Patents by Inventor Danny Lau

Danny Lau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250123793
    Abstract: A system can control volume levels of a plurality of speakers. The system can receive a selected volume level and a plurality of volume offsets corresponding to the plurality of speakers. At least two volume offsets can be different from each other. The system can calculate provisional volume levels for the plurality of speakers. Each provisional volume level can be a sum of the selected volume level and the corresponding volume offset of the speaker. When the provisional volume level is within an operational range of volume levels for the speaker, the system can set a volume level of the speaker to equal the provisional volume level. When the provisional volume level is outside the operational range of volume levels, the system can set the volume level of the speaker to equal a value within the operational range of volume levels for the speaker.
    Type: Application
    Filed: August 9, 2022
    Publication date: April 17, 2025
    Applicant: DTS, Inc.
    Inventors: Dannie Lau, Darren O'Brien
  • Patent number: 12261062
    Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. In one or more embodiments, a process chamber comprises a first window, a second window, a substrate support disposed between the first window and the second window, and a motorized rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window.
    Type: Grant
    Filed: July 19, 2023
    Date of Patent: March 25, 2025
    Assignee: Applied Materials, Inc.
    Inventors: Shu-Kwan Danny Lau, Toshiyuki Nakagawa, Zhiyuan Ye
  • Publication number: 20240357289
    Abstract: A wireless surround sound system can include a plurality of speakers and a source device, such as a television. The source device can decode a multichannel audio bitstream to a plurality of audio channels. The source device can combine the plurality of audio channels into a common bitstream. The source device can wirelessly send the common bitstream as a unicast simultaneously to at least some of the speakers of the plurality of speakers. The plurality of speakers can decode the common bitstream. The plurality of speakers can render audio from the decoded common bitstream. The rendered audio can correspond to a speaker configuration of the wireless surround sound system.
    Type: Application
    Filed: August 16, 2022
    Publication date: October 24, 2024
    Applicant: DTS, Inc.
    Inventors: Dannie Lau, ChunHo Lee
  • Publication number: 20240339342
    Abstract: An apparatus for heating a substrate within a thermal processing chamber is disclosed. The apparatus includes a chamber body, a gas inlet, a gas outlet, an upper window, a lower window, a substrate support, and an upper heating device. The upper heating device is a laser heating device and includes one or more laser assemblies. The laser assemblies include light sources, a cooling plate, optical fibers, and irradiation windows.
    Type: Application
    Filed: June 18, 2024
    Publication date: October 10, 2024
    Inventors: Shu-Kwan Danny LAU, Adel George TANNOUS, Patrick C. GENIS, Zhiyuan YE
  • Patent number: 12037701
    Abstract: A method and apparatus for a process chamber for thermal processing is described herein. The process chamber is a dual process chamber and shares a chamber body. The chamber body includes a first and a second set of gas inject passages. The chamber body may also include a first and a second set of exhaust ports. The process chamber may have a shared gas panel and/or a shared exhaust conduit.
    Type: Grant
    Filed: March 31, 2021
    Date of Patent: July 16, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Zhiyuan Ye, Shu-Kwan Danny Lau, Brian H. Burrows, Lori Washington, Herman Diniz, Martin A. Hilkene, Richard O. Collins, Nyi O. Myo, Manish Hemkar, Schubert S. Chu
  • Patent number: 12033874
    Abstract: An apparatus for heating a substrate within a thermal processing chamber is disclosed. The apparatus includes a chamber body, a gas inlet, a gas outlet, an upper window, a lower window, a substrate support, and an upper heating device. The upper heating device is a laser heating device and includes one or more laser assemblies. The laser assemblies include light sources, a cooling plate, optical fibers, and irradiation windows.
