Abstract: Optical objective dimensioned to operate as part of intravascular endoscope probe and including first and second groups of lens elements. The first group of lens elements includes a first meniscus lens with a negative dioptric power and a first optical doublet. The second group of lens elements include a sequence of second, third, and fourth optical doublets and a second meniscus lens with a positive dioptric power. At least one of the first and second groups of lens elements includes an aspheric refractive surface, thereby reducing distortion down to under 1% for field angles up to at least 40 degrees. Methods for using same, including embodiments with such multiple optical objectives used for acquisition of images of targets with fixed FOV and image fusion, providing enhanced imaging data for target analysis.

Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.

Abstract: A catoptric system for EUV lithography includes six freeform reflective surfaces that are specified based on fringe Zernike polynomials. Each of the surfaces is tilted and/or decentered in a meridian plane and with respect to a common axis so that image and object planes are parallel. Rectangular fields can be imaged with image space numerical aperture of at least 0.5.

Abstract: A catadioptric microscope objective color-corrected for any wavelength in 190 nm to 1000 nm operational range and containing primary spherical front-surface mirror devoid of a through-hole and rear-surface plane-parallel mirror, each of which mirrors has a corresponding reflective annular coating defining an aperture formed in such coating coaxially with the optical axis. The objective, devoid of a Mangin element, is configured such that for any optical field with a diameter smaller than about 50 microns the Strehl ratio is no lower than 0.0781, and/or longitudinal spherical aberration is no larger than 0.0008 mm, and/or the astigmatism is smaller than 0.0005 mm, and/or distortion is smaller than 0.012 percent within the operational range.

Abstract: A catadioptric microscope objective color-corrected for any wavelength in 190 nm to 1000 nm operational range and containing primary spherical front-surface mirror devoid of a through-hole and rear-surface plane-parallel mirror, each of which mirrors has a corresponding reflective annular coating defining an aperture formed in such coating coaxially with the optical axis. The objective, devoid of a Mangin element, is configured such that for any optical field with a diameter smaller than about 50 microns the Strehl ratio is no lower than 0.0781, and/or longitudinal spherical aberration is no larger than 0.0008 mm, and/or the astigmatism is smaller than 0.0005 mm, and/or distortion is smaller than 0.012 percent within the operational range.

Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.

Abstract: Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece includes source of EUV radiation; a pattern-source defining 1D pattern: an illumination unit (IU) configured to irradiate the pattern-source; and projection optics (PO) configured to optically image, with a reduction factor N>1, the 1D pattern on image surface that is optically-conjugate to the 1D pattern. Irradiation of the pattern-source can be on-axis or off-axis. While 1D pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source can be flat or curved. The IU may include a relay reflector. A PO's reflector may include multiple spatially-distinct reflecting elements aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the 1D pattern of the pattern-source.

Abstract: Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece includes source of EUV radiation; a pattern-source defining 1D pattern; an illumination unit (IU) configured to irradiate the pattern-source; and projection optics (PO) configured to optically image, with a reduction factor N>1, the 1D pattern on image surface that is optically-conjugate to the 1D pattern. Irradiation of the pattern-source can be on-axis or off-axis. While 1D pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source can be flat or curved. The IU may include a relay reflector. A PO's reflector may include multiple spatially-distinct reflecting elements aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the 1D pattern of the pattern-source.

Abstract: Projection optical system for forming an image on a substrate and including an illumination relay lens and a projection lens each of which is a catadioptric system. The projection lens may include two portions in optical communication with one another, the first of which is dioptric and the second of which is catadioptric. In a specific case, the projection optical system satisfies 4 < ? ? I ? ? ? T ? < 30 , where ?I and ?T are magnifications of the first portion and the overall projection lens. Optionally, the projection lens may be structured to additionally satisfy 6 < ? ? II ? ? ? T ? < 20 , where ?II is a magnification of the second portion. A digital scanner including such projection optical system and operating with UV light having a spectral bandwidth on the order of 1 picometer. Method for forming an image with such projection optical system.

Abstract: Non-telecentric in image space optical objective dimensioned to operate as part of intravascular endoscope probe and including first and second groups of lens elements (separated by an aperture stop) each of which has negative optical power. The first group of lens elements includes a first meniscus lens with a positive dioptric power and a first optical doublet. The second group of lens elements includes a sequence of second and third optical doublets and a second meniscus lens that follows the third optical doublet. At least one of the first and second groups of lens elements includes an aspheric refractive surface, thereby reducing distortion down to under 0.25% for field angles up to at least 40 degrees.

Abstract: Optical objective dimensioned to operate as part of intravascular endoscope probe and including first and second groups of lens elements. The first group of lens elements includes a first meniscus lens with a negative dioptric power and a first optical doublet. The second group of lens elements include a sequence of second, third, and fourth optical doublets and a second meniscus lens with a positive dioptric power. At least one of the first and second groups of lens elements includes an aspheric refractive surface, thereby reducing distortion down to under 1% for field angles up to at least 40 degrees. Methods for using same, including embodiments with such multiple optical objectives used for acquisition of images of targets with fixed FOV and image fusion, providing enhanced imaging data for target analysis.

