Patents by Inventor Dale Harrison
Dale Harrison has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8054453Abstract: A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized.Type: GrantFiled: September 7, 2010Date of Patent: November 8, 2011Assignee: Jordan Valley Semiconductors Ltd.Inventor: Dale A. Harrison
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Patent number: 8014000Abstract: A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized.Type: GrantFiled: November 3, 2009Date of Patent: September 6, 2011Assignee: Jordan Valley Semiconductors Ltd.Inventor: Dale A. Harrison
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Publication number: 20100328648Abstract: A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized.Type: ApplicationFiled: September 7, 2010Publication date: December 30, 2010Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.Inventor: Dale A. Harrison
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Publication number: 20100301225Abstract: A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sample, a reference sample may have a relatively featureless reflectance spectrum over the same spectral region and is used in combination with the calibration sample to achieve the calibration. In one embodiment the spectral region may include the VUV spectral region.Type: ApplicationFiled: August 12, 2010Publication date: December 2, 2010Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.Inventor: Dale A. Harrison
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Publication number: 20100294922Abstract: A calibration pad having multiple calibration sites is provided. A particular calibration site may be utilized until that particular site has been determined to have become unacceptable for further use, for example from contamination, in which case the calibration processes may then move to use a different calibration site(s) on the calibration pad(s). A variety of techniques may be utilized to provide the determination that a site is no longer acceptable for use. Movement may thus occur over time from site to site for use in a calibration process. A variety of criteria may be established to determine when to move to another site. Though the designation of a site as “bad” may be based upon measured reflectance data, other criteria may also be used. For example, the number of times a site has been exposed to light may be the criteria for designating a site as bad. Alternatively the cumulative exposure of a site may be the criteria.Type: ApplicationFiled: May 22, 2009Publication date: November 25, 2010Inventors: JEFFREY B. HURST, MATTHEW WELDON, PHILLIP WALSH, CRISTIAN RIVAS, DALE A. HARRISON
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Publication number: 20100290033Abstract: A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r-? stage to further reduce the footprint.Type: ApplicationFiled: July 28, 2010Publication date: November 18, 2010Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.Inventors: Phillip Walsh, Dale Harrison
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Publication number: 20100277741Abstract: A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r-? stage to further reduce the footprint.Type: ApplicationFiled: July 13, 2010Publication date: November 4, 2010Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.Inventors: Phillip Walsh, Dale A. Harrison
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Patent number: 7804059Abstract: A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sample, a reference sample may have a relatively featureless reflectance spectrum over the same spectral region and is used in combination with the calibration sample to achieve the calibration. In one embodiment the spectral region may include the VUV spectral region.Type: GrantFiled: August 31, 2004Date of Patent: September 28, 2010Assignee: Jordan Valley Semiconductors Ltd.Inventor: Dale A. Harrison
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Patent number: 7716880Abstract: Composites, products made from composites and method of producing same are provided. The present invention includes an injection moldable product made from a composite material at least composed of balanced mixture of thermoplastics and fibrous components. The injection moldable product is formed into a body that has a wedge-shape, a shim-shape or the like wherein the body includes one or more cored regions extending though at least a portion thereof.Type: GrantFiled: August 14, 2002Date of Patent: May 18, 2010Assignee: Teton West Lumber, Inc.Inventors: Frank Shray, Steven Hollingworth, Dale Harrison, Colin Felton
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Patent number: 7684037Abstract: An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer.Type: GrantFiled: February 27, 2007Date of Patent: March 23, 2010Assignee: MetroSol, Inc.Inventors: Dale A. Harrison, Anthony T. Hayes
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Publication number: 20100051822Abstract: A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized.Type: ApplicationFiled: November 3, 2009Publication date: March 4, 2010Inventor: Dale A. Harrison
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Patent number: 7663097Abstract: A reflectometer calibration technique is provided that may include the use of two calibration samples in the calibration process. Further, the technique allows for calibration even in the presence of variations between the actual and assumed properties of at least one or more of the calibration samples. In addition, the technique utilizes a ratio of the measurements from the first and second calibration samples to determine the actual properties of at least one of the calibration samples. The ratio may be a ratio of the intensity reflected from the first and second calibration samples. The samples may exhibit relatively different reflective properties at the desired wavelengths. In such a technique the reflectance data of each sample may then be considered relatively decoupled from the other and actual properties of one or more of the calibration samples may be calculated. The determined actual properties may then be utilized to assist calibration of the reflectometer.Type: GrantFiled: April 25, 2007Date of Patent: February 16, 2010Assignee: MetroSol, Inc.Inventors: Phillip Walsh, Dale A. Harrison
