Abstract: A method can include receiving a first power supply voltage at a first terminal substantially at a first side of an IC device; providing first and second rows of insulated gate field effect transistors (IGFETs) substantially at a second side of the IC device, each IGFET including first and second source/drains (S/Ds), channels, and a control gate that substantially surrounds the channels. A first power supply voltage can be coupled from the first terminal to an S/D of an IGFET in the first row via a first conductive via disposed between the first side and the second side and a first conductive line buried in and proximate the second side. IGFETs of the first row can have a first conductivity type. IGFETs of the second row can have a second conductivity type. Corresponding devices and systems are also disclosed.

Abstract: A method can include receiving a first power supply voltage at a first terminal at a first side of an IC device and providing a row of stacked pairs of insulated gate field effect transistor (IGFETs) substantially at the second side of the IC device. Each stacked pair can include a first and second IGFET of different conductivity types. Each IGFET can include multiple channels and a control gate that substantially surrounds the channels. A first power supply can be coupled from the first power supply terminal to a first source of one IGFET of the stacked pair via a first conductive via disposed between the first side and the second side and a first conductive line buried in and proximate the second side below the row of stacked pairs. Corresponding devices and systems are also disclosed.

Abstract: A method can include providing first and second insulated gate field effect transistor (IGFET) at a second side of the IC device. First and second IGFETS can be of different conductivity types, and can include first and second source/drains (S/Ds), multiple channels, and a control gate that substantially surrounds the channels. A first power supply voltage can be received at a terminal at the first side of the IC device and coupled to the first IGFET through a conductive via and buried conductive lines. A conductive via can extend through a substrate. Buried conductive lines can be formed in a substrate below first and second IGFETs. An electrostatic discharge structure can be provided proximate to the first side and electrically connected to the first terminal. Corresponding devices and systems are also disclosed.

Abstract: A method can include receiving a first and a second power supply voltage at terminals disposed at a first side of an IC device. Rows of insulated gate field effect transistors (IGFETs) can be provided as a second side of the IC device. Each IGFET can include first and second source/drains (S/Ds), multiple channels, and a control gate that surrounds the channels. Coupling the first or second power supply voltage from one of the terminals to a first S/D of an IGFET via conductive vias and conductive lines. The conductive vias connected to adjacent conductive lines can be offset from one another in the first direction. Corresponding devices and systems are also disclosed.

Abstract: A method can include providing a first power supply voltage to a first terminal substantially at a first side of an IC device, and providing a plurality of first rows of insulated gate field effect transistors (IGFETs) at a second side. The first power supply voltage can be coupled from the first terminal to source conductive lines with first conductive vias. The first power supply can be coupled from each source conductive line to one or more distribution conductive lines. Source and distribution lines can be buried in and proximate the second side below the first rows of IGFETs. The second power supply can be coupled to a source/drain of at least one IGFET in each row of IGFETs by a source or distribution conductive line. Corresponding devices and systems are also disclosed.

Abstract: A method can include receiving a first and second power supply voltage at first and second terminals. An input signal can be received at, or an output signal provided on a third terminal. First and second rows of insulated gate field effect transistors (IGFETs) can be provided at a second side of an IC device, and can form a circuit. A conductive signal path can be provided between the third terminal and the circuit via a third via and third conductive structure. Corresponding devices and systems are also disclosed.

Abstract: A method can include receiving first, second and third power supply voltages at first, second and third terminals, respectively, located at a first side of an IC device. First, second and third rows of insulated gate field effect transistors (IGFETs) can be formed at a second side. A first power supply can be coupled from the first terminal to an IGFET in the first row via a first conductive via and first conductive line. A second power supply can be coupled from the second terminal to an IGFET in the second row via a second conductive via and second conductive line. A third power supply can be coupled from the third terminal to an IGFET in the third row via a third conductive via and third conductive line. Corresponding devices and systems are also disclosed.

