Patents by Inventor Daniel LÖFFLER
Daniel LÖFFLER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190248821Abstract: The present invention relates to a process for generating a thin inorganic film on a substrate. In particular, the present invention relates to a process in which a compound of formula (I) is brought into a gaseous or an aerosol state and deposited from the gaseous or aerosol state onto a solid substrate: In the formula (I), R1, R2, R3, R4, and R5 are independently hydrogen, an alkyl group, an alkenyl group, an aryl group or a silyl group; p is 1, 2; M is Ni or Co; X is a ?-donating ligand which coordinates M; m is 1 or 2; and n is 0 to 3.Type: ApplicationFiled: July 14, 2017Publication date: August 15, 2019Applicant: BASF SEInventors: Carolin LIMBURG, Daniel LOEFFLER, Hagen WILMER, Marc WALTER, Matthias REINERS
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Patent number: 10344381Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In detail the present invention relates a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state (Fig.) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1 and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, R2, R3, R5 and R6 are independent of each other hydrogen, an alkyl group, an aryl group or a trialkylsilyl group, n is an integer from 1 to 3, M is Ni or Co, X is a ligand which coordinates M, and m is an integer from 0 to 4.Type: GrantFiled: July 22, 2015Date of Patent: July 9, 2019Assignee: BASF SEInventors: Julia Strautmann, Rocco Paciello, Thomas Schaub, Felix Eickemeyer, Daniel Loeffler, Hagen Wilmer, Udo Radius, Johannes Berthel, Florian Hering
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Publication number: 20190144998Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.Type: ApplicationFiled: November 29, 2016Publication date: May 16, 2019Applicant: BASF SEInventors: Falko ABELS, David Dominique SCHWEINFURTH, Karl MATOS, Daniel LOEFFLER, Maraike AHLF, Florian BLASBERG, Thomas SCHAUB, Jan SPIELMANN, Axel KIRSTE, Boris GASPAR
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Publication number: 20190144999Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. In particular, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state Lm—M—Xn (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R is independent of each other hydrogen, an alkyl group, an alkenyl group, an aryl group or a silyl group, p is 1, 2 or 3, M is Ni or Co, X is a ?-donating ligand which coordinates M, wherein if present at least one X is a ligand which coordinates M via a phosphor or nitrogen atom, m is 1 or 2 and n is 0 to 3.Type: ApplicationFiled: April 10, 2017Publication date: May 16, 2019Applicant: BASF SEInventors: Carolin LIMBURG, Daniel LOEFFLER, Hagen WILMER, Marc WALTER, Matthias REINERS
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Publication number: 20190003049Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In particular, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state Ln . . . M . . . Xm (I) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is a metal, L is a ligand which coordinates to M and contains at least one phosphorus-carbon multiple bond, wherein L contains a phosphorus-containing heterocyclic ring or a phosphorus-carbon triple bond, X is a ligand which coordinates to M, n is 1 to 5, and m is 0 to 5.Type: ApplicationFiled: January 17, 2017Publication date: January 3, 2019Applicant: BASF SEInventors: Falko ABELS, Daniel LOEFFLER, Hagen WILMER, Robert WOLF, Christian ROEDL, Philipp BUESCHELBERGER
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Publication number: 20180346501Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, or 2, R 1, R2 are an alkyl group, an alkenyl group, an aryl group or a silyl group, m is 1, 2, or 3, R3, R4, and R5 are an alkyl group, an alkenyl group, an aryl group, an alkoxy group, or an aryloxy group, and p is 1, 2 or 3.Type: ApplicationFiled: November 30, 2016Publication date: December 6, 2018Applicant: BASF SEInventors: Torben ADERMANN, Daniel LOEFFLER, Hagen WILMER, Kerstin SCHIERLE-ARNDT, Jan GERKENS, Christian VOLKMANN, Sven SCHNEIDER
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Publication number: 20180320265Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, M is Mn, Ni or Co, X is a ligand which coordinates M, wherein at least one X is a neutrally charged ligand, m is 1, 2 or 3 and n is at least 1 wherein the molecular weight of the compound of general formula (I) is up to 1000 g/mol.Type: ApplicationFiled: November 18, 2016Publication date: November 8, 2018Applicant: BASF SEInventors: Torben ADERMANN, Daniel LOEFFLER, Carolin LIMBURG, Falko ABELS, Hagen WILMER, Monica GILL, Matthew GRIFFITHS, Sean BARRY
