Abstract: According to the present disclosure, there is provided a technique capable of performing a substrate processing more uniformly. According to one aspect thereof, there is provided an electrode structure capable of generating a plasma, including: a first electrode group constituted by: at least one first electrode to which an electric potential is applied; at least one second electrode whose length is different from that of the first electrode and to which an electric potential is applied; and at least one third electrode to which a reference potential is applied; and a second electrode group constituted by: at least one fourth electrode to which an electric potential is applied; at least one fifth electrode whose length is different from that of the fourth electrode and to which an electric potential is applied; and at least one sixth electrode to which the reference potential is applied.

Abstract: There is provided a technique that includes: a process chamber in which a substrate is processed; a plurality of first electrodes; a plurality of second electrodes; a high-frequency power supply configured to supply a high-frequency power; a high-frequency power application plate configured to connect the plurality of first electrodes to the high-frequency power supply; and a grounding plate configured to ground the plurality of second electrodes.

Abstract: A multichannel dispenser 100 includes a plurality of syringes 103 each of which includes a plunger 101 and a housing 102, a drive motor 104 that drives at least one of the plungers 101, tip end portions 106 to which dispensing tips 105 are to be attached, and tubes 107A, 107B causing the syringes 103 and the tip end portions 106 to communicate with each other. The outer diameter 109 of the housing 102 is greater than a pitch distance 108 between the dispensing tips 105, and the plurality of syringes 103 is arranged in multiple lines. Thus, it is possible to increase a plunger diameter as compared to the related art, and to perform dispensing in amounts ranging from a slight amount to a great amount.

Abstract: According to the present disclosure, there is provided a technique capable of performing a substrate processing more uniformly. According to one aspect thereof, there is provided an electrode structure capable of generating a plasma, including: a first electrode group constituted by: at least one first electrode to which an electric potential is applied; at least one second electrode whose length is different from that of the first electrode and to which an electric potential is applied; and at least one third electrode to which a reference potential is applied; and a second electrode group constituted by: at least one fourth electrode to which an electric potential is applied; at least one fifth electrode whose length is different from that of the fourth electrode and to which an electric potential is applied; and at least one sixth electrode to which the reference potential is applied.

Abstract: There is provided a technique that includes: a process chamber in which a substrate is processed; a plurality of first electrodes; a plurality of second electrodes; a high-frequency power supply configured to supply a high-frequency power; a high-frequency power application plate configured to connect the plurality of first electrodes to the high-frequency power supply; and a grounding plate configured to ground the plurality of second electrodes.

Abstract: According to one aspect of the technique, there is provided a substrate processing apparatus including: a process chamber in which a substrate is processed; a first gas supply system configured to supply a first gas onto the substrate in the process chamber and including a plurality of tanks configured to store the first gas, wherein the first gas is heated in the plurality of the tanks; and a controller configured to control the first gas supply system such that the first gas is supplied onto the substrate in the process chamber while switching among the plurality of the tanks.

Abstract: According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a process chamber in which a substrates is processed; and a plasma generator including: a first gas supply pipe through which a first gas is supplied; an application electrode to which a high frequency power is applied; a reference electrode to which a reference potential is applied by being grounded; and a light emitting tube by which the first gas is photo-exited.

Abstract: There is provided a technique that includes (a) a process tube in which a substrate is accommodated and heat-treated; (b) a plurality of coils that are disposed along a longitudinal direction of the process tube and supplied with radio-frequency power from a power source; and (c) a controller configured to be capable of setting a phase difference between two adjacent coils, among the plurality of coils, to a predetermined value, wherein in (c) the predetermined value is changeable and is set so as to make a temperature discrepancy occurring in a vicinity of a boundary between the two adjacent coils smaller than a temperature discrepancy when the phase difference is set to zero.

Abstract: There is provided a technique that includes: a process chamber that processes a plurality of substrates; a substrate holder on which the plurality of substrates is supported; an electrode that forms plasma in the process chamber, and auxiliary plate that is disposed between the plurality of substrates and assists formation of the plasma.

Abstract: According to one aspect of the technique, there is provided a substrate processing apparatus including: a process chamber in which a substrate is processed; a first gas supply system configured to supply a first gas onto the substrate in the process chamber and including a plurality of tanks configured to store the first gas, wherein the first gas is heated in the plurality of the tanks; and a controller configured to control the first gas supply system such that the first gas is supplied onto the substrate in the process chamber while switching among the plurality of the tanks.

Abstract: In a first aspect, an image processing apparatus includes an image processor that executes image processing including printing and/or scanning, a presentation unit that presents first authentication information that can be acquired by a wireless communication terminal, a communicator that receives, from the wireless communication terminal through wireless communication with the wireless communication terminal, an image processing instruction instructing execution of the image processing and second authentication information associated with the image processing instruction, and a controller that performs authentication processing of checking whether the received second authentication information matches the presented first authentication information. The controller controls, based on success in the authentication processing, the image processor to execute the image processing corresponding to the received image processing instruction.

