Patents by Inventor David A. Markle

David A. Markle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10409172
    Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.
    Type: Grant
    Filed: January 23, 2017
    Date of Patent: September 10, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: David Markle, Thomas Laidig, Timothy N. Thomas
  • Publication number: 20190049789
    Abstract: The present disclosure generally relates to systems and methods for manufacturing wire grid polarizers for LCDs using interference lithography, which are also useful for generating large-area grating patterns. In one embodiment, a method includes depositing a bottom anti-reflective coating layer over an aluminum coated flat panel display substrate, depositing a photoresist layer over the bottom anti-reflective coating layer, and exposing the photoresist layer with an image from a phase grating mask. The exposure with the phase grating mask is done by imaging the ±1 diffraction orders from the phase grating mask onto the substrate using a half Dyson optical system. A plurality of half Dyson systems are generally used in parallel to pattern fine geometry lines and spaces of a wire grid polarizer for a large area substrate. Each half Dyson system includes a primary mirror, a positive lens and a reticle.
    Type: Application
    Filed: February 10, 2017
    Publication date: February 14, 2019
    Inventors: David MARKLE, Jang Fung CHEN
  • Patent number: 10162268
    Abstract: Implementations disclosed herein generally relate to a light pipe, or kaleido, for homogenizing light such that the light is uniform once the light exits the light pipe. By reflecting the light inside the light pipe, light uniformity is increased. In one implementation, a light pipe for an image projection apparatus is provided. The light pipe comprises an elongated rectangular body having a refractive index that provides total internal reflection within the elongated rectangular body. The elongated rectangular body has an input face for accepting light into the elongated rectangular body. The input face disposed substantially orthogonal to a longitudinal axis of the elongated rectangular body. The elongated rectangular body has an output face for releasing light from the elongated rectangular body. The output face is disposed substantially orthogonal to the longitudinal axis. The elongated rectangular body has a twist along the longitudinal axis.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: December 25, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: David Markle, Timothy N. Thomas
  • Publication number: 20180335694
    Abstract: The present disclosure generally relates to methods and systems for manufacturing wire grid polarizers (WGP) using Markle-Dyson exposure systems and dual tone development (DTD) frequency doubling. In one embodiment, the method includes depositing a photoresist layer over an aluminum-coated display substrate, patterning the photoresist layer by dual tone development using a Markle-Dyson system to form a photoresist pattern, and transferring the photoresist pattern into the aluminum-coated display substrate to manufacture a WGP having finer pitch, for example less than or equal to about 100 nm, and increased frequency.
    Type: Application
    Filed: April 24, 2018
    Publication date: November 22, 2018
    Inventors: Jang Fung CHEN, Christopher Dennis BENCHER, David MARKLE
  • Patent number: 9907152
    Abstract: An illumination system and methods for controlling the illumination system are provided. In one embodiment, the method includes providing a plurality of illumination sources, monitoring optical output power of the plurality of illumination sources over a period of time, and controlling the plurality of illumination sources to maintain a predetermined level of optical output power. The method further includes compensating for degradations of one or more of the plurality of illumination sources to maintain the predetermined level of optical output power, predicting a lifetime of the illumination system based on the parameters of the plurality of illumination sources, and performing periodic maintenance of the plurality of illumination sources according to a quality control schedule.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: February 27, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jeffrey Kaskey, Thomas Laidig, David Markle, Jang Fung Chen
  • Publication number: 20180024441
    Abstract: Implementations disclosed herein generally relate to a light pipe, or kaleido, for homogenizing light such that the light is uniform once the light exits the light pipe. By reflecting the light inside the light pipe, light uniformity is increased. In one implementation, a light pipe for an image projection apparatus is provided. The light pipe comprises an elongated rectangular body having a refractive index that provides total internal reflection within the elongated rectangular body. The elongated rectangular body has an input face for accepting light into the elongated rectangular body. The input face disposed substantially orthogonal to a longitudinal axis of the elongated rectangular body. The elongated rectangular body has an output face for releasing light from the elongated rectangular body. The output face is disposed substantially orthogonal to the longitudinal axis. The elongated rectangular body has a twist along the longitudinal axis.
