzawa
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Patent number: 10678134Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.Type: GrantFiled: August 30, 2016Date of Patent: June 9, 2020Assignees: MERCK PATENT GMBH, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Yuki Hirayama, Tadashi Kishimoto, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi, Toshiaki Nonaka
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Patent number: 10620538Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.Type: GrantFiled: February 3, 2016Date of Patent: April 14, 2020Assignees: Sakai Display Products Corporation, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi
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Patent number: 10606173Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.Type: GrantFiled: March 23, 2017Date of Patent: March 31, 2020Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Megumi Takahashi, Daishi Yokoyama, Naofumi Yoshida, Katsuto Taniguchi, Masahiro Kuzawa
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Patent number: 10509319Abstract: The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.Type: GrantFiled: February 5, 2016Date of Patent: December 17, 2019Assignees: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Masayoshi Suzuki, Tadashi Kishimoto, Yuki Hirayama, Stephan Dertinger, Toshiaki Nonaka, Daishi Yokoyama
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Patent number: 10435513Abstract: An object of the present invention is to provide a composite of silicon oxide nanoparticles and a silsesquioxane polymer, from which a cured film having a low refractive index can be formed inexpensively. Provided are a method of producing a composite of silicon oxide nanoparticles and a silsesquioxane polymer, the method comprising reacting a silsesquioxane polymer having a silanol group at a terminal or a silane monomer with silicon oxide nanoparticles having a hydroxyl group or an alkoxy group on the surface in a mixed solvent of an aqueous solvent and an organic solvent in the presence of a phase transfer catalyst, and a composite produced by the method.Type: GrantFiled: December 19, 2013Date of Patent: October 8, 2019Assignee: Ridgefield AcquisitionInventors: Naofumi Yoshida, Yuji Tashiro, Daishi Yokoyama, Toshiaki Nonaka
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Patent number: 10409161Abstract: To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability. The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-generator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.Type: GrantFiled: January 20, 2017Date of Patent: September 10, 2019Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.Inventors: Motoki Misumi, Daishi Yokoyama, Megumi Takahashi, Toshiaki Nonaka