Patents by Inventor Daniel LÖFFLER

Daniel LÖFFLER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12297534
    Abstract: The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process for preparing inorganic metal- or semimetal-containing films comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal- or semimetal-containing compound in contact with a compound of general formula (I) or (II) wherein Z is NR2, PR2, OR, SR, CR2, SiR2, X is H, R? or NR?2, wherein at least one X is H, n is 1 or 2, and R and R? is an alkyl group, an alkenyl group, an aryl group, or a silyl group.
    Type: Grant
    Filed: November 16, 2020
    Date of Patent: May 13, 2025
    Assignees: BASF SE, Wayne State University
    Inventors: Sinja Verena Klenk, Alexander Georg Hufnagel, Hagen Wilmer, Daniel Löffler, Sabine Weiguny, Kerstin Schierle-Arndt, Charles Hartger Winter, Nilanka Weerathunga Sirikkathuge
  • Publication number: 20230046318
    Abstract: The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process for preparing inorganic metal- or semimetal-containing films comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal- or semimetal-containing compound in contact with a compound of general formula (I) or (II) wherein Z is NR2, PR2, OR, SR, CR2, SiR2, X is H, R? or NR?2, wherein at least one X is H, n is 1 or 2, and R and R? is an alkyl group, an alkenyl group, an aryl group, or a silyl group.
    Type: Application
    Filed: November 16, 2020
    Publication date: February 16, 2023
    Inventors: Sinja Verena KLENK, Alexander Georg HUFNNAGEL, Hagen WILMER, Daniel LÖFFLER, Sabine WEIGUNY, Kerstin SCHIERLE-ARNDT, Charles Hartger WINTER, Nilanka WEERATHUNGA SIRIKKATHUGE
  • Publication number: 20180187306
    Abstract: The present invention is in the field of processes for producing flexible organic-inorganic laminates as well as barrier films comprising flexible organic-inorganic laminates by atomic layer deposition. In particular the present invention relates to a process for producing a laminate comprising more than once the sequence comprising: (a) depositing an inorganic layer by performing 4 to 150 cycles of an atomic layer deposition process, and (b) depositing an organic layer comprising sulfur by a molecular layer deposition process.
    Type: Application
    Filed: May 7, 2015
    Publication date: July 5, 2018
    Applicant: BASF Coatings GmbH
    Inventors: Maraike AHLF, Felix EICKEMEYER, Daniel LÖFFLER, Stephan KLOTZ, Jürgen FRANK, Myung Mo SUNG, Kwan Hyuck YOON