Abstract: An integrated circuit device that has improved write margin at low operating voltages is disclosed. The integrated circuit device can include an SRAM array that has end power select circuits that can include selection circuits that provide a controllable impedance path between a power supply potential and an array power line. A power supply detection circuit may provide an assist enable signal when a power supply potential is low enough that write assist is needed. A power control circuit may provide end power control signals to end power select circuits to selectively control an impedance path between a power supply potential and an array power line to provide an I-R drop to a selected memory cell. In this way, write margins may be improved at low operating voltages.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include electrostatic discharge (ESD) protection circuit structures. The ESD protection circuit structures may be formed in regions other than the region that the IGFETs are formed as well as in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming ESD protection circuit structures in regions below the IGFETs, an older process technology may be used and device size may be decreased. Furthermore, planar IGFETs of FinFETs may be formed in other regions to decrease device size and improve costs.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include a temperature sensor circuit and core circuitry. The temperature senor circuit may include at least one portion formed in a region other than the region that the IGFETs are formed as well as at least another portion formed in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming a portion of the temperature sensor circuit in regions below the IGFETs, an older process technology may be used and device size may be decreased and cost may be reduced.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include a temperature sensor circuit and core circuitry. The temperature senor circuit may include at least one portion formed in a region other than the region that the IGFETs are formed as well as at least another portion formed in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming a portion of the temperature sensor circuit in regions below the IGFETs, an older process technology may be used and device size may be decreased and cost may be reduced.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include electrostatic discharge (ESD) protection circuit structures. The ESD protection circuit structures may be formed in regions other than the region that the IGFETs are formed as well as in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming ESD protection circuit structures in regions below the IGFETs, an older process technology may be used and device size may be decreased. Furthermore, planar IGFETs of FinFETs may be formed in other regions to decrease device size and improve costs.

Abstract: An integrated circuit device that has improved write margin at low operating voltages is disclosed. The integrated circuit device can include an SRAM array that has end power select circuits that can include selection circuits that provide a controllable impedance path between a power supply potential and an array power line. A power supply detection circuit may provide an assist enable signal when a power supply potential is low enough that write assist is needed. A power control circuit may provide end power control signals to end power select circuits to selectively control an impedance path between a power supply potential and an array power line to provide an I-R drop to a selected memory cell. In this way, write margins may be improved at low operating voltages.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include electrostatic discharge (ESD) protection circuit structures. The ESD protection circuit structures may be formed in regions other than the region that the IGFETs are formed as well as in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming ESD protection circuit structures in regions below the IGFETs, an older process technology may be used and device size may be decreased. Furthermore, planar IGFETs of FinFETs may be formed in other regions to decrease device size and improve costs.

Abstract: An integrated circuit device that has improved write margin at low operating voltages is disclosed. The integrated circuit device can include an SRAM array that has end power select circuits that can include selection circuits that provide a controllable impedance path between a power supply potential and an array power line. A power supply detection circuit may provide an assist enable signal when a power supply potential is low enough that write assist is needed. A power control circuit may provide end power control signals to end power select circuits to selectively control an impedance path between a power supply potential and an array power line to provide an I-R drop to a selected memory cell. In this way, write margins may be improved at low operating voltages.

Abstract: An integrated circuit device that has improved write margin at low operating voltages is disclosed. The integrated circuit device can include an SRAM array that has end power select circuits that can include selection circuits that provide a controllable impedance path between a power supply potential and an array power line. A power supply detection circuit may provide an assist enable signal when a power supply potential is low enough that write assist is needed. A power control circuit may provide end power control signals to end power select circuits to selectively control an impedance path between a power supply potential and an array power line to provide an I-R drop to a selected memory cell. In this way, write margins may be improved at low operating voltages.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include a temperature sensor circuit and core circuitry. The temperature sensor circuit may include at least one portion formed in a region other than the region that the IGFETs are formed as well as at least another portion formed in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming a portion of the temperature sensor circuit in regions below the IGFETs, an older process technology may be used and device size may be decreased and cost may be reduced.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include electrostatic discharge (ESD) protection circuit structures. The ESD protection circuit structures may be formed in regions other than the region that the IGFETs are formed as well as in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming ESD protection circuit structures in regions below the IGFETs, an older process technology may be used and device size may be decreased. Furthermore, planar IGFETs of FinFETs may be formed in other regions to decrease device size and improve costs.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include a temperature sensor circuit and core circuitry. The temperature senor circuit may include at least one portion formed in a region other than the region that the IGFETs are formed as well as at least another portion formed in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming a portion of the temperature sensor circuit in regions below the IGFETs, an older process technology may be used and device size may be decreased and cost may be reduced.

Abstract: An integrated circuit device having insulated gate field effect transistors (IGFETs) having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure has been disclosed. The integrated circuit device may include a temperature sensor circuit and core circuitry. The temperature senor circuit may include at least one portion formed in a region other than the region that the IGFETs are formed as well as at least another portion formed in the region that the IGFETs having a plurality of horizontally disposed channels that can be vertically aligned above a substrate with each channel being surrounded by a gate structure are formed. By forming a portion of the temperature sensor circuit in regions below the IGFETs, an older process technology may be used and device size may be decreased and cost may be reduced.