Abstract: The refrigerator includes: a cooling-water line having a cooling-water pump to thereby send water for cooling a refrigerant inside of a condenser; a lubricating-water supply line connecting the part downstream from the cooling-water pump on the cooling-water line and a compressor 4 and supplying water flowing through the cooling-water line as a lubricant to the compressor 4; and a backup portion supplying water to the lubricating-water supply line instead of supplying water from the cooling-water line when the cooling-water pump is not driven.

Abstract: An axial flow compressor includes: an electric motor including a rotating shaft; a compression portion including a driving shaft connected without a speed-up gear to the rotating shaft of the electric motor and a rotor rotating together with the driving shaft, the compression portion driving the driving shaft and thereby compressing a working fluid; and a velocity reducing portion having a space for reducing the flow velocity of a working fluid discharged from a discharge opening of the compression portion. The rotating shaft of the electric motor is connected to the end of the driving shaft on the side of the discharge opening; and the velocity reducing portion is disposed so as to surround the electric motor.

Abstract: In the condenser provided with two of the degassing chambers separated by a cooling fluid, communication between the degassing chambers is prevented even if a pressure difference is increased between the degassing chambers.

Abstract: The present invention is a cooling block that forms an electrode for generating a plasma for use in a plasma process, and includes a channel for a cooling liquid, the cooling block comprising: a first base material and a second base material respectively made of aluminum, at least one of the first and second base materials having a recess for forming a channel for a cooling liquid; and a diffusion bonding layer, in which zinc is diffused in aluminum, and an anti-corrosion layer of a zinc oxide film, the layers being formed by interposing zinc between the first and second base materials, and by bonding the first and second base materials with zinc interposed therebetween in a heating atmosphere containing oxygen.

Abstract: A substrate stage includes a stage upon which a wafer is placed, a heater element installed within the stage, an upright support that ranges upright from a bottom of a processing chamber and includes a tubular member that includes a small tube portion, a large tube portion and a middle portion attached to and joins the small tube portion and the large tube portion to one another, an outer heat shield plate disposed so as to surround the outer side of the small tube portion and an inner heat shield plate. The outer heat shield plate and the inner heat shield plate are disposed so that an inner edge of the outer heat shield plate and an outer edge of the inner heat shield plate overlap along the entire circumference.

Abstract: The disclosure provides a spectrophotometer, including a light source for irradiating light into a sample gas, a photodetector for detecting light transmitted through the sample gas, an optical filter, and an operation device for calculating a concentration of an actual gas to be measured, contained in the sample gas based on a detection signal value obtained from the photodetector. The operation device calculates the concentration of the actual gas based on function a for associating a concentration of a substitute gas with the actual gas obtained from a reference instrument, function ? for associating a relation between a light absorption of the actual gas and the substitute gas in the reference instrument, with a relation between a light absorption of the actual gas the substitute gas in a calibration instrument, and a function indicating a relation between the concentration of the substitute gas and the detection signal value.

Abstract: An electrode having a gas discharge function, where the degree of freedom related to a maximum gas flow rate is abundant, an electrode cover member may be thinned, and a change of a gas behavior according to time is difficult to be generated in a processing chamber during gas introduction. The electrode includes: a base material having a plurality of gas holes; and an electrode cover member having a plurality of gas holes respectively corresponding to the plurality of gas holes of the base material in a one-to-one manner, fixed to the base material, and disposed facing a processing space in which the object is plasma-processed, wherein a gas hole diameter of the electrode cover member is larger than a gas hole diameter of the base material.

Abstract: The present invention provides a liquid crystal panel that can provide a neutral display that is free from coloring in every direction. The liquid crystal panel includes a first polarizer 14a, a second polarizer 14b, and a liquid crystal cell 13. The first polarizer 14a is arranged on the visible side of the liquid crystal cell 13 and the second polarizer 14b is arranged on the backlight side of the liquid crystal cell 13. The liquid crystal panel further includes a first retardation layer 11 and a second retardation layer 12. A refractive index ellipsoid of the first retardation layer 11 has a relationship of nx=ny>nz, and a refractive index ellipsoid of the second retardation layer 12 has a relationship of nx>ny?nz. The first retardation layer 11 and the second retardation layer 12 are arranged between the liquid crystal cell 13 and the second polarizer 14b.

Abstract: A recording system includes a controller configured to write content data on at least first and second storage media, in parallel with each other. If there is a period in which the content data has failed to be written on the first storage medium but has been written successfully on the second storage medium, the controller finds, on the first storage medium, a storage space, of which the size is equal to or greater than that of partial data that is the content data that has been written successfully on the second storage medium during the period, and writes recovery information on one or more storage media other than the first storage medium. The recovery information includes some pieces of information to identify the first storage medium, to specify the storage space, and to define an area on the second storage medium on which the partial data has been written.

Abstract: [Problem] To provide a substrate processing apparatus capable of preventing adherence of hydrogen fluoride to an inner surface the like of a chamber. [Means for Solving] An apparatus housing and processing a substrate W in a chamber includes a hydrogen fluoride gas supply path 61 for supplying a hydrogen fluoride gas into a chamber 40, wherein a part or whole of an inner surface of the chamber 40 is formed of Al or Al alloy which has not been subjected to surface oxidation treatment. The chamber 40 includes a lid 52 closing an upper opening of a chamber main body 51, and at least an inner surface of the lid 52 is formed of the Al or Al alloy which has not been subjected to alumite treatment.

