Abstract: In a plasma etching method of plasma-etching a sample which has a first magnetic film, a second magnetic film disposed above the first magnetic film, a metal oxide film disposed between the first magnetic film and the second magnetic film, a second metal film disposed over the second magnetic film and forming an upper electrode, and a first metal film disposed below the first magnetic film and forming a lower electrode, the plasma etching method includes the steps of: a first process for etching the first magnetic film, the metal oxide film, and the second magnetic film by using carbon monoxide gas; and a second process for etching the sample by using mixed gas of hydrogen gas and inactive gas after the first process. In this case, the first metal film is a film containing therein tantalum.

Abstract: A table device includes: a first table that includes a first upper surface; a second table that is arranged on one side of the first table in a first axial direction parallel to a first axis in a predetermined plane and includes a second upper surface; a first guiding device that guides the first table in the first axial direction; and a second guiding device that guides the second table in the first axial direction. The first and second guiding devices are arranged in a second axial direction parallel to a second axis in the predetermined plane, the second axis being perpendicular to the first axis.

Abstract: A storage management apparatus configured to allocate physical addresses in a physical storage area, to virtual addresses in a virtual storage area for storing data is provided. The storage management apparatus includes a processor that executes a process to define, in the physical area, a continuous area having a plurality of continuous physical addresses, and define, based on a virtual address to which a physical address in the continuous area has initially been allocated, an allocation range of virtual addresses for allocating the defined continuous area; and allocate a physical address in the defined continuous area to a virtual address in the defined relation range.

Abstract: A vehicle seat having a seat cushion obtained by covering a cushion-side frame with a trim cover, a seat back obtained by covering a back-side frame with a trim cover, and a reclining apparatus for making it possible to adjust the angle of tilt of the seat back with respect to the seat cushion. The reclining apparatus has a return spring provided on the outside of the frames, a locking mechanism for putting the frames into a locked state or an unlocked state, and an operation lever for switching the state of the locking mechanism. An outside surface of the return spring is covered by the operation lever, and the hazard presented by the return spring is reduced.

Abstract: [Purpose] To provide a vehicle seat having a garnish attached thereto, which is simplified in structure for easy secure attachment of the garnish to a seat cushion of the seat, and also highly improved as to outer appearance quality of the seat cushion. [Means for Achieving the Purpose] A vehicle seat of the present invention includes: a frame 4 formed from a sheet metal, the frame standing upright in a vertical direction thereof; a garnish 1 engaged with and fitted to the frame 4 so as to cover an outer peripheral surface of that frame; a cushion element 3 supported by the frame 4; and a trim cover element 2 covering the cushion element 3. In this vehicle seat, a terminal end portion 20 of the trim cover element 2 is fixedly secured to an outer surface of the garnish 1.

Abstract: A vehicle body front portion structure is provided with a suspension member, a vertical wall and a protruding member. A side portion of the suspension member is disposed at a vehicle body lower side of a front side member. The vertical wall is formed at the suspension member and includes a coupling portion to which a vehicle width direction inner side end portion of a lower arm is coupled, which lower arm supports a front wheel. The protruding member is fastened to a fastening portion provided in the vertical wall, at a vehicle width direction outer side relative to the coupling portion, so as to protrude to the vehicle width direction outer side relative to the front side member in plan view.

Abstract: A communication method executed by an information processing apparatus capable of transmitting data to another information processing apparatus, the method includes: setting a first threshold as an amount of data capable of being transmitted without waiting for a reply from the another information processing apparatus; transmitting a first data having a data amount less than or equal to the first threshold to the another information processing apparatus; acquiring from the another information processing apparatus processing time information taken to process the first data by the another information processing apparatus; and changing the first threshold concerning the data amount into a second threshold based on the processing time information.

Abstract: The present invention provides, in a plasma etching method for plasma-etching a magnetic film, a plasma etching method that allows a desired etching depth to be obtained regardless of the opening size of a mask. The present invention is, in a plasma etching method for plasma-etching a magnetic film by using a tantalum film as a mask, characterized by including: a first process to plasma-etch the magnetic film to a desired depth by using a mixed gas of an ammonia gas and a helium gas; and a second process, after the first process, to plasma-etch the magnetic film etched to the prescribed depth by using a mixed gas of an ammonia gas and a gas containing the oxygen element or a mixed gas of an ammonia gas and a gas containing a hydroxyl group.

Abstract: A gas insulated bus is provided which comprises a metallic container whose axis is an axis line; a main circuit conductor housed in the metallic container; a metallic container to be connected with an end of the metallic container and whose axis is an axis line crossing the axis line; a main circuit conductor housed in the metallic container; an insulating spacer of a single-leg structure that supports and insulates a connection portion of the main circuit conductors; a metal-made shield attached to the insulating spacer and provided with an opening open in a direction of the axis line and an opening open in a direction of the axis line, the shield covering the connection portion, the shield being substantially in a barrel or spindle shape having an outside diameter exceeding that of the main circuit conductors.

Abstract: In a plasma etching method of plasma-etching a sample which has a first magnetic film, a second magnetic film disposed above the first magnetic film, a metal oxide film disposed between the first magnetic film and the second magnetic film, a second metal film disposed over the second magnetic film and forming an upper electrode, and a first metal film disposed below the first magnetic film and forming a lower electrode, the plasma etching method includes the steps of: a first process for etching the first magnetic film, the metal oxide film, and the second magnetic film by using carbon monoxide gas; and a second process for etching the sample by using mixed gas of hydrogen gas and inactive gas after the first process. In this case, the first metal film is a film containing therein tantalum.

