Patents by Inventor Dana Gronbeck

Dana Gronbeck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phenolic polymers, methods for synthesis thereof and photoresist compositions comprising same
    Publication number: 20030235777
    Abstract: The invention provides phenolic polymers, and methods for synthesis and photoresists that comprise such polymers. Synthetic methods of the invention include providing a polymer that contains esterified meta-phenolic units, and removing the ester group preferably by hydrolysis to provide a polymer with meta-phenolic units.
    Type: Application
    Filed: December 20, 2002
    Publication date: December 25, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Dana A. Gronbeck, George G. Barclay
  • Photoimageable composition
    Publication number: 20030099899
    Abstract: Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing electronic devices using such compositions. Such compositions are useful as photoresists and in the manufacture of optoelectronic devices.
    Type: Application
    Filed: May 8, 2002
    Publication date: May 29, 2003
    Inventors: Dana A. Gronbeck, George G. Barclay, Leo L. Linehan, Kao Xiong, Subareddy Kanagasabapathy
  • Reduction of inorganic contaminants in polymers and photoresist compositions comprising same
    Publication number: 20020142246
    Abstract: The present invention provides polymers which are substantially or completely free of inorganic contaminants and the use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention also are suitable for use as a resin component for antireflective coating compositions (ARCs). More particularly, the invention provides methods for reducing such contaminants in polymerization initiators, particularly free radical initiators.
    Type: Application
    Filed: December 27, 2001
    Publication date: October 3, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Dana A. Gronbeck, Suzanne Coley, Chi Q. Truong, Ashish Pandya
  • Process for removing heavy metal ions by ion exchange
    Patent number: 5702611
    Abstract: The invention is for a process of removing dissolved heavy metal cation contaminants from an organic solution. The process of the invention involves providing a mixture of a chelating ion exchange resin modified by removal of sodium ions therefrom and an anion exchange resin and contacting said organic solution with said exchange resins for a time sufficient to remove ionic metal impurities and acids. The invention is useful for removal of ionic contaminants from organic solutions requiring high purity.
    Type: Grant
    Filed: January 14, 1997
    Date of Patent: December 30, 1997
    Assignee: Shipley Company, L.L.C.
    Inventors: Dana A. Gronbeck, Kathleen M. O'Connell, William Andrew Burke, Michael N. Gaudet, Stefan J. Caporale