Abstract: A gripping device includes a side supporting unit supporting or releasing a side of a workpiece, a plurality of pusher members pushing the workpiece downward, and a pusher member shifting unit shifting the pusher members in a direction toward or away from the workpiece. An engaging pin to be engaged with a through-hole created in the workpiece is disposed inside at least one of the pusher members.

Abstract: The disclosure provides a method comprising (1) conducting a PCR using a nucleic acid sample obtained from the subject as the template, a forward primer having a nucleic acid sequence of a part of exon 1 of the BCR gene, and a reverse primer having a nucleic acid sequence complementary to a part of exons 2 to 11 of the ABL1 gene, in the presence of a modified nucleic acid having a nucleic acid sequence of a part of exons 2 to 14 of the BCR gene or a nucleic acid sequence complementary thereto; and (2) determining that the subject has the minor BCR-ABL1 gene when the nucleic acid amplification is occurred in the PCR.

Abstract: A gripping device includes a side supporting unit supporting or releasing a side of a workpiece, a plurality of pusher members pushing the workpiece downward, and a pusher member shifting unit shifting the pusher members in a direction toward or away from the workpiece. An engaging pin to be engaged with a through-hole created in the workpiece is disposed inside at least one of the pusher members.

Abstract: The present invention provides a means for efficiently amplifying the exons of PKD1 and PKD2 genes, and a primer set that can amplify all the exons of PKD1 and PKD2 genes under a single set of PCR conditions.

Abstract: A method for quantifying the expression level of human WT1 mRNA conveniently, in a short period of time, and with high sensitivity is provided. The method can be used for diagnosing cancer, such as leukemia and solid cancer, or for determining when to perform bone marrow transplantation. The method is for quantifying the expression level of human WT1 mRNA by one-step RT-PCR and comprises simultaneously subjecting the human WT1 mRNA and a housekeeping gene (mRNA) to reverse transcription and extension reactions carried out sequentially in the same vessel.

Abstract: The present invention provides a means for efficiently amplifying the exons of PKD1 and PKD2 genes, and a primer set that can amplify all the exons of PKD1 and PKD2 genes under a single set of PCR conditions.

Abstract: The device for assisting determination of pathology of a polycystic kidney disease according to the present invention has an extraction means 21 for extracting gene mutation information in a region related to polycystic kidney disease using sequence data showing gene sequences of a test subject; an acquisition means 22 for acquiring, using the extracted gene mutation information, medical information corresponding to the extracted gene mutation from a plurality of databases in which gene mutation and medical information are associated with each other; and a list display means 23 for displaying a list containing the extracted gene mutation information and the obtained medical information.

Abstract: The present invention provides a monoclonal antibody that specifically binds to acid-fast bacillary lipoarabinomannan, particularly tubercle bacillary lipoarabinomannan, the antibody being set forth below: (A) a monoclonal antibody comprising a heavy chain variable region and a light chain variable region joined via a linker, the heavy chain variable region comprising heavy chains CDR1 to CDR3 shown in (a) to (c) below, and the light chain variable region comprising light chains CDR1 to CDR3 shown in (d) to (f) below: (a) heavy chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 1, (b) heavy chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 2, (c) heavy chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 3, (d) light chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 4, (e) light chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 5, and (f) light chain CDR1 consisting of the amino acid sequence set fo

Abstract: A method for quantifying the expression level of human WT1 mRNA conveniently, in a short period of time, and with high sensitivity is provided. The method can be used for diagnosing cancer, such as leukemia and solid cancer, or for determining when to perform bone marrow transplantation. The method is for quantifying the expression level of human WT1 mRNA by one-step RT-PCR and comprises simultaneously subjecting the human WT1 mRNA and a housekeeping gene (mRNA) to reverse transcription and extension reactions carried out sequentially in the same vessel.

Abstract: The present invention provides a monoclonal antibody that specifically binds to acid-fast bacillary lipoarabinomannan, particularly tubercle bacillary lipoarabinomannan, the antibody being set forth below: (A) a monoclonal antibody comprising a heavy chain variable region and a light chain variable region joined via a linker, the heavy chain variable region comprising heavy chains CDR1 to CDR3 shown in (a) to (c) below, and the light chain variable region comprising light chains CDR1 to CDR3 shown in (d) to (f) below: (a) heavy chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 1, (b) heavy chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 2, (c) heavy chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 3, (d) light chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 4, (e) light chain CDR1 consisting of the amino acid sequence set forth in SEQ ID NO: 5, and (f) light chain CDR1 consisting of the amino acid sequence set

Abstract: A substrate delivery mechanism comprises a top ring, a substrate loader for loading a substrate, and a pusher mechanism, wherein the substrate loader comprises a top ring guide and the pusher mechanism comprises a top ring guide lifting table, in which the top ring guide and the top ring guide lifting table together form a sealed space below the substrate held by the top ring in a condition where the substrate loader is moved up by the pusher mechanism, wherein the substrate is detached from the top ring by exhausting the sealed space while at the same time injecting a fluid from through-holes provided in a substrate holding surface of the top ring.

