Abstract: A region is locally modified so as to create a zone that extends as far as at least part of the surface of the region and is formed from a material that can be removed selectively with respect to the material of the region. The region is then covered with an insulating material. An orifice is formed in the insulating material emerging at the surface of the zone. The selectively removable material is removed from the zone through the orifice so as to form a cavity in place of the zone. The cavity and the orifice are then filled with at least one electrically conducting material so as to form a contact pad.

Abstract: A process for forming a silicide on top of at least one silicon portion on the surface of a semiconductor wafer, comprising the following steps: a) implanting, at a defined depth in the silicon portion, through a dielectric layer, of ions that have the property of limiting the silicidation of metals; b) performing heat treatment; c) depositing a metal layer, the metal being capable of forming a silicide by thermal reaction with the silicon; d) performing rapid thermal processing suitable for siliciding the metal deposited at step c); and e) removing the metal that has not reacted to the thermal processing of step d). Advantageously, the thickness of the silicide layer created at step d) is controlled by a suitable choice of the depth of the implantation carried out in step a).

Abstract: A single-crystal silicon region on insulator on silicon intended to receive at least one component, the insulator having overthicknesses.

Abstract: A method for forming, by thermal oxidation, a silicon oxide layer on an integrated circuit comprising three-dimensional silicon patterns, comprising the steps of:

Abstract: Process for fabricating a transistor comprises producing source and drain extension regions, consisting in forming a gate region on a semiconductor substrate and in implanting dopants into the semiconductor substrate on either side of and at a certain distance from the gate of the transistor. The producing of the source and drain extension regions consists in forming an intermediate layer (Cl) on the sidewalls of the gate (GR) and on the surface of the semiconductor substrate. This intermediate layer is formed from a material that is less dense than silicon dioxide. The implantation of dopants (IMP) is carried out through that part of the intermediate layer that is located on the semiconductor substrate.

Abstract: A process for fabricating an integrated circuit includes forming a gate on a crystalline silicon substrate, and amorphizing a region of the substrate to obtain an amorphous silicon region. Dopant is implanted in a subregion lying substantially within the amorphous silicon region of the substrate to form drain and source extensions. A source and drain are then formed at a low temperature.

Abstract: Process for fabricating a transistor comprises producing source and drain extension regions, consisting in forming a gate region on a semiconductor substrate and in implanting dopants into the semiconductor substrate on either side of and at a certain distance from the gate of the transistor. The producing of the source and drain extension regions consists in forming an intermediate layer (Cl) on the sidewalls of the gate (GR) and on the surface of the semiconductor substrate. This intermediate layer is formed from a material that is less dense than silicon dioxide. The implantation of dopants (IMP) is carried out through that part of the intermediate layer that is located on the semiconductor substrate.