Abstract: Projection optical system for forming an image on a substrate and including an illumination relay lens and a projection lens each of which is a catadioptric system. The projection lens may include two portions in optical communication with one another, the first of which is dioptric and the second of which is catadioptric. In a specific case, the projection optical system satisfies 4 < ? ? I ? ? ? T ? < 30 , where ?I and ?T are magnifications of the first portion and the overall projection lens. Optionally, the projection lens may be structured to additionally satisfy 6 < ? ? II ? ? ? T ? < 20 , where ?II is a magnification of the second portion. A digital scanner including such projection optical system and operating with UV light having a spectral bandwidth on the order of 1 picometer. Method for forming an image with such projection optical system.

Abstract: Projection optical system for forming an image on a substrate and including an illumination relay lens and a projection lens each of which is a catadioptric system. The projection lens may include two portions in optical communication with one another, the first of which is dioptric and the second of which is catadioptric. In a specific case, the projection optical system satisfies 4 < ? ? I ? ? ? T ? < 30 , where ?I and ?T are magnifications of the first portion and the overall projection lens. Optionally, the projection lens may be structured to additionally satisfy 6 < ? ? II ? ? ? T ? < 20 , where ?II is a magnification of the second portion. A digital scanner including such projection optical system and operating with UV light having a spectral bandwidth on the order of 1 picometer. Method for forming an image with such projection optical system.

Abstract: An exemplary method involves, in a system comprising a tool that performs a task on a workpiece, a method for determining displacement of the workpiece relative to the tool. Respective displacements of loci of at least a region of the workpiece are mapped using a Goos-Hänchen-insensitive (GH-insensitive) displacement sensor to produce a first set of physical displacement data for the region. Also mapped are respective displacements, from the tool, of the loci using a GH sensitive sensor to produce a second set of optical displacement data for the region. Goodness of fit (GOF) is determined of the second set of data with the first set. According to the GOF, respective GH-correction (GHC) coefficients are determined for at least one locus of the region. When measuring displacement of the at least one locus in the region relative to the tool, the respective GHC coefficient is applied to the measured displacement to reduce an error that otherwise would be present in the measured displacement due to a GH effect.

Abstract: Projection optical system for forming an image on a substrate and including an illumination relay lens and a projection lens each of which is a catadioptric system. The projection lens may include two portions in optical communication with one another, the first of which is dioptric and the second of which is catadioptric. In a specific case, the projection optical system satisfies 4 < ? ? I ? ? ? T ? < 30 , where ?I and ?T are magnifications of the first portion and the overall projection lens. Optionally, the projection lens may be structured to additionally satisfy 6 < ? ? II ? ? ? T ? < 20 , where ?II is a magnification of the second portion. A digital scanner including such projection optical system and operating with UV light having a spectral bandwidth on the order of 1 picometer. Method for forming an image with such projection optical system.

Abstract: Projection optical system for forming an image on a substrate and including an illumination relay lens and a projection lens each of which is a catadioptric system. The projection lens may include two portions in optical communication with one another, the first of which is dioptric and the second of which is catadioptric. In a specific case, the projection optical system satisfies 4 < ? ? I ? ? ? T ? < 30 , where ?I and ?T are magnifications of the first portion and the overall projection lens. Optionally, the projection lens may be structured to additionally satisfy 6 < ? ? II ? ? ? T ? < 20 , where ?II is a magnification of the second portion. A digital scanner including such projection optical system and operating with UV light having a spectral bandwidth on the order of 1 picometer. Method for forming an image with such projection optical system.

Abstract: An exemplary method involves, in a system comprising a tool that performs a task on a workpiece, a method for determining displacement of the workpiece relative to the tool. Respective displacements of loci of at least a region of the workpiece are mapped using a Goos-Hänchen-insensitive (GH-insensitive) displacement sensor to produce a first set of physical displacement data for the region. Also mapped are respective displacements, from the tool, of the loci using a GH sensitive sensor to produce a second set of optical displacement data for the region. Goodness of fit (GOF) is determined of the second set of data with the first set. According to the GOF, respective GH-correction (GHC) coefficients are determined for at least one locus of the region. When measuring displacement of the at least one locus in the region relative to the tool, the respective GHC coefficient is applied to the measured displacement to reduce an error that otherwise would be present in the measured displacement due to a GH effect.

Abstract: An exemplary method involves, in a system comprising a tool that performs a task on a workpiece, a method for determining displacement of the workpiece relative to the tool. Respective displacements of loci of at least a region of the workpiece are mapped using a Goos-Hänchen-insensitive (GH-insensitive) displacement sensor to produce a first set of physical displacement data for the region. Also mapped are respective displacements, from the tool, of the loci using a GH sensitive sensor to produce a second set of optical displacement data for the region. Goodness of fit (GOF) is determined of the second set of data with the first set. According to the GOF, respective GH-correction (GHC) coefficients are determined for at least one locus of the region. When measuring displacement of the at least one locus in the region relative to the tool, the respective GHC coefficient is applied to the measured displacement to reduce an error that otherwise would be present in the measured displacement due to a GH effect.

Abstract: A catoptric system for EUV lithography includes six freeform reflective surfaces that are specified based on fringe Zernike polynomials. Each of the surfaces is tilted and/or decentered in a meridian plane and with respect to a common axis so that image and object planes are parallel. Rectangular fields can be imaged with image space numerical aperture of at least 0.5.

Abstract: New and useful concepts for an imaging optical system configured to simultaneously image a reticle to a pair of imaging locations are provided, where the imaging optics comprise a pair of arms, each of which includes catadioptric imaging optics. In addition, the imaging optics are preferably designed to image a reticle simultaneously to the pair of imaging locations, at a numerical aperture of at least 1.3, and without obscuration of light by the imaging optics.