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Patent number: 7663747Abstract: A technique is provided for monitoring and controlling surface contaminants on optical elements contained within the optical path (or sub-path) of an optical metrology instrument. The technique may be utilized in one embodiment in such a manner as to not require that additional components and/or instrumentation be coupled to, or integrated into, existing metrology equipment. Surface contaminants on optical elements within an optical metrology instrument are monitored so that cleaning procedures can be performed as deemed necessary. The cleaning procedures may include the use of exposing the optical elements to optical radiation. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.Type: GrantFiled: November 16, 2006Date of Patent: February 16, 2010Assignee: MetroSol, Inc.Inventors: Dale A. Harrison, Matthew Weldon
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Publication number: 20100000569Abstract: A technique is provided for monitoring and controlling surface contaminants on optical elements contained within the optical path (or sub-path) of an optical metrology instrument. The technique may be utilized in one embodiment in such a manner as to not require that additional components and/or instrumentation be coupled to, or integrated into, existing metrology equipment. Surface contaminants on optical elements within an optical metrology instrument are monitored so that cleaning procedures can be performed as deemed necessary. The cleaning procedures may include the use of exposing the optical elements to optical radiation. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.Type: ApplicationFiled: November 16, 2006Publication date: January 7, 2010Inventors: Dale A. Harrison, Matthew Weldon
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Publication number: 20090297412Abstract: Disclosed is a solid/liquid reaction process comprising the steps of: a) forming a slurry of a solid and a solution containing a species (SA) reactive with the solid and convertible to a species in the gas phase (SG); b) conducting a reaction between the solid and the species SA in a slurry in a vessel; and c) controlling a process condition of the slurry to minimise reactive conversion of species SA to species SG. Reactive conversion of species SA to species SG in the vessel is minimised by the placement of laminar slurry cover buoyant with respect to the slurry in the vessel. A process of particular importance is the process of cyanidation of gold ores in which reactive conversion of aqueous cyanide (CNaq?) to HCN (g) is a particular problem. A vessel (1, 2, 3) and leach circuit for conducting the solid/liquid process is also disclosed.Type: ApplicationFiled: July 22, 2005Publication date: December 3, 2009Applicant: SONS OF GWALIA LTDInventor: Dale Harrison
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Patent number: 7622310Abstract: A technique is provided for generating and subsequently monitoring the controlled environment(s) within an optical metrology instrument in such a manner as to minimize absorbing species within the light path of the metrology instrument and to minimize the build-up of contaminants on the surfaces of optical elements that may result in performance degradation. Both evacuation and backfill techniques may be utilized together along with a monitoring technique to determine if the environmental is suitable for measurements or if the environment should be regenerated. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.Type: GrantFiled: November 16, 2006Date of Patent: November 24, 2009Assignee: Metrosol, Inc.Inventors: Dale A. Harrison, Matthew Weldon
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Patent number: 7579601Abstract: An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer.Type: GrantFiled: February 27, 2007Date of Patent: August 25, 2009Assignee: Metrosol, Inc.Inventors: Dale A. Harrison, Anthony T. Hayes
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Patent number: 7511265Abstract: A reflectometer calibration technique is provided that may include the use of two calibration samples in the calibration process. Further, the technique allows for calibration even in the presence of variations between the actual and assumed properties of at least one or more of the calibration samples. In addition, the technique utilizes a ratio of the measurements from the first and second calibration samples to determine the actual properties of at least one of the calibration samples. The ratio may be a ratio of the intensity reflected from the first and second calibration samples. The samples may exhibit relatively different reflective properties at the desired wavelengths. In such a technique the reflectance data of each sample may then be considered relatively decoupled from the other and actual properties of one or more of the calibration samples may be calculated. The determined actual properties may then be utilized to assist calibration of the reflectometer.Type: GrantFiled: May 5, 2006Date of Patent: March 31, 2009Assignee: MetroSol, Inc.Inventors: Phillip Walsh, Dale A. Harrison
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Patent number: 7485869Abstract: An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer.Type: GrantFiled: February 27, 2007Date of Patent: February 3, 2009Assignee: MetroSol, Inc.Inventors: Dale A. Harrison, Anthony T. Hayes
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Publication number: 20090002711Abstract: A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized.Type: ApplicationFiled: September 2, 2008Publication date: January 1, 2009Inventor: Dale A. Harrison