Abstract: A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishing surface to polish the workpiece, at least three cleaning apparatuses for cleaning polished workpieces, and a transfer structure for transferring the polished workpieces between at least three cleaning apparatuses. The polishing apparatus further includes a rotary transporter disposed in a position which can be accessed by said top rings and having a plurality of portions positioned on a predetermined circumference from a center of rotation of the rotary transporter for holding the workpieces.

Abstract: A substrate delivery mechanism comprises a top ring, a substrate loader for loading a substrate, and a pusher mechanism, wherein the substrate loader comprises a top ring guide and the pusher mechanism comprises a top ring guide lifting table, in which the top ring guide and the top ring guide lifting table together form a sealed space below the substrate held by the top ring in a condition where the substrate loader is moved up by the pusher mechanism, wherein the substrate is detached from the top ring by exhausting the sealed space while at the same time injecting a fluid from through-holes provided in a substrate holding surface of the top ring.

Abstract: A substrate delivery mechanism comprises a top ring, a substrate loader for loading a substrate, and a pusher mechanism, wherein the substrate loader comprises a top ring guide and the pusher mechanism comprises a top ring guide lifting table, in which the top ring guide and the top ring guide lifting table together form a sealed space below the substrate held by the top ring in a condition where the substrate loader is moved up by the pusher mechanism, wherein the substrate is detached from the top ring by exhausting the sealed space while at the same time injecting a fluid from through-holes provided in a substrate holding surface of the top ring.

Abstract: A substrate delivery mechanism comprises a top ring, a substrate loader for loading a substrate, and a pusher mechanism, wherein the substrate loader comprises a top ring guide and the pusher mechanism comprises a top ring guide lifting table, in which the top ring guide and the top ring guide lifting table together form a sealed space below the substrate held by the top ring in a condition where the substrate loader is moved up by the pusher mechanism, wherein the substrate is detached from the top ring by exhausting the sealed space while at the same time injecting a fluid from through-holes provided in a substrate holding surface of the top ring.

Abstract: A substrate delivery mechanism comprises a top ring, a substrate loader for loading a substrate, and a pusher mechanism, wherein the substrate loader comprises a top ring guide and the pusher mechanism comprises a top ring guide lifting table, in which the top ring guide and the top ring guide lifting table together form a sealed space below the substrate held by the top ring in a condition where the substrate loader is moved up by the pusher mechanism, wherein the substrate is detached from the top ring by exhausting the sealed space while at the same time injecting a fluid from through-holes provided in a substrate holding surface of the top ring.

Abstract: A substrate delivery mechanism comprises a top ring, a substrate loader for loading a substrate, and a pusher mechanism, wherein the substrate loader comprises a top ring guide and the pusher mechanism comprises a top ring guide lifting table, in which the top ring guide and the top ring guide lifting table together form a sealed space below the substrate held by the top ring in a condition where the substrate loader is moved up by the pusher mechanism, wherein the substrate is detached from the top ring by exhausting the sealed space while at the same time injecting a fluid from through-holes provided in a substrate holding surface of the top ring.

Abstract: A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishing surface to polish the workpiece, at least three cleaning apparatuses for cleaning polished workpieces, and a transfer structure for transferring the polished workpieces between at least three cleaning apparatuses. The polishing apparatus further includes a rotary transporter disposed in a position which can be accessed by said top rings and having a plurality of portions positioned on a predetermined circumference from a center of rotation of the rotary transporter for holding the workpieces.

Abstract: A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishing surface to polish the workpiece, at least three cleaning apparatuses for cleaning polished workpieces, and a transfer structure for transferring the polished workpieces between at least three cleaning apparatuses. The polishing apparatus further includes a rotary transporter disposed in a position which can be accessed by said top rings and having a plurality of portions positioned on a predetermined circumference from a center of rotation of the rotary transporter for holding the workpieces.

Abstract: A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, a top ring for holding a workpiece and pressing the workpiece against the polishing surface to polish the workpiece, at least three cleaning apparatuses for cleaning polished workpieces, and a transfer structure for transferring the polished workpieces between at least three cleaning apparatuses. The polishing apparatus further includes a rotary transporter disposed in a position which can be accessed by said top rings and having a plurality of portions positioned on a predetermined circumference from a center of rotation of the rotary transporter for holding the workpieces.