Patents by Inventor David M. Williamson

David M. Williamson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200117099
    Abstract: A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N>1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.
    Type: Application
    Filed: October 17, 2019
    Publication date: April 16, 2020
    Inventors: Daniel Gene Smith, David M. Williamson
  • Publication number: 20200073251
    Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes—includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.
    Type: Application
    Filed: November 8, 2019
    Publication date: March 5, 2020
    Applicant: Nikon Corporation
    Inventors: Daniel Gene Smith, David M. Williamson, Donis G. Flagello, Michael B. Binnard
  • Publication number: 20200057373
    Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes a projection optic sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.
    Type: Application
    Filed: October 25, 2019
    Publication date: February 20, 2020
    Applicant: Nikon Corporation
    Inventors: Daniel Gene Smith, David M. Williamson
  • Patent number: 10488638
    Abstract: Projection optical system for forming an image on a substrate and including an illumination relay lens and a projection lens each of which is a catadioptric system. The projection lens may include two portions in optical communication with one another, the first of which is dioptric and the second of which is catadioptric. In a specific case, the projection optical system satisfies 4 < ? ? I ? ? ? T ? < 30 , where ?I and ?T are magnifications of the first portion and the overall projection lens. Optionally, the projection lens may be structured to additionally satisfy 6 < ? ? II ? ? ? T ? < 20 , where ?II is a magnification of the second portion. A digital scanner including such projection optical system and operating with UV light having a spectral bandwidth on the order of 1 picometer. Method for forming an image with such projection optical system.
    Type: Grant
    Filed: July 5, 2017
    Date of Patent: November 26, 2019
    Assignee: NIKON CORPORATION
    Inventor: David M. Williamson
  • Publication number: 20190262201
    Abstract: A patient support apparatus may include a support surface configured to conduct air along a top face of the support surface so that heat and moisture from a patient lying on the support surface are drawn away from the top face of the support surface. An opening may be formed in a side of the support surface. A cavity may extend from the opening into the support surface. An inlet port may be positioned within the cavity and fluidly coupled to the top face. A blower assembly may be configured to position within the cavity. The blower assembly may have an outlet port that couples to the inlet port when the blower assembly is positioned within the cavity. The blower assembly may conduct air through the inlet port to the top face of the support surface.
    Type: Application
    Filed: February 26, 2019
    Publication date: August 29, 2019
    Inventors: Darrell L. Borgman, Douglas E. Borgman, Arpit Shah, Wui Hsien Wong, Keith Moores, Jason M. Gilreath, Michael R. Montini, Charles A. Lachenbruch, Eric R. Meyer, Frank E. Sauser, Catherine M. Wagner, Rachel L. Williamson, Brandon P. Fisk, Jason B. Grace, Brian Guthrie, Nicole Johannigman, Gregory J. Shannon, David C. Newkirk, Michael Churilla, Jnanesha Ramegowda, Taylor Franklin, Kathryn R. Smith, John G. Byers, Frederick K. Schultz, Andrew R. Wager, Sridhar Karimpuzha Seshadri, Gary R. Gibbons, Scott M. Corbin, John Goewert, Thomas L. Simpson, Faron L. Blessing, James D. Voll, Kin Meng Choi, Stephen S. Amrhein, Herve Gautier, Jean-Francois Lellig, Philippe Kaikenger, Matthieu Guetta
  • Publication number: 20190261853
    Abstract: An optical imaging system includes a first lens system housed in a body of a mobile telecommunication device, the first lens system having a first optical axis, a first entrance pupil fixed in space in a reference plane associated with said body, and a first focal length; and an optical telescope providing a diffraction-limited imaging within a spectral range from at least 486 nm to at least 656 nm. The optical imaging system is configured to image, when the optical telescope is inserted between the first lens system and an entrance pupil of a visual system of an eye (EPE), the EPE onto the first entrance pupil and vice versa with a substantially unit magnification.
    Type: Application
    Filed: February 27, 2019
    Publication date: August 29, 2019
    Inventor: David M. Williamson
  • Patent number: 10386626
    Abstract: Non-telecentric in image space optical objective dimensioned to operate as part of intravascular endoscope probe and including first and second groups of lens elements (separated by an aperture stop) each of which has negative optical power. The first group of lens elements includes a first meniscus lens with a positive dioptric power and a first optical doublet. The second group of lens elements includes a sequence of second and third optical doublets and a second meniscus lens that follows the third optical doublet. At least one of the first and second groups of lens elements includes an aspheric refractive surface, thereby reducing distortion down to under 0.25% for field angles up to at least 40 degrees.
