Patents by Inventor Daisuke Hara

Daisuke Hara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180204742
    Abstract: A substrate processing apparatus, includes: a process chamber accommodating a substrate; a vaporizer vaporizing a liquid precursor to generate reaction gas and deliver a processing gas containing the reaction gas and a carrier gas, the vaporizer including: a vaporization vessel; and a heater heating the liquid precursor introduced into the vessel; a carrier gas flow rate controller controlling flow rate of the carrier gas supplied to the vaporizer; a liquid precursor flow rate controller controlling flow rate of the liquid precursor; a processing gas supply pipe introducing the processing gas delivered from the vaporizer into the process chamber; and a gas concentration sensor detecting a gas concentration of the reaction gas contained in the processing gas delivered from the vaporizer into the processing gas supply pipe.
    Type: Application
    Filed: March 13, 2018
    Publication date: July 19, 2018
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto TATENO, Daisuke HARA, Masahisa OKUNO, Takuya JODA, Takashi TSUKAMOTO, Akinori TANAKA, Toru KAKUDA, Sadayoshi HORII
  • Publication number: 20180113347
    Abstract: A conductive sheet for a touch panel having an active area includes a first conductive layer that is formed of a first thin metal wire disposed in the active area; and a second conductive layer that is formed of a second thin metal wire disposed to overlap with the first conductive layer in the active area, in which a mesh pattern is formed of the first thin metal wire and the second thin metal wire in a case where the conductive sheet is seen from a direction perpendicular to the active area, the mesh pattern is a random pattern, an average line width of the first thin metal wire and the second thin metal wire is 0.5 ?m to 3.5 ?m, and an opening ratio of the mesh pattern is (92.3+X×1.6)% to 99.6%. X represents the average line width of the first and the second thin metal wire.
    Type: Application
    Filed: December 21, 2017
    Publication date: April 26, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke HARA, Hiroshige NAKAMURA, Kensuke KATAGIRI, Masaya NAKAYAMA
  • Publication number: 20180107304
    Abstract: A plurality of regular triangles T having one side length L0 are tightly disposed (A). An apex A of each of the regular triangles T is moved using a random number in a movement tolerance R range to create a new apex B, and the new apexes B are connected to form a plurality of triangles having a random shape (B, C, D). A circumcenter E of each of the triangles is obtained (E). Arbitrary points F at distances, which are less than ½ of radii of circumscribed circles of the triangles, from the circumcenters E are connected to form second cells C2 of a second mesh pattern M2 (F, G, H, I). At least portions of triangles adjacent each other among the triangles are merged to form polygons, and first cells C1 of a first mesh pattern M1 including the triangles and the polygons are formed (J).
    Type: Application
    Filed: December 5, 2017
    Publication date: April 19, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke Hara, Hiroshige Nakamura, Kensuke Katagiri, Masaya Nakayama
  • Patent number: 9668943
    Abstract: A dental conditioning composition that enhances the adhesiveness of any dental material for a tooth surface by suppressing any excessive demineralization for the tooth surface and improving the polymerization activity of a dental adhesive composition by causing a polymerization catalyst included in the dental conditioning composition of the present invention to remain on the tooth surface. A dental conditioning composition having a gel character, that includes a polymerization catalyst, an acidic compound, water, and a thickening agent, and whose pH (the hydrogen ion exponent) is in a range from 0.1 to 0.9.
    Type: Grant
    Filed: July 27, 2015
    Date of Patent: June 6, 2017
    Assignee: KABUSHIKI KAISHA SHOFU
    Inventors: Kazuya Shinno, Akihiro Nagafuji, Shingo Tateishi, Daisuke Hara, Yoshiyuki Jogetsu
  • Publication number: 20170071831
    Abstract: A primer composition for a resin cured material according to the present disclosure comprising (A) a polymerizable monomer having a solubility parameter (an SP value) in the range of from 7.0 to 10.0, (B) a volatile organic solvent, (C) a polymerization catalyst and/or a polymerization accelerator, and (D) a polymerizable monomer having at least two polymerizable group.