    Type: Grant
    Filed: September 3, 2020
    Date of Patent: July 9, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Shu-Kwan Danny Lau, Adel George Tannous, Patrick C. Genis, Zhiyuan Ye
  • Patent number: 11842907
    Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. In one or more embodiments, a process chamber comprises a first window, a second window, a substrate support disposed between the first window and the second window, and a motorized rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: December 12, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Shu-Kwan Danny Lau, Toshiyuki Nakagawa, Zhiyuan Ye
  • Publication number: 20230369077
    Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. In one or more embodiments, a process chamber comprises a first window, a second window, a substrate support disposed between the first window and the second window, and a motorized rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window.
    Type: Application
    Filed: July 19, 2023
    Publication date: November 16, 2023
    Inventors: Shu-Kwan Danny LAU, Toshiyuki NAKAGAWA, Zhiyuan YE
  • Patent number: 11680338
    Abstract: Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels extending substantially parallel to each other across the lower surface, and wherein the upper reflector plate includes air cooling slots extending from the upper surface to the lower surface.
    Type: Grant
    Filed: March 27, 2020
    Date of Patent: June 20, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Brian Burrows, Shu-Kwan Danny Lau, Zhiyuan Ye
  • Publication number: 20220068675
    Abstract: An apparatus for heating a substrate within a thermal processing chamber is disclosed. The apparatus includes a chamber body, a gas inlet, a gas outlet, an upper window, a lower window, a substrate support, and an upper heating device. The upper heating device is a laser heating device and includes one or more laser assemblies. The laser assemblies include light sources, a cooling plate, optical fibers, and irradiation windows.
    Type: Application
    Filed: September 3, 2020
    Publication date: March 3, 2022
    Inventors: Shu-Kwan Danny LAU, Adel George TANNOUS, Patrick C. GENIS, Zhiyuan YE
  • Publication number: 20220013376
    Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. In one or more embodiments, a process chamber comprises a first window, a second window, a substrate support disposed between the first window and the second window, and a motorized rotatable radiant spot heating source disposed over the first window and configured to provide radiant energy through the first window.
    Type: Application
    Filed: July 8, 2020
    Publication date: January 13, 2022
    Inventors: Shu-Kwan Danny LAU, Toshiyuki NAKAGAWA, Zhiyuan YE
  • Patent number: 11184661
    Abstract: Media is selected for video playback through a first device and audio playback through one or more separate devices connected through a wireless network. Different techniques for synchronizing the audio and video can be selected based on one or more factors to improve media playback.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: November 23, 2021
    Assignee: DTS, Inc.
    Inventors: Dannie Lau, Chunho Lee
  • Patent number: 11163524
    Abstract: When the volume is adjusted in a multi-speaker system, it is desirable that one speaker does not change volume disproportionately with respect to another speaker. A method is presented for adjusting a volume level of one or more speakers. Each speaker can have a non-standardized relationship between logical volume level that is input to the speaker and sound pressure level that is produced by the speaker. A selected volume level, corresponding to a sound pressure level, can be received via a user interface. A stored lookup table can be accessed to convert the sound pressure level to a first product-specific logical volume level for each speaker. The stored lookup table can tabulate the non-standardized relationship between logical volume level and sound pressure level for each speaker. Data corresponding to the first product-specific logical volume level can be transmitted to each speaker.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: November 2, 2021
    Assignee: DTS, Inc.
    Inventor: Dannie Lau
  • Publication number: 20210324514
    Abstract: A method and apparatus for a process chamber for thermal processing is described herein. The process chamber is a dual process chamber and shares a chamber body. The chamber body includes a first and a second set of gas inject passages. The chamber body may also include a first and a second set of exhaust ports. The process chamber may have a shared gas panel and/or a shared exhaust conduit. The process chamber described herein enables for the processing of multiple substrates simultaneously with improved process gas flow and heat distribution.