    Type: Application
    Filed: July 21, 2017
    Publication date: January 25, 2018
    Inventors: David MARKLE, Timothy N. THOMAS
  • Publication number: 20180017781
    Abstract: The present disclosure generally relates to frustrated cube assemblies having a first prism having a first surface, a second surface, and a first hypotenuse, and a second prism having a third surface, a fourth surface, and a second hypotenuse. The first and second hypotenuses face one another and are separated by an air gap. The frustrated cube assembly may include a tilted mirror adjacent the second surface. The second surface may be a reflective diffraction grating. Light is reflected to a digital micromirror device (DMD) adjacent to the frustrated cube assembly at a normal incidence angle and through an image projection system along a single optical axis. The direction of light incident on the DMD is such that light reflected from an “on” mirror is directed along the normal to the DMD surface and at 45 degrees to the hypotenuses. The input and output light beams are parallel.
    Type: Application
    Filed: June 30, 2017
    Publication date: January 18, 2018
    Inventors: David MARKLE, Thomas L. LAIDIG, Timothy N. THOMAS, Jang Fung CHEN
  • Patent number: 9737092
    Abstract: An herbal grinder and reservoir having a conical shape wherein said herbal grinder comprises a top grinding cap and a grinding section comprising a plurality of grinding knives; and wherein said grinding section comprises a plate having a drop through pattern for allowing ground material to exit the grinding section and fall into the reservoir.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: August 22, 2017
    Assignee: ASPENDAM, LLC
    Inventors: Matthew Grumbacher, David Markle
  • Patent number: 9733573
    Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
    Type: Grant
    Filed: January 11, 2016
    Date of Patent: August 15, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: David Markle, Thomas Laidig, Jeffrey Kaskey, Jang Fung Chen
  • Publication number: 20170219934
    Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.
    Type: Application
    Filed: January 23, 2017
    Publication date: August 3, 2017
    Inventors: David MARKLE, Thomas LAIDIG, Timothy N. THOMAS
  • Patent number: 9645496
    Abstract: Maskless digital lithography systems and methods with image motion compensation are disclosed. The systems include an illuminator, an image transducer and a scanning device, wherein the transducer can be upstream or downstream from the scanning device. The illuminator provides illumination light that is modulated by the image transducer. The scanning device, illuminator and image transducer are operated in synchrony so that an image formed in a photoresist layer on a moving substrate forms a photoresist pattern that is not substantially smeared.
    Type: Grant
    Filed: July 27, 2015
    Date of Patent: May 9, 2017
    Inventor: David A. Markle
  • Publication number: 20160219684
    Abstract: An illumination system and methods for controlling the illumination system are provided. In one embodiment, the method includes providing a plurality of illumination sources, monitoring optical output power of the plurality of illumination sources over a period of time, and controlling the plurality of illumination sources to maintain a predetermined level of optical output power. The method further includes compensating for degradations of one or more of the plurality of illumination sources to maintain the predetermined level of optical output power, predicting a lifetime of the illumination system based on the parameters of the plurality of illumination sources, and performing periodic maintenance of the plurality of illumination sources according to a quality control schedule.
    Type: Application
    Filed: March 31, 2016
    Publication date: July 28, 2016
    Inventors: Jeffrey KASKEY, Thomas LAIDIG, David MARKLE, Jang Fung CHEN
  • Patent number: 9401278
    Abstract: Methods and apparatuses are provided for improving the intensity profile of a beam image used to process a semiconductor substrate. At least one photonic beam may be generated and manipulated to form an image having an intensity profile with an extended uniform region useful for thermally processing the surface of the substrate. The image may be scanned across the surface to heat at least a portion of the substrate surface to achieve a desired temperature within a predetermined dwell time. Such processing may achieve a high efficiency due to the large proportion of energy contained in the uniform portion of the beam.
