Abstract: The present disclosure relates to techniques for evaluating an electromagnetic field of a device under test.

Abstract: An edge seal for sealing an outer surface of a lower electrode assembly configured to support a semiconductor substrate in a plasma processing chamber, the lower electrode assembly including an annular groove defined between a lower member and an upper member of the lower electrode assembly. The edge seal includes an elastomeric band configured to be arranged within the groove, the elastomeric band having an annular upper surface, an annular lower surface, an inner surface, and an outer surface. When the elastomeric band is in an uncompressed state, the outer surface of the elastomeric band is concave. When the upper and lower surfaces are axially compressed at least 1% such that the elastomeric band is in a compressed state, an outward bulging of the outer surface is not greater than a predetermined distance. The predetermined distance corresponds to a maximum outer diameter of the elastomeric band in the uncompressed state.

Abstract: A high frame rate image system in a theme park attraction simultaneously displays images that are unique to each individual viewer. Although all viewers in a room or theater may be watching the same screen or area, they may see entirely different images. This allows the attraction to present more complex story narratives, and also allows the projected images to be matched to specific guests.

Abstract: An edge seal for sealing an outer surface of a lower electrode assembly configured to support a semiconductor substrate in a plasma processing chamber, the lower electrode assembly including an annular groove defined between a lower member and an upper member of the lower electrode assembly. The edge seal includes an elastomeric band configured to be arranged within the groove, the elastomeric band having an annular upper surface, an annular lower surface, an inner surface, and an outer surface. When the elastomeric band is in an uncompressed state, the outer surface of the elastomeric band is concave. When the upper and lower surfaces are axially compressed at least 1% such that the elastomeric band is in a compressed state, an outward bulging of the outer surface is not greater than a predetermined distance. The predetermined distance corresponds to a maximum outer diameter of the elastomeric band in the uncompressed state.

Abstract: An edge ring configured to surround an outer periphery of a substrate support in a plasma processing chamber wherein plasma is generated and used to process a substrate is disclosed, the substrate support comprising a base plate, a top plate, an elastomer seal assembly between the base plate and the top plate, and an elastomer seal configured to surround the elastomer seal assembly. The edge ring includes an upper inner surface having an edge step directed towards an interior portion of the edge ring and arranged to extend from an outer periphery of a top surface of the top plate to an outer periphery of an upper surface of the base plate, a lower inner surface, an outer surface, a lower surface extending from the lower inner surface to the outer surface, and a top surface extending from the outer surface to the upper inner surface.

Abstract: The present disclosure relates to thermal contrast therapy systems, and automated thermal contrast therapy devices configured to interact with such systems and to perform customized thermal contrast therapy treatment sequences. Treatments may be prescribed by a treatment provider or selected by a user of a thermal contrast therapy device associated with such a system. In some embodiments, a thermal contrast therapy device may be configured to receive an indication from one or more temperature sensors and/or flow meters and to effect a desired measure of heat transfer during treatment, for example, by automatically adjusting the temperature and/or flow rate of the heat transfer fluid. In some embodiments, a thermal contrast therapy device may be configured to receive an indication of one or more physiological parameter values and to perform a customized thermal contrast therapy treatment sequence based, at least in part, on the one or more physiological parameter values.

Abstract: The present disclosure relates to thermal contrast therapy devices, treatment methods for providing thermal contrast therapy, and systems for providing and managing thermal contrast therapy treatments. The thermal contrast therapy devices disclosed herein are configured to provide a sequence of alternating cooling periods and heating periods to one or more areas of a patient's body. A thermal contrast therapy device may comprise a source of hot fluid, a source of cold fluid, and one or more pumps configured to circulate fluid through one or more treatment pads in fluid communication with the device. The thermal contrast therapy devices disclosed herein are configured to rapidly and efficiently transition between alternating cooling periods and heating periods.

Abstract: A system is disclosed for measuring an impedance of a plasma processing chamber. The system includes a radiofrequency signal generator configured to output a radiofrequency signal based on a frequency setpoint and provide an indication of an actual frequency of the radiofrequency signal, where the actual frequency can be different than the frequency setpoint. The system includes an impedance control module including at least one variable impedance control device. A difference between the actual frequency of the radiofrequency signal as output by the radiofrequency signal generator and the frequency setpoint is partially dependent upon a setting of the at least one variable impedance control device and is partially dependent upon the impedance of the plasma processing chamber. The system includes a connector configured to connect with a radiofrequency signal supply line of the plasma processing chamber. The impedance control module is connected between the radiofrequency signal generator and the connector.

Abstract: The present disclosure relates to pontoon shields. The pontoon shields disclosed herein may, for example, protect pontoons from damage and/or enhance the aesthetic appearance of pontoons. The shields may be fashioned from one or more segments of resilient material configured to attach along a longitudinal aspect of a pontoon. The shields may be fashioned from a single segment, or from one or more segments configured to mate with one another. The shields may be attached to a pontoon, for example, via an adhesive, weld, and/or one or more brackets, or other mechanical means.

Abstract: The present disclosure relates to pontoon shields. The pontoon shields disclosed herein may, for example, protect pontoons from damage and/or enhance the aesthetic appearance of pontoons. The shields may be fashioned from one or more segments of resilient material configured to attach along a longitudinal aspect of a pontoon. The shields may be fashioned from a single segment, or from one or more segments configured to mate with one another. The shields may be attached to a pontoon, for example, via an adhesive, weld, and/or one or more brackets, or other mechanical means.