Abstract: A substrate processing apparatus that can reduce the number of parts. A first gas introduction hole through which the hydrogen fluoride gas is introduced into a GDP is formed in an upper lid. A second gas introduction hole through which hydrogen fluoride gas is introduced from a hydrogen fluoride gas source is formed in a processing vessel. When the upper lid engages the upper portion of the processing vessel, one end of the first gas introduction hole is joined with one end of the second gas introduction hole to form an introduction path through which the hydrogen fluoride gas is introduced into a chamber.

Abstract: A substrate processing method capable of preventing a reduction in productivity of the fabrication of a semiconductor device from a substrate. An HF gas is supplied toward a wafer having a thermally-oxidized film, a BPSG film, and a deposit film, to thereby selectively etch the BPSG film and the deposit film using fluorinated acid. A residual matter of H2SiF6 produced at the time of etching is decomposed into HF and SiF4 by being heated.

Abstract: A projector includes: a light source; a polarization conversion element array having an entrance surface on which an effective entrance area and an ineffective entrance area are disposed to form stripes; a modulation device adapted to modulate a linearly polarized light beam emitted from the polarization conversion element array in accordance with an image signal; a projection device adapted to project the modulated light beam; a first light shielding section, a part of the entrance surface being provided with the first light shielding section adapted to shield a part of the incident light beam to the effective entrance area; and a first opening section, the first opening section being another area of the entrance surface than the part provided with the first light shielding section, at least a part of the first opening section reaches an end of the entrance surface.

Abstract: Electric field intensity distribution of a high frequency power for plasma generation can be controlled without generating abnormal electric discharge. There is provided an electrode for a plasma processing apparatus capable of supplying a gas. The electrode may include a base member 105a made of a dielectric material and having therein a certain space U; a cover 107 for airtightly sealing the space U and isolating the space U from a plasma generation space when the electrode is installed at the plasma processing apparatus; and multiple gas hole tubes 105e passing through the cover member 107, the space U and the base member 105a. Each gas hole tube has a gas hole isolated from the space U.

Abstract: There is provided a data structure production method for producing a multilevel directory structure in a backup device. The multilevel directory structure includes target data having at least one of video data and audio data. The data structure production method includes producing a first directory that establishes a first directory hierarchy, producing at least one second directory that establishes a second directory hierarchy lower than the first directory hierarchy wherein the target data is stored in the at least one second directory, and storing the at least one second directory in the first directory provided the first directory is less than or equal to a predetermined size.

Abstract: A partial pressure control system 45 includes two valves 2 which are branched from an operation gas supply pipe 44 and which variably control operation gas, pressure sensors 3 which are respectively connected to the each valves 2 in series and which detect pressure of the operation gas, and a controller 25 which proportionally controls the operation of the valves 2 based on detection result of the pressure sensors 3, thereby relatively controlling pressures P1 and P2 of the two valves. With this configuration, it is possible to reduce wastefull consumption of the operation gas, and to enhance the responsivity with respect to change of setting and the like.

Abstract: A planar heater 1 in which a power supply terminal unit 108 which supplies an electric power is arranged on a central portion on a lower surface of a silica glass plate-like member 102. The power supply terminal unit includes small-diameter silica glass tubes 105a and 106a, which contain a connection line which supplies an electric power to a carbon heat generator and a large-diameter silica glass tube 2 which contains the small-diameter silica glass tubes 105a and 106a. A flange portion 2a is formed on a lower end of the large-diameter silica glass tube 2, and a bent portion 2b having different diameters is formed between an upper end of the large-diameter silica glass and the flange portion 2a, and the first heat shielding plates 19, 20 and 21 configured by metal plates or opaque silica glass plates are contained in the large-diameter silica glass tube below the bent portion.

Abstract: There is provided a processing method for performing a recovery process on a damaged layer formed on a surface of a low-k film of a target substrate by introducing a processing gas containing a methyl group into a processing chamber. The method includes: increasing an internal pressure of the processing chamber up to a first pressure lower than a processing pressure for the recovery process by introducing a dilution gas into the processing chamber maintained in a depressurized state; then stopping the introduction of the dilution gas, and increasing the internal pressure of the processing chamber up to a second pressure as the processing pressure for the recovery process by introducing the processing gas into a region where the target substrate exists within the processing chamber; and performing the recovery process on the target substrate while the processing pressure is maintained.

Abstract: A plasma processing apparatus includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the plasma generation chamber from the processing chamber. The barrier wall member assumes a fin structure achieved by disposing in a radial pattern numerous plate-like fin members extending from a central area thereof toward a peripheral edge. An upper end portion of each fin member overlaps a lower end portion of an adjacent fin member. The fin members are disposed with gaps formed between them and are made to range upward with a tilt along the circumferential direction.

Abstract: A magnetron plasma processing apparatus has a baffle plate interposed between a processing space and a gas exhaust port so as to confine a plasma in the processing space in a processing chamber. The baffle plate has through holes allowing the processing space and the gas exhaust port to communicate with each other. The baffle plate is provided along lines of magnetic force of a magnetic field at a position where the plate is located.