    Type: Application
    Filed: March 31, 2021
    Publication date: October 21, 2021
    Inventors: Zhiyuan YE, Shu-Kwan Danny LAU, Brian H. BURROWS, Lori WASHINGTON, Herman DINIZ, Martin A. HILKENE, Richard O. COLLINS, Nyi O. MYO, Manish HEMKAR, Schubert S. CHU
  • Publication number: 20210189593
    Abstract: Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels extending substantially parallel to each other across the lower surface, and wherein the upper reflector plate includes air cooling slots extending from the upper surface to the lower surface.
    Type: Application
    Filed: March 27, 2020
    Publication date: June 24, 2021
    Inventors: Brian BURROWS, Shu-Kwan Danny LAU, Zhiyuan YE
  • Publication number: 20210144431
    Abstract: Media is selected for video playback through a first device and audio playback through one or more separate devices connected through a wireless network. Different techniques for synchronizing the audio and video can be selected based on one or more factors to improve media playback.
    Type: Application
    Filed: August 21, 2020
    Publication date: May 13, 2021
    Inventors: Dannie Lau, Chunho Lee
  • Patent number: 10897667
    Abstract: A user device can be used to correct for a latency of an audio chain, which extends inclusively between an input and a speaker. The user device can communicate an indication to the speaker to play a sound at a first time, and record a second time at which a microphone on the user device detects the sound. The user device can compare the first and second times to determine a latency of the audio chain. The user device can communicate adjustment data corresponding to the determined latency to a component in the audio chain. The component can use the adjustment data to correct for the determined latency. In some examples, the user device can display instructions to position the user device a specified distance from the speaker, and can account for a time-of-flight of sound to propagate along the specified distance.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: January 19, 2021
    Assignee: DTS, Inc.
    Inventor: Dannie Lau
  • Publication number: 20210004202
    Abstract: When the volume is adjusted in a multi-speaker system, it is desirable that one speaker does not change volume disproportionately with respect to another speaker. A method is presented for adjusting a volume level of one or more speakers. Each speaker can have a non-standardized relationship between logical volume level that is input to the speaker and sound pressure level that is produced by the speaker. A selected volume level, corresponding to a sound pressure level, can be received via a user interface. A stored lookup table can be accessed to convert the sound pressure level to a first product-specific logical volume level for each speaker. The stored lookup table can tabulate the non-standardized relationship between logical volume level and sound pressure level for each speaker. Data corresponding to the first product-specific logical volume level can be transmitted to each speaker.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Inventor: Dannie Lau
  • Patent number: 10795637
    Abstract: When the volume is adjusted in a multi-speaker system, it is desirable that one speaker does not change volume disproportionately with respect to another speaker. A method is presented for adjusting a volume level of one or more speakers. Each speaker can have a non-standardized relationship between logical volume level that is input to the speaker and sound pressure level that is produced by the speaker. A selected volume level, corresponding to a sound pressure level, can be received via a user interface. A stored lookup table can be accessed to convert the sound pressure level to a first product-specific logical volume level for each speaker. The stored lookup table can tabulate the non-standardized relationship between logical volume level and sound pressure level for each speaker. Data corresponding to the first product-specific logical volume level can be transmitted to each speaker.
    Type: Grant
    Filed: June 8, 2017
    Date of Patent: October 6, 2020
    Assignee: DTS, Inc.
    Inventor: Dannie Lau
  • Patent number: 10770319
    Abstract: Embodiments described herein provide processing chambers that include an enclosure for a processing volume, a rotatable support within the enclosure, the support having a shaft that extends outside the enclosure, wherein the shaft has a signal feature located outside the processing volume, an energy module within the enclosure, wherein the shaft extends through the energy module, one or more directed energy sources coupled to the enclosure, and one or more signalers positioned proximate to the signal feature, each signaler coupled to at least one of the directed energy sources.
    Type: Grant
    Filed: February 12, 2019
    Date of Patent: September 8, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Shu-Kwan Danny Lau, Zhiyuan Ye, Zuoming Zhu, Nyi O. Myo, Errol Antonio C. Sanchez, Schubert S. Chu