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Patent number: 10106888Abstract: A process of bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R11, R12, R13, R14, R15, R16, R17, R18 are independent of each other hydrogen, an alkyl group, an aryl group, or a trialkylsilyl group, R21, R22, R23, R24 are independent of each other an alkyl group, an aryl group, or a trialkylsilyl group, n is 1 or 2, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 3.Type: GrantFiled: July 24, 2015Date of Patent: October 23, 2018Assignee: BASF SEInventors: Julia Strautmann, Rocco Paciello, Thomas Schaub, Kerstin Schierle-Arndt, Daniel Loeffler, Hagen Wilmer, Felix Eickemeyer, Florian Blasberg, Carolin Limburg
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Publication number: 20180187306Abstract: The present invention is in the field of processes for producing flexible organic-inorganic laminates as well as barrier films comprising flexible organic-inorganic laminates by atomic layer deposition. In particular the present invention relates to a process for producing a laminate comprising more than once the sequence comprising: (a) depositing an inorganic layer by performing 4 to 150 cycles of an atomic layer deposition process, and (b) depositing an organic layer comprising sulfur by a molecular layer deposition process.Type: ApplicationFiled: May 7, 2015Publication date: July 5, 2018Applicant: BASF Coatings GmbHInventors: Maraike AHLF, Felix EICKEMEYER, Daniel LÖFFLER, Stephan KLOTZ, Jürgen FRANK, Myung Mo SUNG, Kwan Hyuck YOON
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Publication number: 20180044357Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. In particular the present invention relates to a process comprising bringing a com-pound of general formula (I) into the gaseous or aerosol state Ln-M-XmL=formula and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, are independent of each other hydrogen, an alkyl group, an aryl group, or a SiA3 group with A being an alkyl or aryl group, and at least two of R1, R2, R3, R4 are a SiA3 group, n is an integer from 1 to 4, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 4.Type: ApplicationFiled: March 2, 2016Publication date: February 15, 2018Applicant: BASF SEInventors: Jan SPIELMANN, Falko ABELS, Florian BLASBERG, Katharina FEDERSEL, Christian SCHILDKNECHT, Daniel LOEFFLER, Torben ADERMANN, Juergen FRANK, Kerstin SCHIERLE-ARNDT, Sabine WEIGUNY
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Publication number: 20170233865Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. More specifically, the present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R11, R12, R13, R14, R15, R16, R17, R18 are independent of each other hydrogen, an alkyl group, an aryl group, or a trialkylsilyl group, R21, R22, R23, R24 are independent of each other an alkyl group, an aryl group, or a trialkylsilyl group, n is 1 or 2, M is a metal or semimetal, X is a ligand which coordinates M, and m is an integer from 0 to 3.Type: ApplicationFiled: July 24, 2015Publication date: August 17, 2017Applicant: BASF SEInventors: Julia STRAUTMANN, Rocco PACIELLO, Thomas SCHAUB, Kerstin SCHIERLE-ARNDT, Daniel LOEFFLER, Hagen WILMER, Felix EICKEMEYER, Florian BLASBERG, Carolin LIMBURG
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Publication number: 20170175267Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In detail the present invention relates a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state (Fig.) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1 and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, R2, R3, R5 and R6 are independent of each other hydrogen, an alkyl group, an aryl group or a trialkylsilyl group, n is an integer from 1 to 3, M is Ni or Co, X is a ligand which coordinates M, and m is an integer from 0 to 4.Type: ApplicationFiled: July 22, 2015Publication date: June 22, 2017Applicant: BASF SEInventors: Julia STRAUTMANN, Rocco PACIELLO, Thomas SCHAUB, Felix EICKEMEYER, Daniel LOEFFLER, Hagen WILMER, Udo RADIUS, Johannes BERTHEL, Florian HERING
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Publication number: 20160348243Abstract: The present invention relates to a process for the generation of thin inorganic films on substrates, in particular an atomic layer deposition process. This process comprises bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, R5, and R6 are independent of each other hydrogen, an alkyl group, or a trialkylsilyl group, n is an integer from 1 to 3, M is a metal or semimetal, 1 X is a ligand which coordinates M, and m is an integer from 0 to 4.Type: ApplicationFiled: January 22, 2015Publication date: December 1, 2016Applicant: BASF SEInventors: Ke XU, Christian SCHILDKNECHT, Jan SPIELMANN, Juergen FRANK, Florian BLASBERG, Daniel LOEFFLER, Martin GAERTNER, Sabine WEIGUNY, Kerstin SCHIERLE-ARNDT, Katharina FEDERSEL, Falko ABELS