Patents by Inventor David R. Medeiros

David R. Medeiros has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask-making using resist having SIO bond-containing polymer
    Patent number: 6420084
    Abstract: The invention provides improved resist compositions and lithographic methods using the resist compositions of the invention. The resist compositions of the invention are acid-catalyzed resists which are characterized by the presence of an SiO-containing polymer. The invention also encompasses methods of forming patterned material layers (especially conductive, semiconductive, or magnetic material structures) using the combination of the SiO-containing resist and a halogen compound-containing pattern transfer etchant where the halogen is Cl, Br or I.
    Type: Grant
    Filed: June 23, 2000
    Date of Patent: July 16, 2002
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Robert N. Lang, Arpan P. Mahorowala, David R. Medeiros, Wayne M. Moreau
  • Polymers and use thereof
    Publication number: 20020090574
    Abstract: Compositions comprising a polymer having silicon, germanium and/or tin; and a protecting group grafted onto a polymeric backbone are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.
    Type: Application
    Filed: January 9, 2002
    Publication date: July 11, 2002
    Inventors: Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros
  • Underlayer compositions for multilayer lithographic processes
    Publication number: 20020058204
    Abstract: Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslinker, or (B) a polymer containing: (i) saturated polycyclic moieties, and (ii) aromatic moieties for compositions requiring a separate crosslinker. The compositions provide outstanding optical, mechanical and etch selectivity properties. The compositions are especially useful in lithographic processes using radiation less than 200 nm in wavelength to configure underlying material layers.
    Type: Application
    Filed: December 21, 2001
    Publication date: May 16, 2002
    Applicant: International Business Machines Corporation
    Inventors: Mahmoud M. Khojasteh, Timothy M. Hughes, Ranee W. Kwong, Pushkara Rao Varanasi, William R. Brunsvold, Margaret C. Lawson, Robert D. Allen, David R. Medeiros, Ratnam Sooriyakumaran, Phillip Brock
  • Polymers and use thereof
    Patent number: 6346362
    Abstract: Compositions comprising a polymer having silicon, germanium and/or tin; and a protecting group grafted onto a polymeric backbone are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.
    Type: Grant
    Filed: June 15, 2000
    Date of Patent: February 12, 2002
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros
  • Radiation sensitive compositions comprising polymer having acid labile groups
    Patent number: 5362600
    Abstract: The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.
    Type: Grant
    Filed: May 25, 1993
    Date of Patent: November 8, 1994
    Assignee: Shipley Company Inc.
    Inventors: Roger Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro
  • Radiation sensitive compositions comprising polymer having acid labile groups
    Patent number: 5258257
    Abstract: The invention provides a radiation sensitive composition having a polymer binder of phenolic and cyclic alcohol units. At least a portion of the phenolic units and/or cyclic alcohol units of the polymer are bonded to acid labile groups. High solubility differentials between exposed and unexposed regions are realized with only moderate substitution of the binder with the acid labile groups.
    Type: Grant
    Filed: September 23, 1991
    Date of Patent: November 2, 1993
    Assignee: Shipley Company Inc.
    Inventors: Roger Sinta, Richard C. Hemond, David R. Medeiros, Martha M. Rajaratnam, James W. Thackeray, Dianne Canistro