Patents by Inventor Dan Yu

Dan Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10662276
    Abstract: A cured composition including a reaction product of a mixture that includes an isocyanate component having one or more isocyanates and an isocyanate-reactive component having a butylene oxide based polyol, which has a number average molecular weight greater than 2,000 g/mol and less than 8,000 g/mol and a nominal hydroxyl functionality from (2) to (4). At least (50) wt % of a total weight of alkylene oxides used to form the butylene oxide based polyol is butylene oxide. An isocyanate index of the mixture is from (90) to (150). The cured composition in a cured state exhibits a first tan delta peak between a first temperature range of 50° C. to 0° C. and a second tan delta peak between a second temperature range of 75° C. and 150° C.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: May 26, 2020
    Assignee: Dow Global Technologies LLC
    Inventors: Adam C. Colson, Dan Yu, Daniel A. Aguilar, Amber Marie Stephenson, William H. Heath, Shouren Ge
  • Patent number: 10380223
    Abstract: A support tensor machine based neutral point grounding mode decision method and system adopts a support tensor machine method Based on three indexes, i.e., the power supply reliability index, safety index, and economical efficiency index, influences of different neutral point grounding modes are analyzed by employing the support tensor machine method to finally obtain a neutral point grounding mode capable of maximizing power supply reliability of a distribution network.
    Type: Grant
    Filed: March 5, 2018
    Date of Patent: August 13, 2019
    Assignees: STATE GRID ZHEJIANG ELECTRIC POWER COMPANY LIMITED, STATE GRID ZHEJIANG ECONOMIC RESEARCH INSTITUTE, STATE GRID NINGBO ELECTRIC POWER SUPPLY COMPANY LIMITED, ZHEJIANG HUAYUN ELECTRIC POWER ENGINEERING DESIGN CONSULTING CO. LTD
    Inventors: Yingjing He, Yangqing Dan, Weijun Liu, Weimin Zheng, Xiaodi Zhang, Chaoming Zheng, Xiran Wang, Shuyi Shen, Yan Yao, Yanwei Zhu, Fan Li, Lin Zhou, Jiandi Fang, Dan Yu, Ren Tang
  • Publication number: 20190121836
    Abstract: A support tensor machine based neutral point grounding mode decision method and system adopts a support tensor machine method Based on three indexes, i.e., the power supply reliability index, safety index, and economical efficiency index, influences of different neutral point grounding modes are analyzed by employing the support tensor machine method to finally obtain a neutral point grounding mode capable of maximizing power supply reliability of a distribution network.
    Type: Application
    Filed: March 5, 2018
    Publication date: April 25, 2019
    Inventors: Yingjing He, Yangqing Dan, Weijun Liu, Weimin Zheng, Xiaodi Zhang, Chaoming Zheng, Xiran Wang, Shuyi Shen, Yan Yao, Yanwei Zhu, Fan Li, Lin Zhou, Jiandi Fang, Dan Yu, Ren Tang
  • Publication number: 20180346637
    Abstract: A cured composition including a reaction product of a mixture that includes an isocyanate component having one or more isocyanates and an isocyanate-reactive component having a butylene oxide based polyol, which has a number average molecular weight greater than 2,000 g/mol and less than 8,000 g/mol and a nominal hydroxyl functionality from (2) to (4). At least (50) wt % of a total weight of alkylene oxides used to form the butylene oxide based polyol is butylene oxide. An isocyanate index of the mixture is from (90) to (150). The cured composition in a cured state exhibits a first tan delta peak between a first temperature range of 50° C. to 0° C. and a second tan delta peak between a second temperature range of 75° C. and 150° C.
    Type: Application
    Filed: November 9, 2016
    Publication date: December 6, 2018
    Inventors: Adam C. Colson, Dan Yu, Daniel A. Aguilar, Amber Marie Stephenson, William H. Heath, Shouren Ge
  • Publication number: 20180166769
    Abstract: An antenna structure includes a metallic member, a feed portion, and a coupling resistor. The metallic member defines a slot, a first gap, a second gap, and a third gap. The first gap and the second gap are connected with the slot and divide with the slot the metallic member into a first portion and a second portion. The second portion is grounded. The third gap is defined on the first portion and connected with the slot. The first portion is divided into a radiating portion and a coupling portion by the third gap. The coupling portion is spaced apart from the radiating portion. The feed portion is electrically connected to the radiating portion, and the coupling portion is grounded through the coupling resistor.
    Type: Application
    Filed: December 7, 2017
    Publication date: June 14, 2018
    Inventors: CHENG-I CHANG, YU-TING CHEN, CHIEN-CHANG LIU, DAN-YU CHEN, PO-CHIH LIN, CHUAN-CHOU CHI
  • Publication number: 20180005148
    Abstract: Provided are a mapping rule updating method, device and system, for timely updating a mapping rule so as to avoid generating a wrong evaluation result. A mapping rule updating method, includes receiving first data generated in a production process; determining a first execution condition of the production process according to the first data based on a mapping rule; generating an evaluation result, the evaluation result being used for indicating whether the first execution condition is in line with a production plan of the production process; acquiring feedback information, the feedback information including indication information for indicating whether the evaluation result is correct; and updating the mapping rule according to the feedback information. As the mapping rule can be automatically updated, the work load of manually configuring the mapping rule is reduced greatly, and the accuracy of the mapping rule and the timeliness of the update is improved.
    Type: Application
    Filed: June 29, 2017
    Publication date: January 4, 2018
    Applicant: Siemens Aktiengesellschaft
    Inventors: Dan YU, Liang ZHANG
  • Patent number: 9815870
    Abstract: The invention described herein features variants related to infrared fluorescent proteins, in particular to mutants of a phytochrome from the bacterium Bradyrhizobium sp. ORS278. The variants show approximately a ten-fold increase in brightness compared to other known infrared fluorescent proteins. The variants are monomeric, allowing them to be used as a protein tag without disrupting the function of the tagged protein of interest.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: November 14, 2017
    Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Dan Yu, Xiaokun Shu
  • Patent number: 9805756
    Abstract: Implementations disclosed herein provide a method of reducing the topography at the alignment and overlay marks area during the writer pole photolithography process in order to reduce the wafer scale variation and reduce the writer pole photolithography process rework rate. In one implementation, an intermediate stage of a wafer for writer pole formation is generated by removing a part of at least one metallic writer pole layer on top of an intermediate stage writer pole wafer to form a recovery trench, depositing an optically transparent material on top of the wafer, wherein the thickness of the optically transparent material is higher than a target recovery trench topography, forming a photoresist pattern on top of the optically transparent material over the recovery trench, etching the optically transparent material, and removing the photoresist pattern and at least part of the remaining optically transparent material.
    Type: Grant
    Filed: July 5, 2016
    Date of Patent: October 31, 2017
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Yi Liu, Aaron M. Bowser, Dan Yu, Xiaohong Zhang
  • Publication number: 20170207557
    Abstract: The present disclosure relates to a spring sheet, which includes a first spring foot, a second spring foot and a soldering part; the first spring foot includes a first elastic wall and a first hook; the second spring foot includes a second elastic wall and a second hook; the first spring foot and/or the second spring foot are/is connected with the soldering part, and bend/bends and extend/extends outward relative to the soldering part. By the present disclosure, the grounding stability of the spring sheet may be reinforced, and it may be realized that two components in an electronic device are grounded simultaneously.
    Type: Application
    Filed: August 19, 2016
    Publication date: July 20, 2017
    Inventors: Xiangxin HUANG, Dan YU
  • Publication number: 20170169977
    Abstract: Disclosed relates to a power breaking apparatus and a mobile phone. The power breaking apparatus includes: a power source PCB electrically connected with an anode and a cathode of a power source; a breaker electrically connected with the power source PCB, wherein the breaker is arranged with a feeding device comprising a first jack socket and a second jack socket, and when the first jack socket is connected with the second jack socket, then a power supply line of the power source PCB is cut off; and a short-circuit plug arranged with a first plug and a second plug, both of which are electrically connected. The mobile phone includes the power breaking apparatus according to the embodiment of the disclosure.
    Type: Application
    Filed: August 11, 2016
    Publication date: June 15, 2017
    Applicants: Le Holdings (Beijing) Co.,Ltd., LEMOBILE INFORMATION TECHNOLOGY (BEIJING) CO., LTD .
    Inventors: Dan Yu, Dun Tian, Shengmao Cai, Fei Zhang, Hui Wang
  • Patent number: 9659196
    Abstract: A method for data verification may include: receiving by a radio frequency identification (RFID) tag a write command including data to be written; writing by said RFID tag said data to be written into a local storage; reading by said RFID tag data from said local storage; and carrying out by said RFID tag a data verification according to said data read out. Further, a data verification apparatus may include a receiving module for receiving a write command including data to be written; a writing module for writing said data to be written into a first storage module configured for storing said data to be written; a reading module for reading data from said first storage module; and a verifying module for carrying out verification according to the data read out by said reading module. Such method and apparatus may reduce the time of data verification by an RFID tag.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: May 23, 2017
    Assignee: SIEMENS AKTIENGESELLSCHAFT
    Inventors: Hui Li, Dan Yu, Yong Yuan, Liang Zhang
  • Publication number: 20170125937
    Abstract: The present invention discloses a waterproof structure of a card tray hole of a metallic-shell mobile phone. The waterproof structure includes: an SIM card seat; a card tray arranged in the SIM card seat; a card tray push rod which is arranged at one side of the SIM card seat and is used for pushing the card tray so as to eject the card tray out of the shell; and a waterproof sealing needle, which is arranged in a card tray push rod hole formed on the shell of the mobile phone and corresponding to the card tray push rod. The waterproof structure of the card tray hole of the metallic-shell mobile phone can prevent water from entering a shell inside from a shell outside, thereby achieving the waterproof effect.
    Type: Application
    Filed: August 18, 2016
    Publication date: May 4, 2017
    Inventors: Yongchun LIANG, Dan YU, Dun TIAN, Shengmao CAI, Fei ZHANG, Hui WANG
  • Patent number: 9482965
    Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
    Type: Grant
    Filed: May 2, 2016
    Date of Patent: November 1, 2016
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Dan Yu, Aaron Bowser, Yi Liu
  • Publication number: 20160314810
    Abstract: Implementations disclosed herein provide a method of reducing the topography at the alignment and overlay marks area during the writer pole photolithography process in order to reduce the wafer scale variation and reduce the writer pole photolithography process rework rate. In one implementation, an intermediate stage of a wafer for writer pole formation is generated by removing a part of at least one metallic writer pole layer on top of an intermediate stage writer pole wafer to form a recovery trench, depositing an optically transparent material on top of the wafer, wherein the thickness of the optically transparent material is higher than a target recovery trench topography, forming a photoresist pattern on top of the optically transparent material over the recovery trench, etching the optically transparent material, and removing the photoresist pattern and at least part of the remaining optically transparent material.
    Type: Application
    Filed: July 5, 2016
    Publication date: October 27, 2016
    Inventors: Yi Liu, Aaron M. Bowser, Dan Yu, Xiaohong Zhang
  • Publication number: 20160246183
    Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
    Type: Application
    Filed: May 2, 2016
    Publication date: August 25, 2016
    Inventors: Dan Yu, Aaron Bowser, Yi Liu
  • Patent number: 9411234
    Abstract: Implementations disclosed herein provide a method of reducing the topography at the alignment and overlay marks area during the writer pole photolithography process in order to reduce the wafer scale variation and reduce the writer pole photolithography process rework rate. In one implementation, an intermediate stage of a wafer for writer pole formation is generated by removing a part of at least one metallic writer pole layer on top of an intermediate stage writer pole wafer to form a recovery trench, depositing an optically transparent material on top of the wafer, wherein the thickness of the optically transparent material is higher than a target recovery trench topography, forming a photoresist pattern on top of the optically transparent material over the recovery trench, etching the optically transparent material, and removing the photoresist pattern and at least part of the remaining optically transparent material.
    Type: Grant
    Filed: October 1, 2014
    Date of Patent: August 9, 2016
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Yi Liu, Aaron M. Bowser, Dan Yu, Xiaohong Zhang
  • Patent number: 9341939
    Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: May 17, 2016
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Dan Yu, Aaron Bowser, Yi Liu
  • Publication number: 20160124299
    Abstract: Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
    Type: Application
    Filed: October 30, 2014
    Publication date: May 5, 2016
    Inventors: Dan Yu, Aaron Bowser, Yi Liu
  • Publication number: 20160099019
    Abstract: Implementations disclosed herein provide a method of reducing the topography at the alignment and overlay marks area during the writer pole photolithography process in order to reduce the wafer scale variation and reduce the writer pole photolithography process rework rate. In one implementation, an intermediate stage of a wafer for writer pole formation is generated by removing a part of at least one metallic writer pole layer on top of an intermediate stage writer pole wafer to form a recovery trench, depositing an optically transparent material on top of the wafer, wherein the thickness of the optically transparent material is higher than a target recovery trench topography, forming a photoresist pattern on top of the optically transparent material over the recovery trench, etching the optically transparent material, and removing the photoresist pattern and at least part of the remaining optically transparent material.
    Type: Application
    Filed: October 1, 2014
    Publication date: April 7, 2016
    Inventors: Yi Liu, Aaron M. Bowser, Dan Yu, Xiaohong Zhang
  • Patent number: 9306286
    Abstract: A radio frequency identification (RFID) reader antenna includes a feeding frame, a upper stub unit connected with the first side of the feeding frame, and a lower stub unit connected with the second side of the feeding frame, wherein the upper stub unit includes M first stubs extending towards the second side of the feeding frame, the lower stub unit includes N second stubs extending towards the first side of the feeding frame, the M first stubs and the N second stubs are arranged alternately intervallic, where M, N are integers that are greater than one.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: April 5, 2016
    Assignee: Siemens Aktiengesellschaft
    Inventors: Dieter Horst, Dan Yu, Yong Yuan