Abstract: A harness outlet structure of an engine permitting a reliable shield at a harness outlet of the engine. The structure includes a wiring harness is clamped by a shield cover and an engine main body via a grommet bracket. The grommet bracket includes a groove having a width equivalent to the thickness of the shield cover disposed circumferentially between two flange portions of the grommet bracket. A harness overall for shielding the wiring harness is mounted externally on a proximal end of the grommet bracket. The harness overall is a shield outer jacket body formed from braided metal fibers. The harness overall is inserted over an outside of the proximal end of the grommet bracket until one end of the harness overall contacts the flange portion. The harness overall is then joined by a coupling ring.

Abstract: In a plasma processing apparatus capable of generating a plasma in a processing chamber accommodating therein a substrate to plasma-process the substrate, a component disposed in the processing chamber includes an identification indicia formed with one or more symbols indicated by arranging a plurality of dotted recesses on a surface of the component. The dotted recesses are of a substantially circular shape in a plane view and a substantial U-shape in a sectional view. The life span of the component can be detected based on a status of the identification indicia.

Abstract: The present invention provides a button including a button body 10 and a fixture 40 for fixing the button body to fabric. The button body 10 includes a shell member 11 constituting a button outer shell and an accommodation member 31. The shell member 11 includes a button cover 22 and a neck 14 formed cylindrically on the back side of the button cover 22 and having an opening 17 at an outer edge thereof. The accommodation member 31 has a shaft 33 accommodated in the neck with a portion thereof protruding from the opening, and an insert hole 34 formed on the protruding end face of the shaft for the fixture to be inserted therein. Crimping parts 18 are formed on one of the inner periphery of the opening or on the outer peripheral surface of the shaft at specified positions with a prespecified space therebetween along the circumferential direction so as to crimp into the other.

Abstract: A tuner has a dual AGC function, and frequency-converts an input signal into an IF signal. An orthogonal detector calculates a complex signal from the IF signal. A demodulator demodulates a digital signal from the complex signals. An error corrector corrects the error of the digital signal. A signal level detector calculates a level judgment signal from the IF signal. A demodulation level detector detects a signal level of a demodulation signal on a desired band from an output signal of the demodulator. When a demodulation level judgment unit generates a judgment signal representing an influence from interference waves in adjacent channel affecting on a signal on the desired band from the demodulation signal, a control signal generator feeds back a gain control signal to the tuner in accordance with the judgment signal.

Abstract: Disclosed is an OFDM signal receiving apparatus for diversity reception, with a plurality of antennas, of an OFDM signal containing Y sub-carriers, where 2X?1<Y<2X and X>1. The OFDM signal receiving apparatus includes a plurality of receiving systems, and a diversity processing unit connected to the receiving systems and fed with sequences of data on sub-carriers demodulated by the respective receiving systems. At least one of the receiving systems includes an FFT circuit for Fast Fourier transforming, in parallel, only a sequence of data on 2Z sub-carriers contained in the OFDM signal received with a corresponding antenna, where X>Z. The diversity processing unit performs a diversity process on sequences of data on sub-carriers, out of all the Y sub-carries, redundantly demodulated.

Abstract: The lower end of a filler tube is attached to a service hole formed on a cylinder block in a horizontally opposed engine on a rear side of the engine, e.g., on side opposite from which an output shaft projects. The filler tube is provided with an elbow at the lower end thereof, and the elbow is integrally formed with a hole cover. When one end of the elbow is inserted into the service hole and the hole cover is fixed to the cylinder block, the connection of the filler tube and closing of the service hole can be simultaneously accomplished. The filler tube extends upward and a cap is attached on the filler port at the upper end facing toward the vicinity of the lid provided on the cowl 20. The lid 21 is not deformed locally, and forms a curved surface continuing from remaining portion of the cowl 20.

Abstract: An address determination circuit makes an address determination of an optical packet to which a destination address and a source address are assigned on a bit-by-bit basis. The address determination circuit has an optical branching section which divides the optical packet into branches, in which each of the branched optical packet contains the same original data, a delay section which delays at least one of the branched optical packets, a bit determination section which determines each bit value of the branched optical packets, and a logic operation section which performs a logic operation on the bit values of the branched optical packets determined by the bit determination section. The delay section delays the branched optical packets so that the logic operation section performs the logic operation on a bit assigned the destination address or the source address and a bit having a predetermined bit value in synchronization with each other.

Abstract: Installed in a vacuum chamber is a mounting table for supporting semiconductor wafer, which is a substrate to be treated, with an electron beam irradiation mechanism mounted on the ceiling of the vacuum chamber for generating electron beams. The mounting table is adapted to be vertically moved by a lifting/lowering device, allowing the distance between the electron beam irradiating mechanism and the semiconductor wafer to be set at a desired value. This makes it possible to perform a uniform satisfactory treatment over the entire surface of the substrate to be treated.

Abstract: A plasma processing apparatus includes a processing chamber having a ceiling and a sidewall, a susceptor, disposed in the processing chamber, for mounting thereon an object to be processed, a processing gas supply mechanism for supplying a processing gas through the ceiling to generate a plasma, an exhaust plate that is disposed between the susceptor and the sidewall and has a plurality of holes, a gas exhaust unit for exhausting a gas from under the susceptor through the exhaust plate, and a fin structure having plural fins arranged at regular intervals, which is disposed as protruded from the sidewall, at least, in a region extending from a top end portion of the sidewall to a region of a same height as that of a mounting surface of the susceptor for mounting the object thereon.

