Abstract: A yaw-rate sensor having a substrate and a plurality of movable substructures that are mounted over a surface of the substrate, the movable substructures being coupled to a shared, in particular, central spring element, means being provided for exciting the movable substructures into a coupled oscillation in a plane that extends parallel to the surface of the substrate, the movable substructures having Coriolis elements, means being provided for detecting deflections of the Coriolis elements induced by a Coriolis force, a first Coriolis element being provided for detecting a yaw rate about a first axis, a second Coriolis element being provided for detecting a yaw rate about a second axis, the second axis being oriented perpendicularly to the first axis.

Abstract: A yaw-rate sensor for determining a Coriolis force includes a semiconductor substrate, a mass body mounted so it is movable over the semiconductor substrate, a drive unit for setting the mass body into an oscillating movement, and a detection unit for determining a deflection of the mass body which is caused by the Coriolis force. The detection unit includes a piezoresistive element, whose electrical resistance is a function of the deformation of the piezoresistive element.

Abstract: A yaw rate sensor is described which includes a drive device, at least one Coriolis element, and a detection device having at least two detection elements which are coupled to one another with the aid of a coupling device, the drive device being connected to the Coriolis element for driving a vibration of the Coriolis element, and an additional coupling device which is connected to the detection device and to the Coriolis element for coupling a deflection in the plane of vibration of the Coriolis element to the detection device in a direction orthogonal to the vibration.

Abstract: A yaw rate sensor includes: at least one Coriolis element; a drive device connected to the Coriolis element and configured to drive a vibration of the Coriolis element; a detection device having at least one rotor; and a coupling device connected to the detection device and to the Coriolis element. The coupling device is configured to couple a deflection in the plane of vibration of the Coriolis element to the detection device in a direction orthogonal to the vibration, so that when the Coriolis element is deflected a torque for driving the at least one rotor is transmitted from the Coriolis element to the at least one rotor.

Abstract: A coupling structure for a rotation rate sensor apparatus, having at least one first oscillating mass; and having a first frame, surrounding the first oscillating mass, to which the first oscillating mass is coupled; the first frame encompassing four angle elements, each of which angle elements has at least one first limb and one second limb and is respectively coupled with the first limb and with the second limb to another adjacent angle element of the four angle elements. Also described is a further coupling structure for a rotation rate sensor apparatus, to a rotation rate sensor apparatus, to a manufacturing method for a coupling structure for a rotation rate sensor apparatus, and to a manufacturing method for a rotation rate sensor apparatus.

Abstract: A micromechanical sensor having at least one movably mounted measuring element which is opposite at least one stationary electrode, the electrode being situated in a first plane, and being contacted by at least one printed conductor track which is situated in a second plane. A third plane is located between the first plane and the second plane, the third plane including an electrically conductive material.

Abstract: A micromechanical structure, includes at least two structure sections configured to bound a working gap, the at least two structure sections being movable relative to one another, and a working gap width setting device configured to broaden the at least one working gap by movement of a first structure section of the at least two structure sections relative to a second structure section of the at least two structure section, the first structure section is stationary relative to a reference point during operation of the micromechanical structure and (ii) the second structure section is movable relative to the reference point during operation.

Abstract: In a yaw rate sensor with a substrate having a main extent plane and with a first and second partial structure disposed parallel to the main extent plane, the first partial structure includes a first driving structure and the second partial structure includes a second driving structure, the first and second partial structure being excitable by a driving device, via the first and second driving structure, into oscillation parallel to a first axis parallel to the main extent plane, the first partial structure having a first Coriolis element and the second partial structure having a second Coriolis element, the yaw rate sensor being characterized in that the first and second Coriolis elements are displaceable by a Coriolis force parallel to a second axis, which is perpendicular to the first axis, and parallel to a third axis, which is perpendicular to the first and second axis, the second axis extending parallel to the main extent plane, and the first Coriolis element being connected to the second Coriolis eleme

Abstract: A yaw rate sensor having a substrate, a first Coriolis element and a second Coriolis element is described, the first Coriolis element being excitable to a first vibration by first excitation means, and the second Coriolis element being excitable to a second vibration by second excitation means, and the first and second Coriolis elements being connected to one another by a spring structure, and the spring structure also including at least one rocker structure, the rocker structure being anchored on the substrate by at least one spring element.

Abstract: A micromechanical yaw rate sensor includes a substrate having a main plane of extension and two Coriolis elements. The first Coriolis element may be driven to a first vibration along a second direction which is parallel to the main plane of extension. The second Coriolis element may be driven to a second vibration which is antiparallel to the first vibration. A first deflection of the first Coriolis element and a second deflection of the second Coriolis element, in each case along a first direction which is parallel to the main plane of extension and perpendicular to the second direction, may be detected. The micromechanical sensor also has a rocker element indirectly or directly coupled to the first Coriolis element and to the second Coriolis element, which rocker element has a torsional axis essentially parallel to the second direction.

Abstract: A micromechanical yaw-rate sensor comprising a first yaw-rate sensor element, which outputs a first sensor signal, which contains information about a rotation around a first rotational axis, a second yaw-rate sensor element, which outputs a second sensor signal, which contains information about a rotation around a second rotational axis, which is perpendicular to the first rotational axis, a drive, which drives the first yaw-rate sensor element, and a coupling link, which mechanically couples the first yaw-rate sensor element and the second yaw-rate sensor element to one another, so that driving of the first yaw-rate sensor element also causes driving of the second yaw-rate sensor element.

Abstract: A micromechanical device includes at least one drive frame and at least one vibrator, the vibrator being situated in a region surrounded by the drive frame; the vibrator being mechanically coupled to the drive frame. The drive frame is able to be excited to generate a flexural vibration.

Abstract: A rotation rate sensor includes a substrate having a main extension plane, and a Coriolis element movable relative to the substrate, the Coriolis element being provided to be excitable, by way of excitation means, to perform an oscillation deflection substantially parallel to the main extension plane; and the Coriolis element further being provided to be deflectable, by way of a Coriolis force acting on the Coriolis element, to perform a detectable Coriolis deflection perpendicular to the main extension plane; and the rotation rate sensor further including at least one compensation electrode that is provided for at least partial compensation, as a function of the oscillation deflection, for a levitation force acting on the Coriolis element.

Abstract: A rotation rate sensor includes: a mounting device; a first drive frame having a drive, which is designed to set the first drive frame into a first oscillatory motion along an axis of oscillation relative to the mounting device; a first stator electrode; a first actuator electrode coupled to the first drive frame in such a way that in a rotary motion of the rotation rate sensor due to a Coriolis force, the first actuator electrode being displaceable in a first deflection direction relative to the first stator electrode; and an evaluation device configured to determine a voltage applied between the first stator electrode and the first actuator electrode, and to specify information regarding the rotary motion of the rotation rate sensor while taking the determined voltage value into account.