    Type: Grant
    Filed: February 6, 2017
    Date of Patent: August 20, 2019
    Assignee: NIKON CORPORATION
    Inventor: David M. Williamson
  • Patent number: 10370504
    Abstract: Described herein is a method for producing a biofabricated material from collagen or collagen-like proteins which are recombinantly produced and which contain substantially no 3-hydroxyproline. The collagen or collagen-like proteins are isolated from animal sources, or produced by recombinant DNA techniques or by chemical synthesis. The collagen or collagen-like proteins are fibrillated, crosslinked, dehydrated and lubricated thus forming the biofabricated material having a substantially uniform network of collagen fibrils.
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: August 6, 2019
    Assignee: MODERN MEADOW, INC.
    Inventors: Brendan Patrick Purcell, David Thomas Williamson, Francoise Suzanne Marga, Susan J. Schofer, Darryl Miles Cassingham, Stephen M. Spinella, Amy Congdon
  • Publication number: 20190235393
    Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.
    Type: Application
    Filed: April 9, 2019
    Publication date: August 1, 2019
    Inventors: Michael B. Binnard, Daniel Gene Smith, David M. Williamson
  • Patent number: 10359618
    Abstract: Optical objective dimensioned to operate as part of intravascular endoscope probe and including first and second groups of lens elements. The first group of lens elements includes a first meniscus lens with a negative dioptric power and a first optical doublet. The second group of lens elements include a sequence of second, third, and fourth optical doublets and a second meniscus lens with a positive dioptric power. At least one of the first and second groups of lens elements includes an aspheric refractive surface, thereby reducing distortion down to under 1% for field angles up to at least 40 degrees. Methods for using same, including embodiments with such multiple optical objectives used for acquisition of images of targets with fixed FOV and image fusion, providing enhanced imaging data for target analysis.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: July 23, 2019
    Assignee: NIKON CORPORATION
    Inventors: David M. Williamson, Brian L. Stamper
  • Publication number: 20190203000
    Abstract: A biofabricated material containing a network of crosslinked collagen fibrils is disclosed. This material is composed of collagen which is also a major component of natural leather and is produced by a process of fibrillation of collagen molecules into fibrils, crosslinking the fibrils and lubricating the crosslinked fibrils. Unlike natural leathers, this biofabricated material exhibits non-anisotropic (not directionally dependent) physical properties, for example, a sheet of biofabricated material can have substantially the same elasticity or tensile strength when stretched or stressed in different directions. Unlike natural leather, it has a uniform texture that facilitates uniform uptake of dyes and coatings. Aesthetically, it produces a uniform and consistent grain for ease of manufacturability. It can have substantially identical grain, texture and other aesthetic properties on both sides distinct from natural leather where the grain increases from one side (e.g.
    Type: Application
    Filed: March 19, 2019
    Publication date: July 4, 2019
    Applicant: MODERN MEADOW, INC.
    Inventors: Brendan Patrick PURCELL, David Thomas WILLIAMSON, Lixin DAI, Darryl Miles CASSINGHAM, Stephen M. SPINELLA
  • Patent number: 10301440
    Abstract: A biofabricated material containing a network of crosslinked collagen fibrils is disclosed. This material is composed of collagen which is also a major component of natural leather and is produced by a process of fibrillation of collagen molecules into fibrils, crosslinking the fibrils and lubricating the crosslinked fibrils. Unlike natural leathers, this biofabricated material exhibits non-anisotropic (not directionally dependent) physical properties, for example, a sheet of biofabricated material can have substantially the same elasticity or tensile strength when stretched or stressed in different directions. Unlike natural leather, it has a uniform texture that facilitates uniform uptake of dyes and coatings. Aesthetically, it produces a uniform and consistent grain for ease of manufacturability. It can have substantially identical grain, texture and other aesthetic properties on both sides distinct from natural leather where the grain increases from one side (e.g.
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: May 28, 2019
    Assignee: MODERN MEADOW, INC.
    Inventors: Brendan Patrick Purcell, David Thomas Williamson, Lixin Dai, Darryl Miles Cassingham, Stephen M. Spinella
  • Patent number: 10295911
    Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: May 21, 2019
    Assignee: NIKON CORPORATION
    Inventors: Michael B. Binnard, Daniel Gene Smith, David M. Williamson
  • Publication number: 20190113723
    Abstract: A catoptric system for EUV lithography includes six freeform reflective surfaces that are specified based on fringe Zernike polynomials. Each of the surfaces is tilted and/or decentered in a meridian plane and with respect to a common axis so that image and object planes are parallel. Rectangular fields can be imaged with image space numerical aperture of at least 0.5.
