Patents by Inventor David Ziger

David Ziger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and mask design to minimize reflective notching effects
    Patent number: 5780208
    Abstract: A method is described for reducing light scatter in lithographically producing a resist feature wherein the dosage of light beyond the immediate periphery of the desired feature is subjected to a lower dosage of light than is required to properly define the edges of the resist feature. In addition, a mask is described which is partially opaque in those areas remote from the area delineating the desired feature.
    Type: Grant
    Filed: October 17, 1996
    Date of Patent: July 14, 1998
    Assignee: VLSI Technology, Inc.
    Inventors: David Ziger, Pierre Leroux