Abstract: A communication control system includes a first computer and a second computer, wherein the first computer includes a communication interface device and a first processor configured to control the communication interface device to transmit first data and first feature information indicating a feature of the first data to the second computer, and the second computer includes a memory that has a storage area allocated to store second data received from the first computer, and a second processor configured to determine whether the first feature information received from the first computer matches second feature information, indicating a feature of and calculated based on the second data stored in the storage area, and control the memory to release the storage area when the second feature information does not match the received first feature information.

Abstract: A gas-insulated bus bar includes a metal container, a main circuit conductor that is accommodated in the metal container, an insulation spacer of a one-legged structure that includes one end portion attached to the metal container and the other end portion holding the main circuit conductor in the metal container, a shield that is substantially barrel-shaped, attached to the other end portion, and having an outer diameter larger than an outer diameter of the main circuit conductor, and a branch pipe provided on a side of the metal container and branched in a direction substantially perpendicular to an axis line, thereby including an inside portion where the one end portion is arranged. When viewing from a direction parallel to a branching direction of the branch pipe, the insulation spacer and the shield have respective sizes that are arranged within an area defined by an inner diameter of the branch pipe.

Abstract: In a plasma etching method of plasma-etching a sample which has a first magnetic film, a second magnetic film disposed above the first magnetic film, a metal oxide film disposed between the first magnetic film and the second magnetic film, a second metal film disposed over the second magnetic film and forming an upper electrode, and a first metal film disposed below the first magnetic film and forming a lower electrode, the plasma etching method includes the steps of: a first process for etching the first magnetic film, the metal oxide film, and the second magnetic film by using carbon monoxide gas; and a second process for etching the sample by using mixed gas of hydrogen gas and inactive gas after the first process. In this case, the first metal film is a film containing therein tantalum.

Abstract: Described herein are breeding methods useful to increase grain yield. Disclosed is a novel gene, SPIKE, which is shown herein to increase grain yield of modern indica cultivars and can be used to assist development of improved grains. Also described herein are materials and methods for increasing the grain yield of modern indica cultivars.

Abstract: A storage management apparatus configured to allocate physical addresses in a physical storage area, to virtual addresses in a virtual storage area for storing data is provided. The storage management apparatus includes a processor that executes a process to define, in the physical area, a continuous area having a plurality of continuous physical addresses, and define, based on a virtual address to which a physical address in the continuous area has initially been allocated, an allocation range of virtual addresses for allocating the defined continuous area; and allocate a physical address in the defined continuous area to a virtual address in the defined relation range.

Abstract: A vehicle body front portion structure is provided with a suspension member, a vertical wall and a protruding member. A side portion of the suspension member is disposed at a vehicle body lower side of a front side member. The vertical wall is formed at the suspension member and includes a coupling portion to which a vehicle width direction inner side end portion of a lower arm is coupled, which lower arm supports a front wheel. The protruding member is fastened to a fastening portion provided in the vertical wall, at a vehicle width direction outer side relative to the coupling portion, so as to protrude to the vehicle width direction outer side relative to the front side member in plan view.

Abstract: A vehicle seat having a seat cushion obtained by covering a cushion-side frame with a trim cover, a seat back obtained by covering a back-side frame with a trim cover, and a reclining apparatus for making it possible to adjust the angle of tilt of the seat back with respect to the seat cushion. The reclining apparatus has a return spring provided on the outside of the frames, a locking mechanism for putting the frames into a locked state or an unlocked state, and an operation lever for switching the state of the locking mechanism. An outside surface of the return spring is covered by the operation lever, and the hazard presented by the return spring is reduced.

Abstract: A plasma etching method performs plasma etching on a sample, which has laminated films containing a variable layer of a magnetic film, a barrier layer of an insulating material, and a fixed layer of a magnetic film, using a hard mask, which includes at least one of a Ta film and a TiN film. The plasma etching method includes a first step of etching the laminated films using N2 gas; and a second step of etching the laminated films after the first step using mixed gas of N2 gas and gas containing carbon elements.

Abstract: A spiral capacitor-inductor device in which an array of unit capacitors 101 is arranged in a loop along the length is provided as the fourth circuit element. An input signal is applied to one end of the array of the unit capacitors, an output signal is taken out from the other end, an electric charge stored in each unit capacitor increases or decreases in accordance with increase or decrease in the bias applied to the device, the increase or decrease in the electric charge causes the current of the loop to increase or decrease, and, as a result, the magnetic flux 103 generated in the device varies. Accordingly, the fourth circuit element is provided that follows after an inductor, a capacitor, and a resistor is provided in which the electric charge stored determines the magnitude of its magnetic flux.

Abstract: A storage controller that generates multiple versions of a snapshot of a storing device and that includes a first calculator that counts a first number of segments updated in a first snapshot that is to be deleted among the multiple versions of the snapshot but not updated in a second snapshot of a successive version to the first snapshot, a second calculator that counts a second number of segments updated in the second snapshot, and a determining processor that determines, when the first number is the second number or more, that the second snapshot and the first snapshot are a merging source and a merging destination in merging processing, respectively, and determines, when the first number is less than the second number, that the first snapshot and the second snapshot are the merging source and the merging destination, respectively, the merging source being merged into the merging destination.