Abstract: An inspection apparatus is provided that comprises an optical target including a solid host material and a fluorescing material embedded in the solid host material. The solid host material has a predetermined phonon energy HOSTPE. The fluorescing material exhibits a select ground energy level and a target excitation (TE) energy level separated from the ground energy level by a first energy gap corresponding to a fluorescence emission wavelength of interest. The fluorescing material has a next lower lying (NLL) energy level relative to the TE energy level. The NLL energy level is spaced a second energy gap FMEG2 below the TE energy level, wherein a ratio of the FMEG2/HOSTPE is three or more.

Abstract: A structured substrate (100) including a substrate body (102) having an active side (104). The substrate body (102) includes reaction cavities or sites (106) that open along the active side (104) and interstitial regions (118) that separate the reaction cavities (106). The structured substrate (100) includes an ensemble amplifier (120) positioned within each of the reaction cavities (106). The ensemble amplifier (120) includes a plurality of nanostructures (116), such as dimers, trimers, bowtie nanoantenna, nanorods, nanorings, nanoplugs, configured to at least one of amplify electromagnetic energy (108) that propagates into the corresponding reaction cavity (106) or amplify electromagnetic energy (110), such as emitted fluorescence, that is generated within the corresponding reaction cavity (106). Preferably the nanostructures (116) within the cavities (106) are covered with a organic material such as a gel (122).

Abstract: Imprinted substrates are often used to produce miniaturized devices for use in electrical, optic and biochemical applications. Imprinting techniques, such as nanoimprinting lithography, may leave residues in the surface of substrates that affect bonding and decrease the quality of the produced devices. An imprinted substrate with residue-free region, or regions with a reduced amount of residue for improved bonding quality is introduced. Methods to produce imprinted substrates without residues from the imprinting process are also introduced. Methods include physical exclusion methods, selective etching methods and energy application methods. These methods may produce residue-free regions in the surface of the substrate that can be used to produce higher strength bonding.

Abstract: Systems and methods for fabricating three-dimensional objects. The system includes an optical imaging system providing a light source; a photosensitive medium adapted to change states upon exposure to a portion of the light source from the optical imaging system; a control system for controlling movement of the optical imaging system, wherein the optical imaging system moves continuously above the photosensitive medium. The method includes moving a maskless optical imaging system providing the light beam in a continuous sequence; presenting the light beam on a portion of the photosensitive medium; lowering a plate upon which the photosensitive medium resides; and applying a new layer of the photosensitive medium.

Abstract: A compounding dispensing gun includes a pawl-spring assembly and a hand-housing assembly. The hand-housing assembly is coupled to the pawl-spring assembly. The hand-housing assembly has a handle. A plunger assembly extends through the hand-housing assembly and includes a push rod and a push rod head removably coupled to the push rod. The push rod has a plurality of first notches and a plurality of second notches formed thereon. The push rod selectively cooperates with the pawl-spring assembly to advance the push rod and the push rod head during a dispensing operation.

Abstract: Systems and methods for fabricating three-dimensional objects. The system includes an optical imaging system providing a light source; a photosensitive medium adapted to change states upon exposure to a portion of the light source from the optical imaging system; a control system for controlling movement of the optical imaging system, wherein the optical imaging system moves continuously above the photosensitive medium. The method includes moving a maskless optical imaging system providing the light beam in a continuous sequence; presenting the light beam on a portion of the photosensitive medium; lowering a plate upon which the photosensitive medium resides; and applying a new layer of the photosensitive medium.

Abstract: Systems and methods for fabricating three-dimensional objects. The system includes an optical imaging system providing a light source; a photosensitive medium adapted to change states upon exposure to a portion of the light source from the optical imaging system; a control system for controlling movement of the optical imaging system, wherein the optical imaging system moves continuously above the photosensitive medium. The method includes moving a maskless optical imaging system providing the light beam in a continuous sequence; presenting the light beam on a portion of the photosensitive medium; lowering a plate upon which the photosensitive medium resides; and applying a new layer of the photosensitive medium.

Abstract: A compounding dispensing gun includes a pawl-spring assembly and a hand-housing assembly. The hand-housing assembly is coupled to the pawl-spring assembly. The hand-housing assembly has a handle. A plunger assembly extends through the hand-housing assembly and includes a push rod and a push rod head removably coupled to the push rod. The push rod has a plurality of first notches and a plurality of second notches formed thereon. The push rod selectively cooperates with the pawl-spring assembly to advance the push rod and the push rod head during a dispensing operation.

Abstract: In a method for growing a nanowire array, a photoresist layer is placed onto a nanowire growth layer configured for growing nanowires therefrom. The photoresist layer is exposed to a coherent light interference pattern that includes periodically alternately spaced dark bands and light bands along a first orientation. The photoresist layer exposed to the coherent light interference pattern along a second orientation, transverse to the first orientation. The photoresist layer developed so as to remove photoresist from areas corresponding to areas of intersection of the dark bands of the interference pattern along the first orientation and the dark bands of the interference pattern along the second orientation, thereby leaving an ordered array of holes passing through the photoresist layer. The photoresist layer and the nanowire growth layer are placed into a nanowire growth environment, thereby growing nanowires from the nanowire growth layer through the array of holes.

Abstract: In a method for growing a nanowire array, a photoresist layer is placed onto a nanowire growth layer configured for growing nanowires therefrom. The photoresist layer is exposed to a coherent light interference pattern that includes periodically alternately spaced dark bands and light bands along a first orientation. The photoresist layer exposed to the coherent light interference pattern along a second orientation, transverse to the first orientation. The photoresist layer developed so as to remove photoresist from areas corresponding to areas of intersection of the dark bands of the interference pattern along the first orientation and the dark bands of the interference pattern along the second orientation, thereby leaving an ordered array of holes passing through the photoresist layer. The photoresist layer and the nanowire growth layer are placed into a nanowire growth environment, thereby growing nanowires from the nanowire growth layer through the array of holes.