Abstract: A system is disclosed for measuring an impedance of a plasma processing chamber. The system includes a radiofrequency signal generator configured to output a radiofrequency signal based on a frequency setpoint and provide an indication of an actual frequency of the radiofrequency signal, where the actual frequency can be different than the frequency setpoint. The system includes an impedance control module including at least one variable impedance control device. A difference between the actual frequency of the radiofrequency signal as output by the radiofrequency signal generator and the frequency setpoint is partially dependent upon a setting of the at least one variable impedance control device and is partially dependent upon the impedance of the plasma processing chamber. The system includes a connector configured to connect with a radiofrequency signal supply line of the plasma processing chamber. The impedance control module is connected between the radiofrequency signal generator and the connector.

Abstract: An edge seal for sealing an outer surface of a lower electrode assembly configured to support a semiconductor substrate in a plasma processing chamber, the lower electrode assembly including an annular groove defined between a lower member and an upper member of the lower electrode assembly. The edge seal includes an elastomeric band configured to be arranged within the groove, the elastomeric band having an annular upper surface, an annular lower surface, an inner surface, and an outer surface. When the elastomeric band is in an uncompressed state, the outer surface of the elastomeric band is concave. When the upper and lower surfaces are axially compressed at least 1% such that the elastomeric band is in a compressed state, an outward bulging of the outer surface is not greater than a predetermined distance. The predetermined distance corresponds to a maximum outer diameter of the elastomeric band in the uncompressed state.

Abstract: An improved gas injection assembly for mounting in a central bore of a dielectric window of an inductively coupled plasma chamber includes a window having a central bore and cylindrical recess configured to receive an annular insert having a bayonet opening. The gas injector assembly includes a gas injector, an RF shield surrounding the gas injector, and a faceplate surrounding the RF shield, the faceplate including projections at the bottom thereof for engaging the bayonet opening in the annular insert. The window and gas injection assembly are designed to avoid chipping of the window which is typically made of quartz and in prior mounting arrangements the window has a bayonet opening machined therein. Due to the brittle nature of the quartz material, the machined bayonet opening was subject to chipping when the gas injector assembly was inserted into the bayonet opening.

Abstract: A lower electrode assembly useful for supporting a semiconductor substrate in a plasma processing chamber includes a temperature controlled lower base plate, an upper plate, a mounting groove surrounding a bond layer and an edge seal comprising an elastomeric band having an outer concave surface in an uncompressed state, the band mounted in the groove such that upper and lower ends of the band are axially compressed and a maximum outward bulging of the band is no greater than a predetermined distance.

Abstract: A lower electrode assembly useful for supporting a semiconductor substrate in a plasma processing chamber includes a temperature controlled lower base plate, an upper plate, a mounting groove surrounding a bond layer and an edge seal comprising an elastomeric band having an outer concave surface in an uncompressed state, the band mounted in the groove such that upper and lower ends of the band are axially compressed and a maximum outward bulging of the band is no greater than a predetermined distance.

Abstract: The present disclosure relates to pontoon shields. The pontoon shields disclosed herein may, for example, protect pontoons from damage and/or enhance the aesthetic appearance of pontoons. The shields may be fashioned from one or more segments of resilient material configured to attach along a longitudinal aspect of a pontoon. The shields may be fashioned from a single segment, or from one or more segments configured to mate with one another. The shields may be attached to a pontoon, for example, via an adhesive, weld, and/or one or more brackets, or other mechanical means.

Abstract: The present disclosure relates to pontoon shields. The pontoon shields disclosed herein may, for example, protect pontoons from damage and/or enhance the aesthetic appearance of pontoons. The shields may be fashioned from one or more segments of resilient material configured to attach along a longitudinal aspect of a pontoon. The shields may be fashioned from a single segment, or from one or more segments configured to mate with one another. The shields may be attached to a pontoon, for example, via an adhesive, weld, and/or one or more brackets, or other mechanical means.

Abstract: An installation fixture adapted to mount an elastomer band in a mounting groove around a semiconductor substrate support used for supporting a semiconductor substrate in a plasma processing chamber is disclosed, which includes an annular ring having a vertically extending portion on an outer edge of the ring and adapted to receive the elastomer band, and a base plate configured to be attached to the annular ring, the base plate having a plurality of radially extending portions adapted to receive a plurality of mechanical fasteners at locations corresponding to mounting holes in the semiconductor substrate support.

Abstract: The present disclosure relates to thermal contrast therapy systems, and automated thermal contrast therapy devices configured to interact with such systems and to perform customized thermal contrast therapy treatment sequences. Treatments may be prescribed by a treatment provider or selected by a user of a thermal contrast therapy device associated with such a system. In some embodiments, a thermal contrast therapy device may be configured to receive an indication from one or more temperature sensors and/or flow meters and to effect a desired measure of heat transfer during treatment, for example, by automatically adjusting the temperature and/or flow rate of the heat transfer fluid. In some embodiments, a thermal contrast therapy device may be configured to receive an indication of one or more physiological parameter values and to perform a customized thermal contrast therapy treatment sequence based, at least in part, on the one or more physiological parameter values.

Abstract: Systems and methods may detect a proximity of one or more client devices to a venue that provides ambient music and generate an anonymous playlist based on preference data associated with the one or more client devices. Additionally, the anonymous playlist may be sent to the venue. In one example, one or more additional venue suggestions are sent to at least one of the one or more client devices based on the preference data and one or more playlists associated with the one or more additional venues.