Abstract: A pressure sensing port includes an inner block airtightly attached to an inside of a port attachment opening and having a first through hole extending along the axis of the port attachment opening and an intermediate block airtightly attached adjacently to an axially outer surface of the inner block. The intermediate block has a second hole extending through axially in a position where the second through hole is not superposed on the first through hole and communicating with the first through hole through a gap formed between the inner block and the intermediate block. An outer block is airtightly attached between the inner block and intermediate block and has a third through hole extending axially in a position where the third through hole is not superposed on both the first and the second through hole and communicating with the first and the second through hole.

Abstract: A thermally sprayed member or an electrode includes a basic material, a thermally sprayed film formed on the surface of the basic material, the thermally sprayed film being made of an insulating ceramic and a metallic intermediate layer provided between the basic material and the thermally sprayed film for increasing a bonding force therebetween, wherein the thermally sprayed film side of the member is exposed to a high frequency plasma atmosphere and the electrode is intended to form a high frequency plasma on the side of the thermally sprayed film. The basic material includes a base portion made of a conductive material and a dielectric portion provided to include a part of a surface of the basic material. Further, the intermediate layer is comprised of a plurality of island-shaped parts isolated from each other.

Abstract: An optical logic device performs a logic operation on a plurality of input light signals. The optical logic device has a photoelectric conversion portion, in which photoreceivers for receiving input light signals are provided in parallel, that outputs an electric signal obtained by adding up outputs of the photoreceivers, and a comparator that compares a voltage level of the electric signal outputted from the photoelectric conversion portion with a predetermined voltage level.

Abstract: A photoelectric apparatus has a phototransistor which receives a light signal and in which a collector current thereof varies according to intensity of the received light signal, and a transistor in which a collector current thereof varies according to a base voltage thereof. The phototransistor and the transistor constitute a differential amplification circuit. At least one of the phototransistor and the transistor outputs an electric signal.

Abstract: A magnetron plasma processing apparatus has a baffle plate interposed between a processing space and a gas exhaust port so as to confine a plasma in the processing space in a processing chamber. The baffle plate has through holes allowing the processing space and the gas exhaust port to communicate with each other. The baffle plate is provided along lines of magnetic force of a magnetic field at a position where the plate is located.

Abstract: A partial pressure control system 45 includes two valves 2 which are branched from an operation gas supply pipe 44 and which variably control operation gas, pressure sensors 3 which are respectively connected to the each valves 2 in series and which detect pressure of the operation gas, and a controller 25 which proportionally controls the operation of the valves 2 based on detection result of the pressure sensors 3, thereby relatively controlling pressures P1 and P2 of the two valves. With this configuration, it is possible to reduce wastefull consumption of the operation gas, and to enhance the responsivity with respect to change of setting and the like.

Abstract: The present invention relates to a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a plasma process to an object to be processed arranged in the processing container. The plasma processing apparatus of the present invention includes: an electrode unit arranged in the processing container, the electrode unit having an electrode for applying the radio frequency power, and a space portion arranged in the electrode unit, the space portion insulating the electrode and the processing container from each other. The space portion is communicated with an atmospheric air outside the processing container.

Abstract: The lower end of a filler tube is attached to a service hole formed on a cylinder block in a horizontally opposed engine on a rear side of the engine, e.g., on side opposite from which an output shaft projects. The filler tube is provided with an elbow at the lower end thereof, and the elbow is integrally formed with a hole cover. When one end of the elbow is inserted into the service hole and the hole cover is fixed to the cylinder block, the connection of the filler tube and closing of the service hole can be simultaneously accomplished. The filler tube extends upward and a cap is attached on the filler port at the upper end facing toward the vicinity of the lid provided on the cowl 20. The lid 21 is not deformed locally, and forms a curved surface continuing from remaining portion of the cowl 20.

Abstract: A processing apparatus for performing a process on a surface of an object to be processed by applying a high frequency power to an electrode installed in an airtight processing chamber to convert a processing gas introduced therein into a plasma, includes a thermal transfer gas feed pathway for supplying a thermal transfer gas for controlling a temperature of the object to be processed to a minute space between the object to be processed and a holding unit installed on the electrode for attracting and holding the object to be processed through an inner portion of an insulating member disposed under the electrode. A portion of the thermal transfer gas feed pathway, which passes through the inner portion of the insulating member, is formed in a zigzag shape or a spiral shape with respect to a normal direction of a holding surface of the holding unit.

Abstract: An upper electrode for use in generating a plasma of a processing gas includes a cooling block having a coolant path for circulating a coolant therethrough and one or more through holes for passing the processing gas therethrough, an electrode plate having one or more injection openings for injecting the processing gas toward the substrate to be processed mounted on the mounting table, and an electrode frame installed at an upper portion of the cooling block and providing a processing gas diffusion gap for diffusing the processing gas between the cooling block and the electrode frame. The electrode plate is detachably fixed to a bottom surface of the cooling block via a thermally conductive member having flexibility.

Abstract: In a plasma processing apparatus that executes plasma processing on a semiconductor wafer placed inside a processing chamber by generating plasma with a processing gas supplied through a gas supply hole at an upper electrode (shower head) disposed inside the processing chamber, an interchangeable insert member is inserted at a gas passing hole at a gas supply unit to prevent entry of charged particles in the plasma generated in the processing chamber into the gas supply unit. This structure makes it possible to fully prevent the entry of charged particles in the plasma generated inside the processing chamber into the gas supply unit.