Patents by Inventor Daisuke Hara

Daisuke Hara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260302132
    Abstract: According to one aspect of the present invention, a dose information correction method includes: setting a reference correction amount for correcting the dose information; calculating, for each mesh region, a gradient of the dose information defined for a mesh region by using the dose information defined for the mesh region and the dose information defined for a peripheral mesh region around the mesh region; calculating, for each mesh region, an individual correction amount of the dose information of the mesh region to be applied along a direction of the gradient by using a value of a calculated gradient and the reference correction amount; and generating and outputting a corrected dose information map in which corrected dose information obtained by correcting the dose information of the mesh region using a calculated individual correction amount is defined for each mesh region.
    Type: Application
    Filed: February 24, 2026
    Publication date: October 1, 2026
    Applicant: NuFlare Technology, Inc.
    Inventors: Yuji FUJIWARA, Shingo MORI, Daisuke HARA, Yuko KAJIWARA
  • Publication number: 20260299431
    Abstract: In one embodiment, a graphic data generation method includes receiving first graphic data in which a plurality of graphics are defined, and adding, in accordance with presence/absence of an adjacent graphic, adjacency information including the presence/absence of the adjacent graphic to each of the plurality of graphics to generate second graphic data to be used in a quantum beam writing device.
    Type: Application
    Filed: January 23, 2026
    Publication date: October 1, 2026
    Applicant: NuFlare Technology, Inc.
    Inventors: Kenichi YASUI, Daisuke HARA
  • Patent number: 12744182
    Abstract: According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a process chamber in which a substrate is processed; a gas supplier through which a process gas is supplied to the process chamber; a plasma generator provided so as to protrude into the process chamber, constituted by a coil and an insulator, and configured to generate a plasma of the process gas in the process chamber; and an adjuster capable of adjusting a gap distance between the coil and the insulator.
    Type: Grant
    Filed: February 16, 2023
    Date of Patent: September 22, 2026
    Assignee: Kokusai Electric Corporation
    Inventors: Tsuyoshi Takeda, Daisuke Hara
  • Patent number: 12740924
    Abstract: [Problem] To provide a dental curable composition having good mechanical property and good storage stability before and after curing. Solution The dental curable composition of the present disclosure comprises (A) polymerizable monomer, (BC) polymerization initiator, (D) polymerization accelerator and (E) filler, wherein, the (BC) polymerization initiator comprises (B) photopolymerization initiator and/or (C) chemical polymerization initiator, the (B) photopolymerization initiator comprises (B1) photosensitizer and (B2) photoacid generator, the (C) chemical polymerization initiator comprises (C1) organic peroxide, the (E) filler comprises (E1) surface-treated basic filler, and the (E1) surface-treated basic filler is treated with (F1) surface treatment agent represented by the formula (1) and/or condensate thereof. (In the formula, M is a metal atom selected from Si, Ti, Zr, and Al, X is H, OH or a hydrolyzable group, and may be the same or different from each other.
    Type: Grant
    Filed: March 11, 2022
    Date of Patent: September 22, 2026
    Assignee: SHOFU INC.
    Inventors: Shunsuke Miyata, Kenzo Yamamoto, Daisuke Hara
  • Patent number: 12739603
    Abstract: A data volume exchange server includes a terminal IF unit configured to receive an exchange request for a contract data volume of an own country and a contract data volume of another country from terminals of subscribers having contract data volumes of telecommunication carriers of countries different from each other, a data volume exchange unit configured to perform matching of a pair in which another country that requests a contract data volume in one of the received exchange requests matches the own country that provides a contract data volume in another of the received exchange requests, and a server IF unit configured to instruct the communication servers of the telecommunication carriers in the countries to transfer a contract data volume of a matched subscriber of the own country as an exchanged data volume of a subscriber of the other country who is a matching partner.
    Type: Grant
    Filed: June 4, 2020
    Date of Patent: September 15, 2026
    Assignee: NTT, Inc.
    Inventors: Daisuke Hara, Keiko Kuriu
  • Publication number: 20260148941
    Abstract: According to the present disclosure, there is provided a technique capable of performing a substrate processing more uniformly. According to one aspect thereof, there is provided an electrode structure capable of generating a plasma, including: a first electrode group constituted by: at least one first electrode to which an electric potential is applied; at least one second electrode whose length is different from that of the first electrode and to which an electric potential is applied; and at least one third electrode to which a reference potential is applied; and a second electrode group constituted by: at least one fourth electrode to which an electric potential is applied; at least one fifth electrode whose length is different from that of the fourth electrode and to which an electric potential is applied; and at least one sixth electrode to which the reference potential is applied.
    Type: Application
    Filed: January 22, 2026
    Publication date: May 28, 2026
    Inventors: Tsuyoshi TAKEDA, Daisuke HARA, Hiroshi NAKAJO, Iichiro TSUCHIKURA
  • Publication number: 20260106109
    Abstract: There is provided a technique that includes: a process chamber in which a substrate is processed; a plurality of first electrodes; a plurality of second electrodes; a high-frequency power supply configured to supply a high-frequency power; a high-frequency power application plate configured to connect the plurality of first electrodes to the high-frequency power supply; and a grounding plate configured to ground the plurality of second electrodes.
    Type: Application
    Filed: November 21, 2025
    Publication date: April 16, 2026
    Applicant: Kokusai Electric Corporation
    Inventors: Daisuke HARA, Tatsuya NISHINO, Tsuyoshi TAKEDA
  • Publication number: 20260050003
    Abstract: A multichannel dispenser 100 includes a plurality of syringes 103 each of which includes a plunger 101 and a housing 102, a drive motor 104 that drives at least one of the plungers 101, tip end portions 106 to which dispensing tips 105 are to be attached, and tubes 107A, 107B causing the syringes 103 and the tip end portions 106 to communicate with each other. The outer diameter 109 of the housing 102 is greater than a pitch distance 108 between the dispensing tips 105, and the plurality of syringes 103 is arranged in multiple lines. Thus, it is possible to increase a plunger diameter as compared to the related art, and to perform dispensing in amounts ranging from a slight amount to a great amount.
    Type: Application
    Filed: September 7, 2022
    Publication date: February 19, 2026
    Inventors: Masashi SHIBAHARA, Daisuke HARA
  • Patent number: 12555752
    Abstract: According to the present disclosure, there is provided a technique capable of performing a substrate processing more uniformly. According to one aspect thereof, there is provided an electrode structure capable of generating a plasma, including: a first electrode group constituted by: at least one first electrode to which an electric potential is applied; at least one second electrode whose length is different from that of the first electrode and to which an electric potential is applied; and at least one third electrode to which a reference potential is applied; and a second electrode group constituted by: at least one fourth electrode to which an electric potential is applied; at least one fifth electrode whose length is different from that of the fourth electrode and to which an electric potential is applied; and at least one sixth electrode to which the reference potential is applied.
    Type: Grant
    Filed: February 17, 2023
    Date of Patent: February 17, 2026
    Assignee: Kokusai Electric Corporation
    Inventors: Tsuyoshi Takeda, Daisuke Hara, Hiroshi Nakajo, Iichiro Tsuchikura
  • Patent number: 12488962
    Abstract: There is provided a technique that includes: a process chamber in which a substrate is processed; a plurality of first electrodes; a plurality of second electrodes; a high-frequency power supply configured to supply a high-frequency power; a high-frequency power application plate configured to connect the plurality of first electrodes to the high-frequency power supply; and a grounding plate configured to ground the plurality of second electrodes.
    Type: Grant
    Filed: December 16, 2022
    Date of Patent: December 2, 2025
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Daisuke Hara, Tatsuya Nishino, Tsuyoshi Takeda
  • Publication number: 20250340991
    Abstract: According to one aspect of the technique, there is provided a substrate processing apparatus including: a process chamber in which a substrate is processed; a first gas supply system configured to supply a first gas onto the substrate in the process chamber and including a plurality of tanks configured to store the first gas, wherein the first gas is heated in the plurality of the tanks; and a controller configured to control the first gas supply system such that the first gas is supplied onto the substrate in the process chamber while switching among the plurality of the tanks.
    Type: Application
    Filed: July 9, 2025
    Publication date: November 6, 2025
    Inventors: Daisuke HARA, Takashi YAHATA, Kenji SHINOZAKI, Kazuhiko YAMAZAKI
  • Patent number: 12463017
    Abstract: According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a process chamber in which a substrates is processed; and a plasma generator including: a first gas supply pipe through which a first gas is supplied; an application electrode to which a high frequency power is applied; a reference electrode to which a reference potential is applied by being grounded; and a light emitting tube by which the first gas is photo-exited.
    Type: Grant
    Filed: February 3, 2023
    Date of Patent: November 4, 2025
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Tsuyoshi Takeda, Daisuke Hara
  • Publication number: 20250338357
    Abstract: There is provided a technique that includes (a) a process tube in which a substrate is accommodated and heat-treated; (b) a plurality of coils that are disposed along a longitudinal direction of the process tube and supplied with radio-frequency power from a power source; and (c) a controller configured to be capable of setting a phase difference between two adjacent coils, among the plurality of coils, to a predetermined value, wherein in (c) the predetermined value is changeable and is set so as to make a temperature discrepancy occurring in a vicinity of a boundary between the two adjacent coils smaller than a temperature discrepancy when the phase difference is set to zero.
    Type: Application
    Filed: March 12, 2025
    Publication date: October 30, 2025
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Mamoru OHISHI, Naoki HARA, Daisuke HARA, Ryoji NOBATA, Susumu HASHIMOTO
  • Patent number: 12400840
    Abstract: There is provided a technique that includes: a process chamber that processes a plurality of substrates; a substrate holder on which the plurality of substrates is supported; an electrode that forms plasma in the process chamber, and auxiliary plate that is disposed between the plurality of substrates and assists formation of the plasma.
    Type: Grant
    Filed: February 3, 2023
    Date of Patent: August 26, 2025
    Assignee: Kokusai Electric Corporation
    Inventors: Tsuyoshi Takeda, Daisuke Hara
  • Patent number: 12385139
    Abstract: According to one aspect of the technique, there is provided a substrate processing apparatus including: a process chamber in which a substrate is processed; a first gas supply system configured to supply a first gas onto the substrate in the process chamber and including a plurality of tanks configured to store the first gas, wherein the first gas is heated in the plurality of the tanks; and a controller configured to control the first gas supply system such that the first gas is supplied onto the substrate in the process chamber while switching among the plurality of the tanks.
    Type: Grant
    Filed: September 4, 2020
    Date of Patent: August 12, 2025
    Assignee: Kokusai Electric Corporation
    Inventors: Daisuke Hara, Takashi Yahata, Kenji Shinozaki, Kazuhiko Yamazaki
  • Publication number: 20250227190
    Abstract: In a first aspect, an image processing apparatus includes an image processor that executes image processing including printing and/or scanning, a presentation unit that presents first authentication information that can be acquired by a wireless communication terminal, a communicator that receives, from the wireless communication terminal through wireless communication with the wireless communication terminal, an image processing instruction instructing execution of the image processing and second authentication information associated with the image processing instruction, and a controller that performs authentication processing of checking whether the received second authentication information matches the presented first authentication information. The controller controls, based on success in the authentication processing, the image processor to execute the image processing corresponding to the received image processing instruction.
    Type: Application
    Filed: March 30, 2025
    Publication date: July 10, 2025
    Inventors: Shingo ITO, Hiroshi OKA, Shigeki TAKAYA, Daisuke HARA
  • Patent number: 12332258
    Abstract: The present invention determines whether or not a mounted tip and a dispensing amount match with each other in order to prevent contamination in a dispensing device. The present invention is provided with a pipette mechanism 108, 109 that performs suction and discharge, a motor 102 that drives the pipette mechanism, and a pressure sensor 113 that detects a pressure of the pipette mechanism. A dispensing tip 110 is mounted to the pipette mechanism. A control computer 116 controls the motor 102, drives the pipette mechanism in a suction or discharge direction, and determines a type of the dispensing tip 110 on the basis of a difference in pressure waveform detected by the pressure sensor 113.
    Type: Grant
    Filed: August 3, 2020
    Date of Patent: June 17, 2025
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Daisuke Hara, Toshiki Yamagata, Masashi Shibahara
  • Publication number: 20250133170
    Abstract: An image processing apparatus includes an operation panel including a display that displays, in juxtaposition, a menu region with function buttons each corresponding to a type of image processing operation are arranged and a history region with history buttons each corresponding to a completed image processing operation are arranged, and an operator that receives an operation on each of the buttons arranged in the menu region and the history region. In the history region, an individual history button that displays information on the completed image processing operation individually per image processing operation and a group history button that displays a group obtained by classifying the completed image processing operation according to a classification condition are arranged in juxtaposition. The display displays, in the history region, classification information that is information indicating the classification condition and that is associated with the group history button.
    Type: Application
    Filed: December 27, 2024
    Publication date: April 24, 2025
    Inventors: Hiroshi OKA, Shingo ITO, Daisuke HARA
  • Publication number: 20240412987
    Abstract: There is provided a substrate processing apparatus, comprising: a reaction tube in which a substrate is processed; and a plurality of electrodes including at least one first electrode to which a predetermined potential is applied and at least one second electrode to which a reference potential is applied. Two or more of the at least one first electrode or the at least one second electrode are arranged side-by-side in a cross sectional view perpendicular to a vertical direction of the reaction tube.
    Type: Application
    Filed: August 19, 2024
    Publication date: December 12, 2024
    Applicant: Kokusai Electric Corporation
    Inventors: Tsuyoshi TAKEDA, Daisuke HARA
  • Publication number: 20240369590
    Abstract: The dispensing apparatus is able to dispense liquid and includes: a piston; a first drive device that drives the piston; a syringe that has a tip mounting unit to which a dispensing tip is mounted and that receives the piston therein; a pressure sensor that measures pressure within the syringe; a processing device that processes a detection signal of the pressure measured by the pressure sensor; a block having a hole which can be fitted to the tip mounting unit; and a second drive device that varies the relative position between the syringe and the block. The processing device is characterized by: driving the second drive device so as to cause the tip mounting unit and the hole to be fitted to each other; sealing up the interior of the syringe; applying a positive pressure or a negative pressure within the syringe; and then, calculating a correction value.
    Type: Application
    Filed: September 14, 2021
    Publication date: November 7, 2024
    Inventors: Daisuke HARA, Masashi SHIBAHARA, Nobutaka KUMAZAKI