Patents by Inventor Daniel Brors

Daniel Brors has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160181066
    Abstract: Systems and methods using PVD for producing materials, for example nitrides, are disclosed. The present application also relates to use of the materials for electrode materials.
    Type: Application
    Filed: October 16, 2013
    Publication date: June 23, 2016
    Inventors: Daniel Brors, Richard Ernest DeMaray, David Slutz, Richard Clark
  • Publication number: 20140227527
    Abstract: PVD and HPHT methods and apparatus for producing materials, for example nitrides, are disclosed.
    Type: Application
    Filed: September 27, 2012
    Publication date: August 14, 2014
    Applicant: Nitride Solutions Inc.
    Inventors: Daniel Brors, Richard Ernest De-Maray, David Slutz
  • Publication number: 20090188790
    Abstract: A new sputter source is disclosed that allows for high rates of deposition at pressures one or two orders of magnitude lower than has previously been obtained. This results in denser films with reduced ion and electron damage to the substrate.
    Type: Application
    Filed: January 16, 2009
    Publication date: July 30, 2009
    Applicant: 4D-S Pty. Ltd.
    Inventors: DANIEL BRORS, Dominik Schmidt, Michael Hawran, Dave Correia, Art Shulenberger
  • Publication number: 20050013937
    Abstract: A method wherein a thermal gradient over a substrate enhances Chemical Vapor Deposition (CVD) at low pressures. An upper heat source is positioned above the substrate and a lower heat source is positioned below the substrate. The upper and lower heat sources are operated to raise the substrate temperature to 400-700° and cause a heat gradient of 100-200° C. between the upper and lower heat sources. This heat gradient causes an increase in the deposition rate for a given reactant gas flow rate and chamber pressure. The preferred parameters for implementation of the present invention for poly crystalline silicon deposition include the temperature of the upper heat source 100-200° C. above the lower heat source, a substrate temperature in the range of 400-700° C., a reactant gas pressure between 250 and 1000 mTorr, and a gas flow rate of 200-800 sccm. The substrate is rotated, with 5 RPM being a typical rate.
    Type: Application
    Filed: August 13, 2004
    Publication date: January 20, 2005
    Inventors: Robert Cook, Daniel Brors
  • Patent number: 4012766
    Abstract: An improved plastic package and method of manufacture thereof for use in packaging integrated circuit semiconductor devices and the like. A transfer molded package having the lead frame disposed therein is formed having an opening therethrough. The device to be packaged is mounted on a stepped mounting member which then is located with respect to the opening with the height of the step being selected to generally dispose the top surface of the device substantially co-planar with the adjacent leads of the package. Sealing of the package may be accomplished by potting the upper and lower cavities of the opening in the plastic package, or by potting or cementing over a cup above the device so the space immediately above the device remains unfilled after sealing.
    Type: Grant
    Filed: October 8, 1975
    Date of Patent: March 15, 1977
    Assignee: Western Digital Corporation
    Inventors: Alvin B. Phillips, Martin Monciardini, Douglas A. Mills, Daniel Brors