    Type: Application
    Filed: December 12, 2018
    Publication date: April 18, 2019
    Applicant: Nikon Corporation
    Inventor: David M. Williamson
  • Patent number: 10139610
    Abstract: A catadioptric microscope objective color-corrected for any wavelength in 190 nm to 1000 nm operational range and containing primary spherical front-surface mirror devoid of a through-hole and rear-surface plane-parallel mirror, each of which mirrors has a corresponding reflective annular coating defining an aperture formed in such coating coaxially with the optical axis. The objective, devoid of a Mangin element, is configured such that for any optical field with a diameter smaller than about 50 microns the Strehl ratio is no lower than 0.0781, and/or longitudinal spherical aberration is no larger than 0.0008 mm, and/or the astigmatism is smaller than 0.0005 mm, and/or distortion is smaller than 0.012 percent within the operational range.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: November 27, 2018
    Assignee: NIKON CORPORATION
    Inventor: David M. Williamson
  • Publication number: 20180275387
    Abstract: A catadioptric microscope objective color-corrected for any wavelength in 190 nm to 1000 nm operational range and containing primary spherical front-surface mirror devoid of a through-hole and rear-surface plane-parallel mirror, each of which mirrors has a corresponding reflective annular coating defining an aperture formed in such coating coaxially with the optical axis. The objective, devoid of a Mangin element, is configured such that for any optical field with a diameter smaller than about 50 microns the Strehl ratio is no lower than 0.0781, and/or longitudinal spherical aberration is no larger than 0.0008 mm, and/or the astigmatism is smaller than 0.0005 mm, and/or distortion is smaller than 0.012 percent within the operational range.
    Type: Application
    Filed: October 25, 2016
    Publication date: September 27, 2018
    Inventor: David M. Williamson
  • Publication number: 20170336715
    Abstract: Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece includes source of EUV radiation; a pattern-source defining 1D pattern; an illumination unit (IU) configured to irradiate the pattern-source; and projection optics (PO) configured to optically image, with a reduction factor N>1, the 1D pattern on image surface that is optically-conjugate to the 1D pattern. Irradiation of the pattern-source can be on-axis or off-axis. While 1D pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source can be flat or curved. The IU may include a relay reflector. A PO's reflector may include multiple spatially-distinct reflecting elements aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the 1D pattern of the pattern-source.
    Type: Application
    Filed: May 18, 2017
    Publication date: November 23, 2017
    Inventors: Donis G. Flagello, David M. Williamson, Stephen P. Renwick, Daniel Gene Smith, Michael B. Binnard
  • Publication number: 20170336720
    Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.
    Type: Application
    Filed: June 21, 2017
    Publication date: November 23, 2017
    Inventors: Michael B. Binnard, Daniel Gene Smith, David M. Williamson
  • Publication number: 20170336716
    Abstract: Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece includes source of EUV radiation; a pattern-source defining 1D pattern: an illumination unit (IU) configured to irradiate the pattern-source; and projection optics (PO) configured to optically image, with a reduction factor N>1, the 1D pattern on image surface that is optically-conjugate to the 1D pattern. Irradiation of the pattern-source can be on-axis or off-axis. While 1D pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source can be flat or curved. The IU may include a relay reflector. A PO's reflector may include multiple spatially-distinct reflecting elements aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the 1D pattern of the pattern-source.
    Type: Application
    Filed: May 18, 2017
    Publication date: November 23, 2017
    Inventors: Donis G. Flagello, David M. Williamson, Stephen P. Renwick, Daniel Gene Smith, Michael B. Binnard
  • Publication number: 20170307863
    Abstract: Projection optical system for forming an image on a substrate and including an illumination relay lens and a projection lens each of which is a catadioptric system. The projection lens may include two portions in optical communication with one another, the first of which is dioptric and the second of which is catadioptric. In a specific case, the projection optical system satisfies 4 < ? ? I ? ? ? T ? < 30 , where ?I and ?T are magnifications of the first portion and the overall projection lens. Optionally, the projection lens may be structured to additionally satisfy 6 < ? ? II ? ? ? T ? < 20 , where ?II is a magnification of the second portion. A digital scanner including such projection optical system and operating with UV light having a spectral bandwidth on the order of 1 picometer. Method for forming an image with such projection optical system.
    Type: Application
    Filed: July 5, 2017
    Publication date: October 26, 2017
    Inventor: David M. Williamson