    Type: Grant
    Filed: April 15, 2014
    Date of Patent: July 26, 2016
    Assignee: Ultratech, Inc.
    Inventors: Andrew M Hawryluk, Boris Grek, David A Markle
  • Publication number: 20160124316
    Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
    Type: Application
    Filed: January 11, 2016
    Publication date: May 5, 2016
    Inventors: David MARKLE, Thomas LAIDIG, Jeffrey KASKEY, Jang Fung CHEN
  • Patent number: 9329484
    Abstract: Methods of and apparatus for performing direct-write lithography in a two-color photoresist layer are disclosed. The method includes exposing the two-color photoresist layer with transducer and inhibition images that respectively define bright spots and dark spots. The transducer image generates excited-state photo-molecules while the inhibition image converts the exited-state photo-molecules to an unexcited state that is not susceptible to conversion to an irreversible exposed state. The dark spots and bright spots are aligned, with the dark spots being smaller than the bright spots so that a portion of the excited-state photo-molecules adjacent the periphery of the bright spots absorb the inhibition radiation and transition to the unexcited state while a portion of the excited photo-molecules at the center of bright spots are not exposed to the inhibition light and transition to an irreversible exposed state. This forms in the two-color photoresist layer a pattern of sub-resolution photoresist pixels.
    Type: Grant
    Filed: September 26, 2015
    Date of Patent: May 3, 2016
    Assignee: Periodic Structures, Inc.
    Inventors: David A. Markle, John S. Petersen
  • Publication number: 20160103394
    Abstract: Methods of and apparatus for performing direct-write lithography in a two-color photoresist layer are disclosed. The method includes exposing the two-color photoresist layer with transducer and inhibition images that respectively define bright spots and dark spots. The transducer image generates excited-state photo-molecules while the inhibition image converts the exited-state photo-molecules to an unexcited state that is not susceptible to conversion to an irreversible exposed state. The dark spots and bright spots are aligned, with the dark spots being smaller than the bright spots so that a portion of the excited-state photo-molecules adjacent the periphery of the bright spots absorb the inhibition radiation and transition to the unexcited state while a portion of the excited photo-molecules at the center of bright spots are not exposed to the inhibition light and transition to an irreversible exposed state. This forms in the two-color photoresist layer a pattern of sub-resolution photoresist pixels.
    Type: Application
    Filed: September 26, 2015
    Publication date: April 14, 2016
    Applicant: PERIODIC STRUCTURES, INC.
    Inventors: David A. Markle, John S. Petersen
  • Patent number: 9304410
    Abstract: Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.
    Type: Grant
    Filed: December 30, 2013
    Date of Patent: April 5, 2016
    Assignee: Periodic Structures Inc.
    Inventors: David A. Markle, Rudolf H. Hendel, John S. Petersen, Hwan J. Jeong
  • Publication number: 20160085156
    Abstract: Maskless digital lithography systems and methods with image motion compensation are disclosed. The systems include an illuminator, an image transducer and a scanning device, wherein the transducer can be upstream or downstream from the scanning device. The illuminator provides illumination light that is modulated by the image transducer. The scanning device, illuminator and image transducer are operated in synchrony so that an image formed in a photoresist layer on a moving substrate forms a photoresist pattern that is not substantially smeared.
    Type: Application
    Filed: July 27, 2015
    Publication date: March 24, 2016
    Inventor: David A. Markle
  • Patent number: D762090
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: July 26, 2016
    Assignee: Aspendam LLC
    Inventors: Matthew Grumbacher, David Markle
  • Patent number: D762091
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: July 26, 2016
    Assignee: Aspendam LLC
    Inventors: Matthew Grumbacher, David Markle