Patents by Inventor Daniel Paul Sanders

Daniel Paul Sanders has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110147984
    Abstract: A method of forming a layered structure comprising a self-assembled material comprises: disposing a non-crosslinking photoresist layer on a substrate; pattern-wise exposing the photoresist layer to first radiation; optionally heating the exposed photoresist layer; developing the exposed photoresist layer in a first development process with an aqueous alkaline developer, forming an initial patterned photoresist layer; treating the initial patterned photoresist layer photochemically, thermally and/or chemically, thereby forming a treated patterned photoresist layer comprising non-crosslinked treated photoresist disposed on a first substrate surface; casting a solution of an orientation control material in a first solvent on the treated patterned photoresist layer, and removing the first solvent, forming an orientation control layer; heating the orientation control layer to effectively bind a portion of the orientation control material to a second substrate surface; removing at least a portion of the treated pho
    Type: Application
    Filed: December 18, 2009
    Publication date: June 23, 2011
    Inventors: Joy CHENG, Matthew E. COLBURN, Stefan HARRER, William D. HINSBERG, Steven J. HOLMES, Ho-Cheol KIM, Daniel Paul SANDERS
  • Publication number: 20100239985
    Abstract: The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
    Type: Application
    Filed: June 4, 2010
    Publication date: September 23, 2010
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Gregory Breyta, Daniel Paul Sanders, Hoa D. Truong
  • Patent number: 7781157
    Abstract: The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
    Type: Grant
    Filed: July 28, 2006
    Date of Patent: August 24, 2010
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Daniel Paul Sanders, Hoa D. Truong
  • Publication number: 20080026317
    Abstract: The present invention involves a method for generating a photoresist image on a substrate. The method comprises coating a substrate with a film comprising a polymer comprising fluorocarbinol monomers; imagewise exposing the film to radiation; heating the film to a temperature of, at, or below about 90° C. and developing the image. The present invention also relates to a method for generating a photoresist image on a substrate where a polymer comprising fluorocarbinol monomers is used as a protective top coat.
    Type: Application
    Filed: July 28, 2006
    Publication date: January 31, 2008
    Inventors: Gregory Breyta, Daniel Paul Sanders, Hoa D. Truong