Abstract: The present invention determines whether or not a mounted tip and a dispensing amount match with each other in order to prevent contamination in a dispensing device. The present invention is provided with a pipette mechanism 108, 109 that performs suction and discharge, a motor 102 that drives the pipette mechanism, and a pressure sensor 113 that detects a pressure of the pipette mechanism. A dispensing tip 110 is mounted to the pipette mechanism. A control computer 116 controls the motor 102, drives the pipette mechanism in a suction or discharge direction, and determines a type of the dispensing tip 110 on the basis of a difference in pressure waveform detected by the pressure sensor 113.

Abstract: An image processing apparatus includes an operation panel including a display that displays, in juxtaposition, a menu region with function buttons each corresponding to a type of image processing operation are arranged and a history region with history buttons each corresponding to a completed image processing operation are arranged, and an operator that receives an operation on each of the buttons arranged in the menu region and the history region. In the history region, an individual history button that displays information on the completed image processing operation individually per image processing operation and a group history button that displays a group obtained by classifying the completed image processing operation according to a classification condition are arranged in juxtaposition. The display displays, in the history region, classification information that is information indicating the classification condition and that is associated with the group history button.

Abstract: There is provided a substrate processing apparatus, comprising: a reaction tube in which a substrate is processed; and a plurality of electrodes including at least one first electrode to which a predetermined potential is applied and at least one second electrode to which a reference potential is applied. Two or more of the at least one first electrode or the at least one second electrode are arranged side-by-side in a cross sectional view perpendicular to a vertical direction of the reaction tube.

Abstract: The dispensing apparatus is able to dispense liquid and includes: a piston; a first drive device that drives the piston; a syringe that has a tip mounting unit to which a dispensing tip is mounted and that receives the piston therein; a pressure sensor that measures pressure within the syringe; a processing device that processes a detection signal of the pressure measured by the pressure sensor; a block having a hole which can be fitted to the tip mounting unit; and a second drive device that varies the relative position between the syringe and the block. The processing device is characterized by: driving the second drive device so as to cause the tip mounting unit and the hole to be fitted to each other; sealing up the interior of the syringe; applying a positive pressure or a negative pressure within the syringe; and then, calculating a correction value.

Abstract: A dispensing device has: a syringe having a piston, a first drive device driving the piston, and a tip mounting part; a block having first and second orifices; a pump; and a second drive device for varying the relative positions of the syringe and the block. A processing device: drives the second driving device and fits together the tip mounting part and the first orifice such that the interior of the syringe is hermetically sealed, and then drives the pump and applies positive or negative pressure to the interior of the syringe; and subsequently drives the second driving device and fits together the tip mounting part and the second orifice such that the interior of the syringe is hermetically sealed, and then drives the pump and applies positive or negative pressure to the interior of the syringe; and identifies the site of deterioration in the dispensing device.

Abstract: There is provided a technique capable of sufficiently stabilizing a generation of a plasma by avoiding an improper impedance matching. There is provided a technique that includes: an input structure configured to receive a high frequency power, an output structure configured to output the high frequency power; a matching structure containing a variable inductor with a variable inductance; and a variable inductance regulator capable of varying the inductance of the variable inductor.

Abstract: There is provided a substrate processing apparatus, comprising: a reaction tube in which a substrate is processed; and a plurality of electrodes including a plurality of first electrodes to which a predetermined potential is applied and at least one second electrode to which a reference potential is applied. The at least one second electrode is arranged to be sandwiched between two sets of two or more continuously arranged electrodes of the plurality of first electrodes.

Abstract: A substrate processing apparatus, includes: a process chamber accommodating a substrate; a vaporizer vaporizing a liquid precursor to generate reaction gas and deliver a processing gas containing the reaction gas and a carrier gas, the vaporizer including: a vaporization vessel; and a heater heating the liquid precursor introduced into the vessel; a carrier gas flow rate controller controlling flow rate of the carrier gas supplied to the vaporizer; a liquid precursor flow rate controller controlling flow rate of the liquid precursor; a processing gas supply pipe introducing the processing gas delivered from the vaporizer into the process chamber; and a gas concentration sensor detecting a gas concentration of the reaction gas contained in the processing gas delivered from the vaporizer into the processing gas supply pipe.

Abstract: To provide a dental photocurable composition having good storage stability of a matrix containing a polymerizable monomer and a polymerization initiator, etc. and excellent mechanical strength of a dental photocurable composition comprising a mixture of the matrix and a filler. The dental photocurable composition of the present disclosure comprises a matrix containing (A) polymerizable monomer, (B) photosensitizer, (C) photoacid generator and (D) photopolymerization accelerator, and (E) filler, wherein, the dental photocurable composition comprises (A1) polymerizable monomer having an acidic group as the (A) polymerizable monomer, and the dental photocurable composition comprises (D1) tertiary aliphatic amine compound having Log P of 2 or more and pKa of 10 or less as the (D) photopolymerization accelerator.