    Type: Application
    Filed: September 14, 2016
    Publication date: March 16, 2017
    Applicant: SHOFU INC.
    Inventors: Daisuke HARA, Naoya KITADA
  • Patent number: 9530677
    Abstract: A substrate processing apparatus comprises a processing chamber for storing a substrate and performing a specified processing on the substrate, a substrate holding jig for holding the substrate in the processing chamber, a placement stand capable of moving the substrate holding jig inside and outside the processing chamber while mounting the substrate holding jig, a substrate holding jig movement mechanism for moving the substrate holding jig to a location different from the placement stand while holding the substrate holding jig, and a substrate holding jig movement suppression mechanism for suppressing vertical and horizontal movement of the substrate holding jig in order to keep the substrate holding jig mounted on the placement unit of the substrate holding jig movement mechanism.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: December 27, 2016
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Takatomo Yamaguchi, Akinori Tanaka, Daisuke Hara
  • Patent number: 9511005
    Abstract: A single-paste, self-adhesive dental curable composition that has strong self-adhesion to biological hard tissues (such as enamel and dentin of teeth) and good color tone adaptability suitable for use for aesthetic restoration is provided. A dental curable composition contains: an inorganic particle (A) with an average grain size in the range of 0.1 to 50 ?m; an inorganic particle (B) with an average grain size in the range of 0.1 to 50 ?m; a polymerizable monomer (C); and a polymerization catalyst (D). The refractive index na of the inorganic particle (A) and the refractive index nb of the inorganic particle (B) meet the relationship of na>nb. A cured resin material (E), which is obtained by curing a polymerizable composition containing the polymerizable monomer (C) and the polymerization catalyst (D), has a refractive index ne that meets the relationship (1): 0?|na?ne|<0.01?ne?nb?0.05??(1).
    Type: Grant
    Filed: March 25, 2014
    Date of Patent: December 6, 2016
    Assignee: SHOFU INC.
    Inventors: Toshiyuki Nakatsuka, Kazuya Shinno, Satoshi Fujiwara, Daisuke Hara
  • Publication number: 20160213576
    Abstract: The present invention relates to a deagglomerated glass filler for sustained ion release for imparting ion sustained-release property to a dental material for use in the dental field. The dental material means a material for use in filling, prosthetic repair, temporary sealing, temporary bonding, preparation of a prosthetic appliance, adhesion/luting, pit and fissure sealing, or the like in a dental treatment. A glass filler for sustained ion release that sufficiently continuously releases a metal ion present in a glass composition as compared with a conventional glass filler for sustained ion release has been demanded in the field of a dental material. Such an object is achieved by a glass filler for sustained ion release that is obtained by performing a silane compound treatment step and an acidic polymer treatment step and that is controlled to satisfy a specific D50 particle size relationship in each of the steps.
    Type: Application
    Filed: January 20, 2016
    Publication date: July 28, 2016
    Applicant: SHOFU INC.
    Inventors: Daisuke Hara, Toshiyuki Nakatsuka, Yusei Kadobayashi
  • Publication number: 20160030294
    Abstract: Problem An object of the present invention is to provide a dental conditioning composition that enhances the adhesiveness of any dental material for a tooth surface by suppressing any excessive demineralization for the tooth surface and improving the polymerization activity of a dental adhesive composition by causing a polymerization catalyst included in the dental conditioning composition of the present invention to remain on the tooth surface. Solution A dental conditioning composition having a gel character, that includes a polymerization catalyst, an acidic compound, water, and a thickening agent, and whose pH (the hydrogen ion exponent) is in a range from 0.1 to 0.9.
    Type: Application
    Filed: July 27, 2015
    Publication date: February 4, 2016
    Inventors: Kazuya SHINNO, Akihiro NAGAFUJI, Shingo TATEISHI, Daisuke HARA, Yoshiyuki JOGETSU
  • Publication number: 20150342838
    Abstract: To provide a dental composition wherein the acid buffering capacity can be attained and the acid resistance of the tooth substance can be improved while maintaining very high foul breath inhibition capacity. A dental composition including: ion sustained-release glass; and a carrier for supporting the ion sustained-release glass, wherein the ion sustained-release glass is fluoroaluminoborosilicate glass having a composition range of: 15% to 35% by mass SiO2; 15% to 30% by mass Al2O3; 5% to 20% by mass B2O3; 20% to 45% by mass SrO; 5% to 15% by mass F; and 0% to 10% by mass Na2O.
    Type: Application
    Filed: January 9, 2015
    Publication date: December 3, 2015
    Inventors: Daisuke HARA, Yuji SADAKANE, Katsura ISHIKAWA, Hidefumi FUJIMURA, Shuji SAKAMOTO, Akihiro NAGAFUJI, Toshiyuki NAKATSUKA
  • Patent number: 9082694
    Abstract: A substrate processing apparatus includes: a processing chamber that accommodates a substrate; a heating portion that is provided so as to surround a accommodating region of the substrate within the processing chamber; a gas nozzle that is provided inside the heating portion and that supplies a processing gas to the accommodating region of the substrate; and a gas heating mechanism that is provided inside the heating portion and that supplies the processing gas from an upstream side of the gas nozzle into the gas nozzle. A ratio of a flow channel circumferential length to a flow channel cross-sectional area in a gas flow channel of the gas heating mechanism is larger than a ratio of a flow channel circumferential length to a flow channel cross-sectional area in a gas flow channel of the gas nozzle.
    Type: Grant
    Filed: February 22, 2012
    Date of Patent: July 14, 2015
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Shuhei Saido, Daisuke Hara, Takafumi Sasaki
  • Patent number: 9084298
    Abstract: There are provided a substrate processing apparatus capable of suppressing leakage of magnetic field during processing of a substrate.
    Type: Grant
    Filed: February 24, 2011
    Date of Patent: July 14, 2015
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Yukitomo Hirochi, Akinori Tanaka, Akihiro Sato, Takeshi Itoh, Daisuke Hara, Kenji Shirako, Kazuhiro Morimitsu, Masanao Fukuda
  • Patent number: 9028614
    Abstract: When processing such as SiC epitaxial growth is performed at an ultrahigh temperature of 1500° C. to 1700° C., a film-forming gas can be decreased to heat-resistant temperature of a manifold and film quality uniformity can be improved. A substrate processing apparatus includes a reaction chamber for processing a plurality of substrates, a boat for holding the plurality of substrates, a gas supply nozzle for supplying a film-forming gas to the plurality of substrates, an exhaust port for exhausting the film-forming gas supplied into the reaction chamber, a heat exchange part which defines a second flow path narrower than a first flow path defined by an inner wall of the reaction chamber and the boat, and a gas discharge part installed under the lowermost substrate of the plurality of substrates.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: May 12, 2015
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Daisuke Hara, Takeshi Itoh, Masanao Fukuda, Takatomo Yamaguchi, Hiroaki Hiramatsu, Shuhei Saido, Takafumi Sasaki
  • Patent number: D741823
    Type: Grant
    Filed: January 9, 2014
    Date of Patent: October 27, 2015
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto Tateno, Daisuke Hara, Masahisa Okuno, Takuya Joda
  • Patent number: D778457
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: February 7, 2017
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Daisuke Hara, Hideto Tateno
  • Patent number: D778458
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: February 7, 2017
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto Tateno, Daisuke Hara
  • Patent number: D788038
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: May 30, 2017
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto Tateno, Daisuke Hara
  • Patent number: D788704
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: June 6, 2017
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Hideto Tateno, Daisuke Hara
  • Patent number: D788705
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: June 6, 2017
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto Tateno, Daisuke Hara
  • Patent number: D788706
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: June 6, 2017
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Hideto Tateno, Daisuke Hara