Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.

Abstract: An ion source with an insertable target holder for holding a solid dopant material is disclosed. The insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder has a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. The porous surface may be a portion of a perforated crucible, a portion of a perforated retention cap, or a porous insert.

Abstract: An IHC ion source with multiple configurations is disclosed. For example, an IHC ion source comprises a chamber, having at least one electrically conductive wall, and a cathode and a repeller disposed on opposite ends of the chamber. Electrodes are disposed on one or more walls of the ion source. Bias voltages are applied to at least one of the cathode, repeller and the electrodes, relative to the electrically conductive wall of the chamber. Further, the IHC ion source comprises a configuration circuit, which receives the various voltages as input voltages, and provides selected output voltages to the cathode, repeller and electrodes, based on user input. In this way, the IHC ion source can be readily reconfigured for different applications without rewiring the power supplies, as is currently done. This configuration circuit may be utilized with other types of ion sources as well.

Abstract: A method, an information handling system (IHS), and a bracket component for use in an IHS to better retain an inserted expansion card. The bracket component includes a first arm with a surface configured to fasten to a portion of a computer chassis. The portion of the computer chassis is proximate to a printed circuit board (PCB) expansion slot of the computer chassis. The bracket component includes a second arm positioned perpendicular to the first arm. The second arm has an inner surface facing the PCB expansion slot. The bracket component includes a board support pad affixed to the inner surface of the second arm. The board support pad has a flexible surface layer for abutting an edge of one or more PCBs that are inserted into the PCB expansion slot. The board support pad of the bracket component stabilizes the PCBs and reduces vibrations emanating from the computer chassis.

Abstract: Techniques involve a motor assembly including a rotor and a stator. The stator includes a contact surface for contacting an outer surface of the rotor. The contact surface includes a rigid material. The motor assembly also includes at least one constraint disposed along a length of the motor assembly, where the constraint constrains a radial and/or tangential movement of the rotor relative to the stator. The at least one constraint may be disposed at one or more proximate ends of the motor assembly, and/or along the length of the motor assembly. The contact surface of the stator may have a profile including peaks and valleys, and in some embodiments, the contact surface may be treated to reduce friction and/or wear.

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.

Abstract: An ion source with an insertable target holder for holding a solid dopant material is disclosed. The insertable target holder includes a pocket or cavity into which the solid dopant material is disposed. When the solid dopant material melts, it remains contained within the pocket, thus not damaging or degrading the arc chamber. Additionally, the target holder can be moved from one or more positions where the pocket is at least partially in the arc chamber to one or more positions where the pocket is entirely outside the arc chamber. In certain embodiments, a sleeve may be used to cover at least a portion of the open top of the pocket.

Abstract: A method of manufacturing a chassis of an HIS includes manufacturing a chassis having a base panel with an upper chassis surface. The method further includes attaching at least one resilient component to the upper chassis surface and that upwardly presents an adhesive surface to fixedly engage and to provide vibration damping for a storage drive that is inserted on the adhesive surface during assembly of the IHS.

Abstract: An information handling system (IHS) includes user selectable compute components including a storage drive. A chassis includes a base panel having an upper chassis surface. At least one resilient component is coupled to the upper chassis surface. An upwardly presented adhesive surface on one or more of the at least one resilient component can fixedly engage and provide vibration damping for a vibration-susceptible compute component that is inserted during provisioning or later modification or repair of the IHS.

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.

Abstract: An ion source having improved life is disclosed. In certain embodiments, the ion source is an IHC ion source comprising a chamber, having a plurality of electrically conductive walls, having a cathode which is electrically connected to the walls of the ion source. Electrodes are disposed on one or more walls of the ion source. A bias voltage is applied to at least one of the electrodes, relative to the walls of the chamber. In certain embodiments, fewer positive ions are attracted to the cathode, reducing the amount of sputtering experienced by the cathode. Advantageously, the life of the cathode is improved using this technique. In another embodiment, the ion source comprises a Bernas ion source comprising a chamber having a filament with one lead of the filament connected to the walls of the ion source.

Abstract: An ion source having improved life is disclosed. In certain embodiments, the ion source is an IHC ion source comprising a chamber, having a plurality of electrically conductive walls, having a cathode which is electrically connected to the walls of the ion source. Electrodes are disposed on one or more walls of the ion source. A bias voltage is applied to at least one of the electrodes, relative to the walls of the chamber. In certain embodiments, fewer positive ions are attracted to the cathode, reducing the amount of sputtering experienced by the cathode. Advantageously, the life of the cathode is improved using this technique. In another embodiment, the ion source comprises a Bernas ion source comprising a chamber having a filament with one lead of the filament connected to the walls of the ion source.

Abstract: Techniques relate to a moving cavity motor or pump, such as a mud motor, including a rotor, a stator, and one or more apparatus for constraining (i.e., controlling or limiting) the movement of the rotor relative to the stator, where the apparatus for constraining is operable with the rotor catch. The motor may include a top sub, power section having a progressive cavity motor with a stator and rotor, a rotor catch, and an apparatus between a proximal and distal end of the rotor catch shaft. The apparatus may constrain the radial and/or tangential movement of the rotor catch shaft and the rotor.

Abstract: An Information Handling System (IHS) includes a chassis having a base panel, a selected modular cover, and a latching structure. The base panel has an upper chassis surface to receive selected compute components and infrastructure components that vary in height desired for the fully assembled IHS or rack in which the IHS will be inserted. The selected modular cover can have peripheral sides of a vertical height to complement a vertical height of the lateral guides of the base panel to create either a first height enclosure of a first height to house compute components of less than the first height or a second height enclosure of a second height to house compute components of less than the second height but greater than the first height. The latching structure is formed between the peripheral sides of the selected one of the first and second modular cover and the lateral guides of the base panel.

Abstract: An information handling system (IHS) includes a modularly-constructed chassis for receiving varying sizes of snap-in compute components for assembly of the IHS. The modularly-constructed chassis includes a base panel having a chassis surface that includes more than one engagement feature formed within the chassis surface and a selected at least one of a first tray that is sized to receive a first compute component of a first size and a second tray that is sized to receive a second compute component of a second size. The first and second trays have a bottom surface with more than one complementary engagement feature formed within the bottom surface to snap-in corresponding engagement features of the base panel. The IHS includes one or more connecting cabling interconnecting the at least two compute components.

Abstract: An indirectly heated cathode (IHC) ion source having improved life is disclosed. The IHC ion source comprises a chamber having a cathode and a repeller on opposite ends of the ion source. Biased electrodes are disposed on one or more sides of the ion source. The bias voltage applied to at least one of the cathode, the repeller and the electrodes, relative to the chamber, is varied over time. In certain embodiments, the voltage applied to the electrodes may begin at an initial positive voltage. Over time, this voltage may be reduced, while still maintaining the target ion beam current. Advantageously, the life of the cathode is improved using this technique.

Abstract: A moving cavity motor or pump, such as a mud motor, comprising: a rotor, a stator, and one or more apparatus for constraining (i.e., controlling or limiting) the movement of the rotor relative to the stator, where the apparatus for constraining is operable with the rotor catch.

Abstract: A chassis of an information handling system (IHS) includes a lateral segment that spans across a directional path of air travelling from an air intake side to an air exhaust side and including receiving affordances for insertion of a lateral support for a directional air mover. A user can select one of a first lateral support and a second lateral support that is insertable into the lateral segment and securable to the receiving affordances. The first lateral support has apertures of a first size to receive respective first fan modules and the second lateral support has apertures of a second size to receive respective second fan modules. An inserted one of the first and second lateral supports is selected based on a cooling air requirement corresponding to user selected compute components placed within the chassis to operate within the IHS.

Abstract: An ion source having improved life is disclosed. In certain embodiments, the ion source is an IHC ion source comprising a chamber, having a plurality of electrically conductive walls, having a cathode which is electrically connected to the walls of the ion source. Electrodes are disposed on one or more walls of the ion source. A bias voltage is applied to at least one of the electrodes, relative to the walls of the chamber. In certain embodiments, fewer positive ions are attracted to the cathode, reducing the amount of sputtering experienced by the cathode. Advantageously, the life of the cathode is improved using this technique. In another embodiment, the ion source comprises a Bernas ion source comprising a chamber having a filament with one lead of the filament connected to the walls of the ion source.

Abstract: Techniques relate to a moving cavity motor or pump, such as a mud motor, including a rotor, a stator, and one or more apparatus for constraining (i.e., controlling or limiting) the movement of the rotor relative to the stator, where the apparatus for constraining is operable with the rotor catch. The motor may include a top sub, power section having a progressive cavity motor with a stator and rotor, a rotor catch, and an apparatus between a proximal and distal end of the rotor catch shaft. The apparatus may constrain the radial and/or tangential movement of the